Novel solvent drying agent
    2.
    发明授权
    Novel solvent drying agent 失效
    新型溶剂干燥剂

    公开(公告)号:US4169807A

    公开(公告)日:1979-10-02

    申请号:US888425

    申请日:1978-03-20

    申请人: John R. Zuber

    发明人: John R. Zuber

    IPC分类号: C11D7/50 C23G5/02 H01L21/306

    摘要: Mixtures of 1-propanol, water and certain perfluoro compounds form excellent drying agents for silicon based devices. The mixtures have good wetting properties and form azeotropic mixtures in the vapor phase.

    摘要翻译: 1-丙醇,水和某些全氟化合物的混合物形成优异的硅基设备干燥剂。 混合物具有良好的润湿性能并在气相中形成共沸混合物。

    Method of stripping photoresist
    3.
    发明授权
    Method of stripping photoresist 失效
    剥离光刻胶的方法

    公开(公告)号:US4202703A

    公开(公告)日:1980-05-13

    申请号:US849471

    申请日:1977-11-07

    IPC分类号: G03F7/42 C03C23/00 B08B7/00

    CPC分类号: G03F7/425

    摘要: A solution of tetramethylammonium hydroxide and a surfactant in a lower alcohol solubilizes photoresist films without attacking materials found in integrated circuit devices so that a subsequent 1,1,1-trichloroethane rinse completely removes the photoresist.

    摘要翻译: 在低级醇中的四甲基氢氧化铵和表面活性剂的溶液可溶解光致抗蚀剂膜,而不会在集成电路器件中发现材料,从而使随后的1,1,1-三氯乙烷冲洗完全除去光致抗蚀剂。

    Restricted contact planar photodiode
    4.
    发明授权
    Restricted contact planar photodiode 失效
    受限接触平面光电二极管

    公开(公告)号:US4990989A

    公开(公告)日:1991-02-05

    申请号:US464505

    申请日:1990-01-12

    摘要: An InGaAs photodiode is described in which a double layer of silicon nitride on the front surface serves several functions; both layers passivate the surface; an opening in the lower layer provides a diffusion mask for forming the p-n junction; and a narrower opening in the upper silicon nitride layer provides a deposition mask for forming a restricted area contact. In order to reduce strain near the junction, and hence reduce leakage currents and enhance reliability, the contact geometry has a narrow pedestal portion which contacts the surface in a zone remote from the junction edges and has a wider cap portion which is formed on the pedestal portion to seal the surface from the introduction of contaminants. The photodiode may be back-illuminated or front-illuminated.

    摘要翻译: 描述了InGaAs光电二极管,其中前表面上的双层氮化硅具有若干功能; 两层钝化表面; 下层的开口提供用于形成p-n结的扩散掩模; 并且上部氮化硅层中的较窄的开口提供用于形成限制区域接触的沉积掩模。 为了减小接头附近的应变,并且因此减小泄漏电流并增强可靠性,接触几何形状具有窄的基座部分,其在远离接合边缘的区域中接触表面,并且具有形成在基座上的较宽的盖部分 部分以密封表面免受污染物的引入。 光电二极管可以是背照式或前照式的。

    Restricted contact, planar photodiode
    5.
    发明授权
    Restricted contact, planar photodiode 失效
    受限触点,平面光电二极管

    公开(公告)号:US4894703A

    公开(公告)日:1990-01-16

    申请号:US767613

    申请日:1985-08-20

    摘要: A back-illuminated InGaAs photodiode is described in which a double layer of silicon nitride on the front surface serves several functions; both layers passivate the surface; an opening in the lower layer provides a diffusion mask for forming the p-n junction; and a narrower opening in the upper silicon nitride layer provides a deposition mask for forming a restricted area contact. In order to reduce strain near the junction, and hence reduce leakage currents and enhance reliability, the contact geometry has a narrow pedestal portion which contacts the surface in a zone remote from the junction edges and has a wider cap portion which is formed on the pedestal portion to seal the surface from the introduction of contaminants.

    摘要翻译: 描述了背照式InGaAs光电二极管,其中前表面上的双层氮化硅具有若干功能; 两层钝化表面; 下层的开口提供用于形成p-n结的扩散掩模; 并且上部氮化硅层中的较窄的开口提供用于形成限制区域接触的沉积掩模。 为了减小接头附近的应变,并且因此减小泄漏电流并增强可靠性,接触几何形状具有窄的基座部分,其在远离接合边缘的区域中接触表面,并且具有形成在基座上的较宽的盖部分 部分以密封表面免受污染物的引入。