SYSTEM AND METHOD FOR MANUFACTURING POLYAMIC ACID, AND SYSTEM AND METHOD FOR MANUFACTURING POLYIMIDE

    公开(公告)号:US20210002427A1

    公开(公告)日:2021-01-07

    申请号:US16976579

    申请日:2019-02-14

    Abstract: A polyamic acid manufacturing system for manufacturing a polyamic acid is disclosed using, as raw materials, a first solution in which a polyaddition-type first polymerizable compound is dissolved and a second solution in which a polyaddition-type second polymerizable compound that reacts with the first polymerizable compound through polyaddition is dissolved. The polyamic acid manufacturing system may include: a first supply part for supplying the first solution; a second supply part for supplying the second solution; a first combining part; and a first reaction part, thereby producing a first polymerization solution in which the polyamic acid is dissolved. Further, the polyamic acid manufacturing system may include: a first supply step of supplying the first solution; a second supply step of supplying the second solution; a first combining step; and a first reaction step, thereby producing a first polymerization solution in which the polyamic acid is dissolved.

    ANTI-GLARE FILM FOR SOLAR CELL MODULE, SOLAR CELL MODULE PROVIDED WITH ANTI-GLARE FILM, AND METHOD FOR MANUFACTURING SAME
    3.
    发明申请
    ANTI-GLARE FILM FOR SOLAR CELL MODULE, SOLAR CELL MODULE PROVIDED WITH ANTI-GLARE FILM, AND METHOD FOR MANUFACTURING SAME 审中-公开
    用于太阳能电池模块的防透膜,具有防透膜的太阳能电池模块及其制造方法

    公开(公告)号:US20160190357A1

    公开(公告)日:2016-06-30

    申请号:US14902827

    申请日:2014-06-25

    Abstract: An anti-glare film includes a first inorganic layer and a second inorganic layer in this order has form a substrate side. The first inorganic layer contains transparent spherical inorganic fine particles in an inorganic binder. The inorganic binder in the first inorganic layer mainly includes a silicon oxide containing Si—O bonds obtained by hydrolysis of a Si—H bond and a Si—N bond. The second inorganic layer contains an inorganic binder. Preferably, an average thickness of the first inorganic layer is 500 to 2000 nm, an average thickness of the second inorganic layer is 50 to 1000 nm, and a ratio is 0.025 to 0.5. The second inorganic layer may furthermore contain fine particles. The anti-glare film can be used as an anti-glare film for a solar cell module.

    Abstract translation: 防眩膜依次具有第一无机层和第二无机层,形成基板侧。 第一无机层在无机粘合剂中含有透明的球形无机细颗粒。 第一无机层中的无机粘合剂主要包含通过Si-H键和Si-N键的水解得到的含有Si-O键的氧化硅。 第二无机层含有无机粘结剂。 优选地,第一无机层的平均厚度为500〜2000nm,第二无机层的平均厚度为50〜1000nm,比例为0.025〜0.5。 第二无机层还可以含有细颗粒。 防眩膜可以用作太阳能电池模块的防眩膜。

    SYSTEM AND METHOD FOR MANUFACTURING POLYAMIC ACID, AND SYSTEM AND METHOD FOR MANUFACTURING POLYIMIDE

    公开(公告)号:US20240327573A1

    公开(公告)日:2024-10-03

    申请号:US18744272

    申请日:2024-06-14

    CPC classification number: C08G73/1028 C08G73/1014 C08G73/1017

    Abstract: A polyamic acid manufacturing system for manufacturing a polyamic acid is disclosed using, as raw materials, a first solution in which a polyaddition-type first polymerizable compound is dissolved and a second solution in which a polyaddition-type second polymerizable compound that reacts with the first polymerizable compound through polyaddition is dissolved. The polyamic acid manufacturing system may include: a first supply part for supplying the first solution; a second supply part for supplying the second solution; a first combining part; and a first reaction part, thereby producing a first polymerization solution in which the polyamic acid is dissolved. Further, the polyamic acid manufacturing system may include: a first supply step of supplying the first solution; a second supply step of supplying the second solution; a first combining step; and a first reaction step, thereby producing a first polymerization solution in which the polyamic acid is dissolved.

    System and method for manufacturing polyamic acid, and system and method for manufacturing polyimide

    公开(公告)号:US12054586B2

    公开(公告)日:2024-08-06

    申请号:US16976579

    申请日:2019-02-14

    CPC classification number: C08G73/1028 C08G73/1014 C08G73/1017

    Abstract: A polyamic acid manufacturing system for manufacturing a polyamic acid is disclosed using, as raw materials, a first solution in which a polyaddition-type first polymerizable compound is dissolved and a second solution in which a polyaddition-type second polymerizable compound that reacts with the first polymerizable compound through polyaddition is dissolved. The polyamic acid manufacturing system may include: a first supply part for supplying the first solution; a second supply part for supplying the second solution; a first combining part; and a first reaction part, thereby producing a first polymerization solution in which the polyamic acid is dissolved. Further, the polyamic acid manufacturing system may include: a first supply step of supplying the first solution; a second supply step of supplying the second solution; a first combining step; and a first reaction step, thereby producing a first polymerization solution in which the polyamic acid is dissolved.

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