Anti-reflection film and microscope having optical element with the same anti-reflection film applied thereto
    4.
    发明授权
    Anti-reflection film and microscope having optical element with the same anti-reflection film applied thereto 有权
    防反射膜和显微镜具有与其相同的抗反射膜的光学元件

    公开(公告)号:US07126751B2

    公开(公告)日:2006-10-24

    申请号:US11432405

    申请日:2006-05-12

    IPC分类号: G02B21/36 G02B21/00

    CPC分类号: G02B21/16 G02B1/115

    摘要: A microscope includes an optical element provided with an anti-reflection film applied thereto. The anti-reflection film has the following layered structure: having first to sixth layers of films, in order from the surface of the optical element, formed of a high-refractive-index material for each of the first, third and fifth layers, a low-refractive-index material or a middle-refractive-index material for each of the second and fourth layers, and a low-refractive-index material for the sixth layer, with a range of the optical film-thickness nd of each layer in reference to the design wavelength λ being “(0.13˜0.35)×λ/4” for the first layer, “(0.18˜0.75)×λ/4” for the second layer, “(0.28˜2.31)×λ/4” for the third layer, “(0.26˜0.92)×λ/4” for the fourth layer, “(0.20˜0.37)×λ/4” for the fifth layer, and “(1.09˜1.18)×λ/4” for the sixth layer.

    摘要翻译: 显微镜包括设置有施加到其上的抗反射膜的光学元件。 防反射膜具有以下分层结构:从光学元件的表面起依次由第一层,第三层和第五层的高折射率材料形成第一至第六层膜, 用于第二层和第四层中的每一层的低折射率材料或中间折射率材料,以及用于第六层的低折射率材料,每层的光学膜厚度nd的范围在 对于第一层,参考设计波长λ为“(0.13 0.35)xλ/ 4”,对于第二层,“(0.18 0.75)xλ/ 4” ,“第三层的”(0.28〜0.231)×λ/ 4“,第四层的”(0.26〜0.92)×λ/ 4“,”(0.20 0.37)×λ/ 4”,对于第六层为“(1.09 1.18)×λ/ 4”。

    Benzofuran-7-yl uracil derivatives and herbicides
    5.
    发明授权
    Benzofuran-7-yl uracil derivatives and herbicides 有权
    苯并呋喃-7-基尿嘧啶衍生物和除草剂

    公开(公告)号:US6130187A

    公开(公告)日:2000-10-10

    申请号:US117539

    申请日:1998-08-05

    摘要: A benzofuran-7-yl uracil derivative represented by the general formula (1): ##STR1## (wherein each of X and Y is a hydrogen atom, a halogen atom or the like, R.sup.1 is a hydrogen atom, an alkyl group or the like, R.sup.2 is a haloalkyl group or the like, R.sup.3 is a hydrogen atom, a halogen atom or the like, each of R.sup.4 and R.sup.5 which are independent of each other, is a hydrogen atom, an alkyl group, a haloalkyl group, a halogen atom, a cyano group, a phenyl group, a benzyl group, a nitro group or the like), and a herbicide containing it as an active ingredient.The compound of the present invention represented by the general formula (1) exhibits excellent herbicidal effects against various weeds which cause trouble in upland fields, such as, broad leaved weeds, gramineous weeds and perennial or annual cyperaceous weeds, over a wide range from the pre-emergence to the growing stage. It can further control annual weeds and perennial weeds growing in paddy fields.

    摘要翻译: PCT No.PCT / JP97 / 00320 Sec。 371日期:1998年8月5日 102(e)1998年8月5日PCT PCT 1997年2月7日PCT公布。 公开号WO97 / 29105 PCT 日期1997年8月14日由通式(1)表示的苯并呋喃-7-基尿嘧啶衍生物:其中X和Y各自为氢原子,卤素原子等,R 1为氢原子,烷基 R 2为卤代烷基等,R 3为氢原子,卤素原子等,R 4和R 5各自独立地为氢原子,烷基,卤代烷基 卤素原子,氰基,苯基,苄基,硝基等)和含有它的除草剂作为有效成分。 由通式(1)表示的本发明化合物对各种杂草具有优异的除草效果,其在高纬地区如阔叶杂草,禾本科杂草和多年生或一年生的季节性杂草中引起麻烦,范围广泛 出生前到成长阶段。 可以进一步控制在稻田中种植的一年生杂草和多年生杂草。

    Anti-reflection film and microscope having optical element with the same anti-reflection film applied thereto
    7.
    发明申请
    Anti-reflection film and microscope having optical element with the same anti-reflection film applied thereto 有权
    防反射膜和显微镜具有与其相同的抗反射膜的光学元件

    公开(公告)号:US20050122576A1

    公开(公告)日:2005-06-09

    申请号:US10932055

    申请日:2004-09-02

    IPC分类号: G02B1/11 G02B21/16 G02B21/00

    CPC分类号: G02B21/16 G02B1/115

    摘要: A microscope includes an optical element provided with an anti-reflection film applied thereto. The anti-reflection film has the following layered structure: having first to sixth layers of films, in order from the surface of the optical element, formed of a high-refractive-index material for each of the first, third and fifth layers, a low-refractive-index material or a middle-refractive-index material for each of the second and fourth layers, and a low-refractive-index material for the sixth layer, with a range of the optical film-thickness nd of each layer in reference to the design wavelength λ being “(0.13˜0.35)×λ/4” for the first layer, “(0.18˜0.75)×λ/4” for the second layer, “(0.28˜2.31)×λ/4” for the third layer, “(0.26˜0.92)×λ/4” for the fourth layer, “(0.20˜0.37)×λ/4” for the fifth layer, and “(1.09˜1.18)×λ/4” for the sixth layer.

    摘要翻译: 显微镜包括设置有施加到其上的抗反射膜的光学元件。 防反射膜具有以下分层结构:从光学元件的表面起依次由第一层,第三层和第五层的高折射率材料形成第一至第六层膜, 用于第二层和第四层中的每一层的低折射率材料或中间折射率材料,以及用于第六层的低折射率材料,每层的光学膜厚度nd的范围在 对于第一层,参考设计波长λ为“(0.13 0.35)xλ/ 4”,对于第二层,“(0.18 0.75)xλ/ 4” ,“第三层的”(0.28〜0.231)×λ/ 4“,第四层的”(0.26〜0.92)×λ/ 4“,”(0.20 0.37)×λ/ 4”,对于第六层为“(1.09 1.18)×λ/ 4”。

    OPTICAL ELEMENT HAVING ANTI-REFLECTION FILM
    8.
    发明申请
    OPTICAL ELEMENT HAVING ANTI-REFLECTION FILM 审中-公开
    具有抗反射膜的光学元件

    公开(公告)号:US20120200927A1

    公开(公告)日:2012-08-09

    申请号:US13364686

    申请日:2012-02-02

    IPC分类号: G02B1/10

    CPC分类号: G02B1/11 G02B1/10 G02B27/0018

    摘要: An optical element having anti-reflection film includes an anti-reflection film having a reflection characteristic expressed by a function Fm(x), which is on an mth optical surface, and an anti-reflection film having a reflection characteristic expressed by a function Fn(x), which is on an nth optical surface. At least one of the Fm(x) and Fn(x) functions has the maximum value of reflectance in a predetermined wavelength, and has a characteristic curve of W-shape, and the other of the Fm(x) and Fn(x) function has a wavelength that negates at least one maximum value of the Fm(x) and the Fn(x) functions. The anti-reflection film having reflection characteristic expressed by the function Fm(x) is on an optical surface on a side nearer to the light source, than the anti-reflection film having reflectance characteristic expressed by the function Fn(x), where, m and n are positive integers, and m

    摘要翻译: 具有抗反射膜的光学元件包括具有由第m个光学表面上的函数Fm(x)表示的反射特性的抗反射膜和具有由函数Fn表示的反射特性的抗反射膜 (x),其在第n个光学表面上。 Fm(x)和Fn(x)函数中的至少一个具有预定波长的反射率的最大值,并且具有W形的特性曲线,并且Fm(x)和Fn(x)中的另一个 函数具有消除Fm(x)和Fn(x)函数的至少一个最大值的波长。 具有由功能Fm(x)表示的反射特性的防反射膜比具有由功能Fn(x)表示的反射特性的防反射膜的光侧更靠近光源的光学面上, m和n是正整数,m

    NEGATIVE ACTIVE MATERIAL FOR LITHIUM SECONDARY BATTERY, PREPARING METHOD THEREOF AND LITHIUM SECONDARY BATTERY INCLUDING THE SAME
    9.
    发明申请
    NEGATIVE ACTIVE MATERIAL FOR LITHIUM SECONDARY BATTERY, PREPARING METHOD THEREOF AND LITHIUM SECONDARY BATTERY INCLUDING THE SAME 审中-公开
    用于锂二次电池的负极活性材料,其制备方法和包括其的锂二次电池

    公开(公告)号:US20100143800A1

    公开(公告)日:2010-06-10

    申请号:US12606926

    申请日:2009-10-27

    IPC分类号: H01M4/131 H01M4/88 H01M4/133

    CPC分类号: H01M4/485

    摘要: The present invention relates to a negative active material for a lithium secondary battery, a method of preparing the same, and a lithium secondary battery including the same. The negative active material for a lithium secondary battery includes a compound and a carbon composite represented by the following Chemical Formula 1. LiaVbMcO2+d   [Chemical Formula 1] In the above Chemical Formula 1, a, b, c, and d represent a composition ratio, 0.1≦a≦2.5, 0.5≦b≦1.5, 0≦c≦0.5, 0≦d≦0.5, and M is Mg, Si, Sc, Cu, Zu, Nb, Y, or a combination thereof.

    摘要翻译: 本发明涉及一种用于锂二次电池的负极活性材料及其制备方法,以及包含该二次电池的锂二次电池。 锂二次电池的负极活性物质包括化合物和由以下化学式1表示的碳复合物。LiaVbMcO2 + d [化学式1]在上述化学式1中,a,b,c和d表示组成 比率为0.1& nlE; a≦̸ 2.5,0.5≦̸ b≦̸ 1.5,0& nlE; c≦̸ 0.5,0和nlE; d≦̸ 0.5,M是Mg,Si,Sc,Cu,Zu,Nb,Y或它们的组合。