公开(公告)号：US20090109364A1

公开(公告)日：2009-04-30

申请号：US12256840

申请日：2008-10-23

申请人： Joo Young Yang ,  Jung II Lee ,  Jeong Oh Kim ,  Yu Kyeong Ahn ,  Young Kwon Kang ,  Sang Jin Lee ,  Jung Ho Bang

发明人： Joo Young Yang ,  Jung II Lee ,  Jeong Oh Kim ,  Yu Kyeong Ahn ,  Young Kwon Kang ,  Sang Jin Lee ,  Jung Ho Bang

IPC分类号： G02F1/136 ,  G03F7/20 ,  G03F7/00 ,  G03B27/72 ,  G03F1/00

CPC分类号： H01L27/1288 ,  G03F1/36 ,  G03F1/44 ,  G03F1/50 ,  G03F7/0005 ,  H01L27/1214 ,  H01L27/124

摘要： The present invention relates to an exposing device which can form a micron pattern even with an exposing device having a low resolving power by changing a mask pattern, methods for forming a pattern, a channel, and a hole respectively, and a liquid crystal display device therewith and a method for fabricating the same. A method for forming a pattern includes the steps of forming a thin film on a substrate, coating a photoresist film on the thin film, aligning a mask over the photoresist film, the mask formed on a base material, including a light shielding portion having a linear supporting portion and an uneven portion at a boundary of the supporting portion, and a transmission portion defined at regions excluding the light shielding portion, exposing the photoresist film with the mask thereon to a UV beam of a wavelength greater than 300 nm to cause refraction in the vicinity of the uneven portion, and developing the photoresist film exposed thus to form a photoresist film pattern, and patterning the thin film by using the photoresist film pattern thus formed.

摘要翻译： 本发明涉及即使通过改变掩模图案具有低分辨率的曝光装置，也可分别形成图案，通道和孔的方法，以及液晶显示装置，能够形成微米图案的曝光装置 及其制造方法。 形成图案的方法包括以下步骤：在基板上形成薄膜，在薄膜上涂覆光致抗蚀剂膜，在光致抗蚀剂膜上对准掩模，形成在基材上的掩模，包括具有 线性支撑部分和在支撑部分的边界处的不平坦部分，以及限定在除了遮光部分之外的区域的透射部分，使其上具有掩模的光致抗蚀剂膜暴露于波长大于300nm的UV光束以引起折射 在不平坦部分附近，并且使曝光的光致抗蚀剂膜显影以形成光致抗蚀剂图案，并且通过使用由此形成的光致抗蚀剂膜图案来图案化薄膜。

公开(公告)号：US20110306513A1

公开(公告)日：2011-12-15

申请号：US13139095

申请日：2009-12-03

申请人： Eun Young Song ,  Hee Gu Lee ,  Young II Yeom ,  Na Young Ji ,  Jung II Lee ,  Min A. Kang ,  Young Joo Kim ,  Yoon Hee Kang ,  Jae Wha Kim

发明人： Eun Young Song ,  Hee Gu Lee ,  Young II Yeom ,  Na Young Ji ,  Jung II Lee ,  Min A. Kang ,  Young Joo Kim ,  Yoon Hee Kang ,  Jae Wha Kim

IPC分类号： C40B30/04 ,  C40B40/10 ,  C12Q1/68 ,  C07K16/40 ,  G01N33/577 ,  C07H21/00 ,  C07K16/18 ,  C07K16/24 ,  C40B40/06 ,  G01N33/574

CPC分类号： G01N33/5023 ,  C12Q1/6886 ,  C12Q2600/118 ,  C12Q2600/158 ,  G01N33/57438

摘要： The present invention relates to the elucidation of a gene that can act as a novel marker for liver cancer diagnosis and to diagnostic and prognostic measurements of liver cancer using the same. More specifically, it relates to a diagnosis kit that enables diagnostic and prognostic measurement of a liver cancer using a preparation that measures expression levels of at least one gene selected from a group of liver cancer diagnosis markers consisting of S100P, NK4, CCL20, CSPG2, PLAU, MMP12, ESM-1, ABHD7, HCAPG, CXCL-3, Col5A2, MAGEA, GSN, CDC2, CST1, MELK, ATAD2, FAP and MSN and/or a method for diagnostic and prognostic measurement of liver cancer using the same. These have been discovered using normal liver tissues and liver cancer tissues collected from the same liver cancer patient of the present invention and represent the markers whose accuracy and reliability have been greatly improved as markers of liver cancer. The markers of the present invention can be used for the accurate diagnosis and prognosis of liver cancer.

摘要翻译： 本发明涉及可以作为肝癌诊断的新型标志物的基因的阐明，以及使用该基因的肝癌的诊断和预后测定。 更具体地说，本发明涉及能够使用测定从S100P，NK4，CCL20，CSPG2等组成的肝癌诊断标志物组中选出的至少一种基因的表达量的制剂的肝癌的诊断和预后测定的诊断试剂盒， PLAU，MMP12，ESM-1，ABHD7，HCAPG，CXCL-3，Col5A2，MAGEA，GSN，CDC2，CST1，MELK，ATAD2，FAP和MSN和/或使用其进行肝癌的诊断和预后测量的方法。 使用从本发明的同一肝癌患者收集的正常肝组织和肝癌组织已经发现了这些，并且其标志物的准确性和可靠性已经作为肝癌的标志物而大大改善。 本发明的标记物可用于肝癌的准确诊断和预后。

公开(公告)号：US20090191653A1

公开(公告)日：2009-07-30

申请号：US12318531

申请日：2008-12-30

申请人： Jung II Lee

发明人： Jung II Lee

IPC分类号： H01L33/00 ,  H01L21/336

CPC分类号： G02F1/133555 ,  G02F1/136227 ,  H01L27/1248 ,  H01L27/1288

摘要： An array substrate for a transflective liquid crystal display device includes: a substrate; a gate line and a data line on the substrate, the gate line and the data line crossing each other to define a pixel region including a transmissive area and a reflective area surrounding the transmissive area; a thin film transistor having a gate insulating layer, the thin film transistor connected to the gate line and the data line; a first passivation layer on the thin film transistor, the first passivation layer having a drain contact hole exposing a drain electrode of the thin film transistor and a through hole exposing the substrate in the transmissive area; a reflective plate on the first passivation layer; a second passivation layer on the reflective plate; and a pixel electrode on the second passivation layer, the pixel electrode contacting the substrate in the transmissive area through the through hole and contacting the drain electrode through the drain contact hole.