Charged particle beam device and control method of optical system of charged particle beam device

    公开(公告)号:US11222764B2

    公开(公告)日:2022-01-11

    申请号:US16827111

    申请日:2020-03-23

    Applicant: JEOL Ltd.

    Abstract: A charged particle beam device includes: a charged particle source; an optical system which acts on a charged particle beam emitted from the charged particle source; a control unit which controls the optical system; and a storage unit which stores previous setting values of the optical system. The optical system includes a first optical element and a second optical element for controlling a state of the charged particle beam to be incident on the first optical element. The control unit obtains an initial value of a setting value of the second optical element based on previous setting values of the second optical element; and changes a state of the charged particle beam by changing the setting value of the second optical element from the obtained initial value and obtains the setting value of the second optical element based on the change in the state of the charged particle beam.

    Charged Particle Beam Device and Control Method of Optical System of Charged Particle Beam Device

    公开(公告)号:US20200343072A1

    公开(公告)日:2020-10-29

    申请号:US16827111

    申请日:2020-03-23

    Applicant: JEOL Ltd.

    Abstract: A charged particle beam device includes: a charged particle source; an optical system which acts on a charged particle beam emitted from the charged particle source; a control unit which controls the optical system; and a storage unit which stores previous setting values of the optical system. The optical system includes a first optical element and a second optical element for controlling a state of the charged particle beam to be incident on the first optical element. The control unit obtains an initial value of a setting value of the second optical element based on previous setting values of the second optical element; and changes a state of the charged particle beam by changing the setting value of the second optical element from the obtained initial value and obtains the setting value of the second optical element based on the change in the state of the charged particle beam.

    Transmission Electron Microscope and Method of Controlling Same

    公开(公告)号:US20210151286A1

    公开(公告)日:2021-05-20

    申请号:US17095848

    申请日:2020-11-12

    Applicant: JEOL Ltd.

    Inventor: Hirofumi Iijima

    Abstract: A transmission electron microscope includes an electron beam source emitting an electron beam and an illumination optical system for directing the emitted electron beam at a sample. The illumination optical system has a first condenser lens, a second condenser lens, a third condenser lens, a fourth condenser lens, an objective lens, and a condenser aperture disposed at the position of the second condenser lens. The third condenser lens and the fourth condenser lens cooperate to make the position of the condenser aperture and a sample plane conjugate to each other. The first condenser lens and the second condenser lens cooperate to make the electron beam source and a front focal plane of the objective lens conjugate to each other while the conjugate relationship between the position of the condenser aperture and the sample plane is maintained by the third and fourth condenser lenses.

    Electron Microscope
    4.
    发明申请
    Electron Microscope 审中-公开

    公开(公告)号:US20200013582A1

    公开(公告)日:2020-01-09

    申请号:US16454181

    申请日:2019-06-27

    Applicant: JEOL Ltd.

    Abstract: An electron microscope comprises: an electron microscope main body including a phase plate that imparts a phase change to an electron wave, a moving mechanism that moves the phase plate, and a detector that acquires an image formed by an electron beam transmitted through a sample; and a control unit that controls the electron microscope main body. The control unit performs a phase plate image acquisition process of acquiring a phase plate image which is an image of the phase plate; an unevenness determination process of determining whether or not the phase plate has unevenness based on the phase plate image; and a moving mechanism control process of moving the phase plate by controlling the moving mechanism when the control unit has determined that the unevenness is present.

    Phase plate and method of fabricating same
    5.
    发明授权
    Phase plate and method of fabricating same 有权
    相板及其制造方法

    公开(公告)号:US08829436B2

    公开(公告)日:2014-09-09

    申请号:US14138717

    申请日:2013-12-23

    Applicant: JEOL Ltd.

    Abstract: A method of fabricating a phase plate, for use in a transmission electron microscope, with simple process steps is offered. The method includes a step (S100) of forming a first layer on a substrate, a step (S102) of patterning the first layer to form through-holes extending through the first layer, a step (S104) of etching the surface of the substrate opposite to the surface on which the first layer is formed to form an opening which is in communication with the through-holes and which exposes the first layer, and a step (S106) of forming a second layer on the first layer.

    Abstract translation: 提供了一种以简单的工艺步骤制造用于透射电子显微镜的相位板的方法。 该方法包括在基板上形成第一层的工序(S100),对第一层进行图案化以形成延伸穿过第一层的贯通孔的工序(S102),对基板表面进行蚀刻的工序(S104) 与形成有第一层的表面相对,形成与通孔连通并露出第一层的开口;以及在第一层上形成第二层的步骤(S106)。

    Phase plate, method of fabricating same, and electron microscope

    公开(公告)号:US09786467B2

    公开(公告)日:2017-10-10

    申请号:US15067394

    申请日:2016-03-11

    Applicant: JEOL Ltd.

    Inventor: Hirofumi Iijima

    Abstract: A phase plate capable of suppressing electrification and a method of fabricating the plate are provided. The phase plate is for use in an electron microscope and includes a phase control layer provided with a through-hole and at least one conductive layer covering and closing off the through-hole. The conductive layer is formed on at least one of a first surface and a second surface of the phase control layer, the second surface being on the opposite side of the first surface. The phase control layer produces a given phase difference between electron waves transmitted through the phase control layer and electron waves transmitted through the through-hole.

    Image Acquisition Method and Transmission Electron Microscope
    7.
    发明申请
    Image Acquisition Method and Transmission Electron Microscope 有权
    图像采集方法和透射电子显微镜

    公开(公告)号:US20150136980A1

    公开(公告)日:2015-05-21

    申请号:US14509402

    申请日:2014-10-08

    Applicant: JEOL Ltd.

    Inventor: Hirofumi Iijima

    Abstract: An image acquisition method and system for use in transmission electron microscopy and capable of providing information about a wide range of frequency range. The method is initiated with setting at least one of the spherical aberration coefficient and chromatic aberration coefficient of the imaging system of the microscope to suppress attenuation of a contrast transfer function due to an envelope function. Then, an image is obtained by the imaging system placed in defocus conditions.

    Abstract translation: 一种用于透射电子显微镜的图像采集方法和系统,能够提供有关宽范围频率范围的信息。 通过设置显微镜的成像系统的球面像差系数和色差系数中的至少一个来开始该方法,以抑制由于包络函数引起的对比度传递函数的衰减。 然后,通过放置在散焦条件下的成像系统获得图像。

    Phase Plate and Method of Fabricating Same
    8.
    发明申请
    Phase Plate and Method of Fabricating Same 有权
    相板及其制造方法

    公开(公告)号:US20140183358A1

    公开(公告)日:2014-07-03

    申请号:US14138717

    申请日:2013-12-23

    Applicant: JEOL Ltd.

    Abstract: A method of fabricating a phase plate, for use in a transmission electron microscope, with simple process steps is offered. The method includes a step (S100) of forming a first layer on a substrate, a step (S102) of patterning the first layer to form through-holes extending through the first layer, a step (S104) of etching the surface of the substrate opposite to the surface on which the first layer is formed to form an opening which is in communication with the through-holes and which exposes the first layer, and a step (S106) of forming a second layer on the first layer.

    Abstract translation: 提供了一种以简单的工艺步骤制造用于透射电子显微镜的相位板的方法。 该方法包括在基板上形成第一层的工序(S100),对第一层进行图案化以形成延伸穿过第一层的贯通孔的工序(S102),对基板表面进行蚀刻的工序(S104) 与形成有第一层的表面相对,形成与通孔连通并露出第一层的开口;以及在第一层上形成第二层的步骤(S106)。

    Transmission electron microscope and method of controlling same

    公开(公告)号:US11133151B2

    公开(公告)日:2021-09-28

    申请号:US17095848

    申请日:2020-11-12

    Applicant: JEOL Ltd.

    Inventor: Hirofumi Iijima

    Abstract: A transmission electron microscope includes an electron beam source emitting an electron beam and an illumination optical system for directing the emitted electron beam at a sample. The illumination optical system has a first condenser lens, a second condenser lens, a third condenser lens, a fourth condenser lens, an objective lens, and a condenser aperture disposed at the position of the second condenser lens. The third condenser lens and the fourth condenser lens cooperate to make the position of the condenser aperture and a sample plane conjugate to each other. The first condenser lens and the second condenser lens cooperate to make the electron beam source and a front focal plane of the objective lens conjugate to each other while the conjugate relationship between the position of the condenser aperture and the sample plane is maintained by the third and fourth condenser lenses.

    Electron microscope
    10.
    发明授权

    公开(公告)号:US10741358B2

    公开(公告)日:2020-08-11

    申请号:US16454181

    申请日:2019-06-27

    Applicant: JEOL Ltd.

    Abstract: An electron microscope comprises: an electron microscope main body including a phase plate that imparts a phase change to an electron wave, a moving mechanism that moves the phase plate, and a detector that acquires an image formed by an electron beam transmitted through a sample; and a control unit that controls the electron microscope main body. The control unit performs a phase plate image acquisition process of acquiring a phase plate image which is an image of the phase plate; an unevenness determination process of determining whether or not the phase plate has unevenness based on the phase plate image; and a moving mechanism control process of moving the phase plate by controlling the moving mechanism when the control unit has determined that the unevenness is present.

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