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45 条记录 (耗时 0.038 秒)

    Automatically gain controllable linear differential amplifier using variable degeneration resistor
    1.
    发明授权
    Automatically gain controllable linear differential amplifier using variable degeneration resistor 有权
    使用可变退化电阻自动增益可控线性差分放大器

    公开(公告)号：US06605996B2

    公开(公告)日：2003-08-12

    申请号：US10039542

    申请日：2001-12-31

    申请人： Hyun Kyu Yu ,  Sang-Gug Lee ,  Mun Yang Park ,  Seong-Do Kim ,  Yong-Sik Youn ,  Seon-Ho Han ,  Nam-Soo Kim

    发明人： Hyun Kyu Yu ,  Sang-Gug Lee ,  Mun Yang Park ,  Seong-Do Kim ,  Yong-Sik Youn ,  Seon-Ho Han ,  Nam-Soo Kim

    IPC分类号： H03F345

    CPC分类号： H03G1/007 ,  H03F3/45179 ,  H03F2203/45492 ,  H03G1/0023

    摘要： An automatically gain controllable linear differential amplifier using a variable degeneration resistor is disclosed. The linear differential amplifier includes an input end, a bias current source, a load unit, a first MOS transistor and a second MOS transistor. The linear differential amplifiers of the present invention can control an amplifying gain according to an input signal and improve linearity IIP3 without needing additional power consumption caused by improving the linearity. The automatically gain controllable linear differential amplifier uses NMOS/PMOS transistor so an integration process of the amplifier can be implemented more conveniently and efficiently.

    摘要翻译： 公开了一种使用可变退化电阻的自动增益可控线性差分放大器。 线性差分放大器包括输入端，偏置电流源，负载单元，第一MOS晶体管和第二MOS晶体管。 本发明的线性差分放大器可以根据输入信号控制放大增益，并提高线性度IIP3，而不需要通过提高线性度而引起的附加功耗。 自动增益可控线性差分放大器使用NMOS / PMOS晶体管，因此可以更方便，高效地实现放大器的集成过程。

    Current-reuse bleeding mixer
    2.
    发明授权
    Current-reuse bleeding mixer 有权
    电流再利用出血混合器

    公开(公告)号：US06892062B2

    公开(公告)日：2005-05-10

    申请号：US09828182

    申请日：2001-04-09

    申请人： Sang Gug Lee ,  Jung-Ki Choi ,  Nam-Soo Kim

    发明人： Sang Gug Lee ,  Jung-Ki Choi ,  Nam-Soo Kim

    IPC分类号： H03D1/00 ,  H03D7/14 ,  H04B1/26

    CPC分类号： H03D7/1441 ,  H03D7/1458 ,  H03D7/1491 ,  H03D2200/0043

    摘要： A current-reusing bleeding mixer capable of providing a higher conversion gain, linearity and lower noise figure employing a field-effect transistor includes a first to a fourth transistor and a first and a second load element. The first transistor amplifies a radio frequency (RF) signal. The second and the third transistor, each connected to the first transistor, receive a balanced local oscillator (LO) signal to mix it with the RF signal. The first and the second load element are connected between a supply voltage source and the second transistor and between the supply voltage source and the third transistor, respectively. The fourth transistor, connected between the supply voltage source and the first transistor, amplifies the RF signal and bleeds a current from the supply voltage source.

    摘要翻译： 能够使用场效应晶体管提供更高转换增益，线性度和较低噪声系数的电流再利用排出混合器包括第一至第四晶体管和第一和第二负载元件。 第一晶体管放大射频（RF）信号。 每个连接到第一晶体管的第二和第三晶体管接收平衡本地振荡器（LO）信号以将其与RF信号混合。 第一和第二负载元件分别连接在电源电压源和第二晶体管之间，以及电源电压源和第三晶体管之间。 连接在电源电压源和第一晶体管之间的第四晶体管放大RF信号并从电源电压源中流出电流。

    Conditioner device for conditioning polishing pad and chemical mechanical polishing apparatus including the same
    8.
    发明授权
    Conditioner device for conditioning polishing pad and chemical mechanical polishing apparatus including the same 有权
    用于调理抛光垫的调节装置和包括其的化学机械抛光装置

    公开(公告)号：US07578727B2

    公开(公告)日：2009-08-25

    申请号：US11466425

    申请日：2006-08-22

    申请人： Sung-Tae Moon ,  Dong-Jun Lee ,  Kyoung-Moon Kang ,  Nam-Soo Kim ,  Bong-Su Ahn

    发明人： Sung-Tae Moon ,  Dong-Jun Lee ,  Kyoung-Moon Kang ,  Nam-Soo Kim ,  Bong-Su Ahn

    IPC分类号： B24B53/00

    CPC分类号： B24B53/017 ,  B24B53/14

    摘要： The present invention relates to a conditioner device for polishing pad and a chemical mechanical polishing (CMP) apparatus having the same. The conditioner device of the present invention comprises a rotable support plate including a support plate surface comprising a center area located about the rotational axis of the support plate, a mid area surrounding the center area, and a peripheral area surrounding the mid area, a plurality of conditioning zones located within a portion of the mid area of the support plate surface. A plurality of hard particles which are densely arranged within the conditioning zones and are attached to the support plate surface. A plurality of passages defined by the conditioning zones within which a slurry flows, the passages occupying a portion of the mid area which is not occupied by the conditioning zones, the center area and the peripheral area.

    摘要翻译： 本发明涉及一种用于抛光垫的调节装置和具有该抛光垫的化学机械抛光（CMP）装置。 本发明的调节装置包括可旋转的支撑板，其包括支撑板表面，该支撑板表面包括围绕支撑板的旋转轴线的中心区域，围绕中心区域的中间区域和围绕中间区域的周边区域，多个 位于支撑板表面的中部区域的一部分内的调理区。 多个坚硬颗粒密集地布置在调理区内并附着在支撑板表面上。 由浆料流过的调节区限定的多个通道，通道占据中部区域的未被调节区域，中心区域和周边区域占据的部分。