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公开(公告)号：US07978306B2
公开(公告)日：2011-07-12
申请号：US12216441
申请日：2008-07-03
CPC分类号： G03F7/70725 , G03F7/70341 , G03F7/7075 , G03F9/7046
摘要： A lithographic apparatus may include an optical element, such as an immersion fluid reservoir, which supported at least in part by a bearing, such as a gas bearing. To enable illumination by the lithographic apparatus of an edge of the substrate, a surrounding structure is provided that surrounds the substrate. A level parameter of the substrate, such as a thickness of the substrate, is measured by a sensor, such as a thickness sensor. By means of an actuator, the substrate table on which the substrate is or will be held is positioned with respect to the surrounding structure, such that a surface of the substrate would be on a substantially same level as a surface of the surrounding structure, thus enabling the optical element to transition from the surface of the substrate to the surface of the surrounding structure and vice versa.
摘要翻译： 光刻设备可以包括至少部分由诸如气体轴承的轴承支撑的光学元件，例如浸没式流体储存器。 为了使基板的边缘的光刻设备进行照明，提供围绕基板的周围结构。 衬底的等级参数，例如衬底的厚度，通过诸如厚度传感器的传感器来测量。 通过致动器，其上放置或将保持衬底的衬底台相对于周围结构定位，使得衬底的表面将处于与周围结构的表面基本相同的高度，因此 使得光学元件能够从衬底的表面转移到周围结构的表面，反之亦然。
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公开(公告)号：US07411657B2
公开(公告)日：2008-08-12
申请号：US10990323
申请日：2004-11-17
申请人： Joost Jeroen Ottens , Noud Jan Gilissen , Martinus Hendrikus Antonius Leenders , Koen Jacobus Johannes Maria Zaal
发明人： Joost Jeroen Ottens , Noud Jan Gilissen , Martinus Hendrikus Antonius Leenders , Koen Jacobus Johannes Maria Zaal
CPC分类号： G03F7/70725 , G03F7/70341 , G03F7/7075 , G03F9/7046
摘要： A lithographic apparatus may include an optical element, such as an immersion fluid reservoir, which supported at least in part by a bearing, such as a gas bearing. To enable illumination by the lithographic apparatus of an edge of the substrate, a surrounding structure is provided that surrounds the substrate. A level parameter of the substrate, such as a thickness of the substrate, is measured by a sensor, such as a thickness sensor. By means of an actuator, the substrate table on which the substrate is or will be held is positioned with respect to the surrounding structure, such that a surface of the substrate would be on a substantially same level as a surface of the surrounding structure, thus enabling the optical element to transition from the surface of the substrate to the surface of the surrounding structure and vice versa.
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公开(公告)号：US20080278697A1
公开(公告)日：2008-11-13
申请号：US12216441
申请日：2008-07-03
IPC分类号： G03B27/52
CPC分类号： G03F7/70725 , G03F7/70341 , G03F7/7075 , G03F9/7046
摘要： A lithographic apparatus may include an optical element, such as an immersion fluid reservoir, which supported at least in part by a bearing, such as a gas bearing. To enable illumination by the lithographic apparatus of an edge of the substrate, a surrounding structure is provided that surrounds the substrate. A level parameter of the substrate, such as a thickness of the substrate, is measured by a sensor, such as a thickness sensor. By means of an actuator, the substrate table on which the substrate is or will be held is positioned with respect to the surrounding structure, such that a surface of the substrate would be on a substantially same level as a surface of the surrounding structure, thus enabling the optical element to transition from the surface of the substrate to the surface of the surrounding structure and vice versa.
摘要翻译： 光刻设备可以包括至少部分由诸如气体轴承的轴承支撑的光学元件，例如浸没式流体储存器。 为了使基板的边缘的光刻设备进行照明，提供围绕基板的周围结构。 衬底的等级参数，例如衬底的厚度，通过诸如厚度传感器的传感器来测量。 通过致动器，其上放置或将保持衬底的衬底台相对于周围结构定位，使得衬底的表面将处于与周围结构的表面基本相同的高度，因此 使得光学元件能够从衬底的表面转移到周围结构的表面，反之亦然。
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公开(公告)号：US09188882B2
公开(公告)日：2015-11-17
申请号：US13160042
申请日：2011-06-14
申请人： Joost Jeroen Ottens , Noud Jan Gilissen , Martinus Hendrikus Antonius Leenders , Koen Jacobus Johannes Maria Zaal
发明人： Joost Jeroen Ottens , Noud Jan Gilissen , Martinus Hendrikus Antonius Leenders , Koen Jacobus Johannes Maria Zaal
CPC分类号： G03F7/70725 , G03F7/70341 , G03F7/7075 , G03F9/7046
摘要： A lithographic apparatus may include an optical element, such as an immersion fluid reservoir, which supported at least in part by a bearing, such as a gas bearing. To enable illumination by the lithographic apparatus of an edge of the substrate, a surrounding structure is provided that surrounds the substrate. A level parameter of the substrate, such as a thickness of the substrate, is measured by a sensor, such as a thickness sensor. By means of an actuator, the substrate table on which the substrate is or will be held is positioned with respect to the surrounding structure, such that a surface of the substrate would be on a substantially same level as a surface of the surrounding structure, thus enabling the optical element to transition from the surface of the substrate to the surface of the surrounding structure and vice versa.
摘要翻译： 光刻设备可以包括至少部分由诸如气体轴承的轴承支撑的光学元件，例如浸没式流体储存器。 为了使基板的边缘的光刻设备进行照明，提供围绕基板的周围结构。 衬底的等级参数，例如衬底的厚度，通过诸如厚度传感器的传感器来测量。 通过致动器，其上放置或将保持衬底的衬底台相对于周围结构定位，使得衬底的表面将处于与周围结构的表面基本相同的高度，因此 使得光学元件能够从衬底的表面转移到周围结构的表面，反之亦然。
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公开(公告)号：US20110241259A1
公开(公告)日：2011-10-06
申请号：US13160042
申请日：2011-06-14
申请人： Joost Jeroen OTTENS , Noud Jan Gilissen , Martinus Hendrikus Antonius Leenders , Koen Jacobus Johannes Maria Zaal
发明人： Joost Jeroen OTTENS , Noud Jan Gilissen , Martinus Hendrikus Antonius Leenders , Koen Jacobus Johannes Maria Zaal
CPC分类号： G03F7/70725 , G03F7/70341 , G03F7/7075 , G03F9/7046
摘要： A lithographic apparatus may include an optical element, such as an immersion fluid reservoir, which supported at least in part by a bearing, such as a gas bearing. To enable illumination by the lithographic apparatus of an edge of the substrate, a surrounding structure is provided that surrounds the substrate. A level parameter of the substrate, such as a thickness of the substrate, is measured by a sensor, such as a thickness sensor. By means of an actuator, the substrate table on which the substrate is or will be held is positioned with respect to the surrounding structure, such that a surface of the substrate would be on a substantially same level as a surface of the surrounding structure, thus enabling the optical element to transition from the surface of the substrate to the surface of the surrounding structure and vice versa.
摘要翻译： 光刻设备可以包括至少部分由诸如气体轴承的轴承支撑的光学元件，例如浸没式流体储存器。 为了使基板的边缘的光刻设备进行照明，提供围绕基板的周围结构。 衬底的等级参数，例如衬底的厚度，通过诸如厚度传感器的传感器来测量。 通过致动器，其上放置或将保持衬底的衬底台相对于周围结构定位，使得衬底的表面将处于与周围结构的表面基本相同的高度，因此 使得光学元件能够从衬底的表面转移到周围结构的表面，反之亦然。
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公开(公告)号：US06741329B2
公开(公告)日：2004-05-25
申请号：US10235854
申请日：2002-09-06
申请人： Martinus Hendrikus Antonius Leenders , Johannes Hubertus Josephina Moors , Erik Roelof Loopstra , Noud Jan Gilissen , Markus Franciscus Antonius Eurlings
发明人： Martinus Hendrikus Antonius Leenders , Johannes Hubertus Josephina Moors , Erik Roelof Loopstra , Noud Jan Gilissen , Markus Franciscus Antonius Eurlings
IPC分类号： G03B2742
CPC分类号： G03F7/70066 , G03F7/70083 , G03F7/70358 , G03F7/70558
摘要： An illumination intensity adjustment device includes a plurality of blades disposed in the projection beam so as to cast half-shadows extending across the illumination field. The blades can be selectively rotated to increase their width perpendicular to the projection beam to control uniformity.
摘要翻译： 照明强度调节装置包括设置在投影光束中的多个叶片，以便投射横过照明场的半阴影。 叶片可以选择性地旋转以增加它们垂直于投影光束的宽度，以控制均匀性。
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公开(公告)号：US06956222B2
公开(公告)日：2005-10-18
申请号：US10743276
申请日：2003-12-23
IPC分类号： G03F7/20 , H01L21/027 , H01L21/683 , A61N5/00
CPC分类号： G03F7/707
摘要： A lithographic projection apparatus includes a radiation system for providing a beam of radiation and a support structure for supporting a patterning device. The patterning device serves to pattern the beam according to a desired pattern. The lithographic projection apparatus includes a substrate table for holding a substrate and a projection system for projecting the patterned beam onto a target portion of the substrate. At least one holding structure includes at least one compliant member holding a pimple plate for holding a removable item for the apparatus.
摘要翻译： 光刻投影装置包括用于提供辐射束的辐射系统和用于支撑图案形成装置的支撑结构。 图案形成装置用于根据期望的图案对束进行图案化。 光刻投影装置包括用于保持基板的基板台和用于将图案化的光束投影到基板的目标部分上的投影系统。 至少一个保持结构包括至少一个柔性构件，其保持用于保持装置的可拆卸物品的丘疹板。
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公开(公告)号：US20100165319A1
公开(公告)日：2010-07-01
申请号：US12642627
申请日：2009-12-18
申请人： Hernes Jacobs , Noud Jan Gilissen , Hans Jansen , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Harmen Klaas Van Der Schoot , Marco Koert Stavenga , Bob Streefkerk , Peter Paul Steijaert , Marcus Martinus Petrus Adrianus Vermeulen , Jan Cornelis Van Der Hoeven
发明人： Hernes Jacobs , Noud Jan Gilissen , Hans Jansen , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Harmen Klaas Van Der Schoot , Marco Koert Stavenga , Bob Streefkerk , Peter Paul Steijaert , Marcus Martinus Petrus Adrianus Vermeulen , Jan Cornelis Van Der Hoeven
IPC分类号： G03B27/32
CPC分类号： G03F7/70341
摘要： An immersion lithographic projection apparatus is disclosed in which a liquid removal system surrounds a liquid supply system which provides liquid to a space between a projection system and a substrate. The liquid removal system is moveable relative to the liquid supply system and is controlled to have substantially zero velocity relative to the moving substrate table. The gap between the liquid supply system and the liquid removal system may be covered and the atmosphere between the liquid supply system and the liquid removal system above the substrate table may be maintained such that the vapor pressure of liquid is relatively high.
摘要翻译： 公开了一种浸没式光刻投影装置，其中液体移除系统围绕向投影系统和基板之间的空间提供液体的液体供应系统。 液体移除系统相对于液体供应系统是可移动的，并且被控制为相对于移动的基板台具有基本上零的速度。 可以覆盖液体供应系统和液体移除系统之间的间隙，并且可以保持液体供应系统和衬底台之上的液体去除系统之间的气氛，使得液体的蒸汽压力相对较高。
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公开(公告)号：US07656502B2
公开(公告)日：2010-02-02
申请号：US11472566
申请日：2006-06-22
申请人： Harmen Klaus Van Der Schoot , Noud Jan Gilissen , Peter Paul Steijaert , Erik Roelof Loopstra , Nicolaas Rudolf Kemper , Nicolaas Ten Kate , Johannes Catharinus Hubertus Mulkens , Martinus Hendrikus Antonius Leenders , Hans Jansen , Marco Koert Stavenga , Jan Cornelis Van Der Hoeven , Bob Streefkerk , Hernes Jacobs , Marcus Martinus Petrus Adrianus Vermeulen
发明人： Harmen Klaus Van Der Schoot , Noud Jan Gilissen , Peter Paul Steijaert , Erik Roelof Loopstra , Nicolaas Rudolf Kemper , Nicolaas Ten Kate , Johannes Catharinus Hubertus Mulkens , Martinus Hendrikus Antonius Leenders , Hans Jansen , Marco Koert Stavenga , Jan Cornelis Van Der Hoeven , Bob Streefkerk , Hernes Jacobs , Marcus Martinus Petrus Adrianus Vermeulen
IPC分类号： G03B27/42
CPC分类号： G03F7/70341
摘要： An immersion lithographic projection apparatus is disclosed in which a liquid removal system surrounds a liquid supply system which provides liquid to a space between a projection system and a substrate. The liquid removal system is moveable relative to the liquid supply system and is controlled to have substantially zero velocity relative to the moving substrate table. The gap between the liquid supply system and the liquid removal system may be covered and the atmosphere between the liquid supply system and the liquid removal system above the substrate table may be maintained such that the vapor pressure of liquid is relatively high.
摘要翻译： 公开了一种浸没式光刻投影装置，其中液体移除系统围绕向投影系统和基板之间的空间提供液体的液体供应系统。 液体移除系统相对于液体供应系统是可移动的，并且被控制为相对于移动的基板台具有基本上零的速度。 可以覆盖液体供应系统和液体移除系统之间的间隙，并且可以保持液体供应系统和衬底台之上的液体去除系统之间的气氛，使得液体的蒸汽压力相对较高。
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公开(公告)号：US20080073602A1
公开(公告)日：2008-03-27
申请号：US11472566
申请日：2006-06-22
申请人： Hernes Jacobs , Noud Jan Gilissen , Hans Jansen , Nicolaas Ten Kate , Nicolaas Kemper , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Johannes Mulkens , Harmen Klaas Van Der Schoot , Marco Koert Stavenga , Bob Streefkerk , Peter-Paul Steijaert , Marcus Vermeulen , Jacco Van Der Hoeven
发明人： Hernes Jacobs , Noud Jan Gilissen , Hans Jansen , Nicolaas Ten Kate , Nicolaas Kemper , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Johannes Mulkens , Harmen Klaas Van Der Schoot , Marco Koert Stavenga , Bob Streefkerk , Peter-Paul Steijaert , Marcus Vermeulen , Jacco Van Der Hoeven
IPC分类号： G01N21/86
CPC分类号： G03F7/70341
摘要： An immersion lithographic projection apparatus is disclosed in which a liquid removal system surrounds a liquid supply system which provides liquid to a space between a projection system and a substrate. The liquid removal system is moveable relative to the liquid supply system and is controlled to have substantially zero velocity relative to the moving substrate table. The gap between the liquid supply system and the liquid removal system may be covered and the atmosphere between the liquid supply system and the liquid removal system above the substrate table may be maintained such that the vapor pressure of liquid is relatively high.
摘要翻译： 公开了一种浸没式光刻投影装置，其中液体移除系统围绕向投影系统和基板之间的空间提供液体的液体供应系统。 液体移除系统相对于液体供应系统是可移动的，并且被控制为相对于移动的基板台具有基本上零的速度。 可以覆盖液体供应系统和液体移除系统之间的间隙，并且可以保持液体供应系统和衬底台之上的液体去除系统之间的气氛，使得液体的蒸汽压力相对较高。
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