公开(公告)号：US3645626A

公开(公告)日：1972-02-29

申请号：US3645626D

申请日：1970-06-15

Applicant: IBM

Inventor： DRUSCHEL WILLIAM O

IPC: G01B11/02 ,  G01N21/956 ,  G03F7/20 ,  G06K9/08

CPC classification number: G03F7/70483 ,  G01B11/02 ,  G01N21/956

Abstract: Apparatus for detecting defects in optically discernible patterns on substrates. In apparatus which compares the optically discernible patterns in a pair of regions by coincidentally scanning said regions with a pair of optical sensing members in order to detect differences in the coincidentally sensed data, there is provided a control pattern and a third optical sensing means for scanning the control pattern along a path coincident with the scan paths of the first two sensing means. The control pattern contains optical indicia. When the third sensing means senses one of these optical indicia it activates means which interrupts the comparison of the data sensed by the pair of sensing means.

Abstract translation: 用于检测基板上光学可辨别图案中的缺陷的装置。 在通过用一对光学感测构件巧妙地扫描所述区域来比较一对区域中的光学可辨别图案以便检测重合感测数据的差异的装置中，提供了一种控制模式和用于扫描的第三光学感测装置 沿着与第一两个感测装置的扫描路径一致的路径的控制图案。 控制图案包含光学标记。 当第三感测装置感测到这些光标记中的一个时，它启动中断由一对感测装置感测的数据的比较的装置。

公开(公告)号：US3401589A

公开(公告)日：1968-09-17

申请号：US42062664

申请日：1964-12-23

Applicant: IBM

Inventor： DRUSCHEL WILLIAM O ,  RYMASZEWSKI EUGENE J

IPC: B23Q35/128 ,  G01R31/28 ,  H01L21/66 ,  H01L23/544

CPC classification number: H01L22/20 ,  B23Q35/128 ,  G01R31/2831 ,  H01L23/544 ,  H01L2223/54453 ,  H01L2924/0002 ,  H01L2924/00

公开(公告)号：US3674487A

公开(公告)日：1972-07-04

申请号：US3674487D

申请日：1970-06-18

Applicant: IBM

Inventor： DRUSCHEL WILLIAM O

IPC: G03F7/20 ,  H01L21/00 ,  G03C5/04 ,  G03C5/06

CPC classification number: G03F7/70633 ,  G03F7/70616 ,  H01L21/00 ,  Y10S430/153

Abstract: A METHOD FOR COMPARING THE PATTERN IN A PAIR OF LIGHT MASKS, E.G., MASKS HAVING REGIONS TRANSPARENT TO LIGHT AND REGIONS OPAQUE TO LIGHT. A LIGHT MASKING COPY, EITHER POSITIVE OR NEGATIVE, OF EACH OF THE MASKS IS MADE. THE OPAQUE REGION IN ONE OF SAID COPIES IS RENDERED SEMITRANSPARENT, AFTER WHICH A LIGHT SENSITIVE SUBSTRATE IS EXPOSED THROUGH BOTH OF SAID COPIES SUPERIMPOSED IN REGISTRATION WITH EACH OTHER TO PRODUCE A THREE-TONE COMPOSITE IMAGE IN THE LIGHT SENSITIVE SUBSTRATE OF THE PAIR OF MASKS IN REGISTRATION. WHERE ONE OF THE MASKS HAS SMALLER REGIONS WHICH SHOULD BE POSITIONED WITHIN LIMITS OF LARGER REGIONS ON THE OTHER MASK WHEN SAID MASKS ARE USED IN REGISTRATION WITH EACH OTHER, THE TYPE OF COPY, EITHER POSITIVE OR NEGATIVE, MADE OF EACH MASK AS WELL AS THE SELECTION OF THE MASK IN WHICH THE OPAQUE REGIONS ARE RENDERED SEMITRANSPARENT IS GOVERNED BY THE THE REQUIREMENT THAT SAID SMALLER REGIONS IN SAID COPIES ARE AT LEAST AS OPAQUE AS SAID LARGER REGIONS.