-
公开(公告)号:US4455351A
公开(公告)日:1984-06-19
申请号:US503795
申请日:1983-06-13
IPC分类号: H01L31/107 , H01L21/318 , H01L31/0216 , H01L31/10 , H01L31/18 , B32B9/06
CPC分类号: H01L31/02161 , H01L21/3185 , H01L31/1844 , Y02E10/544 , Y10S438/902
摘要: A process is described for fabricating various optical devices including photodiodes in which a protective dielectric layer is put down on the surface of the device prior to heating to temperatures over about 250-300 degrees C. Such devices have excellent performance characteristics including low dark current and low noise figures.
摘要翻译: 描述了一种用于制造包括光电二极管的各种光学器件的工艺,其中在加热到约250-300℃之间的温度之前,将保护性介电层放在器件的表面上。这样的器件具有优异的性能特征,包括低暗电流和 低噪音数字
-
公开(公告)号:US4169807A
公开(公告)日:1979-10-02
申请号:US888425
申请日:1978-03-20
申请人: John R. Zuber
发明人: John R. Zuber
IPC分类号: C11D7/50 , C23G5/02 , H01L21/306
CPC分类号: H01L21/02052 , C11D7/5063 , C23G5/02
摘要: Mixtures of 1-propanol, water and certain perfluoro compounds form excellent drying agents for silicon based devices. The mixtures have good wetting properties and form azeotropic mixtures in the vapor phase.
摘要翻译: 1-丙醇,水和某些全氟化合物的混合物形成优异的硅基设备干燥剂。 混合物具有良好的润湿性能并在气相中形成共沸混合物。
-
公开(公告)号:US4202703A
公开(公告)日:1980-05-13
申请号:US849471
申请日:1977-11-07
申请人: John R. Zuber , Herbert Foxman
发明人: John R. Zuber , Herbert Foxman
CPC分类号: G03F7/425
摘要: A solution of tetramethylammonium hydroxide and a surfactant in a lower alcohol solubilizes photoresist films without attacking materials found in integrated circuit devices so that a subsequent 1,1,1-trichloroethane rinse completely removes the photoresist.
摘要翻译: 在低级醇中的四甲基氢氧化铵和表面活性剂的溶液可溶解光致抗蚀剂膜,而不会在集成电路器件中发现材料,从而使随后的1,1,1-三氯乙烷冲洗完全除去光致抗蚀剂。
-
公开(公告)号:US4990989A
公开(公告)日:1991-02-05
申请号:US464505
申请日:1990-01-12
IPC分类号: H01L31/0216 , H01L31/0224 , H01L31/105
CPC分类号: H01L31/022408 , H01L31/02161 , H01L31/022416 , H01L31/105
摘要: An InGaAs photodiode is described in which a double layer of silicon nitride on the front surface serves several functions; both layers passivate the surface; an opening in the lower layer provides a diffusion mask for forming the p-n junction; and a narrower opening in the upper silicon nitride layer provides a deposition mask for forming a restricted area contact. In order to reduce strain near the junction, and hence reduce leakage currents and enhance reliability, the contact geometry has a narrow pedestal portion which contacts the surface in a zone remote from the junction edges and has a wider cap portion which is formed on the pedestal portion to seal the surface from the introduction of contaminants. The photodiode may be back-illuminated or front-illuminated.
摘要翻译: 描述了InGaAs光电二极管,其中前表面上的双层氮化硅具有若干功能; 两层钝化表面; 下层的开口提供用于形成p-n结的扩散掩模; 并且上部氮化硅层中的较窄的开口提供用于形成限制区域接触的沉积掩模。 为了减小接头附近的应变,并且因此减小泄漏电流并增强可靠性,接触几何形状具有窄的基座部分,其在远离接合边缘的区域中接触表面,并且具有形成在基座上的较宽的盖部分 部分以密封表面免受污染物的引入。 光电二极管可以是背照式或前照式的。
-
公开(公告)号:US4894703A
公开(公告)日:1990-01-16
申请号:US767613
申请日:1985-08-20
IPC分类号: H01L31/0216 , H01L31/0224 , H01L31/105
CPC分类号: H01L31/02161 , H01L31/022408 , H01L31/022416 , H01L31/105
摘要: A back-illuminated InGaAs photodiode is described in which a double layer of silicon nitride on the front surface serves several functions; both layers passivate the surface; an opening in the lower layer provides a diffusion mask for forming the p-n junction; and a narrower opening in the upper silicon nitride layer provides a deposition mask for forming a restricted area contact. In order to reduce strain near the junction, and hence reduce leakage currents and enhance reliability, the contact geometry has a narrow pedestal portion which contacts the surface in a zone remote from the junction edges and has a wider cap portion which is formed on the pedestal portion to seal the surface from the introduction of contaminants.
摘要翻译: 描述了背照式InGaAs光电二极管,其中前表面上的双层氮化硅具有若干功能; 两层钝化表面; 下层的开口提供用于形成p-n结的扩散掩模; 并且上部氮化硅层中的较窄的开口提供用于形成限制区域接触的沉积掩模。 为了减小接头附近的应变,并且因此减小泄漏电流并增强可靠性,接触几何形状具有窄的基座部分,其在远离接合边缘的区域中接触表面,并且具有形成在基座上的较宽的盖部分 部分以密封表面免受污染物的引入。
-
-
-
-