POSITIVE PHOTOSENSITIVE POLYIMIDE COMPOSITION
    1.
    发明申请
    POSITIVE PHOTOSENSITIVE POLYIMIDE COMPOSITION 有权
    正性光敏聚酰亚胺组合物

    公开(公告)号:US20110059397A1

    公开(公告)日:2011-03-10

    申请号:US12921281

    申请日:2009-03-06

    IPC分类号: G03F7/039

    摘要: The present invention relates to a positive photosensitive polyimide composition that includes polyimide, a polyamic acid, and a photoactive compound. An organic insulating layer for organic light-emitting devices (OLED), which includes the positive photosensitive polyimide composition, may control a taper angle and outgassing, and has excellent adhesion in respects to a substrate, water repellent control ability, and storage stability and the like.

    摘要翻译: 本发明涉及包含聚酰亚胺,聚酰胺酸和光敏化合物的正型感光性聚酰亚胺组合物。 包含正光敏聚酰亚胺组合物的有机发光元件(OLED)的有机绝缘层可以控制锥角和除气,并且在基板上具有优异的粘附性,防水性能和储存稳定性, 喜欢。

    Composition for liquid crystal aligning, liquid crystal aligning layer prepared from the same, and liquid crystal display comprising the same
    5.
    发明申请
    Composition for liquid crystal aligning, liquid crystal aligning layer prepared from the same, and liquid crystal display comprising the same 有权
    用于液晶取向的组合物,由其制备的液晶取向层以及包含该液晶显示器的液晶显示器

    公开(公告)号:US20070154656A1

    公开(公告)日:2007-07-05

    申请号:US11649163

    申请日:2007-01-04

    IPC分类号: C09K19/00 G02F1/1337

    摘要: The present invention to a composition for liquid crystal aligning comprising an oligoimide or oligoamic acid, which comprises a thermocurable or photocurable functional group on at least one end of the oligoimide or oligoamic acid backbone, a liquid crystal aligning layer prepared from the same, and a liquid crystal display comprising the same. The composition for liquid crystal aligning according to the present can minimize the generation of the decomposed by-products, which had been generated upon the use of polyimides, by using an oligoimide or oligoamic acid on at least one end of the backbone, instead of the conventional polyimides and has an excellent effect of improvement in alignment property, thermal stability, and image sticking.

    摘要翻译: 本发明涉及用于液晶取向的组合物,其包含寡酰亚胺或寡聚酸,其包含在低聚酰亚胺或寡聚酰胺酸主链的至少一端上的可热固化或光固化的官能团,由其制备的液晶取向层,以及 包含该液晶显示器的液晶显示器。 根据本发明的用于液晶取向的组合物可以通过在骨架的至少一端使用低聚酰亚胺或寡聚酰胺酸来代替使用聚酰亚胺时产生的分解的副产物的产生,而不是 常规的聚酰亚胺,并且具有优异的取向性,热稳定性和图像粘附性的改善效果。

    Composition for liquid crystal aligning, liquid crystal aligning layer prepared from the same, and liquid crystal display comprising the same
    7.
    发明授权
    Composition for liquid crystal aligning, liquid crystal aligning layer prepared from the same, and liquid crystal display comprising the same 有权
    用于液晶取向的组合物,由其制备的液晶取向层以及包含该液晶显示器的液晶显示器

    公开(公告)号:US07625611B2

    公开(公告)日:2009-12-01

    申请号:US11649163

    申请日:2007-01-04

    IPC分类号: C09K19/00 C09K19/06 C09K19/52

    摘要: The present invention to a composition for liquid crystal aligning comprising an oligoimide or oligoamic acid, which comprises a thermocurable or photocurable functional group on at least one end of the oligoimide or oligoamic acid backbone, a liquid crystal aligning layer prepared from the same, and a liquid crystal display comprising the same. The composition for liquid crystal aligning according to the present can minimize the generation of the decomposed by-products, which had been generated upon the use of polyimides, by using an oligoimide or oligoamic acid on at least one end of the backbone, instead of the conventional polyimides and has an excellent effect of improvement in alignment property, thermal stability, and image sticking.

    摘要翻译: 本发明涉及用于液晶取向的组合物,其包含寡酰亚胺或寡聚酸,其包含在低聚酰亚胺或寡聚酰胺酸主链的至少一端上的可热固化或光固化的官能团,由其制备的液晶取向层,以及 包含该液晶显示器的液晶显示器。 根据本发明的用于液晶取向的组合物可以通过在骨架的至少一端使用低聚酰亚胺或寡聚酰胺酸来代替使用聚酰亚胺时产生的分解的副产物的产生,而不是 常规的聚酰亚胺,并且具有优异的取向性,热稳定性和图像粘附性的改善效果。

    Negative photoresist composition and patterning method for device
    9.
    发明授权
    Negative photoresist composition and patterning method for device 有权
    负光致抗蚀剂组合物和装置的图案化方法

    公开(公告)号:US08795943B2

    公开(公告)日:2014-08-05

    申请号:US13100773

    申请日:2011-05-04

    IPC分类号: G03F7/00 G03F7/004 G03F7/40

    摘要: The present invention relates to a negative photoresist composition and a patterning method for device in which a photoresist pattern having a high sensitivity with a good reverse taper profile can be formed not only to realize an effective patterning of various thin films but also to facilitate removal of the photoresist pattern after the patterning. The photoresist composition comprises an alkali-soluble binder resin; a halogen-containing first photo-acid generator; a triazine-based second photo-acid generator; a cross-linking agent having an alkoxy structure; and a solvent.

    摘要翻译: 本发明涉及负光致抗蚀剂组合物及其构图方法,其中可形成具有良好反向锥形轮廓的高灵敏度的光致抗蚀剂图案,不仅可实现各种薄膜的有效图案化,而且有助于去除 图案化后的光致抗蚀剂图案。 光致抗蚀剂组合物包含碱溶性粘合剂树脂; 含卤素的第一光酸发生剂; 基于三嗪的第二光酸发生剂; 具有烷氧基结构的交联剂; 和溶剂。