Process for shaping ceramic composites
    4.
    发明授权
    Process for shaping ceramic composites 失效
    陶瓷复合材料成型工艺

    公开(公告)号:US5244621A

    公开(公告)日:1993-09-14

    申请号:US865683

    申请日:1992-04-08

    摘要: There are disclosed in process for shaping ceramic composites which comprises shaping a sintered silicon nitride-silicon carbide composite material having a microstructure formed predominantly of equiaxed grains with an average grain size of 2 .mu.m or below and a silicon carbide content of 10-50% by volume, obtained by liquid-phase sintering, at least 40% by volume of the silicon nitride in the material being in the .beta.-phase, by superplastically deforming said material at a strain rate of 10.sup.-6 sec.sup.-1 to 10.sup.-1 sec.sup.-1 under application of tensile stress or compressive stress in a superplastic temperature region of 1400.degree.-1700.degree. C., and a process for shaping ceramic composites which comprises shaping said sintered composite material by superplastic deformation as described above and then heat-treating the shaped article obtained in a non-oxidizing atmosphere under normal or applied pressure at 1000.degree.-2300.degree. C.

    摘要翻译: 在制造陶瓷复合材料的方法中公开了包括使具有主要由等轴晶粒组成的微结构的氮化硅 - 碳化硅复合材料成型,其平均晶粒尺寸为2μm或更小,碳化硅含量为10-50% 通过液相烧结获得的材料中,至少40体积%的材料中的氮化硅在β相中,通过使所述材料以10-6sec-1至10-1sec -1的应变速率进行超塑性变形, 1在1400°-1700℃的超塑性温度区域中施加拉伸应力或压应力,以及一种用于成形陶瓷复合材料的方法,其包括如上所述通过超塑性变形使所述烧结复合材料成形,然后热处理成形 在正常或施加压力下在1000-2200℃下在非氧化性气氛中得到的制品。

    Silicon nitride-silicon carbide composite material and process for
production thereof
    5.
    发明授权
    Silicon nitride-silicon carbide composite material and process for production thereof 失效
    氮化硅 - 碳化硅复合材料及其制造方法

    公开(公告)号:US5134097A

    公开(公告)日:1992-07-28

    申请号:US787129

    申请日:1991-11-04

    IPC分类号: C04B35/584 C04B35/593

    CPC分类号: C04B35/593

    摘要: A sintered silicon nitride-silicon carbide composite material is provided comprising a matrix phase of silicon nitride and silicon carbide where silicon carbide grains having an average diameter of not more than 1 .mu.m are present at grain boundaries of silicon nitride grains and silicon carbide grains having a diameter of several nanometers to several hundred nanometers, typically not more than about 0.5 micrometers, are dispersed within the silicon nitride grains and a dispersion phase where (a) silicon carbide grains having an average diameter of 2 to 50 .mu.m and/or (b) silicon carbide whiskers having a short axis of 0.05 to 10 .mu.m and an aspect ratio of 5 to 300 are dispersed in the matrix phase. A process for the production of the composite material is also provided.

    摘要翻译: 提供了一种烧结氮化硅 - 碳化硅复合材料,其包括氮化硅和碳化硅的基体相,其中平均直径不大于1μm的碳化硅晶粒存在于氮化硅晶粒和碳化硅晶粒的晶界处, 几纳米至几百纳米,通常不超过约0.5微米的直径分散在氮化硅晶粒和分散相中,其中(a)平均直径为2至50微米的碳化硅颗粒和/或( b)短轴为0.05〜10μm,纵横比为5〜300的碳化硅晶须分散在基体相中。 还提供了生产复合材料的方法。