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    Imprint lithography apparatus and method
    1.
    发明授权
    Imprint lithography apparatus and method 有权
    压印光刻设备及方法

    公开(公告)号：US09547235B2

    公开(公告)日：2017-01-17

    申请号：US12898084

    申请日：2010-10-05

    申请人： Jeroen Herman Lammers ,  Sander Frederik Wuister ,  Yvonne Wendela Kruijt-Stegeman ,  Roelof Koole

    发明人： Jeroen Herman Lammers ,  Sander Frederik Wuister ,  Yvonne Wendela Kruijt-Stegeman ,  Roelof Koole

    IPC分类号： G03F7/00 ,  B82Y10/00 ,  B82Y40/00

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    摘要： An imprint lithography method is disclosed for forming a patterned layer from an imprintable liquid medium on a substrate by means of an imprint template having a patterned surface. The method involves contacting the patterned surface and imprintable liquid medium together for a filling period. Light emergent (e.g., scattered or reflected) from an interface between the medium and the patterned surface is collected and measured during the filling period to obtain data concerning one or more voids at the interface, and an estimated end time for the filling period is derived from a relationship between the data and time. The method may allow subsequent process steps to be undertaken more rapidly, with reduced risk of defects arising from remnants of unfilled voids. An imprint lithography apparatus and component for putting the method into effect are also disclosed.

    摘要翻译： 公开了一种压印光刻方法，用于通过具有图案化表面的压印模板从衬底上的可压印液体介质形成图案化层。 该方法包括将图案化表面和可压印液体介质接合在一起，以达到填充时间。 在填充期间收集和测量从介质和图案化表面之间的界面出现的轻微的（例如，散射或反射）以获得关于界面处的一个或多个空隙的数据，并且导出填充时间的估计结束时间 从数据和时间之间的关系。 该方法可以允许更快速地进行随后的工艺步骤，同时减少由未填充的空隙残余物引起的缺陷的风险。 还公开了一种用于使该方法生效的压印光刻设备和组件。

    IMPRINT LITHOGRAPHY APPARATUS AND METHOD
    3.
    发明申请
    IMPRINT LITHOGRAPHY APPARATUS AND METHOD 有权
    IMPRINT LITHOGRAPHY APPARATUS和方法

    公开(公告)号：US20110079939A1

    公开(公告)日：2011-04-07

    申请号：US12898084

    申请日：2010-10-05

    申请人： Jeroen Herman LAMMERS ,  Sander Frederik Wuister ,  Yvonne Wendela Kruijt-Stegeman ,  Roelof Koole

    发明人： Jeroen Herman LAMMERS ,  Sander Frederik Wuister ,  Yvonne Wendela Kruijt-Stegeman ,  Roelof Koole

    IPC分类号： B29C59/16 ,  B29B13/08

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    摘要： An imprint lithography method is disclosed for forming a patterned layer from an imprintable liquid medium on a substrate by means of an imprint template having a patterned surface. The method involves contacting the patterned surface and imprintable liquid medium together for a filling period. Light emergent (e.g., scattered or reflected) from an interface between the medium and the patterned surface is collected and measured during the filling period to obtain data concerning one or more voids at the interface, and an estimated end time for the filling period is derived from a relationship between the data and time. The method may allow subsequent process steps to be undertaken more rapidly, with reduced risk of defects arising from remnants of unfilled voids. An imprint lithography apparatus and component for putting the method into effect are also disclosed.

    摘要翻译： 公开了一种压印光刻方法，用于通过具有图案化表面的压印模板从衬底上的可压印液体介质形成图案化层。 该方法包括将图案化表面和可压印液体介质接合在一起，以达到填充时间。 在填充期间收集和测量从介质和图案化表面之间的界面出现的轻微的（例如，散射或反射）以获得关于界面处的一个或多个空隙的数据，并且导出填充时间的估计结束时间 从数据和时间之间的关系。 该方法可以允许更快速地进行随后的工艺步骤，同时减少由未填充的空隙残余物引起的缺陷的风险。 还公开了一种用于使该方法生效的压印光刻设备和组件。

    Imprint lithography method and apparatus
    4.
    发明授权
    Imprint lithography method and apparatus 有权
    压印光刻方法和装置

    公开(公告)号：US08696969B2

    公开(公告)日：2014-04-15

    申请号：US12698368

    申请日：2010-02-02

    申请人： Sander Frederik Wuister ,  Johan Frederik Dijksman ,  Yvonne Wendela Kruijt-Stegeman ,  Jeroen Herman Lammers ,  Leendert Van Der Tempel

    发明人： Sander Frederik Wuister ,  Johan Frederik Dijksman ,  Yvonne Wendela Kruijt-Stegeman ,  Jeroen Herman Lammers ,  Leendert Van Der Tempel

    IPC分类号： B29C59/02

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    摘要： An imprint lithography method is provided. The method includes undertaking first and second imprints, which comprises for each imprint: for an area of a substrate provided with a plurality of drops of imprintable medium in respectively first and second configurations, imprinting a pattern in the imprintable medium using a same imprint template, pockets being formed between the drops of the imprintable medium, the imprint template and the substrate during the imprinting of the pattern, wherein the first configuration of drops of imprintable medium is different from the second configuration of drops of imprintable medium, such that pockets formed during the second imprint are formed at different locations relative to the imprint template to pockets formed during the first imprint.

    摘要翻译： 提供压印光刻方法。 该方法包括进行第一和第二印记，其包括用于每个印记：对于分别具有多个可压印介质的第一和第二配置的液滴的基板的区域，使用相同的印模模板将图案压印在可压印介质中， 在压印图案期间，在可压印介质的液滴，压印模板和基板之间形成凹穴，其中可压印介质的液滴的第一配置不同于可压印介质的液滴的第二配置， 第二印记形成在相对于印模模板的不同位置，形成在第一印记中形成的凹坑。

    Imprint lithography
    9.
    发明授权
    Imprint lithography 有权
    印刷光刻

    公开(公告)号：US08707890B2

    公开(公告)日：2014-04-29

    申请号：US11488171

    申请日：2006-07-18

    申请人： Ivar Schram ,  Johan Frederik Dijksman ,  Sander Frederik Wuister ,  Yvonne Wendela Kruijt-Stegeman ,  Jeroen Herman Lammers

    发明人： Ivar Schram ,  Johan Frederik Dijksman ,  Sander Frederik Wuister ,  Yvonne Wendela Kruijt-Stegeman ,  Jeroen Herman Lammers

    IPC分类号： B05C7/06

    CPC分类号： B05D5/00 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

    摘要： A method of depositing an imprintable medium onto a target area of a substrate for imprint lithography is disclosed. The method includes moving the substrate, a print head comprising a nozzle to eject an imprintable medium onto the substrate, or both, relative to the other in a first direction across the target area while ejecting a first series of droplets of imprintable medium onto the substrate and moving the substrate, the print head, or both, relative to the other in a second opposing direction across the target area while ejecting a second series of droplets of imprintable medium onto the substrate on or adjacent to droplets from the first series of droplets.

    摘要翻译： 公开了一种将可压印介质沉积到用于压印光刻的基板的目标区域上的方法。 该方法包括移动基板，包括喷嘴的打印头，以在横过目标区域的第一方向上相对于另一方弹出可压印介质，同时将可压印介质的第一系列液滴喷射到基板上 以及相对于另一个相对于第二相对方向移动所述基底，所述打印头或两者，跨过所述目标区域，同时在所述第一系列液滴的液滴上或邻近所述基底上喷射可压印介质的第二系列液滴。