公开(公告)号：US06617592B2

公开(公告)日：2003-09-09

申请号：US09810478

申请日：2001-03-19

申请人： Jun Takamatsu ,  Kiyoshi Hattori ,  Hitoshi Sunaoshi ,  Naoharu Shimomura ,  Kiminobu Akeno ,  Munehiro Ogasawara

发明人： Jun Takamatsu ,  Kiyoshi Hattori ,  Hitoshi Sunaoshi ,  Naoharu Shimomura ,  Kiminobu Akeno ,  Munehiro Ogasawara

IPC分类号： A61N500

CPC分类号： H01J37/304 ,  H01J2237/20292 ,  H01J2237/3175

摘要： A charged particle beam system includes a chamber having an opening in a ceiling, a table placed immediately below the opening and movable in one direction, a laser interferometer set in the chamber, including a laser oscillator placed along the moving direction of the table, a movable mirror placed on the table side opposing the oscillator, a beam splitter placed to cross the laser beam and a fixed mirror fixed, immediately above the beam splitter, on the ceiling of the chamber, an optical lens barrel having an opening communicating with the opening of the chamber, and a beam gun set on a ceiling of the optical lens barrel to irradiate a specimen placed on the table with a charged particle beam through the first and second openings. At least an upper wall portion from the opening to the fixed mirror of the chamber is made of an invar alloy.

摘要翻译： 带电粒子束系统包括：在天花板上具有开口的腔室，放置在开口正下方并可在一个方向上移动的工作台;设置在腔室中的激光干涉仪，包括沿着工作台移动方向放置的激光振荡器， 放置在与振荡器相对的台面侧的可移动反射镜，放置成穿过激光束的分束器和在分束器正上方固定的固定镜，位于腔室的天花板上，光学透镜镜筒具有与开口连通的开口 以及设置在光学镜筒的天花板上的射束，以通过第一和第二开口照射放置在桌子上的带有带电粒子束的样本。 至少从腔室的开口到固定反射镜的上壁部分由凹入合金制成。

公开(公告)号：US07528393B2

公开(公告)日：2009-05-05

申请号：US11235411

申请日：2005-09-26

申请人： Kiminobu Akeno

发明人： Kiminobu Akeno

IPC分类号： A61N5/00

CPC分类号： H01L21/67213 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/31793

摘要： A charged particle beam processing apparatus includes a sample chamber to process a substrate including side faces by a charged particle beam, a movable stage in the sample chamber, the stage including a place on which the substrate is to be mounted, a height and position acquiring unit to acquire a height of the substrate on the stage by irradiating a laser beam onto the substrate on the stage and using the laser beam reflected from the substrate and to acquire positions of at least two adjacent side faces among the side faces based on the acquired height, and a calculating unit to calculate a position of center of gravity of the substrate on the stage and a rotation angle as to a rotary axis vertical to the place on which the substrate is to be mounted based on the positions of the at least two adjacent side faces.

摘要翻译： 带电粒子束处理装置包括：样品室，用于处理包含带电粒子束的侧面的基板;样本室中的可移动台;该台包括要安装基板的位置;高度和位置获取 单元，通过将激光束照射在载物台上的基板上并使用从基板反射的激光束并基于获得的位置获取侧面中的至少两个相邻侧面的位置来获取台架上的基板的高度 高度，以及计算单元，其基于所述至少两个位置的位置来计算在所述台上的所述基板的重心位置和垂直于要安装所述基板的位置的旋转轴的旋转角度 相邻的侧面。

公开(公告)号：US20110155930A1

公开(公告)日：2011-06-30

申请号：US12970084

申请日：2010-12-16

申请人： Michihiro KAWAGUCHI ,  Keisuke Yamaguchi ,  Shun Kanezawa ,  Soichiro Mitsui ,  Kiminobu Akeno

发明人： Michihiro KAWAGUCHI ,  Keisuke Yamaguchi ,  Shun Kanezawa ,  Soichiro Mitsui ,  Kiminobu Akeno

IPC分类号： G21K5/10

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/0044

摘要： A substrate cover 40 includes a conductive portion 41 having a shape corresponding to a peripheral edge region of a substrate. Since at least part of the conductive portion includes transmissive portions 47 each formed of a light transmissive member, it is configured so as to allow desired light to penetrate through. The position of each edge portion of the substrate is detected in such a manner that the substrate is disposed with the substrate cover 40 placed thereon between light irradiation means and a light detecting unit, irradiation light directed from the light irradiation means located above the substrate to the edge portion of the substrate is made to penetrate through at least part of the substrate cover 40, the edge portion of the substrate is then irradiated with light from the irradiation means.

摘要翻译： 基板盖40包括具有与基板的周缘区域对应的形状的导电部41。 由于导电部分的至少一部分包括由透光构件形成的透射部分47，所以它被构造成允许期望的光穿透。 以这样的方式检测基板的每个边缘部分的位置，使得基板设置在其上放置有光照射装置和光检测单元之间的基板盖40，从位于基板上方的光照射装置引导的照射光 使基板的边缘部分穿过基板盖40的至少一部分，然后用来自照射装置的光照射基板的边缘部分。

公开(公告)号：US5602645A

公开(公告)日：1997-02-11

申请号：US527633

申请日：1995-09-13

申请人： Mitsuo Tabata ,  Toru Tojo ,  Kiminobu Akeno ,  Toshiyuki Watanabe ,  Tomohide Watanabe ,  Eiji Yamanaka ,  Chikara Itoh ,  Makoto Taya

发明人： Mitsuo Tabata ,  Toru Tojo ,  Kiminobu Akeno ,  Toshiyuki Watanabe ,  Tomohide Watanabe ,  Eiji Yamanaka ,  Chikara Itoh ,  Makoto Taya

IPC分类号： G01N21/956 ,  G03F1/84 ,  H01L21/027 ,  G01B11/00

CPC分类号： G03F1/84 ,  G01N21/95607 ,  G03F1/62

摘要： The present invention provides a pattern evaluating device including light irradiating means for irradiating the rays of light from a light source upon an object, an objective lens through which the light having penetrated through the object passes, an aperture member stopping the diameter of a light beam which has passed the objective lens, a photo receiving element receiving the light beam which has had the diameter stopped by the aperture member, and judging means for evaluating the pattern, following the information of the light received by the photo receiving element and which corresponds to the pattern, wherein the aperture member is capable of changing the numerical aperture, depending whether or not the sample is provided with a pericle.

摘要翻译： 本发明提供了一种图案评估装置，其包括用于将来自光源的光线照射到物体上的光照射装置，穿过物体的光穿过的物镜通过阻止光束直径的孔径构件 已经通过物镜的光接收元件，接收由孔部件阻挡直径的光束的光接收元件，以及用于评估图案的判断装置，遵循由光接收元件接收的光的信息，并且对应于 所述图案，其中所述孔径构件能够根据样品是否设置有微孔而能够改变数值孔径。

公开(公告)号：US07075621B2

公开(公告)日：2006-07-11

申请号：US11012257

申请日：2004-12-16

申请人： Soichiro Mitsui ,  Toru Tojo ,  Kiminobu Akeno

发明人： Soichiro Mitsui ,  Toru Tojo ,  Kiminobu Akeno

IPC分类号： G03B27/42 ,  G03B27/32

CPC分类号： H01L21/681

摘要： An alignment method for substrates includes preparing an alignment apparatus having a movement mechanism to move a target substrate in horizontal and vertical directions, a rotation mechanism to rotate the substrate in a horizontal plane, an illumination tool to irradiate the substrate, an image sensor to pick up an substrate image, an edge position sensor to sense the substrate edge positions, and a control computer, transferring the substrate from a previous stage using the moving mechanism, measuring the substrate position using the image sensor which picks up the image on a back surface of the substrate, while irradiating the substrate with the illumination tool from a sidewise direction, calculating positional shifts regarding X, Y, and θ of the mask, using the edge position sensor and control computer, correcting the positional shifts of the mask by the moving and rotation mechanisms, and transferring the substrate to a next stage.

摘要翻译： 基板的对准方法包括准备具有移动机构的移动机构以使水平和垂直方向移动目标基板的对准装置，使水平面上的基板旋转的旋转机构，照射基板的照明工具，图像传感器 衬底图像的边缘位置传感器，用于感测衬底边缘位置的边缘位置传感器，以及控制计算机，使用移动机构从前一级传送衬底，使用在后表面上拾取图像的图像传感器来测量衬底位置 在使用边缘位置传感器和控制计算机的情况下，使用边缘位置传感器和控制计算机计算关于掩模的X，Y和θ的位置偏移，通过移动来校正掩模的位置偏移，同时利用照明工具从侧向照射基板 和旋转机构，并将衬底转移到下一阶段。

公开(公告)号：US06901314B2

公开(公告)日：2005-05-31

申请号：US10397288

申请日：2003-03-27

申请人： Soichiro Mitsui ,  Toru Tojo ,  Kiminobu Akeno

发明人： Soichiro Mitsui ,  Toru Tojo ,  Kiminobu Akeno

IPC分类号： G01B11/00 ,  G03F9/00 ,  H01L21/027 ,  H01L21/68 ,  G05B19/00

CPC分类号： H01L21/681

摘要： An alignment apparatus for substrates comprises a first movement mechanism moving a substrate to be treated in a horizontal direction, a second movement mechanism moving the substrate in a vertical direction, a rotation mechanism rotating the substrate in a substrate plane, an illumination tool irradiating the substrate from a sidewise direction in a state where the substrate is held in a desired height position by the second movement mechanism, an image sensor picking up an image on a back surface of the substrate in an irradiated state, an edge position sensor sensing plural edge positions of the substrate from an image obtained by the image sensor, and a control computer obtaining a positional shift of the substrate based on the edge positions sensed by the edge position sensor and correcting a positional shift of the horizontal and rotation directions by the first movement and rotation mechanisms.

摘要翻译： 基板对准装置包括：沿水平方向移动待处理基板的第一移动机构，沿垂直方向移动基板的第二移动机构，在基板平面内旋转基板的旋转机构，照射基板的照明工具 在通过第二移动机构将基板保持在期望的高度位置的状态下的侧面方向上，以照射状态在基板的背面拾取图像的图像传感器，感测多个边缘位置的边缘位置传感器 根据由图像传感器获得的图像获得基板的位置偏移;以及控制计算机，基于由边缘位置传感器感测的边缘位置获得基板的位置偏移，并且通过第一移动来校正水平和旋转方向的位置偏移，以及 旋转机制。

公开(公告)号：US08779397B2

公开(公告)日：2014-07-15

申请号：US12970084

申请日：2010-12-16

申请人： Michihiro Kawaguchi ,  Keisuke Yamaguchi ,  Shun Kanezawa ,  Soichiro Mitsui ,  Kiminobu Akeno

发明人： Michihiro Kawaguchi ,  Keisuke Yamaguchi ,  Shun Kanezawa ,  Soichiro Mitsui ,  Kiminobu Akeno

IPC分类号： H01J37/317 ,  H01J37/20

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/0044

摘要： A substrate cover 40 includes a conductive portion 41 having a shape corresponding to a peripheral edge region of a substrate. Since at least part of the conductive portion includes transmissive portions 47 each formed of a light transmissive member, it is configured so as to allow desired light to penetrate through. The position of each edge portion of the substrate is detected in such a manner that the substrate is disposed with the substrate cover 40 placed thereon between light irradiation means and a light detecting unit, irradiation light directed from the light irradiation means located above the substrate to the edge portion of the substrate is made to penetrate through at least part of the substrate cover 40, the edge portion of the substrate is then irradiated with light from the irradiation means.

摘要翻译： 基板盖40包括具有与基板的周缘区域对应的形状的导电部41。 由于导电部分的至少一部分包括由透光构件形成的透射部分47，所以它被构造成允许期望的光穿透。 以这样的方式检测基板的每个边缘部分的位置，使得基板设置在其上放置有光照射装置和光检测单元之间的基板盖40，从位于基板上方的光照射装置引导的照射光 使基板的边缘部分穿过基板盖40的至少一部分，然后用来自照射装置的光照射基板的边缘部分。

公开(公告)号：US20060076514A1

公开(公告)日：2006-04-13

申请号：US11235411

申请日：2005-09-26

申请人： Kiminobu Akeno

发明人： Kiminobu Akeno

IPC分类号： A61N5/00

CPC分类号： H01L21/67213 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/31793

摘要： A charged particle beam processing apparatus includes a sample chamber to process a substrate including side faces by a charged particle beam, a movable stage in the sample chamber, the stage including a place on which the substrate is to be mounted, a height and position acquiring unit to acquire a height of the substrate on the stage by irradiating a laser beam onto the substrate on the stage and using the laser beam reflected from the substrate and to acquire positions of at least two adjacent side faces among the side faces based on the acquired height, and a calculating unit to calculate a position of center of gravity of the substrate on the stage and a rotation angle as to a rotary axis vertical to the place on which the substrate is to be mounted based on the positions of the at least two adjacent side faces.

公开(公告)号：US20050128451A1

公开(公告)日：2005-06-16

申请号：US11012257

申请日：2004-12-16

申请人： Soichiro Mitsui ,  Toru Tojo ,  Kiminobu Akeno

发明人： Soichiro Mitsui ,  Toru Tojo ,  Kiminobu Akeno

IPC分类号： G01B11/00 ,  G03F9/00 ,  H01L21/027 ,  H01L21/68 ,  G03B27/42

CPC分类号： H01L21/681

摘要： An alignment apparatus for substrates comprises a first movement mechanism moving a substrate to be treated in a horizontal direction, a second movement mechanism moving the substrate in a vertical direction, a rotation mechanism rotating the substrate in a substrate plane, an illumination tool irradiating the substrate from a sidewise direction in a state where the substrate is held in a desired height position by the second movement mechanism, an image sensor picking up an image on a back surface of the substrate in an irradiated state, an edge position sensor sensing plural edge positions of the substrate from an image obtained by the image sensor, and a control computer obtaining a positional shift of the substrate based on the edge positions sensed by the edge position sensor and correcting a positional shift of the horizontal and rotation directions by the first movement and rotation mechanisms.

摘要翻译： 基板对准装置包括：沿水平方向移动待处理基板的第一移动机构，沿垂直方向移动基板的第二移动机构，在基板平面内旋转基板的旋转机构，照射基板的照明工具 在通过第二移动机构将基板保持在期望的高度位置的状态下的侧面方向上，以照射状态在基板的背面拾取图像的图像传感器，感测多个边缘位置的边缘位置传感器 根据由图像传感器获得的图像获得基板的位置偏移;以及控制计算机，基于由边缘位置传感器感测的边缘位置获得基板的位置偏移，并且通过第一移动来校正水平和旋转方向的位置偏移，以及 旋转机制。