摘要:
There is disclosed second-order nonlinear glass material wherein a part having second-order nonlinearity contain Ge, H and OH and second-order nonlinear optical constant d of 1 pm/V or more, and a method for producing second-order nonliner glass material comprising treating a porous class material containing Ge with hydrohen, sintering it and subjecting it to a ultraviolet poling treatment. There can be provided second-order nonlinger glass material having second-order nonlinearity which is a sufficiently high and has a sufficiently long lifetime for a practical purpose, in use of the glass material for optical elements or the like.
摘要:
There is disclosed second-order nonlinear glass material wherein a part having second-order nonlinearity contains Ge, H and OH and has second-order nonlinear optical constant d of 1 pm/V or more, and a method for producing second-order nonlinear glass material comprising treating a porous glass material containing Ge with hydrogen, sintering it and subjecting it to a ultraviolet poling treatment. There can be provided second-order nonlinear glass material having second-order nonlinearity which is a sufficiently high and has a sufficiently long lifetime for a practical purpose, in use of the glass material for optical functional elements or the like.
摘要:
There is disclosed a method for producing a base material for optical fiber having a deformed first clad consisting of at least a core, a first clad and a second clad, comprising a step of deforming a shape of a section of the first clad so that it may have at least one linear part when the first clad is formed around the core, a step of depositing porous glass fine particles as the second clad made of the same material as that of the first clad on a glass rod having the deformed first clad to form a porous glass base material, and a step of forming the second clad having a round section by vitrifying it. There can be provided a method for producing a base material for optical fiber wherein a lot of breakages or cracks on the surface of the base material can be prevented in a step of depositing porous glass fine particles for the second clad on the first clad, and base material for optical fiber having no defects, and an optical fiber having an efficient effect of being excited with excitation light.
摘要:
A mask having a center hole for passing through a center fiber, which is one of multiple fibers, and multiple surrounding holes for passing through surrounding fibers, which are the remainder of the multiple fibers, and a stress adjusting unit for holding stresses generated in the center fiber and surrounding fibers to a desired constant value, respectively, are installed. The surrounding fibers are rotated around the center fiber by rotating the mask. The center fiber and the surrounding fibers that have been twisted around the center fiber are heated with a heating apparatus and drawn. The center fiber and the surrounding fibers are fixed using a clamp installed between the stress adjusting unit and the heating apparatus.
摘要:
There is disclosed a method for producing a base material for optical fiber having a deformed first clad consisting of at least a core, a first clad and a second clad, comprising a step of deforming a shape of a section of the first clad so that it may have at least one linear part when the first clad is formed around the core, a step of depositing porous glass fine particles as the second clad made of the same material as that of the first clad on a glass rod having the deformed first clad to form a porous glass base material, and a step of forming the second clad having a round section by vitrifying it. There can be provided a method for producing a base material for optical fiber wherein a lot of breakages or cracks on the surface of the base material can be prevented in a step of depositing porous glass fine particles for the second clad on the first clad, and base material for optical fiber having no defects, and an optical fiber having an efficient effect of being excited with excitation light.
摘要:
A method for manufacturing a synthesized silica glass optical member, the method comprising: providing a porous silica glass body; heating the porous silica glass body in an atmosphere containing hydrogen or oxygen, and sintering the porous silica glass body in an atmosphere containing fluorine compound. Furthermore, a synthesized silica glass optical member manufactured by the method.
摘要:
An electronic level includes a wide-angle lens system having a two-dimensional imaging element configured to form thereon a picture image including an image of a level staff assigned with a code pattern, an extraction part configured to extract the image of the level staff from the picture image, a height-level measurement value calculation part configured to obtain a height-level measurement value indicated by a portion of the code pattern in the image of the level staff extracted by the extraction part, the portion of the code pattern located at a collimation optical axis of the wide-angle lens system, and a calculation part configured to calculate a collimation height from the height-level measurement value.
摘要:
A substrate plasma processing apparatus includes a substrate holding electrode and a counter electrode which are arranged in a chamber, a high frequency generating device which applies a high frequency of 50 MHZ or higher to the substrate holding electrode, a DC negative pulse generating device which applies a DC negative pulse voltage in a manner of superimposing on the high frequency, and a controller controlling to cause intermittent application of the high frequency and cause intermittent application of the DC negative pulse voltage according to the timing of on or off of the high frequency.
摘要:
A temperature measuring apparatus includes a light source, a first splitter, a second splitter, a reference beam reflector, an optical path length adjuster, a reference beam transmitting member, a first to an nth measuring beam transmitting member and a photodetector. The temperature measuring apparatus further includes an attenuator that attenuates the reference beam reflected from the reference beam reflector to thereby make an intensity thereof closer to an intensity of the measurement beam reflected from the temperature measurement object.
摘要:
A plasma processing apparatus includes a shower head that is installed within a processing chamber for processing a substrate therein so as to face a mounting table for mounting the substrate thereon and supplies a gas toward the substrate in a shower pattern through a plurality of gas discharge holes provided in a facing surface of the shower head facing the mounting table; a plurality of gas exhaust holes formed through the shower head to be extended from the facing surface of the shower head to an opposite surface from the facing surface; a multiple number of rod-shaped magnet pillars standing upright in a gas exhaust space communicating with the gas exhaust holes on the side of the opposite surface; and a driving unit that varies a distance between the magnet pillars and the gas exhaust holes by moving at least a part of the magnet pillars.