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1.发明授权Miniature pulsed vacuum arc plasma gun and apparatus for thin-film fabrication 失效微型脉冲真空电弧等离子体枪和薄膜制造装置
公开(公告)号：US5841236A
公开(公告)日：1998-11-24
申请号：US326667
申请日：1994-09-14
CPC分类号： C23C14/325 , H05H1/44 , H05H1/48
摘要： A miniature (dime-size in cross-section) vapor vacuum arc plasma gun is described for use in an apparatus to produce thin films. Any conductive material can be layered as a film on virtually any substrate. Because the entire apparatus can easily be contained in a small vacuum chamber, multiple dissimilar layers can be applied without risk of additional contamination. The invention has special applications in semiconductor manufacturing.
摘要翻译： 描述了一种用于制造薄膜的装置中的微型（横截面尺寸）蒸气真空电弧等离子体枪。 任何导电材料可以在几乎任何基底上作为膜分层。 因为整个设备可以容易地容纳在小的真空室中，所以可以施加多个不同的层，而没有额外的污染的风险。 本发明在半导体制造中具有特殊应用。
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2.发明授权
公开(公告)号：US5013578A
公开(公告)日：1991-05-07
申请号：US448379
申请日：1989-12-11
申请人： Ian G. Brown , Robert A. MacGill , James E. Galvin
发明人： Ian G. Brown , Robert A. MacGill , James E. Galvin
CPC分类号： H01J27/22 , C23C14/325 , H05H1/48
摘要： An apparatus and method for coating or layering a surface with a metal utilizing a metal vapor vacuum arc plasma source. The apparatus includes a trigger mechanism for actuating the metal vacuum vapor arc plasma source in a pulsed mode at a predetermined rate. The surface or substrate to be coated or layered is supported in position with the plasma source in a vacuum chamber. The surface is electrically biased for a selected period of time during the pulsed mode of operation of the plasma source. Both the pulsing of the metal vapor vacuum arc plasma source and the electrical biasing of the surface are synchronized for selected periods of time.
摘要翻译： 一种利用金属蒸汽真空电弧等离子体源用金属涂覆或分层表面的装置和方法。 该装置包括用于以脉冲模式以预定速率致动金属真空蒸汽电弧等离子体源的触发机构。 要被涂覆或分层的表面或基底被支撑在真空室中的等离子体源的适当位置。 在等离子体源的脉冲操作模式期间，表面被电偏置选定的时间段。 金属蒸汽真空电弧等离子体源的脉冲和表面的电偏置都同步选定的时间段。
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公开(公告)号：US4952843A
公开(公告)日：1990-08-28
申请号：US320475
申请日：1989-03-08
申请人： Ian G. Brown , Robert A. MacGill , James E. Galvin
发明人： Ian G. Brown , Robert A. MacGill , James E. Galvin
摘要： An ion source utilizing a cathode and anode for producing an electric arc therebetween. The arc is sufficient to vaporize a portion of the cathode to form a plasma. The plasma leaves the generation region and expands through another regon. The density profile of the plasma may be flattened using a magnetic field formed within a vacuum chamber. Ions are extracted from the plasma to produce a high current broad on beam.
摘要翻译： 利用阴极和阳极在其间产生电弧的离子源。 电弧足以蒸发阴极的一部分以形成等离子体。 血浆离开生成区域并扩张通过另一个离子。 可以使用在真空室内形成的磁场使等离子体的密度分布变平。 从等离子体中提取离子以产生大电流宽的光束。
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公开(公告)号：US4785220A
公开(公告)日：1988-11-15
申请号：US25335
申请日：1987-03-13
申请人： Ian G. Brown , Robert A. MacGill
发明人： Ian G. Brown , Robert A. MacGill
摘要： An ion generating apparatus utilizing a vacuum chamber, a cathode and an anode in the chamber. A source of electrical power produces an arc or discharge between the cathode and anode. The arc is sufficient to vaporize a portion of the cathode to form a plasma. The plasma is directed to an extractor which separates the electrons from the plasma, and accelerates the ions to produce an ion beam. One embodiment of the appaatus utilizes a multi-cathode arrangement for interaction with the anode.
摘要翻译： 一种利用真空室，阴极和阳极的离子发生装置。 电源产生阴极和阳极之间的电弧或放电。 电弧足以蒸发阴极的一部分以形成等离子体。 等离子体被引导到分离电子与等离子体的提取器，并且加速离子以产生离子束。 该应用的一个实施例利用多阴极布置来与阳极相互作用。
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公开(公告)号：US06465780B1
公开(公告)日：2002-10-15
申请号：US09540679
申请日：2000-03-31
IPC分类号： B01D5944
CPC分类号： H01J37/32055 , G21K1/093 , H01J37/32623 , H01J37/3266 , H01J2237/022
摘要： Cathodic arc plasmas are contaminated with macroparticles. A variety of magnetic plasma filters has been used with various success in removing the macroparticles from the plasma. An open-architecture, bent solenoid filter, with additional field coils at the filter entrance and exit, improves macroparticle filtering. In particular, a double-bent filter that is twisted out of plane forms a very compact and efficient filter. The coil turns further have a flat cross-section to promote macroparticle reflection out of the filter volume. An output conditioning system formed of an expander coil, a straightener coil, and a homogenizer, may be used with the magnetic filter for expanding the filtered plasma beam to cover a larger area of the target. A cathodic arc plasma deposition system using this filter can be used for the deposition of ultrathin amorphous hard carbon (a-C) films for the magnetic storage industry.
摘要翻译： 阴极电弧等离子体被大颗粒污染。 已经使用各种磁性等离子体过滤器，其具有各种成功从血浆中除去大颗粒。 开放架构的弯曲电磁过滤器，在过滤器入口和出口处具有额外的励磁线圈，可改善大颗粒过滤。 特别地，扭曲成平面的双弯曲过滤器形成非常紧凑和有效的过滤器。 线圈匝还具有平坦的横截面以促进大颗粒反射出过滤器体积。 可以使用由膨胀器线圈，矫直线圈和均质器形成的输出调节系统与磁性过滤器一起扩展经过滤的等离子体束以覆盖目标的较大面积。 使用该过滤器的阴极电弧等离子体沉积系统可用于沉积用于磁存储工业的超薄无定形硬碳（a-C）膜。
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公开(公告)号：US06548817B1
公开(公告)日：2003-04-15
申请号：US09540678
申请日：2000-03-31
申请人： Andre Anders , Robert A. MacGill
发明人： Andre Anders , Robert A. MacGill
IPC分类号： H01J2700
CPC分类号： H01J37/32055 , H01J37/32623 , H01J37/3266 , H01J2237/022 , H05H1/48 , H05H2001/488
摘要： A cathodic arc plasma source has an anode formed of a plurality of spaced baffles which extend beyond the active cathode surface of the cathode. With the open baffle structure of the anode, most macroparticles pass through the gaps between the baffles and reflect off the baffles out of the plasma stream that enters a filter. Thus the anode not only has an electrical function but serves as a prefilter. The cathode has a small diameter, e.g. a rod of about ¼ inch (6.25 mm) diameter. Thus the plasma source output is well localized, even with cathode spot movement which is limited in area, so that it effectively couples into a miniaturized filter. With a small area cathode, the material eroded from the cathode needs to be replaced to maintain plasma production. Therefore, the source includes a cathode advancement or feed mechanism coupled to cathode rod. The cathode also requires a cooling mechanism. The movable cathode rod is housed in a cooled metal shield or tube which serves as both a current conductor, thus reducing ohmic heat produced in the cathode, and as the heat sink for heat generated at or near the cathode. Cooling of the cathode housing tube is done by contact with coolant at a place remote from the active cathode surface. The source is operated in pulsed mode at relatively high currents, about 1 kA. The high arc current can also be used to operate the magnetic filter. A cathodic arc plasma deposition system using this source can be used for the deposition of ultrathin amorphous hard carbon (a-C) films for the magnetic storage industry.
摘要翻译： 阴极电弧等离子体源具有由多个隔开的隔板形成的阳极，该隔板延伸超过阴极的活性阴极表面。 利用阳极的开放的挡板结构，大多数大颗粒通过挡板之间的间隙并从进入过滤器的等离子体流中反射出挡板。 因此，阳极不仅具有电功能，而且用作预滤器。 阴极具有小的直径，例如 直径约1/4英寸（6.25毫米）的棒。 因此，等离子体源输出很好地定位，即使在面积有限的阴极点运动中，也可以有效地耦合到小型化滤波器中。 对于小面积的阴极，需要更换从阴极侵蚀的材料来维持等离子体生产。 因此，源包括耦合到阴极棒的阴极前进或进给机构。 阴极还需要冷却机构。 可移动阴极杆容纳在用作电流导体的冷却金属屏蔽或管中，从而降低在阴极中产生的欧姆热，以及作为在阴极处或附近产生的热的散热器。 通过在远离有源阴极表面的位置处与冷却剂接触来完成阴极壳体管的冷却。 源以约1 kA的相对较高的电流在脉冲模式下工作。 高电弧电流也可用于操作磁性过滤器。 使用该源的阴极电弧等离子体沉积系统可用于沉积用于磁存储工业的超薄无定形硬碳（a-C）膜。
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公开(公告)号：US4801269A
公开(公告)日：1989-01-31
申请号：US80324
申请日：1987-07-31
CPC分类号： H01R12/725
摘要： A coaxial cable connector for interfacing with an edge connector for a printed circuit board whereby a coaxial cable can be interconnected with a printed circuit board through the edge connector. The coaxial connector includes a body having two leg portions extending from one side for receiving the edge connector therebetween, and a tubular portion extending from an opposing side for receiving a coaxial cable. A cavity within the body receives a lug of the edge connector and the center conductor of the coaxial cable. Adjacent lugs of the edge connector can be bend around the edge connector housing to function as spring-loaded contacts for receiving the coaxial connector. The lugs also function to facilitate shielding of the center conductor where fastened to the edge connector lug.
摘要翻译： 用于与用于印刷电路板的边缘连接器对接的同轴电缆连接器，由此同轴电缆可以通过边缘连接器与印刷电路板互连。 同轴连接器包括具有从一侧延伸用于接收它们之间的边缘连接器的两个腿部的主体和从相对侧延伸用于接收同轴电缆的管状部分。 主体内的腔体接收边缘连接器的凸耳和同轴电缆的中心导体。 边缘连接器的相邻凸耳可以围绕边缘连接器壳体弯曲，用作接收同轴连接器的弹簧加载触点。 凸耳还起到促进中心导体在紧固到边缘连接器凸耳上的屏蔽的作用。
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公开(公告)号：US4344019A
公开(公告)日：1982-08-10
申请号：US205398
申请日：1980-11-10
IPC分类号： H01J27/04
CPC分类号： H01J27/04
摘要： An ion source of the Penning discharge type having a self-cleaning aperture is provided by a second dynode (24) with an exit aperture (12) in a position opposite a first dynode 10a, from which the ions are sputtered, two opposing cathodes (14, 16), each with an anode (18, 20) for accelerating electrons emitted from the cathodes into a cylindrical space defined by the first and second dynode. A support gas maintained in this space is ionized by the electrons. While the cathodes are supplied with a negative pulse to emit electrons, the first dynode is supplied with a negative pulse (e.g., -300 V) to attract atoms of the ionized gas (plasma). At the same time, the second dynode may also be supplied with a small voltage that is negative with respect to the plasma (e.g., -5 V) for tuning the position of the plasma miniscus for optimum extraction geometry. When the negative pulse to the first dynode is terminated, the second dynode is driven strongly negative (e.g., -600 V) thereby allowing heavy sputtering to take place for a short period to remove virtually all of the atoms deposited on the second dynode from material sputtered off the first dynode. An extractor (22) immediately outside the exit aperture of the second dynode is maintained at ground potential during this entire period of sputtering while the anode, dynode and cathode reference voltage is driven strongly positive (about +20 kV to +30 kV) so that ions accelerated through the aperture will be at ground potential. In that manner, material from the first dynode deposited on the second dynode will be sputtered, in time, to add to the ion beam. Atoms sputtered from the second dynode which do not become ionized and exit through the slit will be redeposited on the first dynode, and hence recycled for further ion beam generation during subsequent operating cycles.
摘要翻译： 具有自清洁孔径的Penning放电型离子源由具有出口孔（12）的第二倍增电极（24）提供在与第一倍增电极10a相对的位置，离子被溅射出来，两个相对的阴极 每个具有用于将从阴极发射的电子加速到由第一和第二倍增电极限定的圆柱形空间中的阳极（18,20）。 保持在该空间中的支撑气体被电子电离。 当阴极被提供有负脉冲以发射电子时，第一倍增电极被提供有负脉冲（例如，-300V）以吸引电离气体（等离子体）的原子。 同时，也可以向第二倍增电极提供相对于等离子体为负的小电压（例如，-5V），用于调整等离子体液面的位置以获得最佳的提取几何形状。 当第一倍增极的负脉冲终止时，第二倍增电极被强烈地负（例如，-600V），从而允许在很短的时间内发生重的溅射，从而从材料中去除几乎所有沉积在第二倍增极上的原子 溅出第一个dynode。 在整个溅射期间，紧邻第二倍增电极的出口孔外面的提取器（22）保持接地电位，而阳极，倍增极和阴极参考电压被强烈地驱动（约+ 20kV至+ 30kV），使得 通过孔径加速的离子将处于地电位。 以这种方式，沉积在第二倍增电极上的第一倍增电极的材料将被及时地溅射以添加到离子束。 从第二倍增极溅射的不会离子化并通过狭缝出射的原子将重新沉积在第一倍增极上，因此在随后的操作循环期间再循环用于进一步的离子束产生。
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