Identifying a cause of a fault based on a process controller output
    2.
    发明授权
    Identifying a cause of a fault based on a process controller output 失效
    根据过程控制器输出识别出故障的原因

    公开(公告)号:US06778873B1

    公开(公告)日:2004-08-17

    申请号:US10210640

    申请日:2002-07-31

    IPC分类号: G06F1900

    摘要: A method and apparatus is provided for identifying a cause of a fault based on controller output. The method comprises processing at least one workpiece under a direction of the controller and detecting a fault associated with the processing of the at least one workpiece. The method further includes determining a plurality of possible causes of the detected fault, identifying a more likely possible cause out of the plurality of possible causes, providing fault information associated with the identified more likely possible cause to the controller. The method further includes providing fault information associated with the identified more likely possible cause to the controller. The method further comprises adjusting the processing of one or more workpieces to be processed next based on the fault information provided to the controller. The method further includes generating prediction data associated with processing of the next workpieces, and comparing the prediction data to processing data associated with the processing of the next workpieces to identify a possible cause of the fault.

    摘要翻译: 提供了一种基于控制器输出来识别故障原因的方法和装置。 该方法包括在控制器的方向上处理至少一个工件,并检测与至少一个工件的处理相关的故障。 该方法还包括确定检测到的故障的多个可能的原因,从多个可能的原因中识别更可能的可能原因,将与所识别的更可能的可能原因相关联的故障信息提供给控制器。 该方法还包括向控制器提供与所识别的更可能的可能原因相关联的故障信息。 该方法还包括基于提供给控制器的故障信息来调整接下来要处理的一个或多个待处理工件的处理。 该方法还包括生成与下一个工件的处理相关联的预测数据,以及将预测数据与与下一个工件的处理相关联的处理数据进行比较,以识别故障的可能原因。

    Dynamic targeting for a process control system

    公开(公告)号:US06773931B2

    公开(公告)日:2004-08-10

    申请号:US10207525

    申请日:2002-07-29

    IPC分类号: H01L2100

    摘要: A method and an apparatus for dynamic targeting for a process control system. A process step is performed upon a first workpiece in a batch based upon a process target setting. The process target setting comprises at least one parameter relating to a target characteristic of the first workpiece. Manufacturing data relating to processing of the first workpiece is acquired. The manufacturing data comprises at least one of a metrology data relating to the processed first workpiece and a tool state data relating to the tool state of a processing tool. Electrical data relating to the processed first workpiece is acquired at least partially during processing of a second workpiece in the batch. The process target setting is adjusted dynamically based upon a correlation of the electrical data with the manufacturing data.

    Method and apparatus for fast disturbance detection and classification
    4.
    发明授权
    Method and apparatus for fast disturbance detection and classification 有权
    用于快速干扰检测和分类的方法和装置

    公开(公告)号:US07299154B1

    公开(公告)日:2007-11-20

    申请号:US11130459

    申请日:2005-05-16

    IPC分类号: G06F17/18

    摘要: The present invention provides a method and apparatus for detecting step and impulse disturbances. The method includes determining a pattern based on a plurality of probabilities associated with a corresponding plurality of wafer processing parameters and determining a type of a disturbance based upon the pattern.

    摘要翻译: 本发明提供了一种用于检测步进和脉冲扰动的方法和装置。 该方法包括基于与相应的多个晶片处理参数相关联的多个概率来确定模式,并且基于该模式来确定干扰的类型。

    Method and apparatus for controlling a fabrication process based on a measured electrical characteristic
    5.
    发明授权
    Method and apparatus for controlling a fabrication process based on a measured electrical characteristic 有权
    基于测量的电气特性来控制制造工艺的方法和装置

    公开(公告)号:US06912437B2

    公开(公告)日:2005-06-28

    申请号:US10262620

    申请日:2002-09-30

    IPC分类号: H01L21/66 G06F19/00

    CPC分类号: H01L22/20 H01L22/12

    摘要: A method includes performing at least one process for forming a feature of a semiconductor device in accordance with an operating recipe. An electrical performance characteristic of the feature is measured. The measured electrical performance characteristic is compared to a target value for the electrical performance characteristic. At least one parameter of the operating recipe is determined based on the comparison. A system includes a process tool, a metrology tool, and a controller. The process tool is configured to perform at least one process for forming a feature of a semiconductor device in accordance with an operating recipe. The metrology tool is configured to measure an electrical performance characteristic of the feature. The controller is configured to compare the measured electrical performance characteristic to a target value for the electrical performance characteristic and determine at least one parameter of the operating recipe based on the comparison.

    摘要翻译: 一种方法包括根据操作配方执行用于形成半导体器件的特征的至少一个处理。 测量该特征的电气性能特征。 将测量的电性能特性与电性能特性的目标值进行比较。 基于比较确定操作配方的至少一个参数。 系统包括处理工具,计量工具和控制器。 处理工具被配置为执行根据操作配方形成半导体器件的特征的至少一个处理。 测量工具被配置为测量该特征的电性能特征。 控制器被配置为将测量的电性能特性与电性能特性的目标值进行比较,并且基于该比较确定操作配方的至少一个参数。

    Process control based on tool health data
    6.
    发明授权
    Process control based on tool health data 有权
    基于工具健康数据的过程控制

    公开(公告)号:US06804619B1

    公开(公告)日:2004-10-12

    申请号:US10231910

    申请日:2002-08-30

    IPC分类号: G06F1900

    摘要: A method is provided for a process control based on tool health data. The method comprises processing a workpiece using a processing tool, receiving trace data associated with the processing of the workpiece from the processing tool and determining at least one value associated with a health of a portion of the processing tool based on at least a portion of the received trace data. The method further comprises adjusting processing of another workpiece based on the determined health value.

    摘要翻译: 提供了一种基于工具健康数据的过程控制的方法。 该方法包括使用处理工具处理工件,从处理工具接收与工件的处理相关联的跟踪数据,并基于至少一部分工作来确定与处理工具的一部分的健康相关联的至少一个值 收到跟踪数据。 该方法还包括基于所确定的健康值来调整另一工件的处理。

    Dress
    7.
    外观设计
    Dress 有权

    公开(公告)号:USD981083S1

    公开(公告)日:2023-03-21

    申请号:US29811394

    申请日:2021-10-14

    申请人: Jin Wang

    设计人: Jin Wang