公开(公告)号：US20060082751A1

公开(公告)日：2006-04-20

申请号：US10964817

申请日：2004-10-15

申请人： Johannes Moors ,  Uwe Mickan ,  Wolfgang Singer ,  Hans-Juergen Mann

发明人： Johannes Moors ,  Uwe Mickan ,  Wolfgang Singer ,  Hans-Juergen Mann

IPC分类号： G03B27/72

CPC分类号： G03F7/70575

摘要： A lithographic system includes a radiation system configured to provide a beam of radiation; an illumination system configured to condition the beam of radiation; a support configured to support a patterning device, the patterning device configured to impart the projection beam with a pattern in its cross-section; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; and transmission adaptor arranged along an optical pathway. The radiation system includes a source configured to generate a beam of radiation. The transmission adaptor adapts an intensity profile as a function of wavelength of the beam of radiation and/or the patterned beam in such a way that the intensity profile equals a predetermined intensity profile.

摘要翻译： 光刻系统包括被配置为提供辐射束的辐射系统; 配置成调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置被构造成在其横截面中赋予所述投影光束图案; 被配置为保持基板的基板台; 投影系统，被配置为将所述图案化的光束投影到所述基板的目标部分上; 和传输适配器沿着光学路径布置。 辐射系统包括被配置为产生辐射束的源。 传输适配器以强度分布等于预定强度分布的方式适应作为辐射束和/或图案化束的波长的函数的强度分布。

公开(公告)号：US20050162629A1

公开(公告)日：2005-07-28

申请号：US10762565

申请日：2004-01-23

申请人： Johannes Moors ,  Uwe Mickan

发明人： Johannes Moors ,  Uwe Mickan

IPC分类号： G03F7/20 ,  G03B27/54

CPC分类号： G03F7/70483 ,  G03F7/7085 ,  G03F7/70916 ,  G03F7/70983

摘要： In a lithographic apparatus, a beam of radiation passes along a beam path to a substrate, for applying patterned illumination to the substrate. An exchangeable aperture screen is inserted in the beam path to partially block out the beam from a remainder of the path onto the substrate. A test surface is provided on the aperture screen, so that the test surface receives a part of the beam that is not passed along the remainder of the beam path. The test surface is made of a material that is sensitive, under influence of radiation from the beam, to chemical alterations that also affect the optical element under influence of radiation from the beam. The test surface is later analyzed for chemical alterations after exposure to the beam.

公开(公告)号：US20060001856A1

公开(公告)日：2006-01-05

申请号：US10882684

申请日：2004-07-02

申请人： Johannes Moors ,  Uwe Mickan

发明人： Johannes Moors ,  Uwe Mickan

IPC分类号： G03B27/72

CPC分类号： G03F7/70558

摘要： A calibration apparatus is provided for calibrating a radiation sensor in a lithographic apparatus. The calibration apparatus includes a window formed of substantially radiation-transparent material for allowing radiation to pass therethrough to reach the radiation sensor. A first reference sensor is located behind the window, having an active surface abutting the window, for measuring the intensity of radiation which passes through the window. A second reference sensor is located a short distance behind the window, having an active surface facing the window, for measuring the intensity of radiation which passes through the window, a first contamination layer formed on the window, and a second contamination layer formed on the active surface of the second reference sensor. The radiation sensor can be calibrated by combining the measurements from the first and second radiation sensors.

摘要翻译： 提供了一种用于校准光刻设备中的辐射传感器的校准设备。 校准装置包括由基本上辐射透明的材料形成的窗口，用于允许辐射通过其中以到达辐射传感器。 第一参考传感器位于窗后，具有邻接窗口的活动表面，用于测量通过窗口的辐射强度。 第二参考传感器位于窗后的短距离处，具有面向窗口的活动表面，用于测量通过窗口的辐射强度，形成在窗口上的第一污染层，以及形成在窗户上的第二污染层 第二参考传感器的有效表面。 可以通过组合来自第一和第二辐射传感器的测量来校准辐射传感器。

公开(公告)号：US20050157284A1

公开(公告)日：2005-07-21

申请号：US10758270

申请日：2004-01-16

申请人： Johannes Moors ,  Uwe Mickan ,  Harm-Jan Voorma ,  Johannes Leonardus Franken

发明人： Johannes Moors ,  Uwe Mickan ,  Harm-Jan Voorma ,  Johannes Leonardus Franken

IPC分类号： G02B17/00 ,  G03F7/20 ,  H01L21/027 ,  G03B27/72

CPC分类号： B82Y10/00 ,  G03F7/70166 ,  G03F7/70175 ,  G03F7/70891

摘要： A lithographic apparatus includes an illumination system for providing a beam of radiation, a support structure for supporting a patterning device, the patterning device serving to impart the beam with a pattern in its cross-section. The apparatus further includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and a collector which is arranged for transmitting radiation, received from a first radiation source, to the illumination system. The apparatus includes at least a heater for heating the collector when the collector receives substantially no radiation from the first radiation source. Further aspects of the invention relate to a device manufacturing method as well as a device manufactured thereby.

摘要翻译： 光刻设备包括用于提供辐射束的照明系统，用于支撑图案形成装置的支撑结构，所述图案形成装置用于在其横截面中赋予光束图案。 该装置还包括用于保持基板的基板台，用于将图案化的光束投影到基板的目标部分上的投影系统以及被布置成用于将从第一辐射源接收的辐射传送到照明系统的收集器。 当收集器基本上不接收来自第一辐射源的辐射时，该装置至少包括用于加热集电器的加热器。 本发明的其它方面涉及一种装置制造方法以及由此制造的装置。

公开(公告)号：US20070152175A1

公开(公告)日：2007-07-05

申请号：US11319770

申请日：2005-12-29

申请人： Johannes Moors ,  Vadim Banine ,  Johannes Christiaan Franken ,  Vladimir Ivanov ,  Konstantin Koshelev ,  Alexander Struycken

发明人： Johannes Moors ,  Vadim Banine ,  Johannes Christiaan Franken ,  Vladimir Ivanov ,  Konstantin Koshelev ,  Alexander Struycken

IPC分类号： G21G4/00

CPC分类号： H05G2/003 ,  G03F7/70033 ,  H05G2/005

摘要： A radiation source generates short-wavelength radiation, such as extreme ultraviolet radiation, for use in lithography. Rotating electrodes are provided which dip into respective baths of liquid metal, for example, tin. An electrical discharge is produced between the electrodes to generate the radiation. Holes are provided in the electrodes and/or in a metal shielding plate around the electrodes to enable better pumping down to low pressure in the vicinity of the discharge to improve the conversion efficiency of the source. The holes in the electrodes improve cooling of the electrodes by causing stirring of the liquid metal, and by improving the thermal and electrical contact between the electrodes and the liquid metal. Improved electrical contact also reduces the time-constant of the discharge circuit, thereby further improving the conversion efficiency of the source.

摘要翻译： 辐射源产生用于光刻的短波长辐射，例如极紫外辐射。 提供旋转电极，其浸入液体金属例如锡的各个浴中。 在电极之间产生放电以产生辐射。 在电极周围设置孔和/或在电极周围的金属屏蔽板中，以便在排出附近更好地向下降低压力以提高源的转换效率。 电极中的孔通过搅拌液态金属而改善电极的冷却，并改善电极和液态金属之间的热和电接触。 改善的电接触也降低了放电电路的时间常数，从而进一步提高了源的转换效率。

公开(公告)号：US20070158579A1

公开(公告)日：2007-07-12

申请号：US11643955

申请日：2006-12-22

申请人： Johannes Moors ,  Vadim Banine ,  Bastiaan Wolschrijn ,  Carolus Antonius Spee ,  Rik Jansen

发明人： Johannes Moors ,  Vadim Banine ,  Bastiaan Wolschrijn ,  Carolus Antonius Spee ,  Rik Jansen

IPC分类号： H01J27/00

CPC分类号： G03F7/2043 ,  G03F7/70041 ,  G03F7/70925

摘要： An optical apparatus includes an illumination system configured to form a pulsed radiation beam, an optical element with a surface on which the radiation beam is incident in operation, and a gas source arranged to supply a mixture of a first type of gas and a second type of gas to a space adjacent the surface. Particles of the first and second types of gas are capable of reacting with the surface, when activated by the radiation beam. The gas source is configured to generate a combination of surface occupation numbers of molecules of the first and second types of gas on the surface under operating conditions, at least prior to pulses of the radiation beam, the combination of surface occupation numbers lying in a range in which reactions of particles with the surface during pulses of the radiation beam are in majority reversed.

摘要翻译： 光学装置包括被配置为形成脉冲辐射束的照明系统，具有辐射束在其中入射的表面的光学元件，以及设置成供应第一类型气体和第二类型的混合物的气体源 的气体到邻近表面的空间。 当由辐射束激活时，第一和第二类气体的颗粒能够与表面反应。 气源被配置成至少在辐射束的脉冲之前，在工作条件下，在表面上产生第一和第二类气体的分子的表面占有数量的组合，表面占有数的组合在一个范围内 其中在辐射束的脉冲期间颗粒与表面的反应多数反转。

公开(公告)号：US20070062557A1

公开(公告)日：2007-03-22

申请号：US11367693

申请日：2006-03-06

申请人： Tatyana Rakhimova ,  Vadim Banine ,  Vladimir Ivanov ,  Konstantin Koshelev ,  Johannes Moors ,  Aleksander Kovalev ,  Dmitriy Lopaev

发明人： Tatyana Rakhimova ,  Vadim Banine ,  Vladimir Ivanov ,  Konstantin Koshelev ,  Johannes Moors ,  Aleksander Kovalev ,  Dmitriy Lopaev

IPC分类号： B08B6/00 ,  C25F5/00 ,  C25F3/30 ,  C25F1/00

CPC分类号： G03F7/70925 ,  G03F7/70933 ,  G21K2201/06

摘要： A method for cleaning elements of a lithographic apparatus, for example optical elements such as a collector mirror, includes providing a gas containing nitrogen; generating nitrogen radicals from at least part of the gas, thereby forming a radical containing gas; and providing at least part of the radical containing gas to the one or more elements of the apparatus. A lithographic apparatus includes a source and an optical element, and an electrical discharge generator arranged to generate a radio frequency discharge.

摘要翻译： 用于清洁光刻设备的元件的方法，例如诸如集光镜的光学元件，包括提供含氮的气体; 从至少部分气体产生氮自由基，从而形成含有自由基的气体; 以及将至少部分含自由基的气体提供给所述装置的一个或多个元件。 光刻设备包括源和光学元件，以及布置成产生射频放电的放电发生器。

公开(公告)号：US20050286029A1

公开(公告)日：2005-12-29

申请号：US10972755

申请日：2004-10-26

申请人： Erik Ham ,  Gert-Jan Heerens ,  Robert Lansbergen ,  Ellard Meijer ,  Hendricus Meijer ,  Hans Meiling ,  Bastiaan Mertens ,  Johannes Moors

发明人： Erik Ham ,  Gert-Jan Heerens ,  Robert Lansbergen ,  Ellard Meijer ,  Hendricus Meijer ,  Hans Meiling ,  Bastiaan Mertens ,  Johannes Moors

IPC分类号： G03B27/52 ,  G03B27/62

CPC分类号： G03B27/52 ,  G03F7/70741

摘要： According to an embodiment, a box for transporting a lithographic patterning device is arranged to cooperate with a lithographic apparatus. The transport box may be provided with a container part having an inner space with a storing position for storing the patterning device and an opening for the transfer of the patterning device. Prior to transfer of the patterning device from the inner space to the apparatus, the inner space is pressurized. The box may also comprise a closure part for closing the opening, and/or a channel system for evacuating and/or feeding gasses from/to the inner space of the box. Other embodiments include a lithographic apparatus comprising and/or configured to cooperate with such a box.

摘要翻译： 根据实施例，用于传送平版印刷图案形成装置的盒被布置成与光刻设备配合。 运输箱可以设置有具有内部空间的容器部分，该内部空间具有用于存储图案形成装置的存储位置和用于图案形成装置的传送的开口。 在将图案形成装置从内部空间传送到装置之前，内部空间被加压。 箱子还可以包括用于关闭开口的封闭部分和/或用于将气体从箱体的内部空间排出和/或进气的通道系统。 其他实施例包括包括和/或配置为与这种盒配合的光刻设备。

公开(公告)号：US20070140910A1

公开(公告)日：2007-06-21

申请号：US11311623

申请日：2005-12-20

申请人： Vadim Banine ,  Levinus Bakker ,  Ralph Kurt ,  Johannes Moors ,  Lucas Stevens ,  Peter Zalm

发明人： Vadim Banine ,  Levinus Bakker ,  Ralph Kurt ,  Johannes Moors ,  Lucas Stevens ,  Peter Zalm

IPC分类号： G01N33/00

CPC分类号： G01N25/142 ,  G01N25/68 ,  Y10T436/25875

摘要： A system for detecting at least one contamination species in an interior space of a lithographic apparatus, including: at least one monitoring surface configured to be in contact with the interior space, a thermal controller configured to control the temperature of the monitoring surface to at least one detection temperature, and at least one detector configured to detect condensation of the at least one contamination species onto the monitoring surface.

摘要翻译： 一种用于检测光刻设备的内部空间中的至少一种污染物质的系统，包括：被配置为与所述内部空间接触的至少一个监测表面;被配置为将所述监测表面的温度控制在至少 一个检测温度，以及至少一个检测器，被配置为检测所述至少一种污染物质到所述监测表面上的冷凝。

公开(公告)号：US20060268246A1

公开(公告)日：2006-11-30

申请号：US11391731

申请日：2006-03-29

申请人： Johannes Jacobs ,  Vadim Banine ,  Barrie Brewster ,  Vladimir Ivanov ,  Bastiaan Mertens ,  Johannes Moors ,  Robert Livesey ,  Baastiaan Wolschrijn

发明人： Johannes Jacobs ,  Vadim Banine ,  Barrie Brewster ,  Vladimir Ivanov ,  Bastiaan Mertens ,  Johannes Moors ,  Robert Livesey ,  Baastiaan Wolschrijn

IPC分类号： G03B27/52

CPC分类号： G03F7/70933 ,  G03F7/70908

摘要： A lithographic apparatus is configured to project a pattern from a patterning device onto a substrate. The apparatus includes a gas purged sealing aperture extending between at least two different zones of the apparatus, and a gas supplier configured to supply the sealing aperture one or more gases selected from a group including hydrogen, deuterium, heavy hydrogen, deuterated hydrogen, and a mixture of argon and hydrogen.

摘要翻译： 光刻设备被配置为将图案从图案形成装置投影到基板上。 该装置包括在装置的至少两个不同区域之间延伸的气体净化密封孔，以及构造成为密封孔提供一种或多种选自包括氢，氘，重氢，氘代氢和 氩和氢的混合物。