公开(公告)号：US20070269735A1

公开(公告)日：2007-11-22

申请号：US10592879

申请日：2005-03-17

申请人： Isao Nishimura ,  Makoto Sugiura ,  Masato Tanaka

发明人： Isao Nishimura ,  Makoto Sugiura ,  Masato Tanaka

IPC分类号： G03C1/37 ,  C08G77/20

CPC分类号： G03F7/0757 ,  C08G77/14 ,  C08G77/24 ,  G03F7/0046 ,  G03F7/0392

摘要： A siloxane resin exhibiting high transparency at a wavelength of 193 nm or less, very suitable as a resin component in a radiation-sensitive resin composition useful particularly for manufacturing LSIs, and a radiation-sensitive resin composition useful as a chemically-amplified resist exhibiting excellent depth of focus (DOF) and capability of remarkably decreasing development defects are provided. The siloxane resin comprises the structural unit (I) shown by the following formula (I) and the structural unit (II) shown by the following formula (II) in the same molecule, the structural unit (I) and the structural unit (II) being included in an amount of more than 0 mol % but not more than 70 mol %, wherein A and B individually represents a divalent linear, branched, or cyclic hydrocarbon group, R1 represents a monovalent acid-dissociable group, and R2 represents a linear, branched, or cyclic alkyl group. The radiation-sensitive resin composition comprises (a) the siloxane resin and (b) a photoacid generator.

摘要翻译： 在特别用于制造LSI的放射线敏感性树脂组合物中，波长193nm以下，非常适合作为树脂成分的高透明性的硅氧烷树脂，以及用作显示优异的化学增幅抗蚀剂的放射线敏感性树脂组合物 提供了焦点深度（DOF）和显着降低开发缺陷的能力。 硅氧烷树脂包含在同一分子中由下式（I）表示的结构单元（I）和由下式（II）表示的结构单元（II），结构单元（I）和结构单元（II ）含量大于0mol％但不大于70mol％，其中A和B各自表示二价直链，支链或环状烃基，R 1表示一价酸 R 2表示直链，支链或环状的烷基。 辐射敏感性树脂组合物包含（a）硅氧烷树脂和（b）光致酸产生剂。

公开(公告)号：US20050171226A1

公开(公告)日：2005-08-04

申请号：US10975052

申请日：2004-10-28

申请人： Isao Nishimura ,  Tsutomu Shimokawa ,  Makoto Sugiura

发明人： Isao Nishimura ,  Tsutomu Shimokawa ,  Makoto Sugiura

IPC分类号： G03F7/039 ,  C08F22/20 ,  C08G2/00 ,  C08G77/14 ,  C08K5/00 ,  C08K5/42 ,  C08L83/06 ,  G03F7/075 ,  H01L21/027

CPC分类号： C08L83/06 ,  C08K5/0025 ,  C08K5/42 ,  C08L2666/04

摘要： A radiation-sensitive resin composition comprising (A) a resin containing a structural unit of the following formula (I), (B) a resin containing a recurring unit of the following formula (II), and (C) a photoacid generator, wherein R1 represents a substituted or unsubstituted divalent (alicyclic) hydrocarbon, R2 represents a lower alkyl group or a monovalent (substituted) alicyclic hydrocarbon group, or any two R2s form in combination a divalent (substituted) alicyclic hydrocarbon group, with the remaining R2 being a lower alkyl group or a monovalent (substituted) alicyclic hydrocarbon group, wherein R3 represents a hydrogen atom, fluorine atom, or trifluoromethyl group, R4 represents a (substituted) hydrocarbon group with a valence of (c+1), (substituted) alicyclic hydrocarbon with a valence of (c+1), or (substituted) aromatic group with a valence of (c+1), R5 represents a hydrogen atom or a monovalent acid-dissociable group, a and b individually represent an integer of 0-3, provided that (a+b)≧1 is satisfied, and c is an integer of 1-3. The radiation-sensitive resin composition has a high transparency at a wavelength of 193 nm or less and is particularly excellent in LER.

摘要翻译： 一种辐射敏感性树脂组合物，其包含（A）含有下式（I）的结构单元的树脂，（B）含有下式（II）的重复单元的树脂和（C）光酸产生剂，其中 R 1表示取代或未取代的二价（脂环族）烃，R 2表示低级烷基或一价（取代）脂环族烃基，或任意两个R 0 其中R 2为低级烷基或单价（取代）脂环族烃基，其中R为低级烷基 > 3表示氢原子，氟原子或三氟甲基，R 4表示具有（c + 1）价（（C + 1）），（取代的）脂环族烃的（取代的）烃基， （c + 1）价或（c + 1）价的（取代）芳基，R 5表示氢原子或一价酸-d 相关基团，a和b分别表示0-3的整数，条件是（a + b）> = 1，c为1-3的整数。 该辐射敏感性树脂组合物在波长193nm以下具有高透明性，在LER中特别优异。

公开(公告)号：US07297461B2

公开(公告)日：2007-11-20

申请号：US10975052

申请日：2004-10-28

申请人： Isao Nishimura ,  Tsutomu Shimokawa ,  Makoto Sugiura

发明人： Isao Nishimura ,  Tsutomu Shimokawa ,  Makoto Sugiura

IPC分类号： G03F7/004 ,  G03C1/72

CPC分类号： C08L83/06 ,  C08K5/0025 ,  C08K5/42 ,  C08L2666/04

摘要： A radiation-sensitive resin composition comprising (A) a resin containing a structural unit of the following formula (I), (B) a resin containing a recurring unit of the following formula (II), and (C) a photoacid generator, wherein R1 represents a substituted or unsubstituted divalent (alicyclic) hydrocarbon, R2 represents a lower alkyl group or a monovalent (substituted) alicyclic hydrocarbon group, or any two R2s form in combination a divalent (substituted) alicyclic hydrocarbon group, with the remaining R2 being a lower alkyl group or a monovalent (substituted) alicyclic hydrocarbon group, wherein R3 represents a hydrogen atom, fluorine atom, or trifluoromethyl group, R4 represents a (substituted) hydrocarbon group with a valence of (c+1), (substituted) alicyclic hydrocarbon with a valence of (c+1), or (substituted) aromatic group with a valence of (c+1), R5 represents a hydrogen atom or a monovalent acid-dissociable group, a and b individually represent an integer of 0-3, provided that (a+b)≧1 is satisfied, and c is an integer of 1-3. The radiation-sensitive resin composition has a high transparency at a wavelength of 193 nm or less and is particularly excellent in LER.

摘要翻译： 一种辐射敏感性树脂组合物，其包含（A）含有下式（I）的结构单元的树脂，（B）含有下式（II）的重复单元的树脂和（C）光酸产生剂，其中 R 1表示取代或未取代的二价（脂环族）烃，R 2表示低级烷基或一价（取代）脂环族烃基，或任意两个R 0 其中R 2为低级烷基或单价（取代）脂环族烃基，其中R为低级烷基 > 3表示氢原子，氟原子或三氟甲基，R 4表示具有（c + 1）价（（C + 1）），（取代的）脂环族烃的（取代的）烃基， （c + 1）价或（c + 1）价的（取代）芳基，R 5表示氢原子或一价酸-d 相关基团，a和b分别表示0-3的整数，条件是（a + b）> = 1，c为1-3的整数。 该辐射敏感性树脂组合物在波长193nm以下具有高透明性，在LER中特别优异。

公开(公告)号：US08716884B2

公开(公告)日：2014-05-06

申请号：US12299937

申请日：2007-01-26

申请人： Minoru Ikemoto ,  Hideo Okayama ,  Hidetoshi Kitanaka ,  Hidetoshi Sumita ,  Yoshinobu Koji ,  Kiyonobu Ueda ,  Yasuhisa Adachi ,  Makoto Sugiura

发明人： Minoru Ikemoto ,  Hideo Okayama ,  Hidetoshi Kitanaka ,  Hidetoshi Sumita ,  Yoshinobu Koji ,  Kiyonobu Ueda ,  Yasuhisa Adachi ,  Makoto Sugiura

IPC分类号： B60L1/00 ,  B60L3/00 ,  H05K7/00 ,  H05K5/00

CPC分类号： B61C17/00 ,  B60L1/003 ,  B60L15/007 ,  B60L2200/26 ,  Y02T10/645

摘要： There is provided a vehicle controller that is mounted in a box-shaped manner beneath the floor or on the roof of a vehicle so as to supply electric power to vehicle apparatuses. The vehicle controller is configured with a plurality of functional modules 4; each of the functional modules 4 has at one side thereof an interface side 22 in which a first interface region 5 where signal-line terminals are arranged and a second interface region 6 where power-line terminals are arranged are separated; in each of the interface sides 22, the first interface region 5 is disposed in the vicinity of one and the same end and the second interface region 6 is disposed in the vicinity of the other and the same end; the plurality of functional modules includes a monitoring circuit, an overvoltage protection circuit, and an inverter.

摘要翻译： 提供了一种车辆控制器，该车辆控制器以车厢形式安装在地板或车顶上，以向车辆设备供电。 车辆控制器配置有多个功能模块4; 每个功能模块4的一侧具有接口侧22，其中布置信号线端子的第一接口区域5和布置电力线端子的第二接口区域6分离; 在每个界面22中，第一界面区域5设置在同一端附近，并且第二界面区域6设置在另一端和同一端附近; 多个功能模块包括监控电路，过电压保护电路和逆变器。

公开(公告)号：US20100203447A1

公开(公告)日：2010-08-12

申请号：US12701592

申请日：2010-02-07

申请人： Noboru Otsuka ,  Takanori Kawakami ,  Yukio Nishimura ,  Makoto Sugiura

发明人： Noboru Otsuka ,  Takanori Kawakami ,  Yukio Nishimura ,  Makoto Sugiura

IPC分类号： G03F7/20 ,  G03F7/004

CPC分类号： C08F220/12 ,  G03F7/0397 ,  G03F7/2041

摘要： A radiation-sensitive resin composition includes (A) an acid labile group-containing resin which becomes alkali-soluble by an action of an acid, (B) a radiation-sensitive acid generator, and (C) a solvent. The resin (A) includes repeating units shown by formulas (1) and (2), wherein R1 and R2 represent a hydrogen atom or a substituted or unsubstituted alkyl group having 1 to 4 carbon atoms, R3 represents a substituted or unsubstituted alkyl group having 1 to 4 carbon atoms, X represents a hydrogen atom, a hydroxyl group, or an acyl group, m represents an integer from 1 to 18, and n represents an integer from 4 to 8.

摘要翻译： 辐射敏感性树脂组合物包括（A）通过酸的作用变成碱溶性的酸不稳定基团的树脂，（B）辐射敏感性酸产生剂和（C）溶剂。 树脂（A）包括由式（1）和（2）表示的重复单元，其中R 1和R 2表示氢原子或取代或未取代的具有1至4个碳原子的烷基，R 3表示取代或未取代的烷基， 1至4个碳原子，X表示氢原子，羟基或酰基，m表示1至18的整数，n表示4至8的整数。

公开(公告)号：US20100068650A1

公开(公告)日：2010-03-18

申请号：US12529341

申请日：2008-03-17

申请人： Yukio Nishimura ,  Kaori Sakai ,  Nobuji Matsumura ,  Makoto Sugiura ,  Atsushi Nakamura ,  Gouji Wakamatsu ,  Yuusuke Anno

发明人： Yukio Nishimura ,  Kaori Sakai ,  Nobuji Matsumura ,  Makoto Sugiura ,  Atsushi Nakamura ,  Gouji Wakamatsu ,  Yuusuke Anno

IPC分类号： G03F7/039 ,  G03F7/40

CPC分类号： G03F7/0035 ,  G03F7/0397 ,  G03F7/2024 ,  G03F7/2041 ,  G03F7/40

摘要： A method of patterning using double exposure patterning in a liquid immersion lithographic process is provided. The patterning method comprises a step of forming a first pattern on a substrate using a first resist layer forming composition, a step of making the first pattern inactive, a step of forming a second pattern on a substrate on which a pattern has been formed using a second resist layer forming composition and exposing the second resist layer to radiation, and a step of developing the exposed resist layer to form a second pattern in the space area of the first pattern. The first resist layer forming composition contains a cross-linking agent which accelerates conversion of the first layer from positive-working to negative-working.

摘要翻译： 提供了一种在液浸光刻工艺中使用双曝光图案化的图案化方法。 图案化方法包括使用第一抗蚀剂层形成组合物在基板上形成第一图案的步骤，使第一图案无效的步骤，在其上已经形成图案的基板上形成第二图案的步骤，使用 第二抗蚀剂层形成组合物并将第二抗蚀剂层暴露于辐射，以及在第一图案的空间区域中显影曝光的抗蚀剂层以形成第二图案的步骤。 第一抗蚀剂层形成组合物含有交联剂，其加速第一层从正性转变为负性转化。

公开(公告)号：US08431332B2

公开(公告)日：2013-04-30

申请号：US12680200

申请日：2008-09-10

申请人： Daita Kouno ,  Norihiko Sugie ,  Gouji Wakamatsu ,  Norihiro Natsume ,  Yukio Nishimura ,  Makoto Sugiura

发明人： Daita Kouno ,  Norihiko Sugie ,  Gouji Wakamatsu ,  Norihiro Natsume ,  Yukio Nishimura ,  Makoto Sugiura

IPC分类号： G03F7/11 ,  G03F7/09 ,  G03F7/38

CPC分类号： G03F7/11 ,  G03F7/2041

摘要： The object of the invention is to provide a composition for forming an upper layer film for immersion exposure capable of forming an upper layer film effectively inhibited from developing defects through an immersion exposure process, such as a watermark defect and dissolution residue defect. Also provided are an upper layer film for immersion exposure and a method of forming a resist pattern. The composition for forming an upper layer film includes a resin ingredient and a solvent. The resin ingredient includes a resin (A) having at least one kind of repeating units selected among those represented by the formulae (1-1) to (1-3) and at least either of the two kinds of repeating units represented by the formulae (2-1) and (2-2). (1-1) (1-2) (1-3) (2-1) (2-2) [In the formulae, R1 represents hydrogen or methyl; R2 and R3 each represents methylene, linear or branched C2-6 alkylene, or alicyclic C4-12 alkylene; R4 represents hydrogen or methyl; and R5 represents a single bond, methylene, or linear or branched C2-6 alkylene.].

摘要翻译： 本发明的目的是提供一种用于形成用于浸渍曝光的上层膜的组合物，其能够通过诸如水印缺陷和溶解残留缺陷的浸渍曝光工艺有效地防止显影缺陷的形成。 还提供了用于浸渍曝光的上层膜和形成抗蚀剂图案的方法。 用于形成上层膜的组合物包括树脂成分和溶剂。 树脂成分包括具有选自由式（1-1）〜（1-3）表示的重复单元中的至少一种重复单元的树脂（A）和由式 （2-1）和（2-2）。 （1-1）（1-2）（1-3）（2-1）（2-2）[式中，R1表示氢或甲基; R2和R3各自表示亚甲基，直链或支链C 2-6亚烷基或脂环族C 4-12亚烷基; R4代表氢或甲基; 并且R 5表示单键，亚甲基或直链或支链C 2-6亚烷基。

公开(公告)号：US07897821B2

公开(公告)日：2011-03-01

申请号：US12873265

申请日：2010-08-31

申请人： Tomoki Nagai ,  Eiji Yoneda ,  Takuma Ebata ,  Takanori Kawakami ,  Makoto Sugiura ,  Tsutomu Shimokawa ,  Makoto Shimizu

发明人： Tomoki Nagai ,  Eiji Yoneda ,  Takuma Ebata ,  Takanori Kawakami ,  Makoto Sugiura ,  Tsutomu Shimokawa ,  Makoto Shimizu

IPC分类号： C07C31/34

CPC分类号： C09D133/14 ,  C07C309/10 ,  C07C309/12 ,  C07C309/19 ,  C07C309/20 ,  C07C381/12 ,  C07D209/76 ,  C08F20/38 ,  C08F28/00 ,  C08F28/02 ,  C08F214/18 ,  C08F220/12 ,  C08F220/18 ,  C08F220/24 ,  C08F220/28 ,  C08F228/02 ,  C09D141/00 ,  G03F7/0045 ,  G03F7/0392 ,  G03F7/0397

摘要： A compound is shown by the following formula (5) in which at least one of Rf groups represents a fluorine atom or a linear or branched perfluoroalkyl group having 1 to 10 carbon atoms, A′ represents a substituted or unsubstituted, linear or branched alkylene group having 1 to 20 carbon atoms, an alkylene group having at least one hetero atom, or a single bond, G represents a divalent organic group having a fluorine atom or a single bond, Mm+ represents an onium cation, m represents a natural number of 1 to 3, and p represents a natural number of 1 to 8.

摘要翻译： 下式（5）表示化合物，其中Rf基中的至少一个表示氟原子或具有1-10个碳原子的直链或支链全氟烷基，A'表示取代或未取代的直链或支链亚烷基 具有1至20个碳原子，具有至少一个杂原子的亚烷基或单键，G表示具有氟原子或单键的二价有机基团，Mm +表示鎓阳离子，m表示1的自然数 至3，p表示1至8的自然数。

公开(公告)号：US07812105B2

公开(公告)日：2010-10-12

申请号：US11914024

申请日：2006-05-11

申请人： Tomoki Nagai ,  Eiji Yoneda ,  Takuma Ebata ,  Takanori Kawakami ,  Makoto Sugiura ,  Tsutomu Shimokawa ,  Makoto Shimizu

发明人： Tomoki Nagai ,  Eiji Yoneda ,  Takuma Ebata ,  Takanori Kawakami ,  Makoto Sugiura ,  Tsutomu Shimokawa ,  Makoto Shimizu

IPC分类号： C08F14/18 ,  C08F28/02

CPC分类号： C09D133/14 ,  C07C309/10 ,  C07C309/12 ,  C07C309/19 ,  C07C309/20 ,  C07C381/12 ,  C07D209/76 ,  C08F20/38 ,  C08F28/00 ,  C08F28/02 ,  C08F214/18 ,  C08F220/12 ,  C08F220/18 ,  C08F220/24 ,  C08F220/28 ,  C08F228/02 ,  C09D141/00 ,  G03F7/0045 ,  G03F7/0392 ,  G03F7/0397

摘要： A radiation-sensitive resin composition is provided which has high transparency to radiation, excelling in basic properties as a resist such as sensitivity, resolution, and pattern shape, and, in particular, a high resolution radiation-sensitive resin composition providing a wide DOF and excelling in LER. Also provided are a polymer which can be used in the composition and a novel compound useful for synthesizing the polymer. The novel compound is shown by the following formula (2), wherein R4 represents a methyl group, a trifluoromethyl group, or a hydrogen atom, at least one of the Rfs represents a fluorine atom or a linear or branched perfluoroalkyl group having 1 to 10 carbon atoms, A represents a divalent organic group or a single bond, G represents a divalent organic group having a fluorine atom or a single bond, Mm+ represents a metal ion or an onium cation, m represents an integer of 1 to 3, and p is an integer of 1 to 8.

摘要翻译： 提供了对辐射具有高透明度的辐射敏感性树脂组合物，作为抗敏剂，例如灵敏度，分辨率和图案形状，具有优异的基本性能，特别是提供宽DOF和高分辨率辐射敏感性树脂组合物 优秀的LER。 还提供了可用于组合物中的聚合物和用于合成聚合物的新型化合物。 该新化合物由下式（2）表示，其中R4表示甲基，三氟甲基或氢原子，Rfs中的至少一个表示氟原子或具有1至10个的直链或支链全氟烷基 碳原子，A表示二价有机基团或单键，G表示具有氟原子或单键的二价有机基团，Mm +表示金属离子或鎓阳离子，m表示1〜3的整数，p表示 是1〜8的整数。

公开(公告)号：US20100009292A1

公开(公告)日：2010-01-14

申请号：US12525816

申请日：2008-02-20

申请人： Tomoki Nagai ,  Atsushi Nakamura ,  Takayoshi Abe ,  Makoto Sugiura

发明人： Tomoki Nagai ,  Atsushi Nakamura ,  Takayoshi Abe ,  Makoto Sugiura

IPC分类号： G03F7/20 ,  G03F7/039

CPC分类号： G03F7/40

摘要： A resin composition which can increase the pattern shrink rate while maintaining the advantages of capability of effectually and precisely micronizing the resist pattern gaps irrespective of the surface conditions of the substrate and forming resist patterns exceeding the wavelength limit economically at low cost in a good condition having only small defects, and a method of efficiently forming a micropattern using the resin composition are disclosed. The resin composition for forming a micropattern includes a hydroxyl group-containing resin, a crosslinking component, and an alcohol solvent which contains an alcohol and not more than 10 mass % of water relative to the total solvent. The crosslinking component includes a compound having two or more acryloyloxy groups in the molecule.

摘要翻译： 可以提高图案收缩率的树脂组合物，同时保持有效地和精确地微细化抗蚀剂图案间隙的能力的优点，而不管基材的表面条件如何，并且在良好的条件下以低成本在经济上形成超过波长极限的抗蚀剂图案， 公开了仅有小的缺陷，以及使用该树脂组合物有效地形成微图案的方法。 用于形成微图案的树脂组合物包括含羟基的树脂，交联组分和醇溶剂，其相对于总溶剂含有醇且不超过10质量％的水。 交联组分包括在分子中具有两个或更多个丙烯酰氧基的化合物。