公开(公告)号：US06934025B2

公开(公告)日：2005-08-23

申请号：US10839049

申请日：2004-05-05

申请人： Jon Opsal ,  Jeffrey T. Fanton ,  Craig Uhrich

发明人： Jon Opsal ,  Jeffrey T. Fanton ,  Craig Uhrich

IPC分类号： G01B11/06 ,  G01J4/00 ,  G01N21/21

CPC分类号： G01B11/0641 ,  G01J4/00 ,  G01N21/211

摘要： An optical measurement system for evaluating a reference sample, having at least a partially known composition, includes a reference ellipsometer and at least one non-contact optical measurement device. The ellipsometer includes a light generator, an analyzer, and a detector. The light generator generates a beam of quasi-monochromatic light of known wavelength and polarization, which is directed at a non-normal angle of incidence relative to the reference sample. The analyzer creates interference between S and P polarized components in the beam after interaction with the sample. The detector then measures the intensity of the beam, which a processor uses to determine the polarization state of the beam and, subsequently, an optical property of the reference sample. The processor then can calibrate an optical measurement device by comparing a measured optical parameter from the optical measurement device to the determined optical property from the reference ellipsometer.

摘要翻译： 用于评估具有至少部分已知组成的参考样品的光学测量系统包括参考椭偏仪和至少一个非接触式光学测量装置。 椭偏仪包括光发生器，分析器和检测器。 光发生器产生已知波长和极化的准单色光束，其被引导到相对于参考样本的非正常入射角。 分析仪在与样品相互作用后，在光束中产生S和P偏振分量之间的干扰。 然后，检测器测量光束的强度，处理器用于确定光束的偏振状态，随后测量参考样品的光学特性。 然后，处理器可以通过将来自光学测量装置的测量光学参数与来自参考椭偏仪的所确定的光学特性进行比较来校准光学测量装置。

公开(公告)号：US06753962B2

公开(公告)日：2004-06-22

申请号：US10320907

申请日：2002-12-17

申请人： Jon Opsal ,  Jeffrey T. Fanton ,  Craig Uhrich

发明人： Jon Opsal ,  Jeffrey T. Fanton ,  Craig Uhrich

IPC分类号： G01J400

CPC分类号： G01B11/0641 ,  G01J4/00 ,  G01N21/211

摘要： An optical measurement system for evaluating a reference sample that has at least a partially known composition. The optical measurement system includes a reference ellipsometer and at least one non-contact optical measurement device. The reference ellipsometer includes a light generator, an analyzer and a detector. The light generator generates a beam of quasi-monochromatic light having a known wavelength and a known polarization for interacting with the reference sample. The beam is directed at a non-normal angle of incidence relative to the reference sample to interact with the reference sample. The analyzer creates interference between the S and P polarized components in the light beam after the light beam has interacted with reference sample. The detector measures the intensity of the light beam after it has passed through the analyzer. A processor determines the polarization state of the light beam entering the analyzer from the intensity measured by the detector, and determines an optical property of the reference sample based upon the determined polarization state, the known wavelength of light from the light generator and the composition of the reference sample. The processor also operates the optical measurement device to measure an optical parameter of the reference sample. The processor calibrates the optical measurement device by comparing the measured optical parameter from the optical measurement device to the determined optical property from the reference ellipsometer.

摘要翻译： 一种用于评估至少具有部分已知组成的参考样品的光学测量系统。 光学测量系统包括参考椭偏仪和至少一个非接触式光学测量装置。 参考椭偏仪包括光发生器，分析器和检测器。 光发生器产生具有已知波长和已知极化的准单色光束，用于与参考样品相互作用。 光束相对于参考样品被引导到非正常入射角，以与参考样品相互作用。 在光束与参考样本相互作用后，分析仪在光束中产生S和P偏振分量之间的干扰。 检测器测量光束通过分析仪后的强度。 处理器根据由检测器测量的强度确定进入分析器的光束的偏振状态，并且基于所确定的偏振状态，来自光发生器的已知的光的波长以及来自光发生器的光的组成，确定参考样品的光学特性 参考样品。 处理器还操作光学测量装置以测量参考样品的光学参数。 处理器通过将来自光学测量装置的测量光学参数与来自参考椭偏仪的所确定的光学特性进行比较来校准光学测量装置。

公开(公告)号：US06515746B2

公开(公告)日：2003-02-04

申请号：US10138984

申请日：2002-05-03

申请人： Jon Opsal ,  Jeffrey T. Fanton ,  Craig Uhrich

发明人： Jon Opsal ,  Jeffrey T. Fanton ,  Craig Uhrich

IPC分类号： G01J400

CPC分类号： G01B11/0641 ,  G01J4/00 ,  G01N21/211

摘要： An optical measurement system for evaluating a reference sample that has at least a partially known composition. The optical measurement system includes a reference ellipsometer and at least one non-contact optical measurement device. The reference ellipsometer includes a light generator, an analyzer and a detector. The light generator generates a beam of quasi-monochromatic light having a known wavelength and a known polarization for interacting with the reference sample. The beam is directed at a non-normal angle of incidence relative to the reference sample to interact with the reference sample. The analyzer creates interference between the S and P polarized components in the light beam after the light beam has interacted with reference sample. The detector measures the intensity of the light beam after it has passed through the analyzer. A processor determines the polarization state of the light beam entering the analyzer from the intensity measured by the detector, and determines an optical property of the reference sample based upon the determined polarization state, the known wavelength of light from the light generator and the composition of the reference sample. The processor also operates the optical measurement device to measure an optical parameter of the reference sample. The processor calibrates the optical measurement device by comparing the measured optical parameter from the optical measurement device to the determined optical property from the reference ellipsometer.

公开(公告)号：US06707056B2

公开(公告)日：2004-03-16

申请号：US10132959

申请日：2002-04-26

申请人： Jeffrey T. Fanton ,  Craig Uhrich

发明人： Jeffrey T. Fanton ,  Craig Uhrich

IPC分类号： G01N2100

CPC分类号： G01N23/20

摘要： A method for operating an optical measurement system is disclosed which permits measurements to be made more uniformly in regions close the edge of a wafer. The optical measurement system includes a probe beam which is focused to an elliptically shaped spot on the surface of the wafer. Improved measurements near the wafer's edge are obtained by rotating the wafer with respect to the measurement spot to insure that the short axis of the ellipse is perpendicular to the wafer edge.

摘要翻译： 公开了一种用于操作光学测量系统的方法，其允许在靠近晶片边缘的区域中更均匀地进行测量。 光学测量系统包括聚焦在晶片表面上的椭圆形点的探针光束。 通过相对于测量点旋转晶片来获得晶片边缘附近的改进的测量，以确保椭圆的短轴垂直于晶片边缘。

公开(公告)号：US06885019B2

公开(公告)日：2005-04-26

申请号：US10766125

申请日：2004-01-28

申请人： Jeffrey T. Fanton ,  Craig Uhrich

发明人： Jeffrey T. Fanton ,  Craig Uhrich

IPC分类号： G01B11/03 ,  G01N23/20 ,  G01N21/00

CPC分类号： G01N23/20

摘要： Systems and methods for operating an optical measurement system are disclosed which permit measurements to be made more uniformly in regions close the edge of a sample, such as a wafer. An optical measurement system can include a probe beam that is focused to an elliptically shaped spot on the surface of the sample. Improved measurements near the edge of the sample can be obtained by rotating the wafer with respect to the measurement spot to ensure that the short axis of the ellipse is perpendicular to the wafer edge.

摘要翻译： 公开了用于操作光学测量系统的系统和方法，其允许在靠近诸如晶片的样本的边缘的区域中更均匀地进行测量。 光学测量系统可以包括聚焦在样品表面上的椭圆形斑点的探针光束。 可以通过相对于测量点旋转晶片来获得靠近样品边缘的改进的测量，以确保椭圆的短轴垂直于晶片边缘。

公开(公告)号：US06744850B2

公开(公告)日：2004-06-01

申请号：US10053373

申请日：2001-10-24

申请人： Jeffrey T. Fanton ,  Craig Uhrich ,  Louis N. Koppel

发明人： Jeffrey T. Fanton ,  Craig Uhrich ,  Louis N. Koppel

IPC分类号： G01T136

CPC分类号： G01N23/20

摘要： An x-ray reflectometry system for measuring thin film samples. The system includes an adjustable x-ray source, such that characteristics of an x-ray probe beam output by the x-ray source can be adjusted to improve the resolution of the measurement system. The x-ray probe beam can also be modified to increase the speed of evaluating the thin film sample, for situations where some degree of resolution can be sacrificed. In addition, or alternatively, the system can also provide an adjustable detector position device which allows the position of the detector to be adjusted to increase the resolution of the system, or to reduce the time it takes to evaluate the thin film material.

摘要翻译： 用于测量薄膜样品的x射线反射系统。 该系统包括可调节的x射线源，使得可以调整由x射线源输出的x射线探针束的特性，以提高测量系统的分辨率。 对于可以牺牲某种程度的分辨率的情况，也可以修改x射线探针光束以增加评估薄膜样品的速度。 另外或者替代地，系统还可以提供可调节的检测器位置装置，其允许调整检测器的位置以增加系统的分辨率，或减少评估薄膜材料所需的时间。

公开(公告)号：US06829049B1

公开(公告)日：2004-12-07

申请号：US09848733

申请日：2001-05-03

申请人： Craig Uhrich ,  Jianhui Chen

发明人： Craig Uhrich ,  Jianhui Chen

IPC分类号： G01J400

CPC分类号： G02B13/143 ,  G01N21/211 ,  G01N2021/213 ,  G02B1/02 ,  G02B7/026

摘要： A broadband ellipsometer is disclosed with an all-refractive optical system for focusing a probe beam on a sample. The ellipsometer includes a broadband light source emitting wavelengths in the UV and visible regions of the spectrum. The change in polarization state of the light reflected from the sample is arranged to evaluate characteristics of a sample. The probe beam is focused onto the sample using a composite lens system formed from materials transmissive in the UV and visible wavelengths and arranged to minimize chromatic aberrations. The spot size on the sample is preferably less than 3 mm and the aberration is such that the focal shift over the range of wavelengths is less than five percent of the mean focal length of the system.

摘要翻译： 公开了一种宽带椭偏仪，其具有用于将探针束聚焦在样品上的全折射光学系统。 椭偏仪包括在光谱的UV和可见光区域发射波长的宽带光源。 从样品反射的光的偏振状态的变化被布置成评估样品的特性。 使用由在UV和可见波长透射的材料形成的复合透镜系统将探针束聚焦到样品上，并布置成使色差最小化。 样品上的斑点尺寸优选小于3mm，并且像差是使得波长范围上的焦点偏移小于系统的平均焦距的百分之五。

公开(公告)号：US06940596B2

公开(公告)日：2005-09-06

申请号：US10967872

申请日：2004-10-18

申请人： Craig Uhrich ,  Jianhui Chen

发明人： Craig Uhrich ,  Jianhui Chen

IPC分类号： G01N21/21 ,  G02B1/02 ,  G02B7/02 ,  G02B13/14 ,  G01J4/00

CPC分类号： G02B13/143 ,  G01N21/211 ,  G01N2021/213 ,  G02B1/02 ,  G02B7/026

摘要： A broadband ellipsometer is disclosed with an all-refractive optical system for focusing a probe beam on a sample. The ellipsometer includes a broadband light source emitting wavelengths in the UV and visible regions of the spectrum. The change in polarization state of the light reflected from the sample is arranged to evaluate characteristics of a sample. The probe beam is focused onto the sample using a composite lens system formed from materials transmissive in the UV and visible wavelengths and arranged to minimize chromatic aberrations. The spot size on the sample can be less than 3 mm and the aberration is such that the focal shift over the range of wavelengths is less than five percent of the mean focal length of the system.

摘要翻译： 公开了一种宽带椭偏仪，其具有用于将探针束聚焦在样品上的全折射光学系统。 椭偏仪包括在光谱的UV和可见光区域发射波长的宽带光源。 从样品反射的光的偏振状态的变化被布置成评估样品的特性。 使用由在UV和可见波长透射的材料形成的复合透镜系统将探针束聚焦到样品上，并布置成使色差最小化。 样品上的斑点尺寸可以小于3mm，并且像差是使得波长范围上的焦点偏移小于系统的平均焦距的百分之五。

公开(公告)号：US20050046842A1

公开(公告)日：2005-03-03

申请号：US10967872

申请日：2004-10-18

申请人： Craig Uhrich ,  Jianhui Chen

发明人： Craig Uhrich ,  Jianhui Chen

IPC分类号： G01N21/21 ,  G02B1/02 ,  G02B7/02 ,  G02B13/14 ,  G01J4/00

CPC分类号： G02B13/143 ,  G01N21/211 ,  G01N2021/213 ,  G02B1/02 ,  G02B7/026

摘要： A broadband ellipsometer is disclosed with an all-refractive optical system for focusing a probe beam on a sample. The ellipsometer includes a broadband light source emitting wavelengths in the UV and visible regions of the spectrum. The change in polarization state of the light reflected from the sample is arranged to evaluate characteristics of a sample. The probe beam is focused onto the sample using a composite lens system formed from materials transmissive in the UV and visible wavelengths and arranged to minimize chromatic aberrations. The spot size on the sample can be less than 3 mm and the aberration is such that the focal shift over the range of wavelengths is less than five percent of the mean focal length of the system.

公开(公告)号：US20070076976A1

公开(公告)日：2007-04-05

申请号：US11499065

申请日：2006-08-04

申请人： Craig Uhrich ,  Lanhua Wei ,  Jeffrey Fanton ,  Ken Krieg

发明人： Craig Uhrich ,  Lanhua Wei ,  Jeffrey Fanton ,  Ken Krieg

IPC分类号： G06K9/40

CPC分类号： G06T5/002 ,  G06T2207/30148

摘要： Methods for eliminating artifacts in two-dimensional optical metrology utilizing the interline CCD detectors are based on a dark-subtraction principle. The self-dark subtraction method takes advantage of strong correlation between the noise patterns in illuminated and dark regions within the same image. Image artifacts are removed and the S/N ratio is improved significantly by subtraction of selected dark region of the image from the illuminated one within the same frame. The dark-frame subtraction technique reduces a “smear” effect by applying a digital processing based on subtraction of the dark frame images from the normal light frame images. A combination of these methods significantly improves performance of two-dimensional optical metrology systems such as spectrometers, ellipsometers, beam profile reflectometers/ellipsometers, scatterometers and spectroscopic scatterometers.

摘要翻译： 利用线间CCD检测器消除二维光学测量中的假象的方法基于暗相减原理。 自暗相减法利用了相同图像中的照明区域和暗区域之间的噪声模式之间的强相关性。 通过从同一帧内的被照明的图像中减去所选图像的暗区域，去除图像伪影并且显着提高S / N比。 暗帧减法技术通过应用基于正常光帧图像的暗帧图像的减法的数字处理来减少“拖影”效果。 这些方法的组合显着提高了二维光学测量系统的性能，如光谱仪，椭偏仪，光束轮廓反射计/椭偏仪，散射仪和分光散射仪。