Method of manufacturing a semiconductor device
    1.
    发明申请
    Method of manufacturing a semiconductor device 失效
    制造半导体器件的方法

    公开(公告)号:US20090286369A1

    公开(公告)日:2009-11-19

    申请号:US12453676

    申请日:2009-05-19

    IPC分类号: H01L21/336

    摘要: In a method of manufacturing a semiconductor device, a tunnel insulation layer is formed on a substrate. A charge trapping layer is formed on the tunnel insulation layer. A protection layer pattern or a mold is formed on the charge trapping layer. Charge trapping layer patterns are formed on the tunnel insulation layer by etching the charge trapping layer using the protection layer pattern or the mold. The charge trapping layer patterns may be spaced apart from each other. Blocking layers are formed on the charge trapping layer patterns, respectively. A gate electrode is formed on the blocking layers and the tunnel insulation layer using the protection layer pattern or the mold.

    摘要翻译: 在制造半导体器件的方法中,在衬底上形成隧道绝缘层。 在隧道绝缘层上形成电荷捕获层。 在电荷捕获层上形成保护层图案或模具。 通过使用保护层图案或模具蚀刻电荷捕获层,在隧道绝缘层上形成电荷俘获层图案。 电荷捕获层图案可以彼此间隔开。 阻挡层分别形成在电荷俘获层图案上。 使用保护层图案或模具在阻挡层和隧道绝缘层上形成栅电极。

    Method of manufacturing a semiconductor device
    2.
    发明授权
    Method of manufacturing a semiconductor device 失效
    制造半导体器件的方法

    公开(公告)号:US07932149B2

    公开(公告)日:2011-04-26

    申请号:US12453676

    申请日:2009-05-19

    IPC分类号: H01L21/336

    摘要: In a method of manufacturing a semiconductor device, a tunnel insulation layer is formed on a substrate. A charge trapping layer is formed on the tunnel insulation layer. A protection layer pattern or a mold is formed on the charge trapping layer. Charge trapping layer patterns are formed on the tunnel insulation layer by etching the charge trapping layer using the protection layer pattern or the mold. The charge trapping layer patterns may be spaced apart from each other. Blocking layers are formed on the charge trapping layer patterns, respectively. A gate electrode is formed on the blocking layers and the tunnel insulation layer using the protection layer pattern or the mold.

    摘要翻译: 在制造半导体器件的方法中,在衬底上形成隧道绝缘层。 在隧道绝缘层上形成电荷捕获层。 在电荷捕获层上形成保护层图案或模具。 通过使用保护层图案或模具蚀刻电荷捕获层,在隧道绝缘层上形成电荷俘获层图案。 电荷捕获层图案可以彼此间隔开。 阻挡层分别形成在电荷俘获层图案上。 使用保护层图案或模具在阻挡层和隧道绝缘层上形成栅电极。

    Method for controlling data reading/writing on random data section
containing defective sector
    3.
    发明授权
    Method for controlling data reading/writing on random data section containing defective sector 失效
    用于控制包含有缺陷扇区的随机数据部分的数据读/写的方法

    公开(公告)号:US6094317A

    公开(公告)日:2000-07-25

    申请号:US997977

    申请日:1997-12-24

    申请人: Yong-Seok Chung

    发明人: Yong-Seok Chung

    摘要: A method for controlling a data read/write operation of a disk drive recording device provided with re-allocated reserve sectors as a substitute for defective sectors, includes the steps of: reading data written on the reserve sectors when turning the power on and further storing the data, and disposing the data stored after being retrieved from the re-allocated reserve sectors as a substitute for defective sectors to the rear of data retrieved from a sector preceding the defective sector when accessing a random data section containing the defective sector, and further transferring the resulting data.

    摘要翻译: 一种用于控制设置有重新分配的备用扇区作为缺陷扇区的替代的磁盘驱动器记录装置的数据读/写操作的方法,包括以下步骤:读取在打开电源时在备用扇区上写入的数据,并进一步存储 数据,并且在访问包含缺陷扇区的随机数据部分时,将从重分配的预留扇区检索出的数据存储在从缺陷扇区之前的扇区中检索出的数据的后面,将从缺陷扇区替换出来的数据作为替代, 传输结果数据。