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公开(公告)号：US08454413B2
公开(公告)日：2013-06-04
申请号：US11614940
申请日：2006-12-21
申请人： Jeonghoon Oh , Tsz-Sin Siu , Hung Chih Chen , Andrew J. Nagengast , Steven M. Zuniga , Thomas B. Brezoczky
发明人： Jeonghoon Oh , Tsz-Sin Siu , Hung Chih Chen , Andrew J. Nagengast , Steven M. Zuniga , Thomas B. Brezoczky
IPC分类号： B24B41/06
CPC分类号： B24B37/30 , B24B41/06 , B29C33/424 , B29C35/02 , B29K2023/00 , B29K2083/00 , B29K2995/0074 , B29L2031/755
摘要： A flexible membrane for use in a carrier head has a generally circular main portion with a lower surface, an annular outer portion for connection to a base assembly, and an annular flap extending from the main portion on a side opposite the lower surface for connection to the base assembly. At least one surface of the flap has a surface texture to prevent adhesion.
摘要翻译： 用于载体头部的柔性膜具有大致圆形的主要部分，具有下表面，用于连接到基座组件的环形外部部分和从主体部分在与下表面相对的一侧延伸的环形挡片，用于连接到 基座组件。 翼片的至少一个表面具有表面纹理以防止粘附。
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公开(公告)号：US20110070810A1
公开(公告)日：2011-03-24
申请号：US12955803
申请日：2010-11-29
IPC分类号： B24B1/00
CPC分类号： B24B37/30
摘要： A carrier head for chemical mechanical polishing of a substrate includes a base and a flexible membrane extending beneath the base. The flexible membrane includes a central portion with an outer surface providing a substrate receiving surface, a perimeter portion connecting the central portion to the base, and at least one flap extending from an inner surface of the central portion. The flap divides a volume between the flexible membrane and the base into a plurality of chambers, and the flap includes a laterally extending first section and an angled second section extending beneath the first section and connecting the laterally extending first section to the central portion.
摘要翻译： 用于基板的化学机械抛光的承载头包括基部和在基部下方延伸的柔性膜。 柔性膜包括具有提供基板接收表面的外表面的中心部分，将中心部分连接到基部的周边部分和从中心部分的内表面延伸的至少一个折片。 翼片将柔性膜和基部之间的体积分成多个室，并且该翼片包括横向延伸的第一部分和在第一部分下方延伸并且将横向延伸的第一部分连接到中心部分的成角度的第二部分。
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公开(公告)号：US20130334752A1
公开(公告)日：2013-12-19
申请号：US13908774
申请日：2013-06-03
申请人： Jeonghoon Oh , Tsz-Sin Siu , Hung Chih Chen , Andrew J. Nagengast , Steven M. Zuniga , Thomas B. Brezoczky
发明人： Jeonghoon Oh , Tsz-Sin Siu , Hung Chih Chen , Andrew J. Nagengast , Steven M. Zuniga , Thomas B. Brezoczky
IPC分类号： B24B37/30
CPC分类号： B24B37/30 , B24B41/06 , B29C33/424 , B29C35/02 , B29K2023/00 , B29K2083/00 , B29K2995/0074 , B29L2031/755
摘要： A flexible membrane for use in a carrier head has a generally circular main portion with a lower surface, an annular outer portion for connection to a base assembly, and an annular flap extending from the main portion on a side opposite the lower surface for connection to the base assembly. At least one surface of the flap has a surface texture to prevent adhesion.
摘要翻译： 用于载体头部的柔性膜具有大致圆形的主要部分，具有下表面，用于连接到基座组件的环形外部部分和从主体部分在与下表面相对的一侧延伸的环形挡片，用于连接到 基座组件。 翼片的至少一个表面具有表面纹理以防止粘附。
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公开(公告)号：US07842158B2
公开(公告)日：2010-11-30
申请号：US11837412
申请日：2007-08-10
IPC分类号： B24B29/00
CPC分类号： B24B37/30
摘要： A carrier head for chemical mechanical polishing of a substrate includes a base and a flexible membrane extending beneath the base. The flexible membrane includes a central portion with an outer surface providing a substrate receiving surface, a perimeter portion connecting the central portion to the base, and at least one flap extending from an inner surface of the central portion. The flap divides a volume between the flexible membrane and the base into a plurality of chambers, and the flap includes a laterally extending first section and an angled second section extending beneath the first section and connecting the laterally extending first section to the central portion.
摘要翻译： 用于基板的化学机械抛光的承载头包括基部和在基部下方延伸的柔性膜。 柔性膜包括具有提供基板接收表面的外表面的中心部分，将中心部分连接到基部的周边部分和从中心部分的内表面延伸的至少一个折片。 翼片将柔性膜和基部之间的体积分成多个室，并且该翼片包括横向延伸的第一部分和在第一部分下方延伸并且将横向延伸的第一部分连接到中心部分的成角度的第二部分。
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公开(公告)号：US07255771B2
公开(公告)日：2007-08-14
申请号：US10810784
申请日：2004-03-26
IPC分类号： B24B29/00
CPC分类号： B24B37/30
摘要： A carrier head for chemical mechanical polishing of a substrate includes a base and a flexible membrane extending beneath the base. The flexible membrane includes a central portion with an outer surface providing a substrate receiving surface, a perimeter portion connecting the central portion to the base, and at least one flap extending from an inner surface of the central portion. The flap divides a volume between the flexible membrane and the base into a plurality of chambers, and the flap includes a laterally extending first section and an angled second section extending beneath the first section and connecting the laterally extending first section to the central portion.
摘要翻译： 用于基板的化学机械抛光的承载头包括基部和在基部下方延伸的柔性膜。 柔性膜包括具有提供基板接收表面的外表面的中心部分，将中心部分连接到基部的周边部分和从中心部分的内表面延伸的至少一个折片。 翼片将柔性膜和基部之间的体积分成多个室，并且该翼片包括横向延伸的第一部分和在第一部分下方延伸并且将横向延伸的第一部分连接到中心部分的成角度的第二部分。
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公开(公告)号：US08088299B2
公开(公告)日：2012-01-03
申请号：US12955803
申请日：2010-11-29
CPC分类号： B24B37/30
摘要： A carrier head for chemical mechanical polishing of a substrate includes a base and a flexible membrane extending beneath the base. The flexible membrane includes a central portion with an outer surface providing a substrate receiving surface, a perimeter portion connecting the central portion to the base, and at least one flap extending from an inner surface of the central portion. The flap divides a volume between the flexible membrane and the base into a plurality of chambers, and the flap includes a laterally extending first section and an angled second section extending beneath the first section and connecting the laterally extending first section to the central portion.
摘要翻译： 用于基板的化学机械抛光的承载头包括基部和在基部下方延伸的柔性膜。 柔性膜包括具有提供基板接收表面的外表面的中心部分，将中心部分连接到基部的周边部分和从中心部分的内表面延伸的至少一个折片。 翼片将柔性膜和基部之间的体积分成多个室，并且该翼片包括横向延伸的第一部分和在第一部分下方延伸并且将横向延伸的第一部分连接到中心部分的成角度的第二部分。
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公开(公告)号：US07081042B2
公开(公告)日：2006-07-25
申请号：US11004223
申请日：2004-12-02
申请人： Hung Chih Chen , Steven M. Zuniga , Tsz-Sin Siu
发明人： Hung Chih Chen , Steven M. Zuniga , Tsz-Sin Siu
IPC分类号： B24B1/00
CPC分类号： B24B37/345 , B24B37/30
摘要： Techniques for removing a substrate from a polishing pad are described. A substrate is pulled away from the polishing pad such that the edges of the substrate are pulled away from the polishing pad before the center of the substrate is pulled from the polishing pad.
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公开(公告)号：US08298047B2
公开(公告)日：2012-10-30
申请号：US12987709
申请日：2011-01-10
申请人： Steven M. Zuniga , Hung Chih Chen
发明人： Steven M. Zuniga , Hung Chih Chen
IPC分类号： B24B5/35
摘要： A retainer is used with an apparatus for polishing a substrate. The substrate has upper and lower surfaces and a lateral, substantially circular, perimeter. The apparatus has a polishing pad with an upper polishing surface for contacting and polishing the lower face of the substrate. The retainer has an inward facing retaining face for engaging and retaining the substrate against lateral movement during polishing of the substrate. The retaining face engages a substrate perimeter at more than substantially a single discrete circumferential location along the perimeter.
摘要翻译： 保持器用于抛光衬底的装置。 衬底具有上表面和下表面以及侧面，基本上圆形的周边。 该装置具有抛光垫，该抛光垫具有用于接触和抛光基底的下表面的上抛光表面。 保持器具有向内的保持面，用于在衬底的抛光期间接合和保持衬底以防止横向移动。 保持面在沿着周边的基本上一个单独的离散圆周位置处接合基底周边。
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公开(公告)号：US20110104990A1
公开(公告)日：2011-05-05
申请号：US12987709
申请日：2011-01-10
申请人： Steven M. Zuniga , Hung Chih Chen
发明人： Steven M. Zuniga , Hung Chih Chen
摘要： A retainer is used with an apparatus for polishing a substrate. The substrate has upper and lower surfaces and a lateral, substantially circular, perimeter. The apparatus has a polishing pad with an upper polishing surface for contacting and polishing the lower face of the substrate. The retainer has an inward facing retaining face for engaging and retaining the substrate against lateral movement during polishing of the substrate. The retaining face engages a substrate perimeter at more than substantially a single discrete circumferential location along the perimeter.
摘要翻译： 保持器用于抛光衬底的装置。 衬底具有上表面和下表面以及侧面，基本上圆形的周边。 该装置具有抛光垫，该抛光垫具有用于接触和抛光基底的下表面的上抛光表面。 保持器具有向内的保持面，用于在衬底的抛光期间接合和保持衬底以防止横向移动。 保持面在沿着周边的基本上一个单独的离散圆周位置处接合基底周边。
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公开(公告)号：US07459057B2
公开(公告)日：2008-12-02
申请号：US10199738
申请日：2002-07-18
申请人： Steven M. Zuniga , Hung Chih Chen
发明人： Steven M. Zuniga , Hung Chih Chen
摘要： A retainer is used with an apparatus for polishing a substrate. The substrate has upper and lower surfaces and a lateral, substantially circular, perimeter. The apparatus has a polishing pad with an upper polishing surface for contacting and polishing the lower face of the substrate. The retainer has an inward facing retaining face for engaging and retaining the substrate against lateral movement during polishing of the substrate. The retaining face engages a substrate perimeter at more than substantially a single discrete circumferential location along the perimeter.
摘要翻译： 保持器用于抛光衬底的装置。 衬底具有上表面和下表面以及侧面，基本上圆形的周边。 该装置具有抛光垫，该抛光垫具有用于接触和抛光基底的下表面的上抛光表面。 保持器具有向内的保持面，用于在衬底的抛光期间接合和保持衬底以防止横向移动。 保持面在沿着周边的基本上一个单独的离散圆周位置处接合基底周边。
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