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公开(公告)号:US20200265298A1
公开(公告)日:2020-08-20
申请号:US16279416
申请日:2019-02-19
发明人: Effendi Leobandung , Malte Rasch , Xiao Sun , Yulong Li , Zhibin Ren
摘要: Methods and systems of implementing a convolutional neural network are described. In an example, a structure may receive input signals and distribute the input signals to a plurality of unit cells. The structure may include a plurality of multi-kernel modules that may include a respective set of unit cells. A unit cell may correspond to an element of a kernel being implemented in the convolutional neural network and may include a storage component configured to store a weight of a corresponding element of the kernel. A first pass gate of the unit cell may be activated to pass a stored weight of the unit cell to a plurality of operation circuits in the corresponding unit cell, such that the stored weight may be applied to the input signals. The structure may generate a set of outputs based on the application of the stored weights to the input signals.
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公开(公告)号:US20190326387A1
公开(公告)日:2019-10-24
申请号:US16502783
申请日:2019-07-03
发明人: Martin M. Frank , Takashi Ando , Xiao Sun , Jin Ping Han , Vijay Narayanan
IPC分类号: H01L49/02 , H01B3/10 , H01L27/11507 , H01L21/02 , H01L21/3213 , H01L21/283
摘要: Artificial synaptic devices with an HfO2-based ferroelectric layer that can be implemented in the CMOS back-end are provided. In one aspect, an artificial synapse element is provided. The artificial synapse element includes: a bottom electrode; a ferroelectric layer disposed on the bottom electrode, wherein the ferroelectric layer includes an HfO2-based material that crystallizes in a ferroelectric phase at a temperature of less than or equal to about 400° C.; and a top electrode disposed on the bottom electrode. An artificial synaptic device including the present artificial synapse element and methods for formation thereof are also provided.
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公开(公告)号:US20190252500A1
公开(公告)日:2019-08-15
申请号:US16395084
申请日:2019-04-25
发明人: Martin M. Frank , Takashi Ando , Xiao Sun , Jin Ping Han , Vijay Narayanan
IPC分类号: H01L29/12 , H01L23/52 , H01L29/06 , H01L27/085
摘要: Artificial synaptic devices with a HfO2-based ferroelectric layer that can be implemented in the CMOS front-end are provided. In one aspect, a method of forming a FET device is provided. The method includes: forming a shallow STI region in a substrate separating a first active area of the substrate from a second active area of the substrate; forming at least one FeFET on the substrate in the first active area having a ferroelectric material including a HfO2-based material; and forming at least one logic FET alongside the at least one FeFET on the substrate in the second active area, wherein the at least one logic FET has a gate dielectric including the HfO2-based material. A FET device formed by the present techniques is also provided.
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公开(公告)号:US10381431B2
公开(公告)日:2019-08-13
申请号:US15797848
申请日:2017-10-30
发明人: Martin M. Frank , Takashi Ando , Xiao Sun , Jin Ping Han , Vijay Narayanan
IPC分类号: H01L27/11507 , H01L49/02 , H01L21/3213 , H01L21/02 , H01L21/283 , H01B3/10
摘要: Artificial synaptic devices with an HfO2-based ferroelectric layer that can be implemented in the CMOS back-end are provided. In one aspect, an artificial synapse element is provided. The artificial synapse element includes: a bottom electrode; a ferroelectric layer disposed on the bottom electrode, wherein the ferroelectric layer includes an HfO2-based material that crystallizes in a ferroelectric phase at a temperature of less than or equal to about 400° C.; and a top electrode disposed on the bottom electrode. An artificial synaptic device including the present artificial synapse element and methods for formation thereof are also provided.
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公开(公告)号:US10381061B2
公开(公告)日:2019-08-13
申请号:US15717023
申请日:2017-09-27
发明人: Jin Ping Han , Xiao Sun , Teng Yang
IPC分类号: G06N3/06 , G11C11/22 , H03K19/177
摘要: Word lines intersect bit lines at a plurality of cross points where a plurality of single memory transistor synapse cells are located. Each cell includes a memory transistor; a pulse shaping unit coupled to a given one of a plurality of signal lines and a gate of the memory transistor; a logic gate having inputs coupled to a corresponding one of the word lines and a corresponding one of the bit lines, and an output coupled to the pulse shaping unit; and a pass gate arrangement. The latter is coupled to the memory transistor, the corresponding one of the word lines, the corresponding one of the bit lines, and the output of the logic gate. Pulses are applied to the gate of the memory transistor for weight adjustment during update and to interconnect the memory transistor to the corresponding one of the bit lines during inference.
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公开(公告)号:US10332874B2
公开(公告)日:2019-06-25
申请号:US15585876
申请日:2017-05-03
发明人: Jin-Ping Han , Yulong Li , Dennis M. Newns , Paul M. Solomon , Xiao Sun
IPC分类号: H01L29/772 , H01L27/06 , H01L29/51 , H01L29/49 , H01L29/06
摘要: A metal-insulator-metal (MIM) capacitor structure includes source and drain regions formed within a semiconductor substrate, a first conducting layer formed over the source and drain regions, and a dielectric layer formed over the first conducting layer. The MIM capacitor structure further includes a second conducting layer formed over the dielectric layer, and a sidewall dielectric formed adjacent the first conducting layer and the dielectric layer. An electric field is created indirectly through the sidewall dielectric to an adjacent field effect transistor (FET) channel in the semiconductor substrate.
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公开(公告)号:US10319818B2
公开(公告)日:2019-06-11
申请号:US15797774
申请日:2017-10-30
发明人: Martin M. Frank , Takashi Ando , Xiao Sun , Jin Ping Han , Vijay Narayanan
IPC分类号: H01L21/28 , H01L29/12 , H01L29/06 , H01L27/085 , H01L23/52
摘要: Artificial synaptic devices with a HfO2-based ferroelectric layer that can be implemented in the CMOS front-end are provided. In one aspect, a method of forming a FET device is provided. The method includes: forming a shallow STI region in a substrate separating a first active area of the substrate from a second active area of the substrate; forming at least one FeFET on the substrate in the first active area having a ferroelectric material including a HfO2-based material; and forming at least one logic FET alongside the at least one FeFET on the substrate in the second active area, wherein the at least one logic FET has a gate dielectric including the HfO2-based material. A FET device formed by the present techniques is also provided.
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公开(公告)号:US20190131407A1
公开(公告)日:2019-05-02
申请号:US15797774
申请日:2017-10-30
发明人: Martin M. Frank , Takashi Ando , Xiao Sun , Jin Ping Han , Vijay Narayanan
IPC分类号: H01L29/12 , H01L23/52 , H01L27/085 , H01L29/06
摘要: Artificial synaptic devices with a HfO2-based ferroelectric layer that can be implemented in the CMOS front-end are provided. In one aspect, a method of forming a FET device is provided. The method includes: forming a shallow STI region in a substrate separating a first active area of the substrate from a second active area of the substrate; forming at least one FeFET on the substrate in the first active area having a ferroelectric material including a HfO2-based material; and forming at least one logic FET alongside the at least one FeFET on the substrate in the second active area, wherein the at least one logic FET has a gate dielectric including the HfO2-based material. A FET device formed by the present techniques is also provided.
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公开(公告)号:US20190096463A1
公开(公告)日:2019-03-28
申请号:US15859583
申请日:2017-12-31
发明人: Jin Ping Han , Xiao Sun , Teng Yang
IPC分类号: G11C11/22 , H03K19/177
CPC分类号: G11C11/223 , G11C11/2255 , G11C11/2257 , G11C11/2259 , G11C11/2275 , G11C11/54 , G11C11/5621 , G11C11/5628 , G11C11/5657 , G11C11/5671 , G11C16/04 , G11C16/08 , G11C16/10 , H03K19/1776
摘要: Word lines intersect bit lines at a plurality of cross points where a plurality of single memory transistor synapse cells are located. Each cell includes a memory transistor; a pulse shaping unit coupled to a given one of a plurality of signal lines and a gate of the memory transistor; a logic gate having inputs coupled to a corresponding one of the word lines and a corresponding one of the bit lines, and an output coupled to the pulse shaping unit; and a pass gate arrangement. The latter is coupled to the memory transistor, the corresponding one of the word lines, the corresponding one of the bit lines, and the output of the logic gate. Pulses are applied to the gate of the memory transistor for weight adjustment during update and to interconnect the memory transistor to the corresponding one of the bit lines during inference.
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公开(公告)号:US10804261B2
公开(公告)日:2020-10-13
申请号:US16662284
申请日:2019-10-24
发明人: Jin-Ping Han , Yulong Li , Dennis M. Newns , Paul M. Solomon , Xiao Sun
IPC分类号: H01L27/06 , H01L27/11507 , H01L27/1159 , H01L29/06 , H01L29/49 , H01L29/51 , H01L21/28
摘要: A metal-insulator-metal (MIM) capacitor structure includes source and drain regions formed within a semiconductor substrate, a first conducting layer formed over the source and drain regions, and a dielectric layer formed over the first conducting layer. The MIM capacitor structure further includes a second conducting layer formed over the dielectric layer, and a sidewall dielectric formed adjacent the first conducting layer and the dielectric layer. An electric field is created indirectly through the sidewall dielectric to an adjacent field effect transistor (FET) channel in the semiconductor substrate.
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