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公开(公告)号：US20110268883A1
公开(公告)日：2011-11-03
申请号：US13064926
申请日：2011-04-26
申请人： Jason R. Haaheim , John Edward Bussan , Edward R. Solheim , John Moskal , Michael R. Nelson , Vadim Val-Khvalabov
发明人： Jason R. Haaheim , John Edward Bussan , Edward R. Solheim , John Moskal , Michael R. Nelson , Vadim Val-Khvalabov
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An apparatus for leveling an array of microscopic pens relative to a substrate surface or measuring a relative tilting therebetween includes an actuator configured to drive one of the array or the substrate to vary a distance therebetween, one or more force sensors configured to measure a force between the array and the surface, and a device configured calculate a force curve parameter of the force over the distance or time. The apparatus is configured to level the array relative to the surface by varying a relative tilting between the array and the substrate surface based on the force curve parameter or to measure the relative tilting based on the force curve parameter. Methods and software also are provided.
摘要翻译： 一种用于相对于衬底表面调平微阵列阵列或测量它们之间的相对倾斜的装置包括致动器，其构造成驱动阵列或衬底之一以改变其间的距离，一个或多个力传感器被配置成测量 阵列和表面，以及配置的装置计算力与力的距离或时间的参数。 该装置被配置为通过基于力曲线参数改变阵列和基板表面之间的相对倾斜度来相对于表面来平坦化阵列，或者基于力曲线参数来测量相对倾斜度。 还提供了方法和软件。
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公开(公告)号：US20110268882A1
公开(公告)日：2011-11-03
申请号：US13064925
申请日：2011-04-26
申请人： John Edward Bussan , Jason R. Haaheim , John Moskal , Edward R. Solheim , Vadim Val-Khvalabov , Michael R. Nelson , Nabil A. Amro , Javad M. Vakil
发明人： John Edward Bussan , Jason R. Haaheim , John Moskal , Edward R. Solheim , Vadim Val-Khvalabov , Michael R. Nelson , Nabil A. Amro , Javad M. Vakil
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An apparatus for leveling an array of microscopic pens with respect to a substrate surface is provided. The apparatus includes an array of microscopic pens; a substrate having a substrate surface; a controllable arm comprising a spherical ball on an end thereof; a force sensor configured to measure a force exerted on the array or the substrate surface at each of the plurality of positions; one or more actuators configured to drive the array and/or the substrate to vary a relative distance and a relative tilting between the array and the substrate surface; and a controller configured to determine a planar offset of the array with respect to the substrate and initiate a leveling of the array with respect to the substrate based on the planar offset. Methods are also provided.
摘要翻译： 提供了一种用于使微阵列阵列相对于衬底表面调平的装置。 该装置包括一列微镜笔; 具有基板表面的基板; 一个可控臂，其一端包括一个球形球; 力传感器，其构造成测量在所述多个位置中的每一个处施加在所述阵列或所述基板表面上的力; 一个或多个致动器被配置为驱动阵列和/或基板以改变阵列和基板表面之间的相对距离和相对倾斜; 以及控制器，被配置为确定阵列相对于衬底的平面偏移，并基于平面偏移启动相对于衬底的阵列的调平。 还提供了方法。
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公开(公告)号：US20110014378A1
公开(公告)日：2011-01-20
申请号：US12838384
申请日：2010-07-16
申请人： John Edward BUSSAN , Sergey V. Rozhok , Vadim Val-Khvalabov , Joseph S. Fragala , Jason R. Haaheim , Michael R. Nelson , Edward R. Solheim , Javad M. Vakil
发明人： John Edward BUSSAN , Sergey V. Rozhok , Vadim Val-Khvalabov , Joseph S. Fragala , Jason R. Haaheim , Michael R. Nelson , Edward R. Solheim , Javad M. Vakil
CPC分类号： G03F7/0002 , G01Q80/00 , G03F9/7034 , G03F9/7053
摘要： Devices for leveling an object for patterning a substrate surface, including an array of scanning probe tips, are provided. A device may include a support structure adapted to mount an object, the object having a plurality of protrusions adapted to form a pattern on a surface of a substrate upon contact of the object to the surface; and at least one flexible joint assembly mounted to the support structure and adapted to allow the object to achieve a parallel orientation with respect to the surface upon contact of the object to the surface. Also provided are apparatuses and kits incorporating the devices and methods of making and using the devices and apparatuses.
摘要翻译： 提供了用于调整用于图案化衬底表面的对象的设备，包括扫描探针尖端的阵列。 装置可以包括适于安装物体的支撑结构，所述物体具有适于在物体与表面接触时在基底的表面上形成图案的多个突起; 以及至少一个柔性接头组件，其安装到所述支撑结构并且适于允许所述物体在所述物体与所述表面接触时相对于所述表面实现平行取向。 还提供了结合设备的装置和套件以及制造和使用设备和装置的方法。
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