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    Positive-working resist composition
    1.
    发明授权
    Positive-working resist composition 有权
    正面抗蚀剂组成

    公开(公告)号：US07241551B2

    公开(公告)日：2007-07-10

    申请号：US10863347

    申请日：2004-06-09

    申请人： Hyou Takahashi ,  Tsukasa Yamanaka ,  Toru Fujimori

    发明人： Hyou Takahashi ,  Tsukasa Yamanaka ,  Toru Fujimori

    IPC分类号： G03F7/004

    CPC分类号： G03F7/0397 ,  G03F7/0045

    摘要： A positive-working resist composition comprising (A) a resin that increases solubility in an alkali developing solution by the action of an acid, (B) a compound which generates an acid upon irradiation of an actinic ray or radiation, (C) a nonionic cyclic compound having at least one partial structure represented by the following formula (I) or (II) and at least having either a melting point of 35° C. or more or a boiling point of 100° C./10 mmHg or more: and (D) a solvent.

    摘要翻译： 一种正性抗蚀剂组合物，其包含（A）通过酸的作用增加在碱性显影液中的溶解性的树脂，（B）在光化射线或辐射照射时产生酸的化合物，（C）非离子表面活性剂 具有至少一种由下式（I）或（II）表示的部分结构并且至少具有35℃或更高的熔点或沸点为100℃/ 10mmHg或更高的部分结构的环状化合物： 和（D）溶剂。

    Positive working photosensitive composition
    2.
    发明授权
    Positive working photosensitive composition 失效
    正光敏组合物

    公开(公告)号：US6013411A

    公开(公告)日：2000-01-11

    申请号：US794890

    申请日：1997-02-05

    申请人： Toshiaki Aoai ,  Toru Fujimori ,  Tsukasa Yamanaka ,  Kazuya Uenishi

    发明人： Toshiaki Aoai ,  Toru Fujimori ,  Tsukasa Yamanaka ,  Kazuya Uenishi

    IPC分类号： G03F7/004 ,  G03F7/039 ,  H01L21/027

    CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/106 ,  Y10S430/121 ,  Y10S430/122

    摘要： A positive working photosensitive composition comprising a resin having repeating units represented by the following formulae (I), (II) and (III), respectively and a compound which generates an acid with irradiation of an active ray or radiation: ##STR1## wherein R.sub.1 represents a hydrogen atom or a methyl group; R.sub.2 represents --C(.dbd.O)--O--C(R.sub.6) (R.sub.7) (R.sub.8) or --O--R.sub.5 --C(.dbd.O)--O--(R.sub.6) (R.sub.7) (R.sub.8); R.sub.3 represents --O--C(R.sub.6)(R.sub.7) (R.sub.8), --O--Si(R.sub.6)(R.sub.7)(Rs) or --O--C(R.sub.9)(R.sub.10)--OR.sub.11 ; R.sub.4 represents a hydrogen atom, a halogen atom, an alkyl group, an aryl group, an alkoxy group, an acyl group or an acyloxy group; R.sub.5 represents an alkylene group; R.sub.6, R.sub.7, R.sub.8, R.sub.9 and R.sub.10 each independently represents a hydrogen atom, an alkyl group, a cycloalkyl group or an alkenyl group, provided that at least two among R.sub.6, R.sub.7 and R.sub.8 are groups other than a hydrogen atom; R.sub.11 represents an alkyl group or an aryl group; two groups selected from R.sub.6, R.sub.7 and R.sub.8 and two groups selected from R.sub.9, R.sub.10 and R.sub.11, each two groups may be combined to form a ring; and n is an integer from 1 to 3.

    摘要翻译： 一种正性感光性组合物，其特征在于，具有分别具有下述式（I），（II）和（III）所示的重复单元的树脂和通过活性射线或辐射照射产生酸的化合物，其中R1表示氢 原子或甲基; R2表示-C（= O）-O-C（R6）（R7）（R8）或-O-R5-C（= O）-O-（R6）（R7）（R8） R3表示-O-C（R6）（R7）（R8），-O-Si（R6）（R7）（Rs）或-O-C（R9）（R10）-OR11; R4表示氢原子，卤素原子，烷基，芳基，烷氧基，酰基或酰氧基; R5表示亚烷基; R6，R7，R8，R9和R10各自独立地表示氢原子，烷基，环烷基或烯基，条件是R6，R7和R8中的至少两个是除氢原子以外的基团; R11表示烷基或芳基; 选自R6，R7和R8的两个基团和选自R9，R10和R11的两个基团，可以将两个基团组合形成环; n为1〜3的整数。

    Chemically amplified positive resist composition
    3.
    发明授权
    Chemically amplified positive resist composition 失效
    化学放大正光刻胶组合物

    公开(公告)号：US5939234A

    公开(公告)日：1999-08-17

    申请号：US655233

    申请日：1996-06-05

    申请人： Tsukasa Yamanaka ,  Toshiaki Aoai ,  Toru Fujimori

    发明人： Tsukasa Yamanaka ,  Toshiaki Aoai ,  Toru Fujimori

    IPC分类号： G03F7/004 ,  G03F7/039 ,  H01L21/027

    CPC分类号： G03F7/0045 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/121

    摘要： Disclosed is a chemically amplified positive resist composition which comprises (A) a compound which contains at least one group selected among tert-alkyl ester groups and tert-alkyl carbonate groups and is capable of increasing solubility of the compound in an alkali aqueous solution by the action of an acid, (B) a compound which contains at least one group selected among acetal groups and silyl ether groups and is capable of increasing solubility of the compound in an alkali aqueous solution by the action of an acid, (C) a compound which is capable of generating an acid by irradiation with an active ray or radiation, and (D) an organic basic compound. The resist composition has high resolving power and forms a satisfactory pattern free from undergoing sensitivity decrease, T-top formation, and change in line width which are caused from exposure to post exposure bake.

    摘要翻译： 公开了一种化学放大型正性抗蚀剂组合物，其包含（A）含有至少一个选自叔烷基酯基和碳酸叔烷基酯基的基团的化合物，并且能够增加化合物在碱性水溶液中的溶解度 酸的作用，（B）含有至少一个选自缩醛基团和甲硅烷基醚基团的基团并且能够通过酸的作用增加化合物在碱性水溶液中的溶解度的化合物，（C）化合物 其能够通过用活性射线或辐射照射产生酸，和（D）有机碱性化合物。 抗蚀剂组合物具有高分辨能力，并且形成了不受曝光曝光烘烤引起的敏感性降低，T顶形成和线宽变化的令人满意的图案。

    Photosensitive composition and pattern forming method using the same
    7.
    发明授权
    Photosensitive composition and pattern forming method using the same 有权
    光敏组合物和使用其的图案形成方法

    公开(公告)号：US07749678B2

    公开(公告)日：2010-07-06

    申请号：US11085482

    申请日：2005-03-22

    申请人： Tsukasa Yamanaka

    发明人： Tsukasa Yamanaka

    IPC分类号： G03F7/00 ,  G03F7/004

    CPC分类号： G03F7/0045 ,  G03F7/0392 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/114

    摘要： A photosensitive composition comprising (A) a resin that is decomposed by the action of an acid to increase solubility in an alkali developing solution, (B) a compound that generates an acid upon irradiation of an actinic ray or radiation, and (C1) a compound having a molecular weight of 1,000 or less and containing an aliphatic ring and an aromatic ring, and a photosensitive composition comprising (A) a resin that is decomposed by the action of an acid to increase solubility in an alkali developing solution, (B) a compound that generates an acid upon irradiation of an actinic ray or radiation, and (C2) a resin containing a hydroxystyrene unit; and a pattern forming method using these photosensitive composition.

    摘要翻译： 一种感光性组合物，其包含（A）通过酸的作用而分解以增加在碱性显影液中的溶解度的树脂，（B）在光化射线或辐射照射时产生酸的化合物，和（C1） （A）通过酸的作用而分解的树脂以增加在碱性显影液中的溶解度的树脂，（B）分子量为1000以下的含有脂肪族环和芳香环的化合物， 在光化射线或辐射照射时产生酸的化合物，和（C2）含有羟基苯乙烯单元的树脂; 以及使用这些感光性组合物的图案形成方法。

    Positive photosensitive composition
    9.
    发明授权
    Positive photosensitive composition 失效
    正光敏组合物

    公开(公告)号：US5824451A

    公开(公告)日：1998-10-20

    申请号：US497795

    申请日：1995-07-03

    申请人： Toshiaki Aoai ,  Tsukasa Yamanaka

    发明人： Toshiaki Aoai ,  Tsukasa Yamanaka

    IPC分类号： G03F7/004

    CPC分类号： G03F7/0045 ,  Y10S430/106

    摘要： A positive photosensitive composition comprising (a)a resin soluble in an aqueous alkali solution containing a specific structure unit; (b) a compound which generates an acid with irradiation of an active ray or radiation; and (c) a low molecular weight acid-decomposable dissolution inhibitor having a molecular weight of not more than 3000, which possesses a tertiary alkyl ester group and whose solubility in an aqueous alkali solution is increased by the action of an acid; wherein compound (c) is a compound having at least two tertiary alkyl ester groups, in which the longest distance with respect to the distance between two tertiary ester groups selected arbitrarily comprises at least 10 bonding atoms except for the atoms contained in the ester groups or a compound having at least three tertiary alkyl ester groups, in which the longest distance with respect to the distance between two tertiary ester groups selected arbitrarily comprises at least 9 bonding atoms except for the atoms contained in the ester groups. The positive photosensitive composition has a high sensitivity, high resolution and good profile and excels in storage stability and heat resistance of the resist solution.

    摘要翻译： 一种正型感光性组合物，其包含（a）可溶于含有特定结构单元的碱性水溶液中的树脂; （b）通过活性射线或辐射的照射产生酸的化合物; 和（c）分子量不大于3000的低分子量可酸分解溶解抑制剂，其具有叔烷基酯基，并且其在碱性水溶液中的溶解度通过酸的作用而增加; 其中化合物（c）是具有至少两个叔烷基酯基团的化合物，其中相对于任选地选择的两个叔酯基团之间的距离最长的距离包含至少10个键合原子，除了酯基团中包含的原子，或 具有至少三个叔烷基酯基的化合物，其中相对于任意选择的两个叔酯基团之间的距离最长的距离包含除了酯基中包含的原子以外的至少9个键合原子。 正型感光性组合物具有高灵敏度，高分辨率和良好的轮廓，并且抗蚀剂溶液的储存稳定性和耐热性优异。