公开(公告)号：US20140273497A1

公开(公告)日：2014-09-18

申请号：US14108494

申请日：2013-12-17

Applicant: Intermolecular Inc.

Inventor： Makonnen Payne ,  Kim Van Berkel

IPC: H01L21/67 ,  H01L21/30 ,  H01L21/306

CPC classification number: H01L21/30 ,  B01J19/0046 ,  B01J2219/00283 ,  B01J2219/00286 ,  B01J2219/00301 ,  B01J2219/00313 ,  B01J2219/0038 ,  B01J2219/00382 ,  B01J2219/00416 ,  B01J2219/00418 ,  B01J2219/00527 ,  B01J2219/00585 ,  B08B3/04 ,  C23C14/08 ,  C23C14/22 ,  C23C14/34 ,  C23C18/1619 ,  C23C18/1682 ,  C25D17/02 ,  G11C13/0004 ,  H01L21/02104 ,  H01L21/30604 ,  H01L21/67051 ,  H01L21/67057 ,  H01L21/6719 ,  H01L22/10 ,  H01L22/12 ,  H01L22/14 ,  H01L27/2463 ,  H01L45/1608

Abstract: Embodiments provided herein describe systems and methods for processing substrates. A substrate having a plurality of site-isolated regions defined thereon is provided. A plurality of wet processes is simultaneously performed. Each of the plurality of wet processes is performed on one of the plurality of site-isolated regions defined on the substrate. The simultaneously performing includes exposing each of the plurality of site-isolated regions to one of a plurality of wet processing formulations. Each of the plurality of wet processing formulations includes a component. The respective component is added to at least some of the plurality of wet processing formulations during the exposing. A processing condition is varied between at least two of the plurality of wet processes in a combinatorial manner.

Abstract translation: 本文提供的实施例描述了用于处理衬底的系统和方法。 提供了具有限定在其上的多个位置隔离区域的基板。 同时执行多个湿法。 多个湿法中的每一个在限定在基板上的多个位置隔离区域之一上进行。 同时执行的包括将多个位置隔离区域中的每一个暴露于多个湿处理制剂中的一个。 多种湿处理制剂中的每一种都包括一种组分。 在曝光期间将相应的组分添加到至少一些湿处理制剂中。 处理条件以组合的方式在多个湿法工艺中的至少两个之间变化。