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公开(公告)号:US20230207012A1
公开(公告)日:2023-06-29
申请号:US18171540
申请日:2023-02-20
Applicant: KIOXIA CORPORATION
Inventor: Takatoshi MINAMOTO , Toshiki HISADA , Dai NAKAMURA
IPC: G11C16/04 , H10B41/10 , H10B41/35 , H10B43/10 , H10B43/35 , G11C16/08 , G11C16/10 , G11C16/24 , H01L23/528
CPC classification number: G11C16/0483 , H10B41/10 , H10B41/35 , H10B43/10 , H10B43/35 , G11C16/08 , G11C16/10 , G11C16/24 , H01L23/528
Abstract: A semiconductor memory device includes a memory cell unit, word lines, a driver circuit, and first transistors. The word lines are connected to the control gates of 0-th to N-th memory cells. The (N+1) number of first transistors transfer the voltage to the word lines respectively. Above one of the first transistors which transfers the voltage to an i-th (i is a natural number in the range of 0 to N) word line, M (M
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公开(公告)号:US20240113058A1
公开(公告)日:2024-04-04
申请号:US18538659
申请日:2023-12-13
Applicant: Kioxia Corporation
Inventor: Nobuaki OKADA , Toshiki HISADA
CPC classification number: H01L24/08 , G11C16/0483 , G11C16/08 , G11C16/24 , H01L25/0657 , H01L25/18 , H10B41/27 , H10B43/27 , H01L2224/08145 , H01L2924/1431 , H01L2924/14511
Abstract: A semiconductor storage device includes first and second chips. The first chip includes a first semiconductor substrate, first conductive layers arranged in a first direction and extending in a second direction, a semiconductor column extending in the first direction and facing the first conductive layers, a first charge storage film formed between the first conductive layers and the semiconductor column, a plurality of first transistors on the first semiconductor substrate, and first bonding electrodes electrically connected to a portion of the plurality of first transistors. The second chip includes a second semiconductor substrate, a plurality of second transistors on the second semiconductor substrate, and second bonding electrodes electrically connected to a portion of the plurality of second transistors, and bonded to the first bonding electrodes. A thickness of the second semiconductor substrate in the first direction is smaller than a thickness of the first semiconductor substrate in the first direction.
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公开(公告)号:US20220077088A1
公开(公告)日:2022-03-10
申请号:US17183809
申请日:2021-02-24
Applicant: KIOXIA CORPORATION
Inventor: Nobuaki OKADA , Toshiki HISADA
IPC: H01L23/00 , H01L25/065 , H01L25/18 , H01L27/11556 , H01L27/11582 , G11C16/04 , G11C16/08
Abstract: A semiconductor storage device includes first and second chips. The first chip includes a first semiconductor substrate, first conductive layers arranged in a first direction and extending in a second direction, a semiconductor column extending in the first direction and facing the first conductive layers, a first charge storage film formed between the first conductive layers and the semiconductor column, a plurality of first transistors on the first semiconductor substrate, and first bonding electrodes electrically connected to a portion of the plurality of first transistors. The second chip includes a second semiconductor substrate, a plurality of second transistors on the second semiconductor substrate, and second bonding electrodes electrically connected to a portion of the plurality of second transistors, and bonded to the first bonding electrodes. A thickness of the second semiconductor substrate in the first direction is smaller than a thickness of the first semiconductor substrate in the first direction.
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