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33 条记录 (耗时 0.017 秒)

    Vertical heat-treating apparatus
    1.
    发明授权
    Vertical heat-treating apparatus 失效
    立式热处理装置

    公开(公告)号：US5163832A

    公开(公告)日：1992-11-17

    申请号：US605377

    申请日：1990-10-30

    申请人： Katsumi Ishii ,  Shingo Watanabe ,  Mitsuo Kato

    发明人： Katsumi Ishii ,  Shingo Watanabe ,  Mitsuo Kato

    IPC分类号： F27D3/00

    CPC分类号： F27D3/0084 ,  Y10S414/14

    摘要： A vertical heat-treating apparatus which allows effective use of an installation space and improved productivity is disclosed. In this system, a plurality of housings, each accommodated with a vertical reactor, are aligned with each other. A gas feed unit and the like are arranged in front of each housing with a space disposed therebetween for conducting maintenance work. A rail is installed along the rear side of the housings. A boat liner is located on the rail for carrying a boat to the housings. An interface mechanism including a horizontal-vertical conversion handling unit for supplying the boat in a vertical state to the boat liner is disposed near the rail.

    摘要翻译： 公开了一种允许有效利用安装空间并提高生产率的立式热处理设备。 在该系统中，各自容纳有垂直反应器的多个壳体彼此对准。 气体供给单元等布置在每个壳体的前面，其间设置有用于进行维护工作的空间。 沿着壳体的后侧安装导轨。 导轨上设有一艘船衬，用于将船带到外壳上。 一个接口机构包括一个水平垂直转换处理单元，用于将垂直状态的船提供给船衬板，靠近轨道。

    Electrostatic Attraction Apparatus for Glass Substrate and Method of Attracting and Releasing the Same
    2.
    发明申请
    Electrostatic Attraction Apparatus for Glass Substrate and Method of Attracting and Releasing the Same 有权
    玻璃基板静电吸引装置及其吸收和释放方法

    公开(公告)号：US20090273879A1

    公开(公告)日：2009-11-05

    申请号：US12225167

    申请日：2006-12-26

    申请人： Mitsuo Kato ,  Shigenari Horie ,  Tatsufumi Aoi ,  Masaki Kawano ,  Yoshitaka Tsumoto ,  Hiroaki Ogasawara ,  Toshiro Kobayashi

    发明人： Mitsuo Kato ,  Shigenari Horie ,  Tatsufumi Aoi ,  Masaki Kawano ,  Yoshitaka Tsumoto ,  Hiroaki Ogasawara ,  Toshiro Kobayashi

    IPC分类号： H02N13/00

    CPC分类号： B65G49/061 ,  H01L21/6831 ,  H02N13/00

    摘要： An object is providing an electrostatic attraction apparatus and an attracting/releasing method capable of reliably attracting and quickly releasing a glass substrate. An attraction force for attracting a glass substrate is obtained according to the physical properties of the glass substrate. In addition to obtaining an attraction voltage (Vc(t)) required for obtaining the attraction force, a holding voltage (Vh(t)) for holding an attraction state and a release voltage (Vr(t)) for releasing the glass substrate are also obtained (S1 to S7) Attraction time period (tc) is actually measured and if this measured time is different from a preset attraction time (t1), the holding voltage (Vh(t)) and the release voltage (Vr(t)) are recalculated according to the actually measured attraction time period (tc) (S8 to S11).

    摘要翻译： 目的在于提供能够可靠地吸引并快速地释放玻璃基​​板的静电吸引装置和吸引/释放方法。 根据玻璃基板的物理性质，得到吸引玻璃基板的吸引力。 除了获得获得吸引力所需的吸引电压（Vc（t））之外，用于保持吸引状态的保持电压（Vh（t））和用于释放玻璃基​​板的释放电压（Vr（t）） （S1〜S7）实际测量吸引时间（tc），如果该测定时间与预设吸引时间（t1）不同，则保持电压（Vh（t））和释放电压（Vr（t） ）根据实际测量的吸引时间周期（tc）重新计算（S8〜S11）。

    Vacuum evaporation coating equipment
    3.
    发明授权
    Vacuum evaporation coating equipment 失效
    真空蒸镀设备

    公开(公告)号：US4649860A

    公开(公告)日：1987-03-17

    申请号：US713743

    申请日：1985-03-19

    申请人： Heisaburo Furukawa ,  Kanji Wake ,  Yoshio Shimozato ,  Kenichi Yanagi ,  Mitsuo Kato ,  Tetsuyoshi Wada ,  Norio Tsukiji ,  Takuya Aiko ,  Toshiharu Kittaka ,  Yasuji Nakanishi

    发明人： Heisaburo Furukawa ,  Kanji Wake ,  Yoshio Shimozato ,  Kenichi Yanagi ,  Mitsuo Kato ,  Tetsuyoshi Wada ,  Norio Tsukiji ,  Takuya Aiko ,  Toshiharu Kittaka ,  Yasuji Nakanishi

    IPC分类号： C23C14/26 ,  C23C14/56 ,  C23C13/08

    CPC分类号： C23C14/562

    摘要： A vacuum evaporation equipment for continuous vacuum evaporation of a metal onto a band or strip of product including at least one vacuum sealing station, provision of ducts that are disposed surrounding the band product and extending from the point of vapor deposition where the band product is subjected to a vacuum evaporation process an a chamber held at a reduced pressure or vacuum state to the extent that substantially no reevaporation of once deposited metal is effectively prevented from occurring. The ducts are adapted to be heated to a temperature substantially higher than the temperature of the steel band product. In addition, there is provided at least one vacuum sealing station with rolls rotatably mounted in the interior of a casing and a complementary sealing bar mounted in a complementary engagement relationship with the rolls having a close gap therebetween. A side panel is mounted self-adjustably in sliding motion in the longitudinal direction along the axes of the rolls on the opposite ends thereof, and heaters are provided to heat the rolls, sealing bar and side panel, respectively.

    摘要翻译： 一种用于将金属连续真空蒸发到包括至少一个真空密封站的产品带或条带上的真空蒸发设备，提供围绕带产品设置并从带状产品所受到的气相沉积点延伸的管道 在真空蒸发过程中，保持在减压或真空状态的室被有效地防止发生一次沉积的金属的基本上不再蒸发。 管道适于被加热到显着高于钢带产品的温度的温度。 此外，提供了至少一个具有可旋转地安装在壳体内部的辊的真空密封站和与辊之间具有紧密间隙的互补啮合关系安装的互补密封条。 侧板在其相对端沿辊的轴线沿纵向方向自由调节地安装，并且分别设置加热器以加热辊，密封条和侧板。

    VACUUM VAPOR DESPOSITION APPARATUS
    7.
    发明申请
    VACUUM VAPOR DESPOSITION APPARATUS 审中-公开
    真空蒸气沉降装置

    公开(公告)号：US20090169720A1

    公开(公告)日：2009-07-02

    申请号：US12396988

    申请日：2009-03-03

    申请人： Keiichi SATO ,  Toshiro Kobayashi ,  Mitsuo Kato ,  Susumu Kamikawa ,  Kouzuo Wada

    发明人： Keiichi SATO ,  Toshiro Kobayashi ,  Mitsuo Kato ,  Susumu Kamikawa ,  Kouzuo Wada

    IPC分类号： C23C16/52

    CPC分类号： C23C14/243 ,  C23C14/543

    摘要： A crucible is a monolithic structure extending over an entire area of a vaporizing chamber and has at least one slit groove provided in the upper surface thereof. The at least one slit groove has a length from one end of the upper surface of the crucible to other end thereof. The at least one slit groove is used as a portion for containing the evaporation material (dopant material or the like). Alternatively, a crucible is a monolithic structure extending over the entire area of the vaporizing chamber and has a plurality of holes provided in the upper surface thereof. The holes are used as portions for containing the evaporation material. Further, the crucible is divided into a plurality of regions, and individual electric heaters are provided under the lower surface of the crucible for the respective regions, whereby temperature can be individually controlled for the respective regions by the electric heaters.

    摘要翻译： 坩埚是在蒸发室的整个区域上延伸的整体结构，并且在其上表面中具有至少一个狭缝槽。 所述至少一个狭缝槽具有从所述坩埚的上表面的一端到其另一端的长度。 使用至少一个狭缝槽作为容纳蒸发材料（掺杂材料等）的部分。 或者，坩埚是在蒸发室的整个区域上延伸的整体结构，并且在其上表面中设置有多个孔。 这些孔用作容纳蒸发材料的部分。 此外，坩埚被分成多个区域，并且在各个区域的坩埚的下表面之下设置单独的电加热器，由此可以通过电加热器对各个区域单独地控制温度。

    Color selecting structure for a cathode-ray tube
    9.
    发明授权
    Color selecting structure for a cathode-ray tube 失效
    阴极射线管的选色结构

    公开(公告)号：US5382871A

    公开(公告)日：1995-01-17

    申请号：US234629

    申请日：1994-04-28

    申请人： Hiroko Funahashi ,  Mitsuo Kato ,  Hidemi Miyamura ,  Jun Yamazaki

    发明人： Hiroko Funahashi ,  Mitsuo Kato ,  Hidemi Miyamura ,  Jun Yamazaki

    IPC分类号： H01J29/07 ,  H01J29/80

    CPC分类号： H01J29/07 ,  H01J2229/0744 ,  H01J2229/0761

    摘要： A color selecting structure for a TRINITRON cathode-ray tube, in which color phosphor stripes are provided and a single electron gun emits three beams, capable of minimizing vertical fringes that deteriorate the quality of a picture displayed on the screen and of attenuating the vibration of a FAG (framing aperture grille plate), includes a thin plate having a plurality of tape-shaped grid (2a) elements and apertures (2a), and fine wires (3) extended across the surface of the aperture grille plate so as to apply a pressure in the range of 6.73.times.10.sup.-6 lbf., 2.24.times.10.sup.-5 lbf. to each grid element (2a).

    摘要翻译： 一种用于TRINITRON阴极射线管的颜色选择结构，其中设置有彩色荧光体条纹，并且单个电子枪发射三束光束，其能够使垂直条纹最小化，从而使屏幕上显示的图像的质量劣化，并且衰减振动 FAG（框架孔格栅板）包括具有多个带状栅格（2a）元件和孔（2a）的薄板和跨过格栅板的表面延伸的细线（3），以便施加 在6.73×10-6 lbf。，2.24×10-5 lbf范围内的压力。 到每个栅格元件（2a）。

    Substrate detecting device for detecting the presence of a transparent and/or an opaque substrate by output of judgement means
    10.
    发明授权
    Substrate detecting device for detecting the presence of a transparent and/or an opaque substrate by output of judgement means 失效
    基板检测装置，用于通过判断装置的输出来检测透明和/或不透明基板的存在

    公开(公告)号：US5354995A

    公开(公告)日：1994-10-11

    申请号：US109430

    申请日：1993-08-20

    申请人： Shunetsu Endo ,  Mitsuo Kato ,  Masato Asakawa

    发明人： Shunetsu Endo ,  Mitsuo Kato ,  Masato Asakawa

    IPC分类号： G01V8/12 ,  G01N21/55 ,  G01N21/59 ,  G06M7/00 ,  H01L21/00 ,  H01L21/67 ,  H01L31/12 ,  G01N21/86

    CPC分类号： H01L21/67259 ,  G01N21/55 ,  G01N21/59

    摘要： A device for detecting a semiconductor wafer in a non-contact manner irrespective of transparency or opacity thereof. At positions corresponding to a plurality of wafers loaded on a carrier, a plurality of light emitting/receiving sensors and a plurality of light receiving sensors are correspondingly provided in pairs in such a manner that their respective light emitting/receiving surfaces and their respective light receiving surface in pairs confront each other. The light emitting/receiving sensors and light receiving sensors are alternately arranged in two rows lengthwise on a sensor support board. In the case of a transparent wafer, a light sent out from a light emitting section of the light emitting/receiving sensor strikes on and is reflected by the surface of the wafer. The thus reflected light is then detected by a light receiving section of the same light emitting/receiving sensor. In the presence of an opaque wafer, a light sent out from the light emitting/receiving sensor is not permitted to reach the confronting light receiving sensor. Conversely, in the absence of the opaque wafer, the light reaches the light receiving sensor for detection. On the other hand, there is provided a judgment section switchably inputting one of a light reception signal generated at the light receiving section of the light emitting/receiving sensor and a light reception signal generated at the light receiving section of the light receiving sensor.

    摘要翻译： 用于以非接触方式检测半导体晶片的装置，而不管其透明度或不透明度如何。 在与载置在载体上的多个晶片相对应的位置，成对地设置有多个发光/接收传感器和多个光接收传感器，使得它们各自的发光/接收表面及其各自的光接收 表面互相对立。 发光/接收传感器和光接收传感器在传感器支撑板上纵向交替布置成两行。 在透明晶片的情况下，从发光/接收传感器的发光部分发出的光线撞击并被晶片的表面反射。 然后由相同的发光/接收传感器的光接收部检测到这样反射的光。 在不透明晶片的存在下，从发光/接收传感器发出的光不允许到达面对的光接收传感器。 相反，在不存在不透明晶片的情况下，光到达用于检测的光接收传感器。 另一方面，提供了一种可切换地输入在发光/接收传感器的光接收部分处产生的光接收信号和在光接收传感器的光接收部分处产生的光接收信号之一的判断部分。