Apparatus for forming a film on a wafer
    1.
    发明授权
    Apparatus for forming a film on a wafer 失效
    用于在晶片上形成薄膜的装置

    公开(公告)号:US5589001A

    公开(公告)日:1996-12-31

    申请号:US159127

    申请日:1993-11-30

    摘要: An apparatus for forming a film by the CVD method allows reaction products to be easily removed from a gas discharge surface without decreasing the uptime/downtime ratio, and includes a gas distributor having a gas discharge surface for discharge of a reaction gas for forming a film on a substrate. A wafer holder has a wafer mounting surface facing the gas discharge surface. A cleaner has a suction head and a brush formed at the entrance of the suction head. A rotary shaft supports the cleaner for movement between the gas discharge surface and a stand-by position and brings the brush of the cleaner onto the gas discharge surface. A vertical positioner moves the wafer holder or gas distributor upward or downward, whereby the wafer holder approaches the gas discharge surface for forming a film and is spaced from the gas discharge surface when cleaning the gas discharge surface by movement of the cleaner on the gas discharge surface.

    摘要翻译: 通过CVD法形成膜的装置允许反应产物容易地从气体放电表面除去而不减少正常运行时间/停机时间比,并且包括具有用于排出形成膜的反应气体的气体放电表面的气体分配器 在基板上。 晶片保持器具有面向气体排出表面的晶片安装表面。 吸尘器在吸头的入口处形成有吸头和刷子。 旋转轴支撑清洁器,用于在排气表面和待机位置之间移动,并将清洁器的刷子带到排气表面上。 垂直定位器向上或向下移动晶片保持器或气体分配器,由此晶片保持器靠近气体排出表面以形成膜,并且通过清洁器在气体放电上的移动来清洁气体排出表面时与气体排出表面间隔开 表面。

    Apparatus for manufacturing semiconductor device
    2.
    发明授权
    Apparatus for manufacturing semiconductor device 失效
    半导体器件制造装置

    公开(公告)号:US5679165A

    公开(公告)日:1997-10-21

    申请号:US531908

    申请日:1995-09-18

    摘要: An apparatus, for forming a film according to an automated continuous CVD (Chemical Vapor Deposition) method includes a wafer holder having a plurality of separate, detachable susceptors, a rotary shaft for rotating the wafer holder to rotate wafer mounting surfaces of the susceptors in one plane, a gas distributor spaced from the wafer holder and facing the moving surface of the wafer mounting surface to discharge a reaction gas onto the wafer mounting surfaces, and a heating instrument spaced from the wafer holder and facing the moving surface of the opposite side of the wafer mounting surfaces, in order to keep the wafer at a stable temperature during forming a film and to allow maintenance and repair to be easily and efficiently performed.

    摘要翻译: 用于根据自动连续CVD(化学气相沉积)方法形成膜的装置包括具有多个分离的可拆卸基座的晶片保持器,用于旋转晶片保持器以使基座的晶片安装表面旋转的旋转轴 平面,与晶片保持器间隔开并面向晶片安装表面的移动表面的气体分配器,以将反应气体排放到晶片安装表面上;以及加热仪器,与晶片保持器间隔开并面对与晶片安装表面相对的移动表面 晶片安装表面,以便在形成膜期间将晶片保持在稳定的温度,并且允许容易且有效地进行维护和修理。

    Hermetic seal and wide-mouthed bottle sealed by the seal
    9.
    发明授权
    Hermetic seal and wide-mouthed bottle sealed by the seal 失效
    密封和密封的密封瓶密封

    公开(公告)号:US6164470A

    公开(公告)日:2000-12-26

    申请号:US254788

    申请日:1999-05-11

    申请人: Hiroshi Chino

    发明人: Hiroshi Chino

    摘要: A hermetic seal for sealing a mouth of a wide-mouthed bottle having a body portion thinly formed by stretch blow molding, and a wide-mouthed bottle a mouth of which is sealed by the hermetic seal. A synthetic resin laminated sheet comprising an aluminum sheet or an aluminum foil as a base is punched into the same shape as a mouth of the wide-mouthed bottle to form the hermetic seal. The sheet is formed into a flat peripheral portion and a bellows inside the flat portion to have alternate multiple mountain and valley portions by press molding concurrently with the punching. The bellows is formed in a concentrical state or in a spiral state to prevent the deformation of the body portion caused by a reduced pressure inside the bottle resulting from cooling

    摘要翻译: PCT No.PCT / JP98 / 03092 Sec。 371日期:1998年5月11日 102(e)日期1998年5月11日PCT提交1998年7月10日PCT公布。 出版物WO99 /​​ 02418 日期1999年1月21日用于密封具有通过拉伸吹塑成型而形成的主体部分的宽口瓶的口的气密密封件,以及通过气密密封密封口的宽口瓶。 将包含铝板或铝箔作为基底的合成树脂层压片材冲压成与宽口瓶子的口相同的形状以形成气密密封。 该片材在平坦部分内形成平坦的周边部分和波纹管,通过与冲压同时的冲压成型具有交替的多个山谷部分。 波纹管形成为同心圆状或螺旋状,以防止由冷却引起的瓶内减压引起的主体部分变形