公开(公告)号：US06707056B2

公开(公告)日：2004-03-16

申请号：US10132959

申请日：2002-04-26

申请人： Jeffrey T. Fanton ,  Craig Uhrich

发明人： Jeffrey T. Fanton ,  Craig Uhrich

IPC分类号： G01N2100

CPC分类号： G01N23/20

摘要： A method for operating an optical measurement system is disclosed which permits measurements to be made more uniformly in regions close the edge of a wafer. The optical measurement system includes a probe beam which is focused to an elliptically shaped spot on the surface of the wafer. Improved measurements near the wafer's edge are obtained by rotating the wafer with respect to the measurement spot to insure that the short axis of the ellipse is perpendicular to the wafer edge.

摘要翻译： 公开了一种用于操作光学测量系统的方法，其允许在靠近晶片边缘的区域中更均匀地进行测量。 光学测量系统包括聚焦在晶片表面上的椭圆形点的探针光束。 通过相对于测量点旋转晶片来获得晶片边缘附近的改进的测量，以确保椭圆的短轴垂直于晶片边缘。

公开(公告)号：US06934025B2

公开(公告)日：2005-08-23

申请号：US10839049

申请日：2004-05-05

申请人： Jon Opsal ,  Jeffrey T. Fanton ,  Craig Uhrich

发明人： Jon Opsal ,  Jeffrey T. Fanton ,  Craig Uhrich

IPC分类号： G01B11/06 ,  G01J4/00 ,  G01N21/21

CPC分类号： G01B11/0641 ,  G01J4/00 ,  G01N21/211

摘要： An optical measurement system for evaluating a reference sample, having at least a partially known composition, includes a reference ellipsometer and at least one non-contact optical measurement device. The ellipsometer includes a light generator, an analyzer, and a detector. The light generator generates a beam of quasi-monochromatic light of known wavelength and polarization, which is directed at a non-normal angle of incidence relative to the reference sample. The analyzer creates interference between S and P polarized components in the beam after interaction with the sample. The detector then measures the intensity of the beam, which a processor uses to determine the polarization state of the beam and, subsequently, an optical property of the reference sample. The processor then can calibrate an optical measurement device by comparing a measured optical parameter from the optical measurement device to the determined optical property from the reference ellipsometer.

摘要翻译： 用于评估具有至少部分已知组成的参考样品的光学测量系统包括参考椭偏仪和至少一个非接触式光学测量装置。 椭偏仪包括光发生器，分析器和检测器。 光发生器产生已知波长和极化的准单色光束，其被引导到相对于参考样本的非正常入射角。 分析仪在与样品相互作用后，在光束中产生S和P偏振分量之间的干扰。 然后，检测器测量光束的强度，处理器用于确定光束的偏振状态，随后测量参考样品的光学特性。 然后，处理器可以通过将来自光学测量装置的测量光学参数与来自参考椭偏仪的所确定的光学特性进行比较来校准光学测量装置。

公开(公告)号：US06885019B2

公开(公告)日：2005-04-26

申请号：US10766125

申请日：2004-01-28

申请人： Jeffrey T. Fanton ,  Craig Uhrich

发明人： Jeffrey T. Fanton ,  Craig Uhrich

IPC分类号： G01B11/03 ,  G01N23/20 ,  G01N21/00

CPC分类号： G01N23/20

摘要： Systems and methods for operating an optical measurement system are disclosed which permit measurements to be made more uniformly in regions close the edge of a sample, such as a wafer. An optical measurement system can include a probe beam that is focused to an elliptically shaped spot on the surface of the sample. Improved measurements near the edge of the sample can be obtained by rotating the wafer with respect to the measurement spot to ensure that the short axis of the ellipse is perpendicular to the wafer edge.

摘要翻译： 公开了用于操作光学测量系统的系统和方法，其允许在靠近诸如晶片的样本的边缘的区域中更均匀地进行测量。 光学测量系统可以包括聚焦在样品表面上的椭圆形斑点的探针光束。 可以通过相对于测量点旋转晶片来获得靠近样品边缘的改进的测量，以确保椭圆的短轴垂直于晶片边缘。

公开(公告)号：US06753962B2

公开(公告)日：2004-06-22

申请号：US10320907

申请日：2002-12-17

申请人： Jon Opsal ,  Jeffrey T. Fanton ,  Craig Uhrich

发明人： Jon Opsal ,  Jeffrey T. Fanton ,  Craig Uhrich

IPC分类号： G01J400

CPC分类号： G01B11/0641 ,  G01J4/00 ,  G01N21/211

摘要： An optical measurement system for evaluating a reference sample that has at least a partially known composition. The optical measurement system includes a reference ellipsometer and at least one non-contact optical measurement device. The reference ellipsometer includes a light generator, an analyzer and a detector. The light generator generates a beam of quasi-monochromatic light having a known wavelength and a known polarization for interacting with the reference sample. The beam is directed at a non-normal angle of incidence relative to the reference sample to interact with the reference sample. The analyzer creates interference between the S and P polarized components in the light beam after the light beam has interacted with reference sample. The detector measures the intensity of the light beam after it has passed through the analyzer. A processor determines the polarization state of the light beam entering the analyzer from the intensity measured by the detector, and determines an optical property of the reference sample based upon the determined polarization state, the known wavelength of light from the light generator and the composition of the reference sample. The processor also operates the optical measurement device to measure an optical parameter of the reference sample. The processor calibrates the optical measurement device by comparing the measured optical parameter from the optical measurement device to the determined optical property from the reference ellipsometer.

摘要翻译： 一种用于评估至少具有部分已知组成的参考样品的光学测量系统。 光学测量系统包括参考椭偏仪和至少一个非接触式光学测量装置。 参考椭偏仪包括光发生器，分析器和检测器。 光发生器产生具有已知波长和已知极化的准单色光束，用于与参考样品相互作用。 光束相对于参考样品被引导到非正常入射角，以与参考样品相互作用。 在光束与参考样本相互作用后，分析仪在光束中产生S和P偏振分量之间的干扰。 检测器测量光束通过分析仪后的强度。 处理器根据由检测器测量的强度确定进入分析器的光束的偏振状态，并且基于所确定的偏振状态，来自光发生器的已知的光的波长以及来自光发生器的光的组成，确定参考样品的光学特性 参考样品。 处理器还操作光学测量装置以测量参考样品的光学参数。 处理器通过将来自光学测量装置的测量光学参数与来自参考椭偏仪的所确定的光学特性进行比较来校准光学测量装置。

公开(公告)号：US06744850B2

公开(公告)日：2004-06-01

申请号：US10053373

申请日：2001-10-24

申请人： Jeffrey T. Fanton ,  Craig Uhrich ,  Louis N. Koppel

发明人： Jeffrey T. Fanton ,  Craig Uhrich ,  Louis N. Koppel

IPC分类号： G01T136

CPC分类号： G01N23/20

摘要： An x-ray reflectometry system for measuring thin film samples. The system includes an adjustable x-ray source, such that characteristics of an x-ray probe beam output by the x-ray source can be adjusted to improve the resolution of the measurement system. The x-ray probe beam can also be modified to increase the speed of evaluating the thin film sample, for situations where some degree of resolution can be sacrificed. In addition, or alternatively, the system can also provide an adjustable detector position device which allows the position of the detector to be adjusted to increase the resolution of the system, or to reduce the time it takes to evaluate the thin film material.

摘要翻译： 用于测量薄膜样品的x射线反射系统。 该系统包括可调节的x射线源，使得可以调整由x射线源输出的x射线探针束的特性，以提高测量系统的分辨率。 对于可以牺牲某种程度的分辨率的情况，也可以修改x射线探针光束以增加评估薄膜样品的速度。 另外或者替代地，系统还可以提供可调节的检测器位置装置，其允许调整检测器的位置以增加系统的分辨率，或减少评估薄膜材料所需的时间。

公开(公告)号：US06515746B2

公开(公告)日：2003-02-04

申请号：US10138984

申请日：2002-05-03

申请人： Jon Opsal ,  Jeffrey T. Fanton ,  Craig Uhrich

发明人： Jon Opsal ,  Jeffrey T. Fanton ,  Craig Uhrich

IPC分类号： G01J400

CPC分类号： G01B11/0641 ,  G01J4/00 ,  G01N21/211

摘要： An optical measurement system for evaluating a reference sample that has at least a partially known composition. The optical measurement system includes a reference ellipsometer and at least one non-contact optical measurement device. The reference ellipsometer includes a light generator, an analyzer and a detector. The light generator generates a beam of quasi-monochromatic light having a known wavelength and a known polarization for interacting with the reference sample. The beam is directed at a non-normal angle of incidence relative to the reference sample to interact with the reference sample. The analyzer creates interference between the S and P polarized components in the light beam after the light beam has interacted with reference sample. The detector measures the intensity of the light beam after it has passed through the analyzer. A processor determines the polarization state of the light beam entering the analyzer from the intensity measured by the detector, and determines an optical property of the reference sample based upon the determined polarization state, the known wavelength of light from the light generator and the composition of the reference sample. The processor also operates the optical measurement device to measure an optical parameter of the reference sample. The processor calibrates the optical measurement device by comparing the measured optical parameter from the optical measurement device to the determined optical property from the reference ellipsometer.

公开(公告)号：US5900939A

公开(公告)日：1999-05-04

申请号：US98880

申请日：1998-06-17

申请人： David E. Aspnes ,  Jon Opsal ,  Jeffrey T. Fanton

发明人： David E. Aspnes ,  Jon Opsal ,  Jeffrey T. Fanton

IPC分类号： G01B11/06 ,  G01J4/00 ,  G01N21/21

CPC分类号： G01B11/0641 ,  G01J4/00 ,  G01N21/211

摘要： An optical measurement system for evaluating a reference sample that has at least a partially known composition. The optical measurement system includes a reference ellipsometer and at least one non-contact optical measurement device. The reference ellipsometer includes a light generator, an analyzer and a detector. The light generator generates a beam of quasimonochromatic light having a known wavelength and a known polarization for interacting with the reference sample. The beam is directed at a non-normal angle of incidence relative to the reference sample to interact with the reference sample. The analyzer creates interference between the S and P polarized components in the light beam after the light beam has interacted with reference sample. The detector measures the intensity of the light beam after it has passed through the analyzer. A processor determines the polarization state of the light beam entering the analyzer from the intensity measured by the detector, and determines an optical property of the reference sample based upon the determined polarization state, the known wavelength of light from the light generator and the composition of the reference sample. The processor also operates the optical measurement device to measure an optical parameter of the reference sample. The processor calibrates the optical measurement device by comparing the measured optical parameter from the optical measurement device to the determined optical property from the reference ellipsometer.

摘要翻译： 一种用于评估至少具有部分已知组成的参考样品的光学测量系统。 光学测量系统包括参考椭偏仪和至少一个非接触式光学测量装置。 参考椭偏仪包括光发生器，分析器和检测器。 光发生器产生具有已知波长和已知极化的准共振色光束，用于与参考样品相互作用。 光束相对于参考样品被引导到非正常入射角，以与参考样品相互作用。 在光束与参考样本相互作用后，分析仪在光束中产生S和P偏振分量之间的干扰。 检测器测量光束通过分析仪后的强度。 处理器根据由检测器测量的强度确定进入分析器的光束的偏振状态，并且基于所确定的偏振状态，来自光发生器的已知的光的波长以及来自光发生器的光的组成，确定参考样品的光学特性 参考样品。 处理器还操作光学测量装置以测量参考样品的光学参数。 处理器通过将来自光学测量装置的测量光学参数与来自参考椭偏仪的所确定的光学特性进行比较来校准光学测量装置。

公开(公告)号：US07619741B2

公开(公告)日：2009-11-17

申请号：US12185297

申请日：2008-08-04

申请人： Lena Nicolaides ,  Jeffrey T. Fanton ,  Alex Salnik ,  Jon Opsal

发明人： Lena Nicolaides ,  Jeffrey T. Fanton ,  Alex Salnik ,  Jon Opsal

IPC分类号： G01N21/00

CPC分类号： G01N21/39 ,  G01N21/1717 ,  G01N21/55 ,  G01N21/636 ,  G01N21/9501 ,  G01N2201/0612 ,  G01N2201/0691

摘要： A modulated reflectance measurement system includes three monochromatic diode-based lasers. Each laser can operate as a probe beam or as a pump beam source. The laser outputs are redirected using a series of mirrors and beam splitters to reach an objective lens. The objective lens focuses the laser outputs on a sample. Reflected energy returns through objective and is redirected by a beam splitter to a detector. A lock-in amplifier converts the output of the detector to produce quadrature (Q) and in-phase (I) signals for analysis. A Processor uses the Q and/or I signals to analyze the sample. By changing the number of lasers used as pump or probe beam sources, the measurement system can be optimized to measure a range of different samples types.

摘要翻译： 调制反射测量系统包括三个基于单色二极管的激光器。 每个激光器可以作为探测光束或作为泵浦光源操作。 使用一系列反射镜和分束器将激光输出重定向到达物镜。 物镜将激光输出聚焦在样品上。 反射能量通过目标返回，并被分束器重定向到检测器。 锁定放大器转换检测器的输出以产生正交（Q）和同相（I）信号用于分析。 处理器使用Q和/或I信号来分析样本。 通过改变用作泵浦或探针光束源的激光器的数量，可以优化测量系统以测量不同样品类型的范围。

公开(公告)号：US07061614B2

公开(公告)日：2006-06-13

申请号：US10141267

申请日：2002-05-08

申请人： David Y. Wang ,  Lawrence Rotter ,  Jeffrey T. Fanton ,  Jeffrey E. McAninch

发明人： David Y. Wang ,  Lawrence Rotter ,  Jeffrey T. Fanton ,  Jeffrey E. McAninch

IPC分类号： G01J4/00

CPC分类号： G01N21/55 ,  G01B11/00 ,  G01J3/10 ,  G01J3/36 ,  G01N21/211

摘要： The subject invention relates to a broadband optical metrology system that segregates the broadband radiation into multiple sub-bands to improve overall performance. Each sub-band includes only a fraction of the original bandwidth. The optical path—the light path that connects the illuminator, the sample and the detector—of each sub-band includes a unique sub-band optical system designed to optimize the performance over the spectral range spanned by the sub-band radiation. All of the sub-band optical systems are arranged to provide small-spot illumination at the same measurement position. Optional purging of the individual sub-band optical paths further improves performance.

公开(公告)号：US06411385B1

公开(公告)日：2002-06-25

申请号：US09886514

申请日：2001-06-21

申请人： David E. Aspnes ,  Jon Opsal ,  Jeffrey T. Fanton

发明人： David E. Aspnes ,  Jon Opsal ,  Jeffrey T. Fanton

IPC分类号： G01J400

摘要： An optical measurement system for evaluating a reference sample that has at least a partially known composition. The optical measurement system includes a reference ellipsometer and at least one non-contact optical measurement device. The reference ellipsometer includes a light generator, an analyzer and a detector. The light generator generates a beam of quasi-monochromatic light having a known wavelength and a known polarization for interacting with the reference sample. The beam is directed at a non-normal angle of incidence relative to the reference sample to interact with the reference sample. The analyzer creates interference between the S and P polarized components in the light beam after the light beam has interacted with reference sample. The detector measures the intensity of the light beam after it has passed through the analyzer. A processor determines the polarization state of the light beam entering the analyzer from the intensity measured by the detector, and determines an optical property of the reference sample based upon the determined polarization state, the known wavelength of light from the light generator and the composition of the reference sample. The processor also operates the optical measurement device to measure an optical parameter of the reference sample. The processor calibrates the optical measurement device by comparing the measured optical parameter from the optical measurement device to the determined optical property from the reference ellipsometer.