PROCESS FOR PRODUCING HOLLOW SILICON BODIES
    1.
    发明申请
    PROCESS FOR PRODUCING HOLLOW SILICON BODIES 有权
    生产中空硅体的工艺

    公开(公告)号:US20160155871A1

    公开(公告)日:2016-06-02

    申请号:US14950787

    申请日:2015-11-24

    摘要: Hollow bodies having a silicon-comprising shell, are produced by, in a gas comprising at least one silane of the general formula SinH2n+2−mXm with n=1 to 4, m=0 to 2n+2 and X=halogen, (a) generating a non-thermal plasma by an AC voltage of frequency f, or operating a light arc, or introducing electromagnetic energy in the infrared region into the gas, giving a resulting phase which (b) is dispersed in a wetting agent and distilled, and then (c) the distillate is contacted at least once with a mixture of at least two of the substances hydrofluoric acid, nitric acid, water, giving a solid residue comprising hollow bodies having a silicon-comprising shell after the conversion reaction of the distillate with the mixture has abated or ended.

    摘要翻译: 具有含硅壳体的空心体通过包含至少一种通式SinH 2 + 2-m X m的硅烷,n = 1〜4,m = 0〜2n + 2,X =卤素的气体,( a)通过频率f的交流电压产生非热等离子体,或者操作光弧,或者将红外区域的电磁能引入气体中,得到(b)分散在润湿剂中并蒸馏出的相 ,然后(c)馏出物与氢氟酸,硝酸,水中的至少两种物质的混合物至少接触一次,得到包含中空体的固体残余物,所述固体残余物在具有含硅壳体的转化反应之后 馏出物与混合物已经减少或结束。