INTEGRATION OF STRESS DECOUPLING AND PARTICLE FILTER ON A SINGLE WAFER OR IN COMBINATION WITH A WAFERLEVEL PACKAGE

    公开(公告)号:US20200331748A1

    公开(公告)日:2020-10-22

    申请号:US16387918

    申请日:2019-04-18

    Abstract: A semiconductor device and a method of manufacturing the same are provided. The semiconductor device includes a substrate having a first surface and a second surface arranged opposite to the first surface; a stress-sensitive sensor disposed at the first surface of the substrate, where the stress-sensitive sensor is sensitive to mechanical stress; a stress-decoupling trench that has a vertical extension that extends from the first surface into the substrate, where the stress-decoupling trench vertically extends partially into the substrate towards the second surface although not completely to the second surface; and a plurality of particle filter trenches that vertically extend from the second surface into the substrate, wherein each of the plurality of particle filter trenches have a longitudinal extension that extends orthogonal to the vertical extension of the stress-decoupling trench.

    INTEGRATION OF STRESS DECOUPLING AND PARTICLE FILTER ON A SINGLE WAFER OR IN COMBINATION WITH A WAFERLEVEL PACKAGE

    公开(公告)号:US20210032097A1

    公开(公告)日:2021-02-04

    申请号:US17076250

    申请日:2020-10-21

    Abstract: A semiconductor device and a method of manufacturing the same are provided. The semiconductor device includes a substrate having a first surface and a second surface arranged opposite to the first surface; a stress-sensitive sensor disposed at the first surface of the substrate, where the stress-sensitive sensor is sensitive to mechanical stress; a stress-decoupling trench that has a vertical extension that extends from the first surface into the substrate, where the stress-decoupling trench vertically extends partially into the substrate towards the second surface although not completely to the second surface; and a plurality of particle filter trenches that vertically extend from the second surface into the substrate, wherein each of the plurality of particle filter trenches have a longitudinal extension that extends orthogonal to the vertical extension of the stress-decoupling trench.

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