公开(公告)号：US08894804B2

公开(公告)日：2014-11-25

申请号：US12747491

申请日：2008-12-12

申请人： Jean-Paul Booth ,  Alexei Marakhtanov ,  Rajinder Dhindsa ,  Luc Albarede ,  Seyed Jafar Jafarian-Tehrani

发明人： Jean-Paul Booth ,  Alexei Marakhtanov ,  Rajinder Dhindsa ,  Luc Albarede ,  Seyed Jafar Jafarian-Tehrani

IPC分类号： C23F1/00 ,  H01J37/32

CPC分类号： H01J37/32935

摘要： An arrangement within a plasma reactor for detecting a plasma unconfinement event is provided. The arrangement includes a sensor, which is a capacitive-based sensor implemented within the plasma reactor. The sensor is implemented outside of a plasma confinement region and is configured to produce a transient current when the sensor is exposed to plasma associated with the plasma unconfinement event. The sensor has at least one electrically insulative layer oriented toward the plasma associated with the plasma unconfined event. The arrangement also includes a detection circuit, which is electrically connected to the sensor for converting the transient current into a transient voltage signal and for processing the transient voltage signal to ascertain whether the plasma unconfinement event exists.

摘要翻译： 提供了用于检测等离子体无约束事件的等离子体反应器内的布置。 该装置包括传感器，其是在等离子体反应器内实现的基于电容的传感器。 传感器在等离子体限制区域外部实现，并且被配置为当传感器暴露于与等离子体无约束事件相关联的等离子体时产生瞬态电流。 传感器具有至少一个朝向与等离子体无约束事件相关联的等离子体的电绝缘层。 该装置还包括检测电路，其与传感器电连接，用于将瞬态电流转换成瞬态电压信号，并用于处理瞬态电压信号以确定是否存在等离子体无约束事件。

公开(公告)号：US20110128017A1

公开(公告)日：2011-06-02

申请号：US12747491

申请日：2008-12-12

申请人： Jean-Paul Booth ,  Alexei Marakhtanov ,  Rajinder Dhindsa ,  Luc Albarede ,  Seyed Jafar Jafarian-Tehrani

发明人： Jean-Paul Booth ,  Alexei Marakhtanov ,  Rajinder Dhindsa ,  Luc Albarede ,  Seyed Jafar Jafarian-Tehrani

IPC分类号： G01R27/26

CPC分类号： H01J37/32935

摘要： An arrangement within a plasma reactor for detecting a plasma unconfinement event is provided. The arrangement includes a sensor, which is a capacitive-based sensor implemented within the plasma reactor. The sensor is implemented outside of a plasma confinement region and is configured to produce a transient current when the sensor is exposed to plasma associated with the plasma unconfinement event. The sensor has at least one electrically insulative layer oriented toward the plasma associated with the plasma unconfined event. The arrangement also includes a detection circuit, which is electrically connected to the sensor for converting the transient current into a transient voltage signal and for processing the transient voltage signal to ascertain whether the plasma unconfinement event exists.

摘要翻译： 提供了用于检测等离子体无约束事件的等离子体反应器内的布置。 该装置包括传感器，其是在等离子体反应器内实现的基于电容的传感器。 传感器在等离子体限制区域外部实现，并且被配置为当传感器暴露于与等离子体无约束事件相关联的等离子体时产生瞬态电流。 传感器具有至少一个朝向与等离子体无约束事件相关联的等离子体的电绝缘层。 该装置还包括检测电路，其与传感器电连接，用于将瞬态电流转换成瞬态电压信号，并用于处理瞬态电压信号以确定是否存在等离子体无约束事件。

公开(公告)号：US20100007362A1

公开(公告)日：2010-01-14

申请号：US12498955

申请日：2009-07-07

申请人： Jean-Paul Booth ,  Luc Albarede ,  Jung Kim ,  Douglas Keil

发明人： Jean-Paul Booth ,  Luc Albarede ,  Jung Kim ,  Douglas Keil

IPC分类号： G01R27/26 ,  G01R31/28

CPC分类号： H01J37/32935 ,  H01L21/67069 ,  H01L22/14 ,  Y10T29/49004

摘要： A method for characterizing deposited film on a substrate within a processing chamber during processing is provided. The method includes determining voltage-current characteristic for a probe head when measuring capacitor is set at a first capacitance value. The method also includes applying RF train to the probe head when measuring capacitor is set at a capacitance value greater than first capacitance value. The method further includes providing an initial resistance value and an initial capacitance value for the deposited film. The method yet also includes employing initial resistance value, initial capacitance value, and voltage-current characteristic to generate simulated voltage-time curve. The method yet further includes determining measured voltage-time curve, which represents potential drop across the deposited film for one RF train. The method more over includes comparing the two curves. If the difference is less than predefined threshold, employ initial resistance value and initial capacitance for characterizing the deposited film.

摘要翻译： 提供了一种在处理期间在处理室内的基板上表征沉积膜的方法。 该方法包括当测量电容器被设置在第一电容值时确定探头的电压 - 电流特性。 该方法还包括当测量电容器被设置为大于第一电容值的电容值时，将RF串施加到探头。 该方法还包括为沉积膜提供初始电阻值和初始电容值。 该方法还包括采用初始电阻值，初始电容值和电压 - 电流特性来产生模拟电压 - 时间曲线。 该方法还包括确定测量的电压时间曲线，其表示用于一个RF火车的沉积膜的电位降。 更多的方法包括比较两条曲线。 如果差值小于预定阈值，则使用初始电阻值和初始电容来表征沉积膜。

公开(公告)号：US08164353B2

公开(公告)日：2012-04-24

申请号：US12498955

申请日：2009-07-07

申请人： Jean-Paul Booth ,  Luc Albarede ,  Jung Kim ,  Douglas Keil

发明人： Jean-Paul Booth ,  Luc Albarede ,  Jung Kim ,  Douglas Keil

IPC分类号： G01R27/26 ,  G01R31/08

CPC分类号： H01J37/32935 ,  H01L21/67069 ,  H01L22/14 ,  Y10T29/49004

摘要： A method for characterizing deposited film on a substrate within a processing chamber during processing is provided. The method includes determining voltage-current characteristic for a probe head when measuring capacitor is set at a first capacitance value. The method also includes applying RF train to the probe head when measuring capacitor is set at a capacitance value greater than first capacitance value. The method further includes providing an initial resistance value and an initial capacitance value for the deposited film. The method yet also includes employing initial resistance value, initial capacitance value, and voltage-current characteristic to generate simulated voltage-time curve. The method yet further includes determining measured voltage-time curve, which represents potential drop across the deposited film for one RF train. The method more over includes comparing the two curves. If the difference is less than predefined threshold, employ initial resistance value and initial capacitance for characterizing the deposited film.

摘要翻译： 提供了一种在处理期间在处理室内的基板上表征沉积膜的方法。 该方法包括当测量电容器被设置在第一电容值时确定探头的电压 - 电流特性。 该方法还包括当测量电容器被设置为大于第一电容值的电容值时，将RF串施加到探头。 该方法还包括为沉积膜提供初始电阻值和初始电容值。 该方法还包括采用初始电阻值，初始电容值和电压 - 电流特性来产生模拟电压 - 时间曲线。 该方法还包括确定测量的电压时间曲线，其表示用于一个RF火车的沉积膜的电位降。 更多的方法包括比较两条曲线。 如果差值小于预定阈值，则使用初始电阻值和初始电容来表征沉积膜。

公开(公告)号：US08968838B2

公开(公告)日：2015-03-03

申请号：US13809784

申请日：2011-07-12

申请人： Jean-Paul Booth ,  Erik Johnson

发明人： Jean-Paul Booth ,  Erik Johnson

IPC分类号： C23C16/509 ,  H01J37/32

CPC分类号： C23C16/509 ,  H01J37/32091 ,  H01J2237/3348

摘要： A method is provided for exciting at least one electrode of a capacitively coupled reactive plasma reactor containing a substrate. The electrode is excited by applying a RF voltage with a trapezoidal waveform comprising a ramp-up, a high plateau, a ramp-down and a low plateau. The plasma density can be controlled by adjusting the duration of the ramp-up, the duration of the ramp-down, the amplitude and the repetition rate of the trapezoidal waveform. The ion energy distribution function at the substrate can be controlled by adjusting the amplitude and the relative duration between the high plateau and the low plateau of the trapezoidal waveform.

摘要翻译： 提供一种用于激发包含衬底的电容耦合反应性等离子体反应器的至少一个电极的方法。 通过施加具有包括斜坡上升，高平台，斜坡下降和低平台的梯形波形的RF电压来激发电极。 可以通过调整斜坡的持续时间，斜坡下降的持续时间，梯形波形的振幅和重复率来控制等离子体密度。 可以通过调整梯形波形的高平台和低平台之间的幅度和相对持续时间来控制衬底上的离子能量分布函数。

公开(公告)号：US20120170039A1

公开(公告)日：2012-07-05

申请号：US13415763

申请日：2012-03-08

申请人： Vijayakumar C. Venugopal ,  Eric Pape ,  Jean-Paul Booth

发明人： Vijayakumar C. Venugopal ,  Eric Pape ,  Jean-Paul Booth

IPC分类号： G01J3/42

CPC分类号： G01N21/274 ,  G01J3/02 ,  G01J3/0205 ,  G01J3/0218 ,  G01J3/0294 ,  G01J3/443 ,  G01N21/68

摘要： A processing system having a chamber for in-situ optical interrogation of plasma emission to quantitatively measure normalized optical emission spectra is provided. The processing chamber includes a confinement ring assembly, a flash lamp, and a set of quartz windows. The processing chamber also includes a plurality of collimated optical assemblies, the plurality of collimated optical assemblies are optically coupled to the set of quartz windows. The processing chamber also includes a plurality of fiber optic bundles. The processing chamber also includes a multi-channel spectrometer, the multi-channel spectrometer is configured with at least a signal channel and a reference channel, the signal channel is optically coupled to at least the flash lamp, the set of quartz windows, the set of collimated optical assemblies, the illuminated fiber optic bundle, and the collection fiber optic bundle to measure a first signal.

摘要翻译： 提供一种具有用于等离子体发射的原位光询问室以定量测量归一化光发射光谱的处理系统。 处理室包括限制环组件，闪光灯和一组石英窗。 处理室还包括多个准直光学组件，多个准直光学组件光学耦合到该组石英窗口。 处理室还包括多个光纤束。 处理室还包括多通道光谱仪，多通道光谱仪配置有至少一个信号通道和一个参考通道，信号通道光学耦合到至少闪光灯，该组石英窗，该组 准直光学组件，照明光纤束和收集光纤束以测量第一信号。

公开(公告)号：US20100033195A1

公开(公告)日：2010-02-11

申请号：US12498950

申请日：2009-07-07

申请人： Jean-Paul Booth ,  Mikio Nagai ,  Douglas Keil

发明人： Jean-Paul Booth ,  Mikio Nagai ,  Douglas Keil

IPC分类号： G01R27/26 ,  G01N27/22

CPC分类号： H01J37/32935

摘要： An arrangement for detecting plasma instability within a processing chamber of a plasma processing system during substrate processing is provided. The arrangement includes a probe arrangement, wherein the probe arrangement is disposed on a surface of the processing chamber and is configured to measure at least one plasma processing parameter. The probe arrangement includes a plasma-facing sensor and a measuring capacitor, wherein the plasma-facing sensor is coupled to a first plate of the measuring capacitor. The arrangement also includes a detection arrangement, which is coupled to a second plate of the measuring capacitor. The detection arrangement is configured to convert an induced current flowing through the measuring capacitor into a set of digital signals, the set of digital signals being processed to detect the plasma instability.

摘要翻译： 提供了一种用于在衬底处理期间检测等离子体处理系统的处理室内的等离子体不稳定性的装置。 该装置包括探针装置，其中探针装置设置在处理室的表面上并被配置成测量至少一个等离子体处理参数。 探针装置包括等离子体面向传感器和测量电容器，其中等离子体面向传感器耦合到测量电容器的第一板。 该装置还包括耦合到测量电容器的第二板的检测装置。 检测装置被配置为将流过测量电容器的感应电流转换成一组数字信号，该组数字信号被处理以检测等离子体不稳定性。

公开(公告)号：US08164349B2

公开(公告)日：2012-04-24

申请号：US12498936

申请日：2009-07-07

申请人： Jean-Paul Booth ,  Douglas L. Keil

发明人： Jean-Paul Booth ,  Douglas L. Keil

IPC分类号： G01R27/26 ,  G01R31/08

CPC分类号： H05H1/0081 ,  H05H1/0012

摘要： A method for identifying a stabilized plasma within a processing chamber of a plasma processing system is provided. The method includes executing a strike step within the processing chamber to generate a plasma. The strike step includes applying a substantially high gas pressure within the processing chamber and maintaining a low radio frequency (RF) power within the processing chamber. The method also includes employing a probe head to collect a set of characteristic parameter measurements during the strike step, the probe head being on a surface of the processing chamber, wherein the surface is within close proximity to a substrate surface. The method further includes comparing the set of characteristic parameter measurements against a pre-defined range. If the set of characteristic parameter measurements is within the pre-defined range, the stabilized plasma exists.

摘要翻译： 提供了一种在等离子体处理系统的处理室内识别稳定的等离子体的方法。 该方法包括在处理室内执行击打步骤以产生等离子体。 冲击步骤包括在处理室内施加基本上高的气体压力并且在处理室内保持低射频（RF）功率。 该方法还包括采用探针头在罢工步骤期间收集一组特征参数测量值，探针头位于处理室的表面上，其中该表面紧邻衬底表面。 该方法还包括将特征参数测量集合与预定义范围进行比较。 如果一组特征参数测量值在预定范围内，则存在稳定的等离子体。

公开(公告)号：US08144328B2

公开(公告)日：2012-03-27

申请号：US12418492

申请日：2009-04-03

申请人： Vijayakumar C. Venugopal ,  Eric Pape ,  Jean-Paul Booth

发明人： Vijayakumar C. Venugopal ,  Eric Pape ,  Jean-Paul Booth

IPC分类号： G01N21/00

CPC分类号： G01N21/274 ,  G01J3/02 ,  G01J3/0205 ,  G01J3/0218 ,  G01J3/0294 ,  G01J3/443 ,  G01N21/68

摘要： An arrangement for in-situ optical interrogation of plasma emission to quantitatively measure normalized optical emission spectra in a plasma chamber is provided. The arrangement includes a flash lamp and a set of quartz windows. The arrangement also includes a plurality of collimated optical assemblies, which is optically coupled to the set of quartz windows. The arrangement further includes a plurality of fiber optic bundles, which comprises at least an illumination fiber optic bundle, a collection fiber optic bundle, and a reference fiber optic bundle. The arrangement more over includes a multi-channel spectrometer, which is configured with at least a signal channel and a reference channel. The signal channel is optically coupled to at least the flash lamp, the set of quartz windows, the set of collimated optical assemblies, the illuminated fiber optic bundle, and the collection fiber optic bundle to measure a first signal.

摘要翻译： 提供了用于等离子体发射的原位光询问以定量测量等离子体室中的归一化光发射光谱的布置。 该装置包括闪光灯和一组石英窗。 该布置还包括多个准直的光学组件，其光耦合到该组石英窗口。 该布置还包括多个光纤束，其包括至少照明光纤束，收集光纤束和参考光纤束。 更多的布置包括多通道光谱仪，其被配置有至少一个信号通道和参考通道。 信号通道光学耦合到至少闪光灯，该组石英窗，该组准直光学组件，照明光纤束和收集光纤束以测量第一信号。

公开(公告)号：US20090251700A1

公开(公告)日：2009-10-08

申请号：US12418492

申请日：2009-04-03

申请人： Vijayakumar C. Venugopal ,  Eric Pape ,  Jean-Paul Booth

发明人： Vijayakumar C. Venugopal ,  Eric Pape ,  Jean-Paul Booth

IPC分类号： G01N21/25

CPC分类号： G01N21/274 ,  G01J3/02 ,  G01J3/0205 ,  G01J3/0218 ,  G01J3/0294 ,  G01J3/443 ,  G01N21/68

摘要： An arrangement for in-situ optical interrogation of plasma emission to quantitatively measure normalized optical emission spectra in a plasma chamber is provided. The arrangement includes a flash lamp and a set of quartz windows. The arrangement also includes a plurality of collimated optical assemblies, which is optically coupled to the set of quartz windows. The arrangement further includes a plurality of fiber optic bundles, which comprises at least an illumination fiber optic bundle, a collection fiber optic bundle, and a reference fiber optic bundle. The arrangement more over includes a multi-channel spectrometer, which is configured with at least a signal channel and a reference channel. The signal channel is optically coupled to at least the flash lamp, the set of quartz windows, the set of collimated optical assemblies, the illuminated fiber optic bundle, and the collection fiber optic bundle to measure a first signal.

摘要翻译： 提供了用于等离子体发射的原位光询问以定量测量等离子体室中的归一化光发射光谱的布置。 该装置包括闪光灯和一组石英窗。 该布置还包括多个准直的光学组件，其光耦合到该组石英窗口。 该布置还包括多个光纤束，其包括至少照明光纤束，收集光纤束和参考光纤束。 更多的布置包括多通道光谱仪，其被配置有至少一个信号通道和参考通道。 信号通道光学耦合到至少闪光灯，该组石英窗，该组准直光学组件，照明光纤束和收集光纤束以测量第一信号。