Method for manufacturing semiconductor device, and semiconductor device
    1.
    发明授权
    Method for manufacturing semiconductor device, and semiconductor device 有权
    半导体装置的制造方法以及半导体装置

    公开(公告)号:US07588969B2

    公开(公告)日:2009-09-15

    申请号:US11417182

    申请日:2006-05-04

    IPC分类号: H01L21/00

    摘要: The present invention provides a manufacturing method of a thinned semiconductor device with high reliability at low cost and a semiconductor device manufactured by the method. A peeling layer, a transistor, and an insulating layer are formed in this order over a substrate, an opening is formed so as to expose at least a part of the peeling layer, and the transistor is peeled off from the substrate by a physical means. The peeling layer is formed by forming a metal film and a metal oxide film so as to be in contact with the metal film by a method using a solution.

    摘要翻译: 本发明提供一种以低成本实现高可靠性的薄型半导体器件的制造方法以及通过该方法制造的半导体器件。 在衬底上依次形成剥离层,晶体管和绝缘层,形成开口以使至少一部分剥离层露出,并且晶体管通过物理手段从衬底剥离 。 通过使用溶液的方法,通过形成金属膜和金属氧化物膜以与金属膜接触来形成剥离层。

    Manufacturing method of semiconductor device
    2.
    发明授权
    Manufacturing method of semiconductor device 有权
    半导体器件的制造方法

    公开(公告)号:US07465674B2

    公开(公告)日:2008-12-16

    申请号:US11437983

    申请日:2006-05-22

    IPC分类号: H01L21/311

    摘要: An object of the present invention is to provide a method for manufacturing a semiconductor device with high reliability, at low cost, in which an element forming layer having a thin film transistor and the like provided over a substrate is peeled from the substrate, so that a semiconductor device is manufactured. According to the invention, a metal film is formed over a substrate, a plasma treatment is performed to the metal film in a dinitrogen monoxide atmosphere to form a metal oxide film over the metal film, a first insulating film is formed continuously without being exposed to the air, an element forming layer is formed over the first insulating film, and the element forming layer is peeled from the substrate, so that a semiconductor device is manufactured.

    摘要翻译: 本发明的目的是提供一种以低成本制造具有高可靠性的半导体器件的方法,其中设置在衬底上的薄膜晶体管等的元件形成层从衬底上剥离,使得 制造半导体器件。 根据本发明,在基板上形成金属膜,在一氧化二氮气氛中对金属膜进行等离子体处理,在金属膜上形成金属氧化物膜,连续形成第一绝缘膜而不暴露于 在第一绝缘膜上形成元件形成层的空气,并且元件形成层从基板剥离,从而制造半导体器件。

    Manufacturing method of semiconductor device
    3.
    发明申请
    Manufacturing method of semiconductor device 有权
    半导体器件的制造方法

    公开(公告)号:US20060270191A1

    公开(公告)日:2006-11-30

    申请号:US11437983

    申请日:2006-05-22

    IPC分类号: H01L21/30

    摘要: An object of the present invention is to provide a method for manufacturing a semiconductor device with high reliability, at low cost, in which an element forming layer having a thin film transistor and the like provided over a substrate is peeled from the substrate, so that a semiconductor device is manufactured. According to the invention, a metal film is formed over a substrate, a plasma treatment is performed to the metal film in a dinitrogen monoxide atmosphere to form a metal oxide film over the metal film, a first insulating film is formed continuously without being exposed to the air, an element forming layer is formed over the first insulating film, and the element forming layer is peeled from the substrate, so that a semiconductor device is manufactured.

    摘要翻译: 本发明的目的是提供一种以低成本制造具有高可靠性的半导体器件的方法,其中设置在衬底上的薄膜晶体管等的元件形成层从衬底上剥离,使得 制造半导体器件。 根据本发明,在基板上形成金属膜,在一氧化二氮气氛中对金属膜进行等离子体处理,在金属膜上形成金属氧化物膜,连续形成第一绝缘膜而不暴露于 在第一绝缘膜上形成元件形成层的空气,并且元件形成层从基板剥离,从而制造半导体器件。

    Wireless Chip And Manufacturing Method Thereof
    5.
    发明申请
    Wireless Chip And Manufacturing Method Thereof 有权
    无线芯片及其制造方法

    公开(公告)号:US20080093464A1

    公开(公告)日:2008-04-24

    申请号:US11660165

    申请日:2005-08-10

    摘要: It is an object of the present invention to reduce the cost of a wireless chip, further, to reduce the cost of a wireless chip by enabling the mass production of a wireless chip, and furthermore, to provide a downsized and lightweight wireless chip. A wireless chip in which a thin film integrated circuit peeled from a glass substrate or a quartz substrate is formed between a first base material and a second base material is provided according to the invention. As compared with a wireless chip formed from a silicon substrate, the wireless chip according to the invention realizes downsizing, thinness, and lightweight. The thin film integrated circuit included in the wireless chip according to the invention at least has an n-type thin film transistor having an LDD (Lightly Doped Drain) structure, a p-type thin film transistor having a single drain structure, and a conductive layer functioning as an antenna.

    摘要翻译: 本发明的目的在于降低无线芯片的成本,并且通过实现无线芯片的批量生产,进一步降低无线芯片的成本,此外,提供小型化,轻量化的无线芯片。 根据本发明,提供一种其中从玻璃基板或石英基板剥离的薄膜集成电路形成在第一基材和第二基材之间的无线芯片。 与由硅基板形成的无线芯片相比,根据本发明的无线芯片实现了小型化,薄型化和轻量化。 包括在根据本发明的无线芯片中的薄膜集成电路至少具有具有LDD(轻掺杂漏极)结构的n型薄膜晶体管,具有单个漏极结构的p型薄膜晶体管和导电 层作为天线起作用。

    Wireless chip and manufacturing method thereof
    6.
    发明授权
    Wireless chip and manufacturing method thereof 有权
    无线芯片及其制造方法

    公开(公告)号:US08288773B2

    公开(公告)日:2012-10-16

    申请号:US11660165

    申请日:2005-08-10

    IPC分类号: H01L29/76

    摘要: It is an object of the present invention to reduce the cost of a wireless chip, further, to reduce the cost of a wireless chip by enabling the mass production of a wireless chip, and furthermore, to provide a downsized and lightweight wireless chip. A wireless chip in which a thin film integrated circuit peeled from a glass substrate or a quartz substrate is formed between a first base material and a second base material is provided according to the invention. As compared with a wireless chip formed from a silicon substrate, the wireless chip according to the invention realizes downsizing, thinness, and lightweight. The thin film integrated circuit included in the wireless chip according to the invention at least has an n-type thin film transistor having an LDD (Lightly Doped Drain) structure, a p-type thin film transistor having a single drain structure, and a conductive layer functioning as an antenna.

    摘要翻译: 本发明的目的在于降低无线芯片的成本,并且通过实现无线芯片的批量生产,进一步降低无线芯片的成本,此外,提供小型化,轻量化的无线芯片。 根据本发明,提供一种其中从玻璃基板或石英基板剥离的薄膜集成电路形成在第一基材和第二基材之间的无线芯片。 与由硅基板形成的无线芯片相比,根据本发明的无线芯片实现了小型化,薄型化和轻量化。 包括在根据本发明的无线芯片中的薄膜集成电路至少具有具有LDD(轻掺杂漏极)结构的n型薄膜晶体管,具有单个漏极结构的p型薄膜晶体管和导电 层作为天线起作用。

    Wireless chip and manufacturing method thereof
    9.
    发明授权
    Wireless chip and manufacturing method thereof 有权
    无线芯片及其制造方法

    公开(公告)号:US08790994B2

    公开(公告)日:2014-07-29

    申请号:US13596376

    申请日:2012-08-28

    IPC分类号: H01L21/46

    摘要: It is an object of the present invention to reduce the cost of a wireless chip, further, to reduce the cost of a wireless chip by enabling the mass production of a wireless chip, and furthermore, to provide a downsized and lightweight wireless chip. A wireless chip in which a thin film integrated circuit peeled from a glass substrate or a quartz substrate is formed between a first base material and a second base material is provided according to the invention. As compared with a wireless chip formed from a silicon substrate, the wireless chip according to the invention realizes downsizing, thinness, and lightweight. The thin film integrated circuit included in the wireless chip according to the invention at least has an n-type thin film transistor having an LDD (Lightly Doped Drain) structure, a p-type thin film transistor having a single drain structure, and a conductive layer functioning as an antenna.

    摘要翻译: 本发明的目的在于降低无线芯片的成本,并且通过实现无线芯片的批量生产,进一步降低无线芯片的成本,此外,提供小型化,轻量化的无线芯片。 根据本发明,提供一种其中从玻璃基板或石英基板剥离的薄膜集成电路形成在第一基材和第二基材之间的无线芯片。 与由硅基板形成的无线芯片相比,根据本发明的无线芯片实现了小型化,薄型化和轻量化。 包括在根据本发明的无线芯片中的薄膜集成电路至少具有具有LDD(轻掺杂漏极)结构的n型薄膜晶体管,具有单个漏极结构的p型薄膜晶体管和导电 层作为天线起作用。