公开(公告)号：US20130182255A1

公开(公告)日：2013-07-18

申请号：US13349576

申请日：2012-01-13

申请人： Jianming Zhou ,  Craig Hickman

发明人： Jianming Zhou ,  Craig Hickman

IPC分类号： G01B11/00 ,  H01L23/544

CPC分类号： G03F7/70633

摘要： An overlay mark for checking alignment accuracy between a former layer and a later layer on a wafer is described, including a former pattern as a part of the former layer, and a later pattern as a part of a patterned photoresist layer defining the later layer. The former pattern has two parallel opposite edges each forming a sharp angle α with the x-axis of the wafer. The later pattern also has two parallel opposite edges each forming the sharp angle α with the x-axis of the wafer.

摘要翻译： 描述了用于检查晶片上的前层和稍后层之间的对准精度的覆盖标记，包括作为前一层的一部分的前一图案，以及作为限定稍后层的图案化光致抗蚀剂层的一部分的稍后图案。 前一种图案具有两个平行的相对边缘，每个边缘与晶片的x轴形成锐角α。 稍后的图案还具有两个平行的相对边缘，每个边缘与晶片的x轴形成锐角α。

公开(公告)号：US09134628B2

公开(公告)日：2015-09-15

申请号：US13349576

申请日：2012-01-13

申请人： Jianming Zhou ,  Craig Hickman

发明人： Jianming Zhou ,  Craig Hickman

IPC分类号： G01B11/00 ,  G03F7/20

CPC分类号： G03F7/70633

摘要： An overlay mark for checking alignment accuracy between a former layer and a later layer on a wafer is described, including a former pattern as a part of the former layer, and a later pattern as a part of a patterned photoresist layer defining the later layer. The former pattern has two parallel opposite edges each forming a sharp angle α with the x-axis of the wafer. The later pattern also has two parallel opposite edges each forming the sharp angle α with the x-axis of the wafer.

摘要翻译： 描述了用于检查晶片上的前层和稍后层之间的对准精度的覆盖标记，包括作为前一层的一部分的前一图案，以及作为限定稍后层的图案化光致抗蚀剂层的一部分的稍后图案。 前一种图案具有两个平行的相对边缘，每个边缘与晶片的x轴形成锐角α。 后面的图案还具有两个平行的相对边缘，每个边缘与晶片的x轴形成锐角α。

公开(公告)号：US08609302B2

公开(公告)日：2013-12-17

申请号：US13214865

申请日：2011-08-22

申请人： Jianming Zhou ,  Scott L. Light ,  David Kewley ,  Prasanna Srinivasan ,  Anton deVilliers

发明人： Jianming Zhou ,  Scott L. Light ,  David Kewley ,  Prasanna Srinivasan ,  Anton deVilliers

IPC分类号： G03F1/60

CPC分类号： G03F7/20 ,  G03F1/26 ,  G03F1/32 ,  G03F7/70433 ,  G03F7/70883

摘要： Methods of lithography, methods for forming patterning tools, and patterning tools are described. One such patterning tool include an active region that forms a first diffraction image on a lens when in use, and an inactive region that forms a second diffraction image on a lens when in use. The inactive region includes a pattern of phase shifting features formed in a substantially transparent material of the patterning tool. Patterning tools and methods, as described, can be used to compensate for lens distortion from effects such as localized heating.

公开(公告)号：US08486611B2

公开(公告)日：2013-07-16

申请号：US12836495

申请日：2010-07-14

申请人： Dan Millward ,  Kaveri Jain ,  Zishu Zhang ,  Lijing Gou ,  Anton de Villiers ,  Jianming Zhou ,  Yuan He ,  Michael Hyatt ,  Scott L. Light

发明人： Dan Millward ,  Kaveri Jain ,  Zishu Zhang ,  Lijing Gou ,  Anton de Villiers ,  Jianming Zhou ,  Yuan He ,  Michael Hyatt ,  Scott L. Light

IPC分类号： G03F7/26

CPC分类号： H01L21/76879 ,  H01L21/0337 ,  H01L21/31144 ,  H01L21/76816 ,  H01L27/0207 ,  H01L27/105 ,  H01L27/1052 ,  H01L27/10882 ,  H01L27/10888

摘要： Some embodiments include methods of forming patterns. A semiconductor substrate is formed to comprise an electrically insulative material over a set of electrically conductive structures. An interconnect region is defined across the electrically conductive structures, and regions on opposing sides of the interconnect region are defined as secondary regions. A two-dimensional array of features is formed over the electrically insulative material. The two-dimensional array extends across the interconnect region and across the secondary regions. A pattern of the two-dimensional array is transferred through the electrically insulative material of the interconnect region to form contact openings that extend through the electrically insulative material and to the electrically conductive structures, and no portions of the two-dimensional array of the secondary regions is transferred into the electrically insulative material.

摘要翻译： 一些实施例包括形成图案的方法。 半导体衬底被形成为在一组导电结构之上包括电绝缘材料。 跨导电结构限定互连区域，并且互连区域的相对侧上的区域被定义为次级区域。 特征的二维阵列形成在电绝缘材料上。 二维阵列跨越互连区域并跨越次级区域延伸。 二维阵列的图案通过互连区域的电绝缘材料转移以形成延伸穿过电绝缘材料和导电结构的接触开口，并且二次区域的二维阵列的任何部分 被转移到电绝缘材料中。

公开(公告)号：US20120038895A1

公开(公告)日：2012-02-16

申请号：US12857316

申请日：2010-08-16

申请人： Yuan He ,  Kaveri Jain ,  Lijing Gou ,  Zishu Zhang ,  Anton deVilliers ,  Michael Hyatt ,  Jianming Zhou ,  Scott Light ,  Dan Millward

发明人： Yuan He ,  Kaveri Jain ,  Lijing Gou ,  Zishu Zhang ,  Anton deVilliers ,  Michael Hyatt ,  Jianming Zhou ,  Scott Light ,  Dan Millward

IPC分类号： G03B27/54 ,  G03B27/32

CPC分类号： G03F7/70116 ,  G03F7/70891

摘要： Photolithographic apparatus and methods are disclosed. One such apparatus includes an optical path configured to provide a first diffraction pattern in a portion of an optical system and to provide a second diffraction pattern to the portion of the optical system after providing the first diffraction pattern. Meanwhile, one such method includes providing a first diffraction pattern onto a portion of an optical system, wherein a semiconductor article is imaged using the first diffraction pattern. A second diffraction pattern is also provided onto the portion of the optical system, but the second diffraction pattern is not used to image the semiconductor article.

摘要翻译： 公开了光刻设备和方法。 一种这样的设备包括光路，其被配置为在光学系统的一部分中提供第一衍射图案，并且在提供第一衍射图案之后，向光学系统的部分提供第二衍射图案。 同时，一种这样的方法包括在光学系统的一部分上提供第一衍射图案，其中半导体制品使用第一衍射图案成像。 第二衍射图案也提供到光学系统的部分上，但是第二衍射图案不用于对半导体制品进行成像。

公开(公告)号：US20110173131A1

公开(公告)日：2011-07-14

申请号：US12930613

申请日：2011-01-11

申请人： Feng Huang ,  Jianming Zhou ,  Guohua Liu ,  Bohan Kong

发明人： Feng Huang ,  Jianming Zhou ,  Guohua Liu ,  Bohan Kong

IPC分类号： G06Q30/00

CPC分类号： G06Q30/02 ,  G06Q30/0282

摘要： Attribute aggregation for a standard product unit (SPU) includes: receiving an attribute and a corresponding attribute value for a product; storing the attribute and the corresponding attribute value for the product; determining a frequency of the attribute and a frequency of the corresponding attribute value; aggregating the attribute and the corresponding attribute value based at least in part on the frequency of the attribute and the frequency of the corresponding attribute value according to a predetermined attribute aggregation rule; and generating a standard product unit of attribute information for the product.

摘要翻译： 标准产品单元（SPU）的属性聚合包括：为产品接收属性和对应的属性值; 存储产品的属性和相应的属性值; 确定属性的频率和对应的属性值的频率; 至少部分地基于属性的频率和对应的属性值的频率根据预定的属性聚合规则来聚合属性和对应的属性值; 并产生产品的属性信息的标准产品单位。

公开(公告)号：US20100142696A1

公开(公告)日：2010-06-10

申请号：US12530140

申请日：2007-11-15

申请人： Jianming Zhou ,  Congxing Ouyang ,  Jinglei Liu

发明人： Jianming Zhou ,  Congxing Ouyang ,  Jinglei Liu

IPC分类号： H04M3/42

CPC分类号： H04L67/141 ,  H04L67/14

摘要： The present invention relates to a message-based notifying method for notifying a waiting queue and an application server, wherein the method includes: sending, by a calling terminal, a call request to a called terminal; forwarding, by an application server, to the called terminal the call request sent from the calling terminal, and determining from a response message returned from the called terminal whether the called terminal is in an idle status; and if the called terminal is in a busy status, then adding by the application server the calling terminal into a waiting enqueuing queue of the called terminal, and sending to the calling terminal a waiting notification message containing a waiting queue value corresponding to the calling terminal; or if the called terminal is in an idle status, then establishing directly a communication connection between the calling terminal and the called terminal.

摘要翻译： 本发明涉及一种用于通知等待队列和应用服务器的基于消息的通知方法，其中方法包括：主叫终端向被叫终端发送呼叫请求; 由应用服务器向被叫终端转发从呼叫终端发送的呼叫请求，并从被叫终端返回的响应消息中确定被叫终端是否处于空闲状态; 并且如果被叫终端处于忙状态，则由应用服务器将主叫终端添加到被叫终端的等待排队队列中，并向主叫终端发送等待通知消息，该消息包含对应于主叫终端的等待队列值 ; 或者被叫终端处于空闲状态，则直接建立主叫终端与被叫终端之间的通信连接。

公开(公告)号：US08848896B2

公开(公告)日：2014-09-30

申请号：US12530140

申请日：2007-11-15

申请人： Jianming Zhou ,  Congxing Ouyang ,  Jinglei Liu

发明人： Jianming Zhou ,  Congxing Ouyang ,  Jinglei Liu

IPC分类号： H04M3/42 ,  H04L29/08

CPC分类号： H04L67/141 ,  H04L67/14

摘要： The present invention relates to a message-based notifying method for notifying a waiting queue and an application server, wherein the method includes: sending, by a calling terminal, a call request to a called terminal; forwarding, by an application server, to the called terminal the call request sent from the calling terminal, and determining from a response message returned from the called terminal whether the called terminal is in an idle status; and if the called terminal is in a busy status, then adding by the application server the calling terminal into a waiting enqueuing queue of the called terminal, and sending to the calling terminal a waiting notification message containing a waiting queue value corresponding to the calling terminal; or if the called terminal is in an idle status, then establishing directly a communication connection between the calling terminal and the called terminal.

摘要翻译： 本发明涉及一种用于通知等待队列和应用服务器的基于消息的通知方法，其中方法包括：主叫终端向被叫终端发送呼叫请求; 由应用服务器向被叫终端转发从呼叫终端发送的呼叫请求，并从被叫终端返回的响应消息中确定被叫终端是否处于空闲状态; 并且如果被叫终端处于忙状态，则由应用服务器将主叫终端添加到被叫终端的等待排队队列中，并向主叫终端发送等待通知消息，该消息包含对应于主叫终端的等待队列值 ; 或者被叫终端处于空闲状态，则直接建立主叫终端与被叫终端之间的通信连接。

公开(公告)号：US08620005B2

公开(公告)日：2013-12-31

申请号：US13067444

申请日：2011-06-01

申请人： Dengyong Ma ,  Jun Yang ,  Jianming Zhou ,  Guoqiang Chai

发明人： Dengyong Ma ,  Jun Yang ,  Jianming Zhou ,  Guoqiang Chai

IPC分类号： H04R29/00 ,  H04R27/00

CPC分类号： H04R1/005 ,  H03M3/46 ,  H04R1/403 ,  H04R3/12

摘要： The present invention disclosed an all-digital speaker system device based on multi-bit Σ-Δ Modulation, comprising an A/D converter, an interpolation filter, a Σ-Δ modulator, a dynamic mismatch regulator, a differential buffer and a speaker array. The present invention takes advantage of the Σ-Δ modulation technique to effectively reduce the cost and complexity of the hardware realization of the speaker system device, thus realizing the full digitalization of the whole sound transmission link and the integration of the system device with low power dissipation and volume. Furthermore, the system device according to the present invention is provided with a better control ability on the local sound field, thus providing a better practicable method for the voice secret transmission.

摘要翻译： 本发明公开了一种基于多位Σ-Δ调制的全数字扬声器系统装置，包括A / D转换器，内插滤波器，Σ-Δ调制器，动态失配调节器，差分缓冲器和扬声器阵列 。 本发明利用Σ-Δ调制技术有效地降低了扬声器系统设备的硬件实现的成本和复杂性，从而实现了整个声音传输链路的全数字化和低功率系统设备的集成 耗散和体积。 此外，根据本发明的系统设备在本地声场上具有更好的控制能力，从而为语音秘密传输提供了更好的可行方法。

公开(公告)号：US20130216795A1

公开(公告)日：2013-08-22

申请号：US13401858

申请日：2012-02-22

申请人： Jianming Zhou ,  Anton Devilliers ,  Erik Byers

发明人： Jianming Zhou ,  Anton Devilliers ,  Erik Byers

IPC分类号： G06F17/50 ,  B32B3/10

CPC分类号： G03F1/34 ,  Y10T428/24851

摘要： A reticle for lens heating mitigation includes a substrate, a target pattern and a redistributive pattern. The substrate includes a live pattern region and the target pattern is disposed within the live pattern region for constructing the target pattern onto a wafer. The redistributive pattern is also disposed within the live pattern region for redistributing energy onto a lens without being printed onto the wafer and without correcting said target pattern to be printed onto the wafer.

摘要翻译： 用于透镜加热缓解的掩模版包括基板，目标图案和再分布图案。 基板包括带电图案区域，并且目标图案设置在带电图案区域内，用于将目标图案构造到晶片上。 再分布图案也设置在活模式区域内，用于将能量重新分配到透镜上，而不会印刷到晶片上，而不会将要印刷的目标图案校正到晶片上。