Method of manufacturing a medium for microfiltration, for
ultrafiltration, or for reverse osmosis
    5.
    发明授权
    Method of manufacturing a medium for microfiltration, for ultrafiltration, or for reverse osmosis 失效
    制造用于微滤,超滤或反渗透的介质的方法

    公开(公告)号:US4562021A

    公开(公告)日:1985-12-31

    申请号:US647481

    申请日:1984-09-05

    摘要: The present invention relates to a method of manufacturing a medium for microfiltration, for ultrafiltration, or for reverse osmosis, wherein hydrolysis is performed on an alkoxide, an organo-metallic compound, or a metal salt of an organic or an inorganic acid, optionally dissolved in an anhydrous organic solvent, in order to obtain a sol of particles of the oxide or of the hydroxide of the corresponding chemical element, a thickening agent is added to the sol, and the resulting sol is slip cast onto a support layer having pores which are larger than pores desired for the filter medium, the thin layer deposited on the support medium is then dried, and then heat treated to eliminate the thickening agent and to sinter the particles of the deposited thin layer. The thickening agent is added to the sol in conjunction with a strong acid whose anion does not form a complex with ions of the oxide or hydroxide metal, and the slip casting is performed by mere putting into contact without filtering.

    摘要翻译: 本发明涉及用于微滤,超滤或反渗透的介质的制造方法,其中在有机或无机酸的醇盐,有机金属化合物或金属盐上进行水解,任选地溶解 在无水有机溶剂中,为了得到氧化物或相应化学元素的氢氧化物颗粒的溶胶,向溶胶中加入增稠剂,将所得溶胶滑移到具有孔的支撑层上, 大于过滤介质所需的孔,然后将沉积在载体介质上的薄层干燥,然后热处理以除去增稠剂并烧结沉积的薄层的颗粒。 将增稠剂与其阴离子与氧化物或氢氧化物金属的离子不形成络合物的强酸相结合,并且通过仅进行过滤而进行接触而进行。

    Structure of the insulator--semiconductor type
    6.
    发明授权
    Structure of the insulator--semiconductor type 失效
    绝缘体 - 半导体类型的结构

    公开(公告)号:US4320178A

    公开(公告)日:1982-03-16

    申请号:US136568

    申请日:1980-04-02

    摘要: Structure of the insulator--semiconductor type constituted by a semiconducting crystalline substrate formed from a III-V compound of formula (A.sup.III B.sup.V) coated with an insulating layer, wherein the substrate has a specific crystalline orientation and wherein the insulator is a sulphide in accordance with the formula (A.sup.III B.sup.V)S.sub.4.It also relates to a process for the preparation of such a structure.Applications of the invention occur in the fields of microelectronics and optoelectronics.

    摘要翻译: 由由绝缘层涂覆的由式(AIIIBV)III-V化合物形成的半导体晶体衬底构成的绝缘体 - 半导体类型的结构,其中该衬底具有特定的结晶取向,并且其中绝缘体是根据 公式(AIIIBV)S4。 它还涉及制备这种结构的方法。 本发明的应用发生在微电子学和光电子学领域。

    Anticorrosion means and compositions containing same
    7.
    发明授权
    Anticorrosion means and compositions containing same 失效
    防腐方法和含有其的组合物

    公开(公告)号:US4613450A

    公开(公告)日:1986-09-23

    申请号:US715918

    申请日:1985-03-25

    摘要: This invention relates to a corrosion inhibitor for protecting metallic surfaces which are in contact with water, in particular circuits, apparatus and devices which use water as energetic or thermic fluid, said corrosion inhibitor being a fluorophosphate compound selected from the group consisting of:(i) compound of the formula M.sub.2.sup.I PO.sub.3 F, xH.sub.2 O(ii) compound of the formula LiM.sup.I PO.sub.3 F, xH.sub.2 O(iii) compound of the formula NaM.sup.I PO.sub.3 F, xH.sub.2 O(iv) compound of the formula M.sup.II PO.sub.3 F, xH.sub.2 O(v) compound of the formula M.sub.2.sup.I M.sup.II (PO.sub.3 F).sub.2, xH.sub.2 O(vi) compound of the formula M.sup.I PO.sub.2 F.sub.2, xH.sub.2 O(vii) compound of the formula M.sup.II (PO.sub.2 F.sub.2).sub.2, x H.sub.2 O(wherein M.sup.I is Na, K, Rb, Cs or HN.sub.4 ; M.sup.II is Mg, Ca, Ba, Sr, Zn, Cd, Mn, Ni or Co; and x is an integer or a fractional number comprised between 0 and 6) and(viii) mixtures thereof.

    摘要翻译: 本发明涉及用于保护与水接触的金属表面的腐蚀抑制剂,特别是使用水作为能量或热流体的电路,设备和装置,所述腐蚀抑制剂是选自以下的氟磷酸盐化合物:(i (Ⅹ)式NaMIPO3F,xH2O化合物(ⅳ)式MIIPO3F化合物,xH2O(Ⅴ)式M2IMII(PO3F)2化合物 ,xH 2 O(vi)式MIPO 2 F 2的化合物,xH 2 O(vii)式MII(PO 2 F 2)2的化合物,x H 2 O(其中MI是Na,K,Rb,Cs或HN 4; MII是Mg,Ca,Ba,Sr ,Zn,Cd,Mn,Ni或Co; x是0至6之间的整数或分数)和(viii)其混合物。