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公开(公告)号：US20060096071A1
公开(公告)日：2006-05-11
申请号：US10543904
申请日：2004-01-29
CPC分类号： B29C66/0044 , A44B18/0049 , B29C43/021 , B29C65/02 , B29C66/71 , B29C66/721 , B29C66/727 , B29C66/73117 , B29C66/7392 , B29C67/0044 , B29C2043/023 , B29C2043/3652 , B29C2043/465 , B29L2031/729 , Y10T24/27 , B29K2077/00 , B29K2023/10 , B29K2067/003 , B29K2027/18 , B29K2067/00 , B29K2023/12
摘要： A system and method for manufacturing a substrate having a bed of hooks located therein, in particular a system or manufacturing a hook plate having hooks with enlarged shaped heads. The system can include the use of a heated generally flat coining plate, a resilient layer placed under the hook plate, and a forming sheet placed between the coining plate and the tops of stems to be coined.
摘要翻译： 一种用于制造具有位于其中的钩床的衬底的系统和方法，特别是系统或制造具有带扩大形状头部的钩的钩板。 该系统可以包括使用加热的大致平坦的压印板，放置在钩板下方的弹性层，以及放置在压印板和待干燥的茎的顶部之间的成形纸。
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公开(公告)号：US07919034B2
公开(公告)日：2011-04-05
申请号：US10543904
申请日：2004-01-29
IPC分类号： B29C51/14
CPC分类号： B29C66/0044 , A44B18/0049 , B29C43/021 , B29C65/02 , B29C66/71 , B29C66/721 , B29C66/727 , B29C66/73117 , B29C66/7392 , B29C67/0044 , B29C2043/023 , B29C2043/3652 , B29C2043/465 , B29L2031/729 , Y10T24/27 , B29K2077/00 , B29K2023/10 , B29K2067/003 , B29K2027/18 , B29K2067/00 , B29K2023/12
摘要： A system and method for manufacturing a substrate having a bed of hooks located therein, in particular a system or manufacturing a hook plate having hooks with enlarged shaped heads. The system can include the use of a heated generally flat coining plate, a resilient layer placed under the hook plate, and a forming sheet placed between the coining plate and the tops of stems to be coined.
摘要翻译： 一种用于制造具有位于其中的钩床的衬底的系统和方法，特别是系统或制造具有带扩大形状头部的钩的钩板。 该系统可以包括使用加热的大致平坦的压印板，放置在钩板下方的弹性层，以及放置在压印板和待干燥的茎的顶部之间的成形纸。
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公开(公告)号：US20050010321A1
公开(公告)日：2005-01-13
申请号：US10793361
申请日：2004-03-04
申请人： Michael Contos , Michael Bourdeau , Lonnie Pillar , Robert Sailer
发明人： Michael Contos , Michael Bourdeau , Lonnie Pillar , Robert Sailer
CPC分类号： G05B23/0235 , C25D13/22 , C25D21/12
摘要： A processor-based system for monitoring and optimizing an electrocoating operation comprising at least one data acquisition module configured to receive characteristics of the electrocoating operation and at least one process control module in communication with the at least one data acquisition module and the electrocoating operation. An electrocoating process that includes such a process or based system and methods of using the system are also disclosed.
摘要翻译： 一种用于监测和优化电涂覆操作的基于处理器的系统，包括至少一个数据采集模块，该至少一个数据采集模块被配置为接收电涂覆操作的特性和至少一个与至少一个数据采集模块和电涂覆操作通信的过程控制模块。 还公开了包括这种过程或基于系统和使用该系统的方法的电涂工艺。
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公开(公告)号：US20130181331A1
公开(公告)日：2013-07-18
申请号：US13876225
申请日：2011-09-28
IPC分类号： H01L31/0216 , H01L21/02
CPC分类号： H01L31/02168 , C23C16/36 , C23C16/452 , H01L21/02167 , H01L21/02208 , H01L21/02274 , Y02E10/50
摘要： Provided are silicon-containing films with a refractive index suitable for antireflection, articles having a surface comprising the films, and atmospheric-pressure plasma-enhanced chemical vapor deposition (AE-PECVD) processes for the formation of surface films and coatings. The processes generally include providing a substrate, providing a precursor comprising silicon, and reacting the precursor with a gas comprising nitrogen (N2) in a low-temperature plasma at atmospheric pressure, wherein the products of the reacting form a film on the substrate. An antireflection coating made by the process can have a refractive index of about 1.5 to about 2.2. Articles are provided having a surface that includes the antireflection coating.
摘要翻译： 提供了具有适合于抗反射的折射率的含硅膜，具有包含膜的表面的制品和用于形成表面膜和涂层的大气压等离子体增强化学气相沉积（AE-PECVD）方法。 所述方法通常包括提供衬底，提供包含硅的前体，并在大气压下在低温等离子体中使前体与包含氮（N 2）的气体反应，其中反应产物在衬底上形成膜。 通过该方法制备的抗反射涂层可以具有约1.5至约2.2的折射率。 具有包括抗反射涂层的表面的制品。
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