SEMICONDUCTOR DEVICE
    2.
    发明申请

    公开(公告)号:US20220223611A1

    公开(公告)日:2022-07-14

    申请号:US17369453

    申请日:2021-07-07

    Abstract: A semiconductor device has a first conductivity type semiconductor substrate. A second conductivity type first impurity diffusion layer is disposed in a surface region of the semiconductor substrate. A resistance element is configured with a first conductivity type second impurity diffusion layer disposed in the first impurity diffusion layer in the surface region of the semiconductor substrate. In a transistor, a gate is connected to an input portion of the resistance element, a source is connected to the first impurity diffusion layer, and a drain is connected to a voltage source higher than the voltage of the input portion. A current source is connected to the source.

    SEMICONDUCTOR MEMORY DEVICE
    3.
    发明申请

    公开(公告)号:US20250095760A1

    公开(公告)日:2025-03-20

    申请号:US18823749

    申请日:2024-09-04

    Abstract: According to embodiments, a semiconductor memory device includes a memory string including a first select transistor, a first memory cell, and a second memory cell, a bit line, a first word line, a second word line, and a control circuit configured to execute a write operation including a program operation and a program verify operation. The control circuit is configured to raise a voltage of the second word line to a first voltage based on a first condition, in a case of executing the program verify operation of the first memory cell, and to raise a voltage of the first word line to the first voltage based on a second condition different from the first condition, in a case of executing the program verify operation of the second memory cell.

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