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    Method and exposure apparatus for performing a tilted focus and a device manufactured accordingly
    2.
    发明申请
    Method and exposure apparatus for performing a tilted focus and a device manufactured accordingly 有权
    用于进行倾斜聚焦的方法和曝光装置以及由此制造的装置

    公开(公告)号：US20060279718A1

    公开(公告)日：2006-12-14

    申请号：US11441348

    申请日：2006-05-26

    申请人： Arie Den Boef ,  Jacobus Burghoorn ,  Martinus Leenders ,  Uwe Mickan ,  Roeland Vanneer ,  Jan Hauschild

    发明人： Arie Den Boef ,  Jacobus Burghoorn ,  Martinus Leenders ,  Uwe Mickan ,  Roeland Vanneer ,  Jan Hauschild

    IPC分类号： G03B27/52

    CPC分类号： G03F7/70641 ,  G03F7/70283 ,  G03F9/7026 ,  G03F9/7069

    摘要： A method for performing a tilted focus test includes the steps of providing a target object, providing a projection beam of radiation using a radiation source, providing a reflective device to introduce a projected projection beam of radiation onto the target portion, introducing a first projected projection beam of radiation onto the target object using the reflective device in a first orientation, using a tilting device for tilting the reflective device to a second orientation to provide a second projection beam with a tilt relative to said first projection beam, introducing a second projected projection beam of radiation onto the target object, and determining a lateral shift of the first and second projected projection beams on the target object and determining from said lateral shift a defocus of the target object with respect to the projected projection beam.

    摘要翻译： 执行倾斜聚焦测试的方法包括以下步骤：提供目标物体，使用辐射源提供辐射投影光束，提供反射装置以将投射的投射射束投射到目标部分上，引入第一投射投影 使用倾斜装置将反射装置倾斜到第二取向以提供具有相对于所述第一投影光束的倾斜的第二投影光束，引入第二投射投影 确定目标物体上的第一和第二投影投影光束的横向位移，并根据所述横向偏移确定目标物体相对于投影投影光束的散焦。

    Method and exposure apparatus for performing a tilted focus and a device manufactured accordingly
    3.
    发明授权
    Method and exposure apparatus for performing a tilted focus and a device manufactured accordingly 有权
    用于进行倾斜聚焦的方法和曝光装置以及由此制造的装置

    公开(公告)号：US07834975B2

    公开(公告)日：2010-11-16

    申请号：US11441348

    申请日：2006-05-26

    申请人： Jacobus Burghoorn ,  Jan Hauschild ,  Arie Jeffrey Den Boef ,  Martinus Hendrikus Antonius Leenders ,  Uwe Mickan ,  Roeland Nicolaas Maria Vanneer

    发明人： Jacobus Burghoorn ,  Jan Hauschild ,  Arie Jeffrey Den Boef ,  Martinus Hendrikus Antonius Leenders ,  Uwe Mickan ,  Roeland Nicolaas Maria Vanneer

    IPC分类号： G03B27/42

    CPC分类号： G03F7/70641 ,  G03F7/70283 ,  G03F9/7026 ,  G03F9/7069

    摘要： A method for performing a tilted focus test includes the steps of providing a target object, providing a projection beam of radiation using a radiation source, providing a reflective device to introduce a projected projection beam of radiation onto the target portion, introducing a first projected projection beam of radiation onto the target object using the reflective device in a first orientation, using a tilting device for tilting the reflective device to a second orientation to provide a second projection beam with a tilt relative to said first projection beam, introducing a second projected projection beam of radiation onto the target object, and determining a lateral shift of the first and second projected projection beams on the target object and determining from said lateral shift a defocus of the target object with respect to the projected projection beam.

    摘要翻译： 执行倾斜聚焦测试的方法包括以下步骤：提供目标物体，使用辐射源提供辐射投影光束，提供反射装置以将投射的投影射束投射到目标部分上，引入第一投射投影 使用倾斜装置将反射装置倾斜到第二取向以提供具有相对于所述第一投影光束的倾斜的第二投影光束，引入第二投射投影 确定目标物体上的第一和第二投影投影光束的横向位移，并根据所述横向偏移确定目标物体相对于投影投影光束的散焦。

    Calibration apparatus and method of calibrating a radiation sensor in a lithographic apparatus
    5.
    发明授权
    Calibration apparatus and method of calibrating a radiation sensor in a lithographic apparatus 有权

    公开(公告)号：US07092072B2

    公开(公告)日：2006-08-15

    申请号：US10882684

    申请日：2004-07-02

    申请人： Johannes Hubertus Josephina Moors ,  Uwe Mickan

    发明人： Johannes Hubertus Josephina Moors ,  Uwe Mickan

    IPC分类号： G03B27/72 ,  G03B27/54

    CPC分类号： G03F7/70558

    摘要： A calibration apparatus is provided for calibrating a radiation sensor in a lithographic apparatus. The calibration apparatus includes a window formed of substantially radiation-transparent material for allowing radiation to pass therethrough to reach the radiation sensor. A first reference sensor is located behind the window, having an active surface abutting the window, for measuring the intensity of radiation which passes through the window. A second reference sensor is located a short distance behind the window, having an active surface facing the window, for measuring the intensity of radiation which passes through the window, a first contamination layer formed on the window, and a second contamination layer formed on the active surface of the second reference sensor. The radiation sensor can be calibrated by combining the measurements from the first and second radiation sensors.

    Actuator system, lithographic apparatus, method of controlling the position of a component and device manufacturing method
    6.
    发明授权
    Actuator system, lithographic apparatus, method of controlling the position of a component and device manufacturing method 失效
    执行器系统，光刻设备，控制部件位置的方法和装置的制造方法

    公开(公告)号：US08634062B2

    公开(公告)日：2014-01-21

    申请号：US12627776

    申请日：2009-11-30

    申请人： Gosse Charles De Vries ,  Edwin Johan Buis ,  Uwe Mickan

    发明人： Gosse Charles De Vries ,  Edwin Johan Buis ,  Uwe Mickan

    IPC分类号： G03B27/54

    CPC分类号： G03F7/70825 ,  G03F7/70141

    摘要： An actuator system is provided that is configured to move a component relative to a base of the actuator system. The actuator system may include first and second actuating elements, each including two sections of material that are joined to each other and have different coefficients of thermal expansion. The two actuating elements may be configured such that if the temperature of one is increased it applies a force on the component in a direction that is opposite to the force applied by the other actuating element if its temperature is increased. The actuator system may further include at least one power supply configured to provide independently controllable heating to the first and second actuating elements.

    摘要翻译： 提供致动器系统，其构造成相对于致动器系统的基座移动部件。 致动器系统可以包括第一和第二致动元件，每个致动元件包括彼此连接并且具有不同的热膨胀系数的两部分材料。 两个致动元件可被构造成使得如果一个温度升高，则如果其温度升高，则该部件在与另一致动元件施加的力相反的方向上施加力。 致动器系统还可以包括被配置为向第一和第二致动元件提供独立可控加热的至少一个电源。

    ILLUMINATION SYSTEM, LITHOGRAPHIC APPARATUS AND ILLUMINATION METHOD
    7.
    发明申请
    ILLUMINATION SYSTEM, LITHOGRAPHIC APPARATUS AND ILLUMINATION METHOD 审中-公开
    照明系统，光刻设备和照明方法

    公开(公告)号：US20120262690A1

    公开(公告)日：2012-10-18

    申请号：US13518301

    申请日：2010-11-29

    申请人： Wilhelmus Petrus De Boeij ,  Erik Roelof Loopstra ,  Uwe Mickan ,  Jan Bernard Plechelmus Van Schoot ,  Gosse Charles De Vries

    发明人： Wilhelmus Petrus De Boeij ,  Erik Roelof Loopstra ,  Uwe Mickan ,  Jan Bernard Plechelmus Van Schoot ,  Gosse Charles De Vries

    IPC分类号： G03B27/54

    CPC分类号： G03F7/70116 ,  G03F7/70075

    摘要： An illumination system includes a field-facet mirror-device and a pupil mirror configured to condition a beam of radiation incident on the field-facet mirror-device. The field-facet mirror-device includes reflective field facets movable between first and second orientations relative to the incident beam. The field facets in their first orientations are effective to reflect the incident radiation towards respective reflective pupil facets so as to form part of a conditioned beam reflected from the pupil-facet mirror-device. The field facets in their second orientations are effective to reflect the incident radiation onto respective areas of the pupil-facet mirror-device designated as beam dump areas. The areas are arranged to prevent radiation incident on the areas from forming part of the conditioned beam and are arranged between the limits of an annular area on the pupil-facet mirror-device effective to define the inner and outer regions of the conditioned beam reflected from the pupil-facet mirror-device.

    摘要翻译： 照明系统包括场分面镜装置和配置成调节入射在场面镜装置上的辐射束的光瞳镜。 场面反射镜装置包括相对于入射光束在第一和第二取向之间移动的反射场面。 其第一取向中的场小面有效地将入射辐射反射到各个反射光瞳面，以便形成从瞳孔面反射镜装置反射的条件光束的一部分。 其第二取向中的场面有效地将入射的辐射反射到被指定为光束聚集区域的瞳孔面反射镜装置的相应区域上。 这些区域被布置成防止入射到区域上的辐射形成调节梁的一部分，并且被布置在瞳孔面反射镜装置上的环形区域的极限之间，有效地限定条件束的内部和外部区域从 瞳孔面反射镜。

    Actuator System, Lithographic Apparatus, Method of Controlling the Position of a Component and Device Manufacturing Method
    9.
    发明申请
    Actuator System, Lithographic Apparatus, Method of Controlling the Position of a Component and Device Manufacturing Method 失效
    执行器系统，光刻设备，控制部件位置的方法和装置制造方法

    公开(公告)号：US20100149506A1

    公开(公告)日：2010-06-17

    申请号：US12627776

    申请日：2009-11-30

    申请人： Gosse Charles DE VRIES ,  Edwin Johan Buis ,  Uwe Mickan

    发明人： Gosse Charles DE VRIES ,  Edwin Johan Buis ,  Uwe Mickan

    IPC分类号： G03B27/54 ,  H02N10/00

    CPC分类号： G03F7/70825 ,  G03F7/70141

    摘要： An actuator system is provided that is configured to move a component relative to a base of the actuator system. The actuator system may include first and second actuating elements, each including two sections of material that are joined to each other and have different coefficients of thermal expansion. The two actuating elements may be configured such that if the temperature of one is increased it applies a force on the component in a direction that is opposite to the force applied by the other actuating element if its temperature is increased. The actuator system may further include at least one power supply configured to provide independently controllable heating to the first and second actuating elements.

    摘要翻译： 提供致动器系统，其构造成相对于致动器系统的基座移动部件。 致动器系统可以包括第一和第二致动元件，每个致动元件包括彼此连接并且具有不同的热膨胀系数的两部分材料。 两个致动元件可被构造成使得如果一个温度升高，则如果其温度升高，则该部件在与另一致动元件施加的力相反的方向上施加力。 致动器系统还可以包括被配置为向第一和第二致动元件提供独立可控加热的至少一个电源。

    Method of generating a photolithography patterning device, computer program, patterning device, method of determining the position of a target image on or proximate a substrate, measurement device, and lithographic apparatus
    10.
    发明授权
    Method of generating a photolithography patterning device, computer program, patterning device, method of determining the position of a target image on or proximate a substrate, measurement device, and lithographic apparatus 有权
    产生光刻图案形成装置的方法，计算机程序，图案形成装置，确定基板上或附近的目标图像的位置的方法，测量装置和光刻装置

    公开(公告)号：US07960074B2

    公开(公告)日：2011-06-14

    申请号：US11345629

    申请日：2006-02-02

    申请人： Uwe Mickan ,  Hendricus Johannes Maria Meijer

    发明人： Uwe Mickan ,  Hendricus Johannes Maria Meijer

    IPC分类号： G03F1/00 ,  G06F17/50

    CPC分类号： G03F7/70433 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/24 ,  G03F7/70283 ,  G03F7/70666 ,  G03F9/7003 ,  G03F9/7076 ,  G03F9/7088

    摘要： A method of generating a photolithography patterning device for transferring a pattern formed in the patterning device onto a substrate utilizing a lithographic projection apparatus includes defining features within the pattern formed in the device, wherein the features have dimensions and orientations chosen to create a desired image on the substrate during pattern transfer; and adjusting the dimensions of the features to compensate the desired image for displacement and dimension errors introduced by the effective shadow angle of the radiation on the features during pattern transfer or correlated to the position of the features within the exposure slit during pattern transfer. A measurement device for determining the position of a target image on or proximate a substrate in a lithographic projection apparatus, wherein the target image is formed by features on a patterning device, includes a detector configured to measure the position of the target image on or proximate the substrate, wherein the detector compensates the measured position of the target image for displacement and dimension errors introduced by the effective shadow angle of the radiation on the features of the patterning device during pattern transfer or correlated to the position of the features within the exposure slit during pattern transfer. A lithographic apparatus includes a measurement device.

    摘要翻译： 使用光刻投影装置产生用于将形成在图案形成装置中的图案转印到基板上的光刻图案形成装置的方法包括限定在所述装置中形成的图案内的特征，其中所述特征具有选择的尺寸和取向以在 图案转印时的基板; 并且调整特征的尺寸以补偿在图案转印期间由辐射对特征的有效阴影角度引入的位移和尺寸误差所需的图像，或者与图案转印期间的曝光缝隙内的特征位置相关。 一种测量装置，用于在光刻投影设备中确定目标图像在基板上或其附近的位置，其中所述目标图像由图案形成装置上的特征形成，所述测量装置包括检测器，所述检测器被配置为测量所述目标图像在或近似的位置 所述基板，其中所述检测器补偿所述目标图像的测量位置，并且通过所述辐射的有效阴影角度在所述图案转印期间对所述图案形成装置的特征引入的尺寸误差或与所述曝光缝隙内的所述特征的位置相关联 在图案转移期间。 光刻设备包括测量装置。