Liquid-ejection head and method for manufacturing liquid-ejection head substrate
    3.
    发明授权
    Liquid-ejection head and method for manufacturing liquid-ejection head substrate 有权
    液体喷射头和液体喷射头基板的制造方法

    公开(公告)号:US08366950B2

    公开(公告)日:2013-02-05

    申请号:US12204802

    申请日:2008-09-05

    IPC分类号: G01D15/00

    摘要: A method for manufacturing a liquid-ejection head substrate including a silicon substrate having a supply port for supplying liquid is provided. The method includes: forming an etching mask layer on a surface of the silicon substrate, the etching mask layer having an opening in a portion corresponding to the supply port; forming a first recess in the surface of the silicon substrate by anisotropically etching the silicon substrate through the opening in the etching mask layer; forming a second recess that extends toward the other surface of the silicon substrate, in a surface of the first recess in the silicon substrate; and forming the supply port by anisotropically etching the silicon substrate from the surface provided with the second recess.

    摘要翻译: 提供一种制造包括具有用于供应液体的供给口的硅基板的液体喷射头基板的方法。 该方法包括:在硅衬底的表面上形成蚀刻掩模层,该蚀刻掩模层在与供给口对应的部分中具有开口; 通过在蚀刻掩模层中的开口各向异性蚀刻硅衬底,在硅衬底的表面中形成第一凹槽; 形成在所述硅衬底的所述第一凹部的表面中朝向所述硅衬底的另一表面延伸的第二凹部; 以及通过从设置有所述第二凹部的表面各向异性地蚀刻所述硅衬底而形成所述供给口。

    LIQUID-EJECTION HEAD AND METHOD FOR MANUFACTURING LIQUID-EJECTION HEAD SUBSTRATE
    4.
    发明申请
    LIQUID-EJECTION HEAD AND METHOD FOR MANUFACTURING LIQUID-EJECTION HEAD SUBSTRATE 有权
    液体喷射头及其制造方法

    公开(公告)号:US20090065474A1

    公开(公告)日:2009-03-12

    申请号:US12204802

    申请日:2008-09-05

    IPC分类号: B41J2/16

    摘要: A method for manufacturing a liquid-ejection head substrate including a silicon substrate having a supply port for supplying liquid is provided. The method includes: forming an etching mask layer on a surface of the silicon substrate, the etching mask layer having an opening in a portion corresponding to the supply port; forming a first recess in the surface of the silicon substrate by anisotropically etching the silicon substrate through the opening in the etching mask layer; forming a second recess that extends toward the other surface of the silicon substrate, in a surface of the first recess in the silicon substrate; and forming the supply port by anisotropically etching the silicon substrate from the surface provided with the second recess.

    摘要翻译: 提供一种制造包括具有用于供应液体的供给口的硅基板的液体喷射头基板的方法。 该方法包括:在硅衬底的表面上形成蚀刻掩模层,该蚀刻掩模层在与供给口对应的部分中具有开口; 通过在蚀刻掩模层中的开口各向异性蚀刻硅衬底,在硅衬底的表面中形成第一凹槽; 形成在所述硅衬底的所述第一凹部的表面中朝向所述硅衬底的另一表面延伸的第二凹部; 以及通过从设置有所述第二凹部的表面各向异性地蚀刻所述硅衬底而形成所述供给口。

    Process of producing liquid discharge head
    5.
    发明授权
    Process of producing liquid discharge head 有权
    生产液体排放头的工艺

    公开(公告)号:US08163187B2

    公开(公告)日:2012-04-24

    申请号:US12478602

    申请日:2009-06-04

    IPC分类号: B41J2/05

    摘要: Provided is a process of producing a liquid discharge head having a substrate, a passage-forming member, and a patterned layer. The process includes providing a resin layer on a substrate; providing a resist pattern on the resin layer for patterning the resin layer; forming a patterned layer by patterning the resin layer using the resist pattern as a mask; providing a layer for forming a passage pattern having a shape of passage on the resist pattern lying on the patterned layer; forming a passage pattern by patterning the layer for forming a passage pattern; removing the resist pattern; providing a passage-forming member so as to cover the passage pattern and the patterned layer; and removing the passage pattern to give the passage.

    摘要翻译: 提供了一种制造具有基板,通道形成部件和图案化层的排液头的方法。 该方法包括在基底上提供树脂层; 在树脂层上提供抗蚀剂图案,用于图案化树脂层; 通过使用抗蚀剂图案作为掩模对树脂层进行图案化来形成图案层; 提供用于在位于图案化层上的抗蚀剂图案上形成具有通道形状的通道图案的层; 通过图案化形成通道图案的层来形成通道图案; 去除抗蚀剂图案; 提供通道形成构件以覆盖通道图案和图案层; 并且去除通道图案以给出通道。

    PROCESS OF PRODUCING LIQUID DISCHARGE HEAD
    6.
    发明申请
    PROCESS OF PRODUCING LIQUID DISCHARGE HEAD 有权
    生产液体排放头的过程

    公开(公告)号:US20090302502A1

    公开(公告)日:2009-12-10

    申请号:US12478602

    申请日:2009-06-04

    IPC分类号: B29C67/00

    摘要: Provided is a process of producing a liquid discharge head having a substrate, a passage-forming member, and a patterned layer. The process includes providing a resin layer on a substrate; providing a resist pattern on the resin layer for patterning the resin layer; forming a patterned layer by patterning the resin layer using the resist pattern as a mask; providing a layer for forming a passage pattern having a shape of passage on the resist pattern lying on the patterned layer; forming a passage pattern by patterning the layer for forming a passage pattern; removing the resist pattern; providing a passage-forming member so as to cover the passage pattern and the patterned layer; and removing the passage pattern to give the passage.

    摘要翻译: 提供了一种制造具有基板,通道形成部件和图案化层的排液头的方法。 该方法包括在基底上提供树脂层; 在树脂层上提供抗蚀剂图案,用于图案化树脂层; 通过使用抗蚀剂图案作为掩模对树脂层进行图案化来形成图案层; 提供用于在位于图案化层上的抗蚀剂图案上形成具有通道形状的通道图案的层; 通过图案化形成通道图案的层来形成通道图案; 去除抗蚀剂图案; 提供通道形成构件以覆盖通道图案和图案层; 并且去除通道图案以给出通道。