INORGANIC PASSIVATION MATERIAL, METHOD FOR FORMING THE SAME, AND INORGANIC PASSIVATION PROTECTIVE FILM PRODUCED THEREFROM
    2.
    发明申请
    INORGANIC PASSIVATION MATERIAL, METHOD FOR FORMING THE SAME, AND INORGANIC PASSIVATION PROTECTIVE FILM PRODUCED THEREFROM 有权
    无机钝化材料,其形成方法及其生产的无机钝化保护膜

    公开(公告)号:US20150183936A1

    公开(公告)日:2015-07-02

    申请号:US14305354

    申请日:2014-06-16

    Abstract: A method for forming an inorganic passivation material is provided. The method includes mixing about 5 to 80 parts by weight of trialkoxysilane, about 10 to 80 parts by weight of tetraalkoxysilane, and about 1 to 30 parts by weight of catalyst to perform a reaction at pH of about 0.05 to 4 to form an inorganic resin material. The inorganic resin material is modified by phosphate ester to form an inorganic passivation material, wherein phosphate ester is about 0.1-10 parts by weight based on 100 parts by weight of the inorganic resin material. An inorganic passivation material and a passivation protective film produced therefrom are also provided.

    Abstract translation: 提供了一种形成无机钝化材料的方法。 该方法包括混合约5至80重量份的三烷氧基硅烷,约10至80重量份的四烷氧基硅烷和约1至30重量份的催化剂,以在约0.05至4的pH下进行反应以形成无机树脂 材料。 无机树脂材料被磷酸酯改性以形成无机钝化材料,其中基于100重量份的无机树脂材料,磷酸酯为约0.1-10重量份。 还提供无机钝化材料和由其制备的钝化保护膜。

    COATING COMPOSITION AND METHOD OF PREPARING THE SAME

    公开(公告)号:US20180179416A1

    公开(公告)日:2018-06-28

    申请号:US15855268

    申请日:2017-12-27

    CPC classification number: C09D183/10 C08G77/445 C08G81/00

    Abstract: The embodiments of the present disclosure provide a coating composition, including: polysilsesquioxane polymer modified organic resin represented by Formula (1): Wherein, R1 is C3-12 epoxy group, C3-12 acrylate group, C3-12 alkylacryloxy group, C3-12 aminoalkyl group, C3-12 isocyanate-alkyl group, C3-12 alkylcarboxylic acid group, C3-12 alkyl halide group, C3-12 mercaptoalkyl group, C3-12 alkyl group, or C3-12 alkenyl group; R2 is half oxygen(O1/2), hydroxyl group, C1-8 alkyl group, or C1-8 alkoxy group; R3 is halide group, C1-8 alkyl halide group, C1-8 alkoxy group, C1-12 alkyl group, or C5-20 aromatic ring; R4 is hydrogen or C1-8 alkyl group; R5 is modified or unmodified carbonyl compound moiety; n is a positive integer from 1 to 200; m is a positive integer from 10 to 500, and s is an integer from 0 to 250.

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