公开(公告)号：US20050179410A1

公开(公告)日：2005-08-18

申请号：US11059570

申请日：2005-02-17

申请人： Jun Jeong ,  Kwang-Jo Jung ,  Dong-wook Lee ,  Tae-hoon Lee

发明人： Jun Jeong ,  Kwang-Jo Jung ,  Dong-wook Lee ,  Tae-hoon Lee

IPC分类号： G11B19/20 ,  G11B19/28 ,  H02P1/16 ,  H02P6/20 ,  H02P5/46

CPC分类号： G11B19/20 ,  G11B19/2054 ,  H02P1/166

摘要： A method of controlling starting current of an adaptive spindle motor in consideration of maximum allowable consumption power and a disk drive using the method. The method includes measuring a supply voltage supplied to the disk drive, calculating a maximum current that can be supplied to the spindle motor in a range of maximum allowable power in correspondence to the supply voltage measured in the measuring of the supply voltage, and applying the calculated maximum current to the spindle motor to start the spindle motor.

摘要翻译： 考虑到最大允许消耗功率和使用该方法的磁盘驱动器来控制自适应主轴电机的起动电流的方法。 该方法包括：测量提供给磁盘驱动器的电源电压，计算可以在与供电电压的测量中测量的电源电压相对应的最大允许功率的范围内提供给主轴电动机的最大电流， 计算出主轴电机的最大电流以启动主轴电机。

公开(公告)号：US07110205B2

公开(公告)日：2006-09-19

申请号：US11059570

申请日：2005-02-17

申请人： Jun Jeong ,  Kwang-jo Jung ,  Dong-wook Lee ,  Tae-hoon Lee

发明人： Jun Jeong ,  Kwang-jo Jung ,  Dong-wook Lee ,  Tae-hoon Lee

IPC分类号： G11B15/18

CPC分类号： G11B19/20 ,  G11B19/2054 ,  H02P1/166

摘要： A method of controlling starting current of an adaptive spindle motor in consideration of maximum allowable consumption power and a disk drive using the method. The method includes measuring a supply voltage supplied to the disk drive, calculating a maximum current that can be supplied to the spindle motor in a range of maximum allowable power in correspondence to the supply voltage measured in the measuring of the supply voltage, and applying the calculated maximum current to the spindle motor to start the spindle motor.

摘要翻译： 考虑到最大允许消耗功率和使用该方法的磁盘驱动器来控制自适应主轴电机的起动电流的方法。 该方法包括：测量提供给磁盘驱动器的电源电压，计算可以在与供电电压的测量中测量的电源电压相对应的最大允许功率的范围内提供给主轴电动机的最大电流， 计算到主轴电机的最大电流以启动主轴电机。

公开(公告)号：US20090286453A1

公开(公告)日：2009-11-19

申请号：US12385704

申请日：2009-04-16

申请人： Il-young Yoon ,  Tae-hoon Lee ,  Jae-ouk Choo

发明人： Il-young Yoon ,  Tae-hoon Lee ,  Jae-ouk Choo

IPC分类号： B24B49/04 ,  B24B1/00

CPC分类号： B24B37/042 ,  B24B49/04

摘要： In accordance with at least one example embodiment, a method of chemical-mechanical polishing includes re-polishing a polished layer on a wafer based on a measured thickness of the polished layer. In accordance with at least one example embodiment, an apparatus for chemical-mechanical polishing may include a thickness measuring unit configured to measure a thickness of a polished surface on a wafer and to determine a re-polishing time based on the measured thickness. In accordance with example embodiments, a thickness deviation between different lots, wafers, or chips inside a wafer is reduced regardless of the durability of a polishing pad, a polishing head, or a disk used in a polishing apparatus.

摘要翻译： 根据至少一个示例性实施例，化学机械抛光的方法包括基于所测量的抛光层的厚度在晶片上重新抛光抛光层。 根据至少一个示例性实施例，用于化学机械抛光的设备可以包括厚度测量单元，其被配置为测量晶片上的抛光表面的厚度并且基于测量的厚度来确定重新抛光时间。 根据示例性实施例，晶片内的不同批次，晶片或芯片之间的厚度偏差减小，而与研磨装置中使用的抛光垫，抛光头或盘的耐久性无关。

公开(公告)号：US20060003677A1

公开(公告)日：2006-01-05

申请号：US11169731

申请日：2005-06-30

申请人： Moo-yong Park ,  Tae-hoon Lee ,  Jae-eung Koo

发明人： Moo-yong Park ,  Tae-hoon Lee ,  Jae-eung Koo

IPC分类号： B24B1/00

CPC分类号： B24B37/04 ,  B24B57/04 ,  Y02P70/179

摘要： A polishing pad for use in chemically mechanically polishing a semiconductor substrate enhances the uniformity of the rate at which material is removed from the surface of the semiconductor substrate, thereby ensuring the reproducibility of the chemical mechanical polishing process. The polishing pad has main grooves that divide an upper portion of the pad into a plurality of cells. At least one of the cells includes a land portion and a grooved portion substantially enclosed by the land portion. A respective slurry hole extends through the pad to the grooved portion such that slurry supplied through the slurry hole feeds into the grooved portion but is impeded by the land portion from flowing outwardly of the cell.

摘要翻译： 用于化学机械抛光半导体衬底的抛光垫增强了从半导体衬底的表面去除材料的速率的均匀性，从而确保了化学机械抛光工艺的再现性。 抛光垫具有将焊盘的上部分成多个单元的主凹槽。 至少一个电池包括基部和基本上由接地部分包围的开槽部分。 相应的浆料孔通过垫延伸到开槽部分，使得通过浆料孔供应的浆料进入槽部分，但是被陆部部分阻碍从池中向外流动。

公开(公告)号：US07197304B2

公开(公告)日：2007-03-27

申请号：US10422303

申请日：2003-04-24

申请人： Jong-tae Chung ,  Jin-soup Joung ,  Tae-hoon Lee

发明人： Jong-tae Chung ,  Jin-soup Joung ,  Tae-hoon Lee

IPC分类号： H04Q7/20

CPC分类号： H04L41/0677 ,  G01S19/03 ,  H04L41/064 ,  H04L41/065 ,  H04L43/028 ,  H04W24/00

摘要： The present invention relates to a diagnosis system for a wireless data communication protocol, and more particularly, to a wireless data communication protocol diagnosis system enabling to compare/analyze simultaneously a trouble caused by the measurement of a wireless data communication protocol by means of synchronizing individual data communication packets with mobile communication protocol measurement data by receiving the data communication packets transmitted individually from a plurality of terminals to connect to a measuring unit and by providing the individual data communication packets with precise time information from a time information providing means.

摘要翻译： 无线数据通信协议诊断系统技术领域本发明涉及无线数据通信协议的诊断系统，更具体地说，涉及一种无线数据通信协议诊断系统，其能够通过同步个体来同时比较/分析由无线数据通信协议的测量引起的故障 具有移动通信协议测量数据的数据通信分组，通过接收从多个终端单独发送的数据通信分组连接到测量单元，并且通过从时间信息提供装置向各个数据通信分组提供精确的时间信息。

公开(公告)号：US20090305438A1

公开(公告)日：2009-12-10

申请号：US12457040

申请日：2009-05-29

申请人： Il-young Yoon ,  Tae-hoon Lee ,  Jae-ouk Choo

发明人： Il-young Yoon ,  Tae-hoon Lee ,  Jae-ouk Choo

IPC分类号： H01L21/306 ,  H01L21/762 ,  H01L21/66

CPC分类号： H01L21/76229 ,  H01L21/31053 ,  H01L21/67219

摘要： A trench isolation method of a semiconductor device includes forming polishing prevention film patterns on a semiconductor substrate, etching the semiconductor device by using the polishing prevention film patterns as masks and forming trenches, and forming conformal insulation films on the semiconductor substrate and the polishing prevention film patterns by burying the trenches. The conformal insulation films are first polished using a first polishing pad by using a slurry including an abrasive having a polishing selection ratio with respect to the polishing prevention film patterns. The first polished conformal insulation films are second polished using a second polishing pad including an abrasive and by using the polishing prevention film patterns as polishing prevention films.

摘要翻译： 半导体器件的沟槽隔离方法包括在半导体衬底上形成防抛光膜图案，通过使用防抛光膜图案作为掩模蚀刻半导体器件并形成沟槽，并在半导体衬底和抛光防止膜上形成保形绝缘膜 埋葬壕沟的模式。 首先通过使用包括具有抛光选择比的研磨剂的浆料相对于抛光防止膜图案，使用第一抛光垫来抛光保形绝缘膜。 第一抛光保形绝缘膜使用包括研磨剂的第二抛光垫和通过使用抛光防止膜图案作为抛光防止膜进行第二抛光。

公开(公告)号：US07364497B2

公开(公告)日：2008-04-29

申请号：US11169731

申请日：2005-06-30

申请人： Moo-yong Park ,  Tae-hoon Lee ,  Jae-eung Koo

发明人： Moo-yong Park ,  Tae-hoon Lee ,  Jae-eung Koo

IPC分类号： B24B5/00 ,  B24B29/00

CPC分类号： B24B37/04 ,  B24B57/04 ,  Y02P70/179

摘要： A polishing pad for use in chemically mechanically polishing a semiconductor substrate enhances the uniformity of the rate at which material is removed from the surface of the semiconductor substrate, thereby ensuring the reproducibility of the chemical mechanical polishing process. The polishing pad has main grooves that divide an upper portion of the pad into a plurality of cells. At least one of the cells includes a land portion and a grooved portion substantially enclosed by the land portion. A respective slurry hole extends through the pad to the grooved portion such that slurry supplied through the slurry hole feeds into the grooved portion but is impeded by the land portion from flowing outwardly of the cell.

摘要翻译： 用于化学机械抛光半导体衬底的抛光垫增强了从半导体衬底的表面去除材料的速率的均匀性，从而确保了化学机械抛光工艺的再现性。 抛光垫具有将焊盘的上部分成多个单元的主凹槽。 至少一个电池包括基部和基本上由接地部分包围的开槽部分。 相应的浆料孔通过垫延伸到开槽部分，使得通过浆料孔供应的浆料进入槽部分，但是被陆部部分阻碍从池中向外流动。

公开(公告)号：US08941041B2

公开(公告)日：2015-01-27

申请号：US11848583

申请日：2007-08-31

申请人： Tae-hoon Lee

发明人： Tae-hoon Lee

IPC分类号： H05B6/64 ,  H05B6/80 ,  F24C15/20 ,  F24C15/00

CPC分类号： H05B6/6435 ,  F24C15/006 ,  H05B6/642

摘要： A cooking apparatus is provided. The cooking apparatus includes a cooking cavity, an upper space formed above the cooking cavity, lateral side spaces formed to at opposite lateral sides of the cooking cavity, a rear space formed behind the cooking cavity, and a lower space formed below the cooking cavity. A fan provided in the rear space generates a cooling flow that cools components housed in the rear space. A cooling flow path extends from the rear space and into the upper space and lateral side spaces. Flow from the upper space enters the door to cool the door and is exhausted through a lower portion of the door. Flow from the lateral side spaces, which includes an exhaust flow from the cooking cavity, is guided to the lower space and exhausted. In this manner, the cooking apparatus can be completely cooled and cooking odors and heat appropriately exhausted by the cooling fan positioned in the rear space.

摘要翻译： 提供烹饪设备。 烹饪设备包括烹饪腔，形成在烹饪腔上方的上部空间，形成在烹饪腔的相对侧面的侧面空间，形成在烹饪腔后面的后部空间，以及形成在烹饪腔下方的下部空间。 后部空间中设置的风扇产生冷却容纳在后方空间的部件的冷却流。 冷却流路从后部空间延伸到上部空间和侧面空间。 从上部空间的流动进入门以冷却门并且通过门的下部排出。 从包括来自烹饪腔的排出流的横向侧空间的流动被引导到下部空间并排出。 以这种方式，烹饪设备可以被完全冷却，并且烹饪气味和热量由位于后部空间中的冷却风扇适当地排出。

公开(公告)号：US20060176790A1

公开(公告)日：2006-08-10

申请号：US11348339

申请日：2006-02-07

申请人： Jang-hoon Yoo ,  Soo-han Park ,  Chun-seong Park ,  Tae-hoon Lee

发明人： Jang-hoon Yoo ,  Soo-han Park ,  Chun-seong Park ,  Tae-hoon Lee

IPC分类号： G11B5/09 ,  G11B7/00

CPC分类号： G11B7/1369 ,  G11B7/0948 ,  G11B7/1267 ,  G11B7/1376 ,  G11B7/13927 ,  G11B2007/0013

摘要： An optical disk writing and reading apparatus and a method thereof is provided. The optical disk writing and reading apparatus has an optical pick-up for writing or reading data on an optical disk by using a laser light of a certain wavelength, an optical power calculation part for calculating an optical power of the laser light generated from the optical pick-up, and a micom operating the optical power calculation part by every certain time to detect the optical power of the laser light and adjusting the optical power of the laser light based on a preset optimum optical power to be optimized while writing the data on the optical disk.

摘要翻译： 提供了一种光盘写入读取装置及其方法。 光盘写入读取装置具有通过使用一定波长的激光在光盘上写入或读取数据的光学拾取器，用于计算从光学产生的激光的光学功率的光学功率计算部 拾取器和微型计算机，每隔一定时间操作光功率计算部件，以检测激光的光功率，并且基于在将数据写入时优化的预设最佳光功率来调整激光的光功率 光盘。

公开(公告)号：US08826054B2

公开(公告)日：2014-09-02

申请号：US13025564

申请日：2011-02-11

申请人： Tae-hoon Lee

发明人： Tae-hoon Lee

IPC分类号： G06F1/00

CPC分类号： G06F1/3203 ,  G06F1/3275 ,  G06F1/3287 ,  Y02D10/13 ,  Y02D10/14 ,  Y02D10/171

摘要： A computer system and a control method thereof, the computer system includes a host unit which includes a plurality of lines, a plurality of memory units to which power is selectively supplied, a power supply which supplies power to the plurality of memory units, a graphic processor which connects with the host unit through the plurality of lines and accesses the plurality of memory unit, and a controller which controls supply of power to the plurality of memory units on the basis of an operation mode of the host unit, controls whether to use the plurality of lines in transmitting data in accordance with the supply of power to the plurality of memory units, and controls the graphic processor not to access the memory units receiving no power among the plurality of memory units.

摘要翻译： 一种计算机系统及其控制方法，所述计算机系统包括主机单元，其包括多条线路，选择供电的多个存储单元，向所述多个存储单元供电的电源，图形 处理器，其通过多条线路与主机单元连接并访问多个存储单元;以及控制器，其基于主机单元的操作模式控制向多个存储器单元供电的控制器，控制是否使用 所述多条线根据向所述多个存储器单元的供电而发送数据，并且控制所述图形处理器不访问所述多个存储器单元中不接收电力的存储器单元。