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    NANOPARTICLE-CONTAINING MACROCYCLIC OLIGOESTERS
    1.
    发明申请
    NANOPARTICLE-CONTAINING MACROCYCLIC OLIGOESTERS 审中-公开
    含纳米微晶纤维的低聚物

    公开(公告)号：US20100197838A1

    公开(公告)日：2010-08-05

    申请号：US11916394

    申请日：2006-06-02

    申请人： Karl Koehler ,  Ferdinand Hardinghaus ,  Jai-Won Park ,  David-Christopher Glende ,  Klaus Nietzel

    发明人： Karl Koehler ,  Ferdinand Hardinghaus ,  Jai-Won Park ,  David-Christopher Glende ,  Klaus Nietzel

    IPC分类号： C08K3/30 ,  C08L67/02 ,  C08K5/49 ,  C08K5/09 ,  C08K5/17

    CPC分类号： B82Y30/00 ,  C08G63/81 ,  C08K3/01 ,  C08K2201/011 ,  C08L67/00

    摘要： The invention discloses polymeric esters of terephthalic acid with deagglomerated barium sulphate having an average primary particle size of less than 0.5 μm, containing a crystallization inhibitor and being coated with a dispersant, as filler. The dispersant has preferably reactive groups which are able to interact with the surface of the barium sulphate; particular preference is given to dispersants which are able to endow the barium sulphate with a hydrophilic surface and have reactive groups for coupling to or into polymers. Also disclosed is a corresponding precursor based on macrocyclic oligoesters which comprise such barium sulphate.

    摘要翻译： 本发明公开了对苯二甲酸与平均一次粒径小于0.5μm的解聚硫酸钡的聚合酯，其含有结晶抑制剂并且涂覆有分散剂作为填料。 分散剂优选具有能够与硫酸钡表面相互作用的反应性基团; 特别优选能够赋予硫酸钡亲水性表面并具有与聚合物结合或聚合的偶联基团的分散剂。 还公开了基于包含这种硫酸钡的大环低聚酯的相应的前体。

    Particles modified by copolymers of olefinically unsaturated monomers
    6.
    发明申请
    Particles modified by copolymers of olefinically unsaturated monomers 审中-公开
    由烯属不饱和单体的共聚物改性的颗粒

    公开(公告)号：US20090048380A1

    公开(公告)日：2009-02-19

    申请号：US12282234

    申请日：2007-03-22

    申请人： David-Christopher Glende ,  Ferdinand Hardinghaus ,  Jai-Won Park ,  Karl Kohler

    发明人： David-Christopher Glende ,  Ferdinand Hardinghaus ,  Jai-Won Park ,  Karl Kohler

    IPC分类号： C09D133/06 ,  C08K3/30

    CPC分类号： C09D133/10 ,  B82Y30/00 ,  C08B3/20 ,  C08F210/14 ,  C08F212/08 ,  C08F220/06 ,  C08F220/14 ,  C08F220/26 ,  C09D133/062 ,  C09D135/06 ,  C09J133/06 ,  C09J133/10 ,  C09J135/06

    摘要： Particles, especially nanoparticles, being coated with copolymers (A) of olefinically unsaturated monomers (a), preparable by single-stage or multistage controlled free-radical copolymerization in an aqueous medium of (a1) at least one olefinically unsaturated monomer containing at least one chelate-forming group and (a2) at least one olefinically unsaturated monomer different from olefinically unsaturated monomer (a1) and selected from the group consisting of (a21) monomers of the general formula (I): R1R2C═CR3R4, in which the radicals R1, R2, R3, and R4 each independently are hydrogen atoms or substituted or unsubstituted alkyl, cycloalkyl, alkylcycloalkyl, cycloalkylalkyl, aryl, alkylaryl, cycloalkylaryl, arylalkyl or arylcycloalkyl radicals, with the proviso that at least two of the variables R1, R2, R3 and R4 are substituted or unsubstituted aryl, arylalkyl or arylcycloalkyl radicals, especially substituted or unsubstituted aryl radicals, (a22) olefinically unsaturated terpene hydrocarbons, and (a23) dimeric alpha-alkylvinylaromatics. They are suitable as a polyether filler, for adhesives as well.

    摘要翻译： 颗粒，特别是纳米颗粒，其涂覆有烯属不饱和单体（a）的共聚物（A），其可通过在（a1）至少一种含至少一种烯属不饱和单体的烯属不饱和单体的水性介质中通过单级或多级控制的自由基共聚合制备 螯合形成基团和（a2）至少一种不同于烯属不饱和单体（a1）的烯属不饱和单体，选自（a21）通式（I）的单体：R1R2C-CR3R4，其中基团R1 ，R 2，R 3和R 4各自独立地为氢原子或取代或未取代的烷基，环烷基，烷基环烷基，环烷基烷基，芳基，烷基芳基，环烷基芳基，芳基烷基或芳基环烷基，条件是至少两个变量R1，R2，R3 和R 4是取代或未取代的芳基，芳基烷基或芳基环烷基，特别是取代或未取代的芳基，（a22）烯属不饱和萜烯氢 碳氢化合物和（a23）二聚α-烷基乙烯基芳烃。 它们适合作为聚醚填料，也适用于粘合剂。

    Method of chemical mechanical polishing using abrasive particles of alkaline earth metal salts
    9.
    发明授权
    Method of chemical mechanical polishing using abrasive particles of alkaline earth metal salts 失效
    使用碱土金属盐磨料颗粒进行化学机械抛光的方法

    公开(公告)号：US07108586B2

    公开(公告)日：2006-09-19

    申请号：US10870423

    申请日：2004-06-18

    申请人： Karl Koehler ,  Ferdinand Hardinghaus ,  Jai-Won Park

    发明人： Karl Koehler ,  Ferdinand Hardinghaus ,  Jai-Won Park

    IPC分类号： B24B1/00

    CPC分类号： C09G1/02

    摘要： Particles of strontium carbonate, barium carbonate, strontium sulfate and/or barium sulfate having a sufficient degree of fineness, especially when produced synthetically, are suitable as abrasive agents in chemical mechanical polishing (CMP polishing) of components, e.g., microelectronic components such as silicon wafers. The alkaline earth metal salt compounds are used as slurries in water and/or organic liquids and optionally may contain a dispersing agent, and preferably have a pH value of at least 8.

    摘要翻译： 具有足够细度的碳酸锶，碳酸钡，硫酸锶和/或硫酸钡的颗粒，特别是合成生产时，适合作为组分的化学机械抛光（CMP抛光）中的研磨剂，例如微电子组件如硅 晶圆 碱土金属盐化合物用作水和/或有机液体中的浆料，并且任选地可以含有分散剂，并且优选具有至少8的pH值。

    Method of chemical mechanical polishing using abrasive particles of alkaline earth metal salts
    10.
    发明申请
    Method of chemical mechanical polishing using abrasive particles of alkaline earth metal salts 失效
    使用碱土金属盐磨料颗粒进行化学机械抛光的方法

    公开(公告)号：US20050048877A1

    公开(公告)日：2005-03-03

    申请号：US10870423

    申请日：2004-06-18

    申请人： Karl Koehler ,  Ferdinand Hardinghaus ,  Jai-Won Park

    发明人： Karl Koehler ,  Ferdinand Hardinghaus ,  Jai-Won Park

    IPC分类号： B24B37/00 ,  C09G1/02 ,  C09K3/14 ,  H01L21/304 ,  H01L21/306 ,  B24B1/00

    CPC分类号： C09G1/02

    摘要： Particles of strontium carbonate, barium carbonate, strontium sulfate and/or barium sulfate having a sufficient degree of fineness, especially when produced synthetically, are suitable as abrasive agents in chemical mechanical polishing (CMP polishing) of components, e.g., microelectronic components such as silicon wafers. The alkaline earth metal salt compounds are used as slurries in water and/or organic liquids and optionally may contain a dispersing agent, and preferably have a pH value of at least 8.

    摘要翻译： 具有足够细度的碳酸锶，碳酸钡，硫酸锶和/或硫酸钡的颗粒，特别是合成生产时，适合作为组分的化学机械抛光（CMP抛光）中的研磨剂，例如微电子组件如硅 晶圆 碱土金属盐化合物用作水和/或有机液体中的浆料，并且任选地可以含有分散剂，并且优选具有至少8的pH值。