公开(公告)号：US20240021429A1

公开(公告)日：2024-01-18

申请号：US18372163

申请日：2023-09-25

Applicant: JSR CORPORATION

Inventor： Ken MARUYAMA ,  Takayoshi Abe ,  Kazunori Sakai

IPC: H01L21/027 ,  H01L21/311 ,  G03F7/16 ,  G03F7/004 ,  G03F7/20

CPC classification number: H01L21/0274 ,  H01L21/31116 ,  G03F7/167 ,  G03F7/0042 ,  G03F7/2004

Abstract: A method for manufacturing a semiconductor substrate includes forming a resist underlayer film directly or indirectly on a substrate by applying a composition for forming a resist underlayer film. A metal-containing resist film is formed on the resist underlayer film. The metal-containing resist film is exposed. An exposed portion of the exposed metal-containing resist film is dissolved with a developer to form a resist pattern.

公开(公告)号：US20140363773A1

公开(公告)日：2014-12-11

申请号：US14465320

申请日：2014-08-21

Applicant: JSR Corporation

Inventor： Atsushi Nakamura ,  Tsutomu Shimokawa ,  Junichi Takahashi ,  Takayoshi Abe ,  Tomoki Nagai ,  Tomohiro Kakizawa

IPC: G03F7/039

CPC classification number: G03F7/0392 ,  G03F7/0035 ,  G03F7/0397 ,  G03F7/40 ,  H01L21/0273 ,  Y10S430/106

Abstract: A radiation-sensitive resin composition includes a resin including a repeating unit shown by a following general formula (1), a photoacid generator and a photodisintegrating base shown by a following general formula (8). R1 represents a hydrogen atom or a methyl group, and each of R2s individually represents a monovalent alicyclic hydrocarbon group having 4 to 20 carbon atoms or a derivative thereof, a linear or branched alkyl group having 1 to 4 carbon atoms, or the like. Each of R18 to R20 individually represents a hydrogen atom, an alkyl group, an alkoxy group, a hydroxyl group or a halogen atom, and Z− represents OH−, R—COO−, R—SO3− or an anion shown by a following formula (10), wherein R represents an alkyl group, an aryl group or an alkaryl group.

Abstract translation: 辐射敏感性树脂组合物包括含有下列通式（1）表示的重复单元的树脂，光致酸产生剂和由以下通式（8）表示的光致聚合碱。 R1表示氢原子或甲基，R2各自表示碳原子数为4〜20的一价脂环族烃基或其衍生物，碳原子数为1〜4的直链或支链烷基等。 R 18〜R 20各自独立地表示氢原子，烷基，烷氧基，羟基或卤素原子，Z-表示OH-，R-COO-，R-SO 3 - 或下述 式（10），其中R表示烷基，芳基或烷芳基。