摘要:
An optical recording medium includes a substrate, a first dielectric layer, a recording layer, a second dielectric layer, a super-resolution layer, and a third dielectric layer, which are provided in that order. The super-resolution layer is formed of a material configured such that voids are generated when the material is irradiated with DC light at a predetermined irradiation power for 1 to 300 seconds. Therefore, super-resolution reproduction can be made such that the irradiation power of a readout laser beam does not depend on the size of a recording mark.
摘要:
An optical recording medium includes a substrate, a first dielectric layer, a recording layer, a second dielectric layer, a super-resolution layer, and a third dielectric layer, which are provided in that order. The super-resolution layer is formed of a material configured such that voids are generated when the material is irradiated with DC light at a predetermined irradiation power for 1 to 300 seconds. Therefore, super-resolution reproduction can be made such that the irradiation power of a readout laser beam does not depend on the size of a recording mark.
摘要:
A super-resolution information recording medium, a recording/reproducing apparatus, and a recording/reproducing method uses an information recording medium provides a super-resolution effect by fluid bubbles. The fluid bubbles are formed in at least a portion of the medium by a light beam radiated to reproduce a signal from the information recording medium. Accordingly, the super-resolution information recording medium has improved optical characteristics, so that better recording/reproduction is possible.
摘要:
In an optical information medium comprising an information recording layer having a mark train of marks and spaces, the mark train is read out by scanning it with a laser beam and detecting a light intensity change pattern of reflected laser beam. Provided that the reflected laser beam includes polarized light components which define an angle θ with the mark train, a polarized light component giving θ=0 is x0 component, and a polarized light component giving θ=90° is y0 component, the mark train is read out utilizing at least a light intensity change of x0 component. When pits or recorded marks having a size approximate to or below the resolution limit are read out, the present invention allows high read outputs to be obtained and prevents omission of readout signals.
摘要:
An apparatus for reproducing information stored in an optical recording medium which comprises marks or pits which are arranged at a pitch less than λ/2NA, wherein λ is a wavelength of light used for reproduction and NA is an numerical aperture of an objective lens. The apparatus generally comprises a laser diode, a polarization beam splitter, an objective lens, beam splitters, a low-frequency light detecting system with a photodetector, a high-frequency light detecting system with a photodetector, and a signal processing circuit for combining detection signals from the photodetectors. In the high-frequency light detecting system, before a convergent lens, a shielding band is provided so as to shield the middle of a bundle of rays of reproduction light.
摘要:
An etching resist has a first heat-generating layer, a second heat-generating layer, and a metal compound layer including a metallic oxynitride layer containing a metallic oxynitride. The first heat-generating layer, the metallic oxynitride layer, and the second heat-generating layer are directly or indirectly laminated such that the metallic oxynitride layer is positioned between the first heat-generating layer and the second heat-generating layer.
摘要:
The invention performs super resolution reproduction with a recording layer and a signal reproducing functional layer laminated on a grooved substrate. A length of a mark recorded in a Mark Position method is only one length that is less than the resolution limit in an optical system to be used, and recording marks are formed both on a land and in a groove of the grooved substrate.
摘要:
An etching resist containing a metallic oxynitride. The etching resist of the present invention can be suitably used, for example, in the production of a molded article for surface-working an optical member such as a microlens sheet, a light diffusing sheet, a non-reflective sheet, a sheet for encapsulating photosemiconductor elements, an optical waveguide, an optical disk, or a photosensor.
摘要:
Disclosed is a photolithographic pattern-forming material capable of giving a fine patterned resist layer rapidly and being used repeatedly. The pattern-forming material is a multilayered body comprising a substrate and a photoresist layer thereon which is overlaid with a three-layered composite film for near-field light generation consisting of an intermediate layer of a non-linear optical material such as antimony sandwiched between two dielectric layers. When irradiated with active rays focused on the optically nonlinear layer, a fine optical window or light scattering point is formed therein where a near-field light is generated to pattern-wise expose the photoresist layer.
摘要:
Provided is an optical probe array head device in which a single optical detector or a plurality of optical detectors are disposed to each of the optical probes constituting an optical probe array having a plurality of apertures. The optical detectors are arranged to surround the aperture so as to be able to efficiently detect scattering of a feeble near-field light enabling similtaneous detection of a multipilicity of optical signals. In this device, an optical lens system necessary for optical detection can be omitted by integrating the optical probe array and the optical detectors. In addition, the output signals from the optical detectors can be utilized for conducting position control of the optical probe array head.