公开(公告)号：US08470914B2

公开(公告)日：2013-06-25

申请号：US12861761

申请日：2010-08-23

申请人： Jung Ho Jo ,  Kyung Jun Kim ,  Hye Ran Seong ,  Hye Won Jeong ,  Chan Hyo Park ,  Yu Na Kim ,  Sang Woo Kim ,  Se Jin Shin ,  Kyoung Ho Ahn

发明人： Jung Ho Jo ,  Kyung Jun Kim ,  Hye Ran Seong ,  Hye Won Jeong ,  Chan Hyo Park ,  Yu Na Kim ,  Sang Woo Kim ,  Se Jin Shin ,  Kyoung Ho Ahn

IPC分类号： C08L79/08 ,  C08G69/26 ,  C08K5/41

CPC分类号： G03F7/0233 ,  C08G73/1042 ,  C08G73/1046 ,  C08G73/105 ,  C08G73/16 ,  C08L79/08 ,  G03F7/0048

摘要： The present invention relates to polyimide or precursor thereof represented by Chemical Formula 1 or 2 and a photosensitive resin composition including the same. The polyimide or precursor thereof are fabricated using diamine comprising polyalkyleneoxide. The photosensitive resin composition of the present invention has excellent light transmissivity, an excellent resolution, and excellent photo sensitivity and image forming performance. Further, the photosensitive resin composition has high adhesiveness with substrates, such as a silicon film, a silicon oxide film, and a metal film. In particular, an excellent film without failure, such as crack, can be formed.

摘要翻译： 本发明涉及由化学式1或2表示的聚酰亚胺或其前体和包含其的感光性树脂组合物。 聚酰亚胺或其前体使用包含聚环氧烷的二胺制造。 本发明的感光性树脂组合物具有优异的透光性，优异的分辨率，优异的光敏性和成像性能。 此外，感光性树脂组合物与硅膜，氧化硅膜，金属膜等基材的粘合性高。 特别地，可以形成无破裂的优异的膜，例如裂纹。

公开(公告)号：US08257901B2

公开(公告)日：2012-09-04

申请号：US12720364

申请日：2010-03-09

申请人： Sang Woo Kim ,  Chan Hyo Park ,  Kyung Jun Kim ,  Hye Ran Seong ,  Se Jin Shin ,  Dong Hyun Oh

发明人： Sang Woo Kim ,  Chan Hyo Park ,  Kyung Jun Kim ,  Hye Ran Seong ,  Se Jin Shin ,  Dong Hyun Oh

IPC分类号： G03F7/023 ,  C08G69/32

CPC分类号： G03F7/0233 ,  C08G73/1039 ,  C08G73/1042 ,  C08G73/1064 ,  C08L79/08 ,  G03F7/0045 ,  Y10S430/107

摘要： Polyimide-based polymers and copolymers thereof are provided. Further provided is a positive type photoresist composition comprising at least one of the polyimide-based polymers and copolymers thereof as a binder resin. The photoresist composition exhibits high resolution, high sensitivity, excellent film characteristics and improved mechanical properties, which are required for the formation of semiconductor buffer coatings.

摘要翻译： 提供了聚酰亚胺基聚合物及其共聚物。 还提供了包含作为粘合剂树脂的至少一种聚酰亚胺基聚合物及其共聚物的正型光致抗蚀剂组合物。 光致抗蚀剂组合物显示出形成半导体缓冲涂层所需的高分辨率，高灵敏度，优异的膜特性和改进的机械性能。

公开(公告)号：US20110123927A1

公开(公告)日：2011-05-26

申请号：US12994010

申请日：2009-05-20

申请人： Chan Hyo Park ,  Hye In Shin ,  Hye Ran Seong ,  Kyung Jun Kim ,  Dong Hyun Oh

发明人： Chan Hyo Park ,  Hye In Shin ,  Hye Ran Seong ,  Kyung Jun Kim ,  Dong Hyun Oh

IPC分类号： G03F7/004 ,  G03F7/20 ,  B05D3/02 ,  B05D7/24 ,  B05D7/14

CPC分类号： G03F7/0233 ,  G03F7/0046 ,  G03F7/40

摘要： A photosensitive resin composition is provided. The photosensitive resin composition comprises a) an alkali-soluble polyimide resin, b) an alkali-soluble novolak resin, c) a photosensitizer, and d) an organic solvent. The photosensitive resin composition is resistant to heat and can be used to form a pattern whose lateral angles are easily controllable. A large difference in developability between exposed and unexposed portions of the photosensitive resin composition is caused when patterning. The photosensitive resin composition is advantageous in terms of sensitivity, resolution, heat resistance and adhesiveness. Particularly, the lateral angles of the pattern can be easily controlled by varying the contents of the alkali-soluble resins. Therefore, the photosensitive resin composition is useful in the formation of an insulating film pattern of an organic light emitting diode (OLED).

摘要翻译： 提供感光性树脂组合物。 感光性树脂组合物包含a）碱溶性聚酰亚胺树脂，b）碱溶性酚醛清漆树脂，c）光敏剂，和d）有机溶剂。 感光性树脂组合物耐热，可用于形成其横向角度容易控制的图案。 当图案化时，引起感光性树脂组合物的曝光部与未曝光部之间的显影性差。 感光性树脂组合物在灵敏度，分辨率，耐热性和粘合性方面是有利的。 特别地，可以通过改变碱溶性树脂的含量来容易地控制图案的横向角度。 因此，感光性树脂组合物可用于形成有机发光二极管（OLED）的绝缘膜图案。

公开(公告)号：US20100233618A1

公开(公告)日：2010-09-16

申请号：US12720364

申请日：2010-03-09

申请人： Sang Woo KIM ,  Chan Hyo Park ,  Kyung Jun Kim ,  Hye Ran Seong ,  Se Jin Shin ,  Dong Hyun Oh

发明人： Sang Woo KIM ,  Chan Hyo Park ,  Kyung Jun Kim ,  Hye Ran Seong ,  Se Jin Shin ,  Dong Hyun Oh

IPC分类号： G03F7/004 ,  C08G73/10

CPC分类号： G03F7/0233 ,  C08G73/1039 ,  C08G73/1042 ,  C08G73/1064 ,  C08L79/08 ,  G03F7/0045 ,  Y10S430/107

摘要： Polyimide-based polymers and copolymers thereof are provided. Further provided is a positive type photoresist composition comprising at least one of the polyimide-based polymers and copolymers thereof as a binder resin. The photoresist composition exhibits high resolution, high sensitivity, excellent film characteristics and improved mechanical properties, which are required for the formation of semiconductor buffer coatings.

摘要翻译： 提供了聚酰亚胺基聚合物及其共聚物。 还提供了包含作为粘合剂树脂的至少一种聚酰亚胺基聚合物及其共聚物的正型光致抗蚀剂组合物。 光致抗蚀剂组合物显示出形成半导体缓冲涂层所需的高分辨率，高灵敏度，优异的膜特性和改进的机械性能。

公开(公告)号：US20100069520A1

公开(公告)日：2010-03-18

申请号：US12458352

申请日：2009-07-08

申请人： Sang-Woo Kim ,  Dong-Hyun Oh ,  Hye-In Shin ,  Hye-Ran Seong ,  Chan-Hyo Park ,  Kyung-Jun Kim

发明人： Sang-Woo Kim ,  Dong-Hyun Oh ,  Hye-In Shin ,  Hye-Ran Seong ,  Chan-Hyo Park ,  Kyung-Jun Kim

IPC分类号： C08G73/10 ,  C08F2/46

CPC分类号： G03F7/0395 ,  C08G73/1007 ,  C08G73/1028 ,  C08G73/1039 ,  C08G73/1042 ,  C08G73/1046 ,  C08G73/1067 ,  C08G73/1071 ,  C08J5/18 ,  C08J2379/08 ,  C08L79/08 ,  G03F7/0233

摘要： A block copolymer of a polyimide and a polyamic acid is disclosed. Further disclosed are a method for producing the block copolymer and a positive type photosensitive composition comprising the block copolymer. The solubility of the photosensitive composition in an alkaline aqueous solution is controlled to achieve high resolution of a pattern. Further disclosed are a protective film of a semiconductor device and an ITO insulating film of an organic light emitting diode (OLED), which are formed using the block copolymer. The protective film and the ITO insulating film are very stable over time.

摘要翻译： 公开了一种聚酰亚胺和聚酰胺酸的嵌段共聚物。 进一步公开了制备嵌段共聚物的方法和包含嵌段共聚物的正型感光组合物。 控制感光性组合物在碱性水溶液中的溶解度，实现图案的高分辨率。 还公开了使用嵌段共聚物形成的半导体器件和有机发光二极管（ITO）的ITO绝缘膜的保护膜。 保护膜和ITO绝缘膜随着时间的推移非常稳定。

公开(公告)号：US20110274853A1

公开(公告)日：2011-11-10

申请号：US13100773

申请日：2011-05-04

申请人： Chan-Hyo PARK ,  Kyung-Jun KIM ,  Yu-Na KIM

发明人： Chan-Hyo PARK ,  Kyung-Jun KIM ,  Yu-Na KIM

IPC分类号： G03F7/004 ,  B05D5/12 ,  G03F7/20

CPC分类号： G03F7/0384 ,  G03F7/0045 ,  G03F7/0382 ,  G03F7/30 ,  G03F7/38 ,  G03F7/40

摘要： The present invention relates to a negative photoresist composition and a patterning method for device in which a photoresist pattern having a high sensitivity with a good reverse taper profile can be formed not only to realize an effective patterning of various thin films but also to facilitate removal of the photoresist pattern after the patterning. The photoresist composition comprises an alkali-soluble binder resin; a halogen-containing first photo-acid generator; a triazine-based second photo-acid generator; a cross-linking agent having an alkoxy structure; and a solvent.

摘要翻译： 本发明涉及负光致抗蚀剂组合物及其构图方法，其中可形成具有良好反向锥形轮廓的高灵敏度的光致抗蚀剂图案，不仅可实现各种薄膜的有效图案化，而且有助于去除 图案化后的光致抗蚀剂图案。 光致抗蚀剂组合物包含碱溶性粘合剂树脂; 含卤素的第一光酸发生剂; 基于三嗪的第二光酸发生剂; 具有烷氧基结构的交联剂; 和溶剂。

公开(公告)号：US20110059397A1

公开(公告)日：2011-03-10

申请号：US12921281

申请日：2009-03-06

申请人： Hye-Ran Seong ,  Chan-Hyo Park ,  Dong-Hyun Oh ,  Hye-In Shin ,  Kyung-Jun Kim ,  Se-Jin Shin

发明人： Hye-Ran Seong ,  Chan-Hyo Park ,  Dong-Hyun Oh ,  Hye-In Shin ,  Kyung-Jun Kim ,  Se-Jin Shin

IPC分类号： G03F7/039

CPC分类号： G03F7/0233 ,  H01L51/5237 ,  H01L51/5253

摘要： The present invention relates to a positive photosensitive polyimide composition that includes polyimide, a polyamic acid, and a photoactive compound. An organic insulating layer for organic light-emitting devices (OLED), which includes the positive photosensitive polyimide composition, may control a taper angle and outgassing, and has excellent adhesion in respects to a substrate, water repellent control ability, and storage stability and the like.

摘要翻译： 本发明涉及包含聚酰亚胺，聚酰胺酸和光敏化合物的正型感光性聚酰亚胺组合物。 包含正光敏聚酰亚胺组合物的有机发光元件（OLED）的有机绝缘层可以控制锥角和除气，并且在基板上具有优异的粘附性，防水性能和储存稳定性， 喜欢。

公开(公告)号：US20080283210A1

公开(公告)日：2008-11-20

申请号：US11943474

申请日：2007-11-20

申请人： Jong Bae Kim ,  Jae Kee Lee ,  Jin Yul Jung ,  Chan Hyo Park ,  Jin Hwa Kim

发明人： Jong Bae Kim ,  Jae Kee Lee ,  Jin Yul Jung ,  Chan Hyo Park ,  Jin Hwa Kim

IPC分类号： B22C9/00 ,  B22C9/02

CPC分类号： B22C9/103 ,  B22C9/02

摘要： A method for manufacturing a cylinder head system for a vehicle includes manufacturing a first main mold having an exhaust manifold mold and a first water jacket mold; manufacturing a second main mold having a second water jacket mold; and assembling the first main mold to the second main mold. The exhaust manifold mold is configured to form an exhaust manifold, the first water jacket mold is configured to form a first water jacket for cooling the exhaust manifold, and the second water jacket mold is configured to form a second water jacket for cooling a cylinder block.

摘要翻译： 制造车辆用气缸盖系统的方法包括制造具有排气歧管模具和第一水套模具的第一主模具; 制造具有第二水套模具的第二主模具; 以及将所述第一主模具组装到所述第二主模具。 排气歧管模具被配置成形成排气歧管，第一水套模具构造成形成用于冷却排气歧管的第一水套，并且第二水套模具构造成形成用于冷却气缸体的第二水套 。

公开(公告)号：US20080141971A1

公开(公告)日：2008-06-19

申请号：US11950997

申请日：2007-12-05

申请人： Chan Hyo Park ,  Si Hun Lee ,  Wootae Kim ,  Ingee Suh ,  Jong Bae Kim ,  Jae Kee Lee

发明人： Chan Hyo Park ,  Si Hun Lee ,  Wootae Kim ,  Ingee Suh ,  Jong Bae Kim ,  Jae Kee Lee

IPC分类号： F02F1/42

CPC分类号： F02F1/4264 ,  F01N13/107 ,  Y02E20/16

摘要： Exhaust passages are integrally formed in at least a projection portion protruded from a side portion of a cylinder head. Interference between a vehicle body and an exhaust manifold can be reduced in a limited engine compartment space and engine performance can thereby be improved,

摘要翻译： 排气通道一体地形成在至少从气缸盖的侧部突出的突出部分中。 在有限的发动机舱空间中，可以减少车身与排气歧管之间的干扰，从而可以提高发动机性能，

公开(公告)号：US08795943B2

公开(公告)日：2014-08-05

申请号：US13100773

申请日：2011-05-04

申请人： Chan-Hyo Park ,  Kyung-Jun Kim ,  Yu-Na Kim

发明人： Chan-Hyo Park ,  Kyung-Jun Kim ,  Yu-Na Kim

IPC分类号： G03F7/00 ,  G03F7/004 ,  G03F7/40

CPC分类号： G03F7/0384 ,  G03F7/0045 ,  G03F7/0382 ,  G03F7/30 ,  G03F7/38 ,  G03F7/40

摘要： The present invention relates to a negative photoresist composition and a patterning method for device in which a photoresist pattern having a high sensitivity with a good reverse taper profile can be formed not only to realize an effective patterning of various thin films but also to facilitate removal of the photoresist pattern after the patterning. The photoresist composition comprises an alkali-soluble binder resin; a halogen-containing first photo-acid generator; a triazine-based second photo-acid generator; a cross-linking agent having an alkoxy structure; and a solvent.

摘要翻译： 本发明涉及负光致抗蚀剂组合物及其构图方法，其中可形成具有良好反向锥形轮廓的高灵敏度的光致抗蚀剂图案，不仅可实现各种薄膜的有效图案化，而且有助于去除 图案化后的光致抗蚀剂图案。 光致抗蚀剂组合物包含碱溶性粘合剂树脂; 含卤素的第一光酸发生剂; 基于三嗪的第二光酸发生剂; 具有烷氧基结构的交联剂; 和溶剂。