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17 条记录 (耗时 0.015 秒)

    Method and apparatus for controlling a fabrication process based on a measured electrical characteristic
    2.
    发明授权
    Method and apparatus for controlling a fabrication process based on a measured electrical characteristic 有权
    基于测量的电气特性来控制制造工艺的方法和装置

    公开(公告)号：US06912437B2

    公开(公告)日：2005-06-28

    申请号：US10262620

    申请日：2002-09-30

    申请人： Robert J. Chong ,  Jin Wang

    发明人： Robert J. Chong ,  Jin Wang

    IPC分类号： H01L21/66 ,  G06F19/00

    CPC分类号： H01L22/20 ,  H01L22/12

    摘要： A method includes performing at least one process for forming a feature of a semiconductor device in accordance with an operating recipe. An electrical performance characteristic of the feature is measured. The measured electrical performance characteristic is compared to a target value for the electrical performance characteristic. At least one parameter of the operating recipe is determined based on the comparison. A system includes a process tool, a metrology tool, and a controller. The process tool is configured to perform at least one process for forming a feature of a semiconductor device in accordance with an operating recipe. The metrology tool is configured to measure an electrical performance characteristic of the feature. The controller is configured to compare the measured electrical performance characteristic to a target value for the electrical performance characteristic and determine at least one parameter of the operating recipe based on the comparison.

    摘要翻译： 一种方法包括根据操作配方执行用于形成半导体器件的特征的至少一个处理。 测量该特征的电气性能特征。 将测量的电性能特性与电性能特性的目标值进行比较。 基于比较确定操作配方的至少一个参数。 系统包括处理工具，计量工具和控制器。 处理工具被配置为执行根据操作配方形成半导体器件的特征的至少一个处理。 测量工具被配置为测量该特征的电性能特征。 控制器被配置为将测量的电性能特性与电性能特性的目标值进行比较，并且基于该比较确定操作配方的至少一个参数。

    Process control based on tool health data
    3.
    发明授权
    Process control based on tool health data 有权
    基于工具健康数据的过程控制

    公开(公告)号：US06804619B1

    公开(公告)日：2004-10-12

    申请号：US10231910

    申请日：2002-08-30

    申请人： Robert J. Chong ,  Eric O. Green ,  Jin Wang

    发明人： Robert J. Chong ,  Eric O. Green ,  Jin Wang

    IPC分类号： G06F1900

    CPC分类号： G05B19/4065 ,  G05B2219/37258

    摘要： A method is provided for a process control based on tool health data. The method comprises processing a workpiece using a processing tool, receiving trace data associated with the processing of the workpiece from the processing tool and determining at least one value associated with a health of a portion of the processing tool based on at least a portion of the received trace data. The method further comprises adjusting processing of another workpiece based on the determined health value.

    摘要翻译： 提供了一种基于工具健康数据的过程控制的方法。 该方法包括使用处理工具处理工件，从处理工具接收与工件的处理相关联的跟踪数据，并基于至少一部分工作来确定与处理工具的一部分的健康相关联的至少一个值 收到跟踪数据。 该方法还包括基于所确定的健康值来调整另一工件的处理。

    Method of controlling exposure processes by monitoring photon levels, and system for accomplishing same
    4.
    发明授权
    Method of controlling exposure processes by monitoring photon levels, and system for accomplishing same 有权
    通过监控光子水平来控制曝光过程的方法以及完成相同的系统

    公开(公告)号：US07186487B1

    公开(公告)日：2007-03-06

    申请号：US10771109

    申请日：2004-02-03

    申请人： Robert J. Chong

    发明人： Robert J. Chong

    IPC分类号： G03C5/00

    CPC分类号： G03F7/70558 ,  G03B7/00

    摘要： The present invention is generally directed to various methods of controlling exposure processes by monitoring photon levels, and various systems for accomplishing same. In one embodiment, the method comprises performing an exposure process by generating light comprised of a number of photons from a light source to expose at least a portion of a layer of photo-sensitive material, counting a number of photons incident on at least a portion of the layer of photo-sensitive material, and controlling at least one of a duration of the exposure process and an irradiance of the light source based upon the counted number of photons. In another illustrative embodiment, the method comprises performing an exposure process by generating light comprised of a number of photons from a light source to expose at least a portion of a layer of photo-sensitive material, determining a rate at which the photons impact at least a portion of the layer of photo-sensitive material, and controlling at least one of a duration of the exposure process and an irradiance of the light source based upon the determined rate of the photons impacting the layer of photo-sensitive material.

    摘要翻译： 本发明一般涉及通过监控光子水平来控制曝光过程的各种方法以及用于实现其的各种系统。 在一个实施例中，该方法包括通过产生由来自光源的多个光子组成的光来曝光光敏材料层的至少一部分，对入射在至少一部分上的光子计数 的光敏材料层，并且基于计数的光子数来控制曝光过程的持续时间和光源的辐照度中的至少一个。 在另一说明性实施例中，该方法包括通过产生由光源产生的多个光子的光进行曝光处理，以暴露光敏材料层的至少一部分，确定光子至少影响的速率 光敏材料层的一部分，并且基于影响光敏材料层的光子的确定速率来控制曝光过程的持续时间和光源的辐照度中的至少一个。

    Method and apparatus for dynamically monitoring controller tuning parameters
    8.
    发明授权
    Method and apparatus for dynamically monitoring controller tuning parameters 有权
    动态监控控制器调谐参数的方法和装置

    公开(公告)号：US06961636B1

    公开(公告)日：2005-11-01

    申请号：US10126172

    申请日：2002-04-19

    申请人： Robert J. Chong ,  Alexander J. Pasadyn ,  Thomas J. Sonderman

    发明人： Robert J. Chong ,  Alexander J. Pasadyn ,  Thomas J. Sonderman

    IPC分类号： G05B13/02 ,  G05B19/418 ,  G06F19/00

    CPC分类号： G05B19/41875 ,  G05B13/025 ,  G05B2219/32187 ,  Y02P90/20 ,  Y02P90/22

    摘要： A method includes processing a plurality of workpieces in accordance with an operating recipe. Metrology data associated with the processing is collected. A control model including at least one tuning parameter having a default value is provided. A plurality of perturbations is introduced to shift the tuning parameter from its default value. Control actions are generated based on the metrology data and the perturbations to the tuning parameter in the control model to modify the operating recipe. An error signal associated with each of the perturbations is generated. The default value of the tuning parameter is modified based on the error signals.

    摘要翻译： 一种方法包括根据操作配方处理多个工件。 收集与处理相关的计量数据。 提供了包括具有默认值的至少一个调谐参数的控制模型。 引入多个扰动以从其默认值移位调谐参数。 基于测量数据和控制模型中的调谐参数的扰动来生成控制动作，以修改操作配方。 产生与每个扰动相关联的误差信号。 调整参数的默认值根据错误信号进行修改。

    Advanced process control of the manufacture of an oxide-nitride-oxide stack of a memory device, and system for accomplishing same
    10.
    发明授权
    Advanced process control of the manufacture of an oxide-nitride-oxide stack of a memory device, and system for accomplishing same 失效
    存储器件的氧化物 - 氮化物 - 氧化物堆叠的制造的先进工艺控制和用于实现其的系统

    公开(公告)号：US06953697B1

    公开(公告)日：2005-10-11

    申请号：US10277357

    申请日：2002-10-22

    申请人： Howard E. Castle ,  Robert J. Chong ,  Brian K. Cusson ,  Eric O. Green

    发明人： Howard E. Castle ,  Robert J. Chong ,  Brian K. Cusson ,  Eric O. Green

    IPC分类号： H01L21/66 ,  H01L21/8247

    CPC分类号： H01L22/12 ,  Y10S438/954

    摘要： The present invention is generally directed to an advanced process control of the manufacture of memory devices, and a system for accomplishing same. In one illustrative embodiment, the method comprises performing at least one process operation to form at least one layer of an oxide-nitride-oxide stack of a memory cell, the stack being comprised of a first layer of oxide positioned above a first layer of polysilicon, a layer of silicon nitride positioned above the first layer of oxide, and a second layer of oxide positioned above the layer of silicon nitride. The method further comprises measuring at least one characteristic of at least one of the first layer of polysilicon, the first oxide layer, the layer of silicon nitride, and the second layer of oxide and adjusting at least one parameter of at least one process operation used to form at least one of the first oxide layer, the layer of silicon nitride and the second oxide layer if the measured at least one characteristic is not within acceptable limits.

    摘要翻译： 本发明一般涉及存储器件的制造的高级过程控制和用于实现其的系统。 在一个说明性实施例中，该方法包括执行至少一个处理操作以形成存储器单元的氧化物 - 氮化物 - 氧化物堆叠的至少一层，所述堆叠由位于第一多晶硅层之上的第一层氧化物 位于第一氧化物层之上的氮化硅层和位于氮化硅层上方的第二层氧化物。 该方法还包括测量第一多晶硅层，第一氧化物层，氮化硅层和第二氧化物层中的至少一个的至少一个特征，并且调整使用的至少一个工艺操作的至少一个参数 如果所测量的至少一个特性不在可接受的限度内，则形成第一氧化物层，氮化硅层和第二氧化物层中的至少一个。