PROCESS FOR DEPOSITING AN ANTI-REFLECTIVE LAYER ON A SUBSTRATE
    6.
    发明申请
    PROCESS FOR DEPOSITING AN ANTI-REFLECTIVE LAYER ON A SUBSTRATE 有权
    在基材上沉积抗反射层的方法

    公开(公告)号:US20140030429A1

    公开(公告)日:2014-01-30

    申请号:US13982339

    申请日:2012-02-06

    IPC分类号: B05D5/06

    摘要: The present invention relates to a process for depositing an anti-reflective layer on a transparent flat substrate comprising the steps of providing a liquid coating composition comprising at least one solvent, at least one inorganic oxide precursor, and at least one pore forming agent; applying the coating composition to the substrate; drying the applied coating layer, and curing the coating layer; wherein during drying a gas flow is provided to the substrate at a flow rate of between 0.2 and 6 m/s. The advantage of this process is that defects visible in edge areas of the coated substrate can be significantly reduced.

    摘要翻译: 本发明涉及一种在透明平坦基材上沉积抗反射层的方法,包括以下步骤:提供包含至少一种溶剂,至少一种无机氧化物前体和至少一种成孔剂的液体涂料组合物; 将涂料组合物施加到基材上; 干燥涂覆的涂层,并固化涂层; 其中在干燥期间,以0.2至6m / s的流速向衬底提供气流。 该方法的优点是可以显着降低在涂覆的基材的边缘区域中可见的缺陷。