ELECTRIC FIELD EMITTING SOURCE, ELEMENT USING SAME, AND PRODUCTION METHOD THEREFOR
    3.
    发明申请
    ELECTRIC FIELD EMITTING SOURCE, ELEMENT USING SAME, AND PRODUCTION METHOD THEREFOR 有权
    电场发射源,使用相同的元件及其生产方法

    公开(公告)号:US20140191650A1

    公开(公告)日:2014-07-10

    申请号:US14152045

    申请日:2014-01-10

    CPC classification number: H01J19/24 H01J1/304 H01J3/021 H01J9/025

    Abstract: An electric field emitting source is equipped with an electron emitting film which comprises a nano-sized electron emitting substance and has a first surface and a second surface constituting the surface opposite thereto, and a cathode which secures one end of the electron emitting film and comprises a first block and a second block respectively corresponding to the first surface and the second surface of the electron emitting film.

    Abstract translation: 电场发射源配备有电子发射膜,该电子发射膜包括纳米尺寸的电子发射物质,并且具有构成与其相对的表面的第一表面和第二表面,以及固定电子发射膜的一端的阴极, 分别对应于电子发射膜的第一表面和第二表面的第一块和第二块。

    X-ray source apparatus and control method thereof

    公开(公告)号:US10912180B2

    公开(公告)日:2021-02-02

    申请号:US16371396

    申请日:2019-04-01

    Abstract: The present disclosure relates to an X-ray source apparatus and a control method of the X-ray source apparatus in which a cathode electrode and a gate electrode are arranged in an array form to enable matrix control, and, thus, it is possible to irradiate X-rays at an optimum dose for each position on the subject. Therefore, it is possible to suppress the irradiation of more X-rays than are needed to the subject. Also, it is possible to obtain a high-resolution and high-quality X-ray image. As such, two-dimensional matrix control makes it easy to control the dose of X-rays and makes it possible to uniformly irradiate X-rays to the subject. Therefore, it is possible to manufacture a high-resolution surface X-ray source with less dependence on the size of the focus of electron beams.

Patent Agency Ranking