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公开(公告)号：US09999983B2
公开(公告)日：2018-06-19
申请号：US13968514
申请日：2013-08-16
发明人： Akiko Suzuki , Akinobu Sato
CPC分类号： B26D1/0006 , B26D2001/002 , Y10T428/24355
摘要： A chipping-proof nonmetal inorganic solid-state material is characterized in that the inorganic solid-state material has, in at least a part of a surface thereof, a surface structure in which a network of recesses and protuberances surrounded by the recesses are formed, the protuberances have an average width of 5 nm to 50 nm, a physical property of the surface structure differs from the physical property of an interior of the inorganic solid-state material lying below the surface structure, and there is no solid-solid interface between the surface structure and the interior of the inorganic solid-state material.
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公开(公告)号：US09056405B2
公开(公告)日：2015-06-16
申请号：US13913335
申请日：2013-06-07
发明人： Akinobu Sato , Akiko Suzuki , Takeshi Kawano
IPC分类号： B29C33/42
CPC分类号： B29C33/42
摘要： The average roughness Ra of a mold tool surface that comes into contact with a material to be molded measured for a measurement area 10 μm square or smaller is equal to or lower than 5 nm, and fine granular projection structures having diameters ranging from 10 to 80 nm and heights ranging from 10 to 40 nm are formed on the mold tool surface with a density of 400/μm2 or higher. The frictional force due to the anchoring effect or the digging effect is reduced, and the adhesive force due to meniscus is also reduced. The release resistance is significantly reduced without affecting the dimensional precision of a fine molded product.
摘要翻译： 在10μm以下的测定区域测定的与被成型材料接触的模具表面的平均粗糙度Ra为5nm以下，直径为10〜80μm的微细粒状突起结构 在模具工具表面上以400 /μm2或更高的密度形成范围为10至40nm的高度。 由于锚定效应或挖掘效果引起的摩擦力降低，并且由于弯月面引起的粘合力也降低。 耐冲击性显着降低，而不影响精细模制产品的尺寸精度。
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公开(公告)号：US20130270734A1
公开(公告)日：2013-10-17
申请号：US13913335
申请日：2013-06-07
发明人： Akinobu Sato , Akiko Suzuki , Takeshi Kawano
IPC分类号： B29C33/42
CPC分类号： B29C33/42
摘要： The average roughness Ra of a mold tool surface that comes into contact with a material to be molded measured for a measurement area 10 μm square or smaller is equal to or lower than 5 nm, and fine granular projection structures having diameters ranging from 10 to 80 nm and heights ranging from 10 to 40 nm are formed on the mold tool surface with a density of 400 /μm2 or higher. The frictional force due to the anchoring effect or the digging effect is reduced, and the adhesive force due to meniscus is also reduced. The release resistance is significantly reduced without affecting the dimensional precision of a fine molded product.
摘要翻译： 与正方形或以下的测量区域测量的待模制材料接触的模具工具表面的平均粗糙度Ra等于或小于5nm，并且直径范围为10至80的细颗粒突起结构 在模具工具表面上以400 / m 2或更高的密度形成范围为10至40nm的高度。 由于锚定效应或挖掘效果引起的摩擦力降低，并且由于弯月面引起的粘合力也降低。 耐冲击性显着降低，而不影响精细模制产品的尺寸精度。
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公开(公告)号：US09852886B2
公开(公告)日：2017-12-26
申请号：US14138602
申请日：2013-12-23
发明人： Akinobu Sato , Akiko Suzuki , Takeshi Kawano
IPC分类号： B21D37/18 , H01J37/317 , H01J37/305 , B32B3/30 , C23F4/00
CPC分类号： H01J37/3056 , B21D37/18 , B32B3/30 , C23F4/00 , H01J37/317 , Y10T428/12389 , Y10T428/24355 , Y10T428/24446 , Y10T428/24479
摘要： A slide part has a surface structure in which there are at least two periodic structures among a first periodic structure with a period of 10 nm to 100 nm inclusive and a depth of 5 nm to 50 nm inclusive, a second periodic structure with a period of 100 nm to 1000 nm inclusive and a depth of 20 nm to 500 nm inclusive, and a third periodic structure with a period of 1000 nm to 10000 nm inclusive and a depth of 100 nm to 3000 nm inclusive, in which one of the at least two periodic structures is formed on the other periodic structure.
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5.发明授权公开(公告)号：US09289910B2
公开(公告)日：2016-03-22
申请号：US13908293
申请日：2013-06-03
发明人： Akinobu Sato , Akiko Suzuki
CPC分类号： B26D1/0006 , B26D2001/002 , B26D2001/0053 , B28D1/225 , C03B33/105 , Y02P40/57 , Y10T83/929
摘要： Two surfaces forming a cutting edge and a ridge of a cutting edge existing along the boundary between the two surfaces intersecting with each other are irradiated with a gas cluster ion beam at the same time, the maximum height of the profile of the two surfaces being equal to or smaller than 1 μm. A facet is newly formed on the ridge of the cutting edge by performing the irradiation with the gas cluster ion beam in such a manner that the two surfaces are not perpendicularly but obliquely irradiated with the gas cluster ion beam, and at least a part of the ridge of the cutting edge is perpendicularly irradiated with the gas cluster ion beam.
摘要翻译： 形成沿相交的两个表面之间的边界上存在的切割边缘和脊的两个表面同时被气体簇离子束照射，两个表面的轮廓的最大高度相等 或1μm以下。 通过以气体簇离子束的两个表面不垂直但倾斜地照射气体团簇离子束的方式对切割边缘的脊部新形成小面，并且至少部分 切割边缘的脊线与气体团簇离子束垂直照射。
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公开(公告)号：US09114541B2
公开(公告)日：2015-08-25
申请号：US14054058
申请日：2013-10-15
发明人： Akinobu Sato , Akiko Suzuki
CPC分类号： B26B9/02 , B23B27/005 , B23B2200/242 , B23B2226/125 , B23B2226/31 , B23B2226/315 , B23C5/18 , B23C2200/243 , B23C2210/123 , B23C2226/125 , B23C2226/31 , B23C2226/315 , C23C14/48
摘要： In an edge tool having a cutting edge made of a nonmetal inorganic solid-state material with a facet formed on a ridge of the cutting edge, a pre-wearing layer having a thickness of 5 nm or more and having a surface structure formed by a network of recesses and protuberances surrounded by the recesses is formed on a surface of the facet. The average width of the protuberances is 5 nm to 50 nm. A property value of the pre-wearing layer is different from the property value of the inorganic solid-state material underlying the pre-wearing layer, and there is no solid-solid interface between the pre-wearing layer and the inorganic solid-state material.
摘要翻译： 在具有由非金属无机固态材料制成的切削刃的边缘工具中，其具有形成在切削刃的脊部上的小面，具有厚度为5nm以上并且具有由 由凹部包围的凹部和突起的网络形成在小面的表面上。 突起的平均宽度为5nm至50nm。 预磨损层的特性值与预磨损层下方的无机固体材料的特性值不同，在预磨损层与无机固态材料之间不存在固体 - 固体界面 。
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公开(公告)号：US09875880B2
公开(公告)日：2018-01-23
申请号：US15464858
申请日：2017-03-21
发明人： Akinobu Sato , Akiko Suzuki , Takeshi Kawano
IPC分类号： C23F4/00 , H01J37/305 , B32B3/30 , B21D37/18 , H01J37/317
CPC分类号： H01J37/3056 , B21D37/18 , B32B3/30 , C23F4/00 , H01J37/317 , Y10T428/12389 , Y10T428/24355 , Y10T428/24446 , Y10T428/24479
摘要： A slide part has a surface structure in which there are at least two periodic structures among a first periodic structure with a period of 10 nm to 100 nm inclusive and a depth of 5 nm to 50 nm inclusive, a second periodic structure with a period of 100 nm to 1000 nm inclusive and a depth of 20 nm to 500 nm inclusive, and a third periodic structure with a period of 1000 nm to 10000 nm inclusive and a depth of 100 nm to 3000 nm inclusive, in which one of the at least two periodic structures is formed on the other periodic structure.
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8.发明授权公开(公告)号：US09663862B2
公开(公告)日：2017-05-30
申请号：US14932038
申请日：2015-11-04
发明人： Akinobu Sato , Akiko Suzuki , Emmanuel Bourelle , Jiro Matsuo , Toshio Seki
IPC分类号： H01J27/00 , C23F4/00 , H01J27/02 , H01J37/20 , H01J37/305 , H01J37/317 , H01L21/3065
CPC分类号： C23F4/00 , H01J27/026 , H01J37/20 , H01J37/3053 , H01J37/317 , H01J2237/20207 , H01J2237/20214 , H01L21/3065
摘要： A method of smoothing a solid surface with a gas cluster ion beam includes irradiating the solid surface with the gas cluster ion beam. The irradiating includes, when scratches which can be likened to a line-and-space pattern structure with widths and heights on the order of a submicrometer to micrometer are present on the solid surface, a process of emitting the gas cluster ion beam so as to expose substances, which remain on side-walls of the scratches due to lateral transferal caused by collisions with gas clusters, to other gas clusters, and the gas cluster ion beam diverges non-concentrically and/or non-uniformly.
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公开(公告)号：US09233410B2
公开(公告)日：2016-01-12
申请号：US13888706
申请日：2013-05-07
发明人： Akinobu Sato , Akiko Suzuki , Takeshi Kawano
CPC分类号： B21D37/205 , B21D37/20 , B23K15/08 , B26D7/088 , B26F1/14 , C23F4/00 , G21K5/02 , Y10T83/263 , Y10T83/929 , Y10T83/9437
摘要： To enable fabrication of a precise stamped product having an extremely low surface roughness. Ripples 24 having depths ranging from 10 to 100 nm are formed with periodicities ranging from 100 to 1000 nm on a stamping tool surface that comes into contact with a workpiece material. The ripples 24 have a stripe shape extending in a direction substantially perpendicular to the direction of sliding between the stamping tool (die 21) and the workpiece material (the direction of the arrow a). The ripples 24 serve as micro pools. For example, a product that is required to have a surface roughness of the order of several tens of nm or lower can be satisfactorily stamped.
摘要翻译： 为了制造具有极低表面粗糙度的精密冲压产品。 在与工件材料接触的冲压工具表面上形成深度范围为10至100nm的波纹24，周期范围为100至1000nm。 波纹24具有在与冲压工具（模具21）和工件材料（箭头a的方向）之间的滑动方向基本垂直的方向上延伸的条纹形状。 波纹24作为微池。 例如，可以令人满意地冲压要求具有几十nm以下的表面粗糙度的产品。
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公开(公告)号：US20130240760A1
公开(公告)日：2013-09-19
申请号：US13888706
申请日：2013-05-07
发明人： Akinobu Sato , Akiko Suzuki , Takeshi Kawano
IPC分类号： G21K5/02
CPC分类号： B21D37/205 , B21D37/20 , B23K15/08 , B26D7/088 , B26F1/14 , C23F4/00 , G21K5/02 , Y10T83/263 , Y10T83/929 , Y10T83/9437
摘要： To enable fabrication of a precise stamped product having an extremely low surface roughness. Ripples 24 having depths ranging from 10 to 100 nm are formed with periodicities ranging from 100 to 1000 nm on a stamping tool surface that comes into contact with a workpiece material. The ripples 24 have a stripe shape extending in a direction substantially perpendicular to the direction of sliding between the stamping tool (die 21) and the workpiece material (the direction of the arrow a). The ripples 24 serve as micro pools. For example, a product that is required to have a surface roughness of the order of several tens of nm or lower can be satisfactorily stamped.
摘要翻译： 为了制造具有极低表面粗糙度的精密冲压产品。 在与工件材料接触的冲压工具表面上形成深度范围为10至100nm的波纹24，周期范围为100至1000nm。 波纹24具有在与冲压工具（模具21）和工件材料（箭头a的方向）之间的滑动方向基本垂直的方向上延伸的条纹形状。 波纹24作为微池。 例如，可以令人满意地冲压要求具有几十nm以下的表面粗糙度的产品。
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