IC PACKAGE INCLUDING MULTI-CHIP UNIT WITH BONDED INTEGRATED HEAT SPREADER

    公开(公告)号:US20210242104A1

    公开(公告)日:2021-08-05

    申请号:US17234671

    申请日:2021-04-19

    申请人: Intel Corporation

    摘要: A multi-chip unit suitable for chip-level packaging may include multiple IC chips that are interconnected through a metal redistribution structure, and that are directly bonded to an integrated heat spreader. Bonding of the integrated heat spreader to the multiple IC chips may be direct so that no thermal interface material (TIM) is needed, resulting in a reduced bond line thickness (BLT) and lower thermal resistance. The integrated heat spreader may further serve as a structural member of the multi-chip unit, allowing a second side of the redistribution structure to be further interconnected to a host by solder interconnects. The redistribution structure may be fabricated on a sacrificial interposer that may facilitate planarizing IC chips of differing thickness prior to bonding the heat spreader. The sacrificial interposer may be removed to expose the RDL for further interconnection to a substrate without the use of through-substrate vias.

    IC package including multi-chip unit with bonded integrated heat spreader

    公开(公告)号:US11011448B2

    公开(公告)日:2021-05-18

    申请号:US16529617

    申请日:2019-08-01

    申请人: Intel Corporation

    摘要: A multi-chip unit suitable for chip-level packaging may include multiple IC chips that are interconnected through a metal redistribution structure, and that are directly bonded to an integrated heat spreader. Bonding of the integrated heat spreader to the multiple IC chips may be direct so that no thermal interface material (TIM) is needed, resulting in a reduced bond line thickness (BLT) and lower thermal resistance. The integrated heat spreader may further serve as a structural member of the multi-chip unit, allowing a second side of the redistribution structure to be further interconnected to a host by solder interconnects. The redistribution structure may be fabricated on a sacrificial interposer that may facilitate planarizing IC chips of differing thickness prior to bonding the heat spreader. The sacrificial interposer may be removed to expose the RDL for further interconnection to a substrate without the use of through-substrate vias.

    IC package including multi-chip unit with bonded integrated heat spreader

    公开(公告)号:US11581235B2

    公开(公告)日:2023-02-14

    申请号:US17234671

    申请日:2021-04-19

    申请人: Intel Corporation

    摘要: A multi-chip unit suitable for chip-level packaging may include multiple IC chips that are interconnected through a metal redistribution structure, and that are directly bonded to an integrated heat spreader. Bonding of the integrated heat spreader to the multiple IC chips may be direct so that no thermal interface material (TIM) is needed, resulting in a reduced bond line thickness (BLT) and lower thermal resistance. The integrated heat spreader may further serve as a structural member of the multi-chip unit, allowing a second side of the redistribution structure to be further interconnected to a host by solder interconnects. The redistribution structure may be fabricated on a sacrificial interposer that may facilitate planarizing IC chips of differing thickness prior to bonding the heat spreader. The sacrificial interposer may be removed to expose the RDL for further interconnection to a substrate without the use of through-substrate vias.

    DUMMY DIE IN A RECESSED MOLD STRUCTURE OF A PACKAGED INTEGRATED CIRCUIT DEVICE

    公开(公告)号:US20220102231A1

    公开(公告)日:2022-03-31

    申请号:US17032583

    申请日:2020-09-25

    申请人: Intel Corporation

    摘要: Techniques and mechanisms for facilitating heat conductivity in a packaged device with a dummy die. In an embodiment, a packaged device comprises a substrate and one or more IC die coupled thereto. A dummy die structure extends to a bottom of a recess structure formed by a first package mold structure on the substrate. The dummy die structure comprises a polymer resin and a filler, or comprises a metal which has a low coefficient of thermal expansion (CTE). A second package mold structure, which extends to the recess structure, is adjacent to the first package mold structure and to an IC die. In another embodiment, a first CTE of the dummy die is less than a second CTE of one of the package mold structures, and a first thermal conductivity of the dummy die is greater than a second thermal conductivity of the one of the package mold structures.

    Method to achieve variable dielectric thickness in packages for better electrical performance

    公开(公告)号:US11145583B2

    公开(公告)日:2021-10-12

    申请号:US15970602

    申请日:2018-05-03

    申请人: Intel Corporation

    摘要: Embodiments include packages substrates and a method of forming the package substrate. A package substrate includes a first dielectric comprising a first conductive layer, and a second dielectric comprising a second conductive layer and a third conductive layer. The second and third conductive layers are embedded in the second dielectric, where a top surface of the third conductive layer is above a top surface of the second conductive layer. The package substrate has a fourth conductive layer on the second dielectric. The first dielectric has a first dielectric thickness between the first and third conductive layers. The first dielectric also has a second dielectric thickness between the first and second conductive layers. The package substrate includes the second dielectric thickness that is greater than the first dielectric thickness. The second dielectric may have a z-height of a first bottom surface greater than a z-height of a second bottom surface.