公开(公告)号：US20100264113A1

公开(公告)日：2010-10-21

申请号：US12724819

申请日：2010-03-16

申请人： Ikuo YONEDA ,  Takuya Kono ,  Tetsuro Nakasugi ,  Ryoichi Inanami

发明人： Ikuo YONEDA ,  Takuya Kono ,  Tetsuro Nakasugi ,  Ryoichi Inanami

IPC分类号： B44C1/22 ,  B29C35/08 ,  B29C59/02

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

摘要： There is provided a template in which a gap region of a substrate to be processed can be covered with an imprint resist, a method of manufacturing the same, and a method of forming a pattern.A template used in an optical imprint method includes a substrate, a pattern forming region that is provided on the substrate and includes an imprint pattern, a first step portion that is provided outside the pattern forming region and is disposed below the pattern forming region, a first side portion that connects the pattern forming region and the first step portion, a second step portion that is provided outside the first step portion and is disposed below the first step portion, and a second side portion that connects the first step portion and the second step portion and has a surface roughness more than that of the first side portion.

摘要翻译： 提供了一种模板，其中待加工的基板的间隙区域可以用抗蚀刻剂覆盖，其制造方法和形成图案的方法。 在光学印记法中使用的模板包括基板，设置在基板上的图案形成区域，并且包括印模图案，设置在图案形成区域的外侧并设置在图案形成区域下方的第一台阶部， 连接图案形成区域和第一台阶部的第一侧面部分，设置在第一台阶部分的外侧并设置在第一台阶部下方的第二台阶部，以及将第一台阶部和第二台阶部 并且具有比第一侧部的表面粗糙度更多的表面粗糙度。

公开(公告)号：US20140072668A1

公开(公告)日：2014-03-13

申请号：US13731617

申请日：2012-12-31

申请人： Ikuo YONEDA ,  Tetsuro Nakasugi

发明人： Ikuo YONEDA ,  Tetsuro Nakasugi

IPC分类号： B29C59/02

CPC分类号： B29C59/02 ,  B29C33/424 ,  G03F7/0002 ,  Y10T428/24488

摘要： According to one embodiment, a mold includes a base material, a pedestal portion and a pattern portion. The base material includes a first surface and a second surface. The pedestal portion protruded from the first surface of the base material and includes a side surface. The pattern portion is provided in the pedestal portion and includes an concave-convex pattern. The pedestal portion includes a first region and a second region. The first region is provided with the concave-convex pattern. The second region is provided between the first region and the side surface. The second region has maximum height equal to maximum height of the first region. The second region has a first height of the second region on the side surface side and a second height of the second region on the first region side. The first height is lower than the second height.

摘要翻译： 根据一个实施例，模具包括基底材料，基座部分和图案部分。 基材包括第一表面和第二表面。 所述基座部从所述基材的第一表面突出并且包括侧面。 图案部分设置在基座部分中并且包括凹凸图案。 基座部分包括第一区域和第二区域。 第一区域设置有凹凸图案。 第二区域设置在第一区域和侧面之间。 第二区域具有等于第一区域的最大高度的最大高度。 所述第二区域具有在所述第一区域侧上的所述第二区域的侧表面侧的第一高度和所述第二区域的第二高度。 第一个高度低于第二个高度。

公开(公告)号：US20100075443A1

公开(公告)日：2010-03-25

申请号：US12553906

申请日：2009-09-03

申请人： Ikuo YONEDA ,  Tetsuro Nakasugi ,  Masamitsu Itoh ,  Ryoichi Inanami

发明人： Ikuo YONEDA ,  Tetsuro Nakasugi ,  Masamitsu Itoh ,  Ryoichi Inanami

IPC分类号： H01L21/66 ,  G06K9/00

CPC分类号： G01N21/956 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

摘要： A template inspection method for performing defect inspection of a template, by bringing a pattern formation surface of a template used to form a pattern close to a first fluid coated on a flat substrate, filling the first fluid into a pattern of the template, and by performing optical observation of the template in a state that the first fluid is sandwiched between the template and the substrate, wherein a difference between an optical constant of the first fluid and an optical constant of the template is larger than a difference between an optical constant of air and the optical constant of the template.

摘要翻译： 一种用于对模板进行缺陷检查的模板检查方法，通过将用于形成图案的模板的图案形成表面靠近涂覆在平坦基板上的第一流体，将第一流体填充到模板的图案中，以及通过 在第一流体夹在模板和基板之间的状态下进行模板的光学观察，其中第一流体的光学常数与模板的光学常数之间的差异大于模板的光学常数之间的差异 空气和模板的光学常数。

公开(公告)号：US20090224436A1

公开(公告)日：2009-09-10

申请号：US12398479

申请日：2009-03-05

申请人： Shinji MIKAMI ,  Ikuo YONEDA

发明人： Shinji MIKAMI ,  Ikuo YONEDA

IPC分类号： B29C59/16 ,  G03F7/00

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

摘要： An imprint method, in which pattern forming is performed by having a light curable material applied on a sample face of a substrate being a processing target hardened by being exposed to light in a state where the light curable material and a pattern formed surface of a template contact each other, the pattern formed surface having a concave-convex pattern formed thereon; wherein in one exposure performed with respect to a predetermined shot of the light curable material, an exposure amount at a light curable material on a first region which contacts a pattern formed region including the concave-convex pattern of the template is greater than an exposure amount at a light curable material on a second region which at least contacts a part of a pattern periphery region of the template, the pattern periphery region existing in a periphery of the pattern formed region of the template.

摘要翻译： 一种压印方法，其中图案形成是通过使光涂布在基板的样品面上的光固化材料，该基材是通过在可光固化材料和模板形成表面的模板的状态下被曝光而硬化的加工对象 所述图案形成表面具有形成在其上的凹凸图案; 其特征在于，相对于所述光固化材料的预定照射进行一次曝光，与包含所述模板的凹凸图案的图案形成区域接触的第一区域上的光固化性材料的曝光量大于曝光量 在至少与模板的图案周边区域的一部分接触的第二区域上的光固化材料上，存在于模板的图案形成区域的外围的图案周边区域。

公开(公告)号：US20130221581A1

公开(公告)日：2013-08-29

申请号：US13607396

申请日：2012-09-07

申请人： Ikuo YONEDA

发明人： Ikuo YONEDA

IPC分类号： B29C59/02 ,  B29C35/08

CPC分类号： G03F7/0002

摘要： According to one embodiment, the pattern formation apparatus relating to the embodiment is a pattern formation apparatus wherein an object to be patterned (pattern transferring material) is irradiated with light under the state of affixing a three dimensional pattern formed on the main plane of a template to the object to transfer a reverse image of the three dimension pattern into the pattern transferring material the pattern transferring material. The pattern formation apparatus provides a light irradiation part and a control part. The light irradiation part is configured to irradiate light having intensity distribution in the irradiation plane parallel to the main plane. The control part is configured to control the light irradiation part to change the intensity distribution according to time.

摘要翻译： 根据一个实施例，与实施例相关的图案形成装置是图案形成装置，其中在固定在模板的主平面上的三维图案的状态下用光照射待图案的物体（图案转印材料） 以将三维图案的反转图像转印到图案转印材料图案转印材料中。 图案形成装置提供光照射部和控制部。 光照射部被配置为照射与主平面平行的照射平面中的强度分布的光。 控制部被配置为控制光照射部根据时间改变强度分布。

公开(公告)号：US20110237086A1

公开(公告)日：2011-09-29

申请号：US13024932

申请日：2011-02-10

申请人： Ikuo YONEDA

发明人： Ikuo YONEDA

IPC分类号： H01L21/31 ,  B32B3/30 ,  C23F1/04

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  Y10T428/24479 ,  Y10T428/24488

摘要： According to one embodiment, there is provided a template which includes a first region and a second region. The first region is provided with a first pattern of a plurality of recessed portions formed on a main surface of the template, and has a first thickness. The second region is provided with a second pattern of a plurality of recessed portions formed on the main surface of the template, and has a second thickness different from the first thickness. The second pattern is different from the first pattern in at least one of interval and dimension of the recessed portions.

摘要翻译： 根据一个实施例，提供了包括第一区域和第二区域的模板。 第一区域设置有形成在模板的主表面上的多个凹部的第一图案，并且具有第一厚度。 第二区域设置有形成在模板的主表面上的多个凹部的第二图案，并且具有不同于第一厚度的第二厚度。 第二图案与凹部的间隔和尺寸中的至少一个不同于第一图案。

公开(公告)号：US20100022036A1

公开(公告)日：2010-01-28

申请号：US12179804

申请日：2008-07-25

申请人： Ikuo YONEDA ,  Takumi Ota ,  Takeshi Koshiba

发明人： Ikuo YONEDA ,  Takumi Ota ,  Takeshi Koshiba

IPC分类号： H01L21/66

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

摘要： According to an aspect of the present invention, there is provided a template including: a template substrate; patterns for forming device patterns on a wafer substrate; and a charging monitoring pattern, a size of the charging monitoring pattern being equal to a largest pattern in the patterns for forming the device patterns.

摘要翻译： 根据本发明的一个方面，提供了一种模板，包括：模板基板; 用于在晶片衬底上形成器件图案的图案; 以及充电监视模式，充电监视模式的大小等于用于形成设备模式的模式中的最大模式。

公开(公告)号：US20100072647A1

公开(公告)日：2010-03-25

申请号：US12549232

申请日：2009-08-27

申请人： Hiroshi TOKUE ,  Ikuo YONEDA ,  Shinji MIKAMI ,  Takumi OTA

发明人： Hiroshi TOKUE ,  Ikuo YONEDA ,  Shinji MIKAMI ,  Takumi OTA

IPC分类号： B29C45/76

CPC分类号： B29C33/424 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

摘要： A patterning method according to an embodiment of the present invention comprises: acquiring information about a surface state of an underlying film formed on a substrate; determining, based on the surface state, whether irregularity/foreign matter is present in each shot region in which a pattern is to be formed; and solidifying a resist agent while a first template, when it is determined that no irregularity/foreign matter is present in the shot region, or a second template that is different from the first template, when it is determined that irregularity/foreign matter is present in the shot region, is brought close to the underlying film on the shot region at a certain distance with the resist agent therebetween.

摘要翻译： 根据本发明的实施例的图案化方法包括：获取关于形成在基板上的底层膜的表面状态的信息; 基于表面状态确定在要形成图案的每个拍摄区域中是否存在不规则/异物; 并且当确定存在不规则/异物时，当确定在射击区域中不存在不规则/异物或与第一模板不同的第二模板时，第一模板固化抗蚀剂 在射出区域中，与其间的抗蚀剂在一定距离处使其与射出区域上的底层膜接近。

公开(公告)号：US20090267268A1

公开(公告)日：2009-10-29

申请号：US12237435

申请日：2008-09-25

申请人： Ikuo YONEDA ,  Shinji Mikami

发明人： Ikuo YONEDA ,  Shinji Mikami

IPC分类号： B29C43/58 ,  B29C43/32

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  Y10S977/887

摘要： An imprint system has a design data storing section which stores template information and remaining film thickness set value information, a vaporization-to-be-compensated storing section which stores a plurality of distributions of applied amounts for compensating vaporization, an arithmetic section which calculates a distribution of an applied amount for filling a pattern based upon said template information, calculates a distribution of an applied amount for forming a remaining film thickness based upon said remaining film thickness set value information, calculates a pattern density of the template from said template information, extracts a distribution of an applied amount for compensating vaporization, corresponding to this pattern density, from said vaporization-to-be-compensated storing section, and adds up this extracted distribution of an applied amount for compensating vaporization, said distribution of an applied amount for filling a pattern, and said distribution of an applied amount for forming a remaining film thickness, to calculate a distribution of an applied amount of the imprint member, and an application section which applies the imprint member on the substrate based upon said distribution of an applied amount of the imprint member.

摘要翻译： 压印系统具有存储模板信息和剩余膜厚设定值信息的设计数据存储部，存储用于补偿蒸发的施加量的多个分布的蒸发补偿存储部，算出运算部 基于所述模板信息分配用于填充图案的施加量，基于所述剩余膜厚设定值信息计算形成剩余膜厚度的涂布量的分布，根据所述模板信息计算模板的图案密度， 从所述蒸发待补偿存储部分中提取与该图案密度相对应的补偿蒸发量的分布，并将所提取的用于补偿蒸发的施加量的提取分布相加，将所分配的施加量分配给 填充一个模式，并表示一个应用程序的分配 形成剩余膜厚的量，计算压印构件的施加量的分布;以及施加部，其基于压印构件的施加量的分布，将压印构件施加在基板上。

公开(公告)号：US20080214010A1

公开(公告)日：2008-09-04

申请号：US12018490

申请日：2008-01-23

申请人： Ikuo YONEDA ,  Shunko MAGOSHI

发明人： Ikuo YONEDA ,  Shunko MAGOSHI

IPC分类号： H01L21/311 ,  B28B21/42

CPC分类号： H01L21/0271 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

摘要： According to the present invention, there is provided a semiconductor device fabrication method comprising, bringing a mold having a predetermined pattern into contact with at least a portion of an imprinting material formed on a substrate to be processed, and forming the pattern on the substrate to be processed by sequentially transferring the pattern for each shot, wherein one of a dicing region and a monitor pattern formation region of the substrate to be processed is coated with the imprinting material.

摘要翻译： 根据本发明，提供了一种半导体器件制造方法，包括：使具有预定图案的模具与形成在待加工基板上的压印材料的至少一部分接触，并将基板上的图案形成为 通过顺序地转印每个镜头的图案来处理，其中待加工的基底的切割区域和监视器图案形成区域之一被涂覆有压印材料。